CN1102470C - 一种冲压模具及用该模具模压的计算机用玻璃基片 - Google Patents

一种冲压模具及用该模具模压的计算机用玻璃基片 Download PDF

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CN1102470C
CN1102470C CN96113357A CN96113357A CN1102470C CN 1102470 C CN1102470 C CN 1102470C CN 96113357 A CN96113357 A CN 96113357A CN 96113357 A CN96113357 A CN 96113357A CN 1102470 C CN1102470 C CN 1102470C
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metal die
glass substrate
computer memory
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mold
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坂本恭章
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Zatec Tech. K.K.
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06—Construction of plunger or mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06—Construction of plunger or mould
    • C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
    • C23C16/0263—Irradiation with laser or particle beam
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73913—Composites or coated substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/24—Carbon, e.g. diamond, graphite, amorphous carbon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/40—Product characteristics
    • C03B2215/44—Flat, parallel-faced disc or plate products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/40—Product characteristics
    • C03B2215/45—Ring or doughnut disc products or their preforms
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers

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  • Moulds For Moulding Plastics Or The Like (AREA)
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Abstract

在涂覆碳涂层之前，通过在超硬材料制成的金属模具的成形表面注入离子，可增加碳涂层在模具材料表面的粘附性，并提高模具的寿命。在金属冲压模具中，通过在表面涂覆碳涂层保证具有所需的平整度，该模具的特征在于在涂覆碳涂层之前通过离子注入使成形表面的表面层改性。

Description

一种冲压模具及用该模具模压的计算机用玻璃基片
本发明涉及一种冲压计算机存贮器用硬盘的玻璃基片的模具，以及用该模具冲压的计算机存贮器用模压玻璃基片。
迄今为止，通常使用由涂覆磁性材料的铝基片制成的硬盘。但是，由于需要很多研磨加工以得到特定的铝基片表面粗糙度，因而制造成本高。
出于上述考虑，本发明的目的是提供一种冲压模具，它能得到特定的表面粗糙度，还提供了用该冲压模具冲压的计算机存贮器装置用的玻璃基片，它们的成本均低。
依据本发明，尽管涂覆有石墨或非晶型碳的金属模具具有所需要的平整度，但是在涂覆碳之前还是要在超硬模具材料表面注入氮离子，并将模具的表面层改性。
根据该方法，可以增强碳在模具上的粘附性，因而可大大提高模具的寿命。
在本发明中，至少在表面的0.5μm深度内注入离子，然后再于该离子注入表面上涂覆0.1-1μm厚的碳涂层。另外，将表面处理以使平整度达到2/1000-8/1000。
另外，依据本发明，用金属模具模压用于计算机存贮器用玻璃基片的玻璃板，该金属模具表面通过注入离子然后涂覆石墨或非晶金刚石型碳而得到改性。
图1表示计算机存贮器用玻璃基片，它是用本发明的金属模具模压的。
下面详述本发明的实施方案。这里，通过离子注入例如氮原子的离子注入，随后涂覆石墨或非晶金刚石型碳，将表面平整度大于8/1000的由超硬材料制成的金属模具改性以在表面层上形成高斯分布。
即，通过离子注入在超硬合金表面的至少0.5μm深度内形成离子注入层，然后，在该离子注入层上形成厚度为0.1-1μm的碳涂层，再将最后一层表面修平以保持平整度为2/1000-8/1000。
通过使用本发明的金属模具，可以模压附图所示的计算机存贮器用的玻璃基片1。
在离子注入方法中使用高频放电(105-107Hz)，通过保持离子化电流为10mA，离子辐射剂量为100剂量，温度为300-500℃，时间为10-40秒，可以将离子注入到表面层的至少为0.5μm的深度内，然后在该金属模具的离子注入层上涂覆非晶金刚石型碳，厚度为0.1-1μm。
例如，如果用本发明的金属模具冲压约63mm的玻璃板，首先将预成形为圆盘的玻璃板加热到玻璃材料的软化温度，然后将该加热的玻璃板装入加热至相同温度的金属模具中，之后进行冲压。冲压之后，将冲压的玻璃板在15-20分钟内逐渐冷却并冷至室温。尽管进行了100,000次这种冲压操作，也没有观察到碳涂层从金属模具表面剥落。由这种实际的结果可以看出本发明的效果。
该金属模具的寿命明显提高的原因看来是由于通过将玻璃温度与模具温度保持一致，减少了金属模具的疲劳，还由于离子辐射改善了金属模具的剥落性能。
如上详述，在本发明中，在涂覆碳之前，通过离子注入使金属模具的成型表面在表面层上得到改性，之后，这可以大大地提高碳涂层在金属模具上的粘附性，并提高金属模具的寿命，而且省去了冲压产品的抛光步骤，这是因为模压的玻璃板具有高等级的平整度。
在用本发明的模具得到玻璃基片后，用磁性材料涂覆该玻璃基片的表面。

Claims (4)

1，一种用于冲压计算机存贮器用模压玻璃基片的金属模具，其中通过用碳涂覆由超硬材料制成的所述模具表面来保证所需的平整度，其特征在于在涂覆碳涂层之前对所述金属模具的所述表面进行离子注入并使所述表面层改性。
2，权利要求1的用于冲压计算机存贮器用模压玻璃基片的金属模具，其中对所述模具的所述表面进行了深达所述表面层至少0.5μm的离子注入。
3，权利要求1的用于冲压玻璃基片的金属模具，其中在所述离子注入层上的碳涂层为0.1-1μm厚。
4，用作计算机存贮器玻璃基片的模压玻璃板，用由超硬材料制成的金属模具冲压成型，通过在金属模具表面涂覆碳涂层使所述的金属模具具有所需的平整度，所述表面在涂覆碳涂层之前进行离子注入而被改性。
CN96113357A 1995-08-29 1996-08-29 一种冲压模具及用该模具模压的计算机用玻璃基片 Expired - Fee Related CN1102470C (zh)

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KR100385257B1 (ko) 2003-08-09
JPH09183622A (ja) 1997-07-15
GB9618034D0 (en) 1996-10-09
CA2184206A1 (en) 1997-03-01
CN1147983A (zh) 1997-04-23
MY115041A (en) 2003-03-31
AU6432296A (en) 1997-03-06
JP3275091B2 (ja) 2002-04-15
CA2184206C (en) 2002-10-08
FR2738236B1 (fr) 1999-03-12
ZA967329B (en) 1997-03-04
JP2909724B2 (ja) 1999-06-23
SG47172A1 (en) 1998-03-20
GB2304736B (en) 1999-09-22
NL1003899A1 (nl) 1997-03-03
AU718549B2 (en) 2000-04-13
FR2738236A1 (fr) 1997-03-07
NL1003899C2 (nl) 1998-02-12
GB2304736A (en) 1997-03-26
KR970010687A (ko) 1997-03-27
IL119144A0 (en) 1996-11-14
JPH09194227A (ja) 1997-07-29

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