KR950004410A - 반도체장치의 게이트형성방법 - Google Patents
반도체장치의 게이트형성방법 Download PDFInfo
- Publication number
- KR950004410A KR950004410A KR1019930013692A KR930013692A KR950004410A KR 950004410 A KR950004410 A KR 950004410A KR 1019930013692 A KR1019930013692 A KR 1019930013692A KR 930013692 A KR930013692 A KR 930013692A KR 950004410 A KR950004410 A KR 950004410A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- gate
- polysilicon
- deposited
- melting point
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract 5
- 238000000034 method Methods 0.000 title claims 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract 5
- 229920005591 polysilicon Polymers 0.000 claims abstract 5
- 238000002844 melting Methods 0.000 claims abstract 3
- 230000008018 melting Effects 0.000 claims abstract 3
- 239000002184 metal Substances 0.000 claims abstract 3
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract 2
- 238000000151 deposition Methods 0.000 claims 2
- 238000005468 ion implantation Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 230000035515 penetration Effects 0.000 abstract 1
- 230000006641 stabilisation Effects 0.000 abstract 1
- 238000011105 stabilization Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
- H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
- H01L21/28052—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a silicide layer formed by the silicidation reaction of silicon with a metal layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
본 발명은 반도체장치의 게이트형성방법에 관한 것으로, 붕소침투 및 폴리사이드의 열적분안정 요인에 의한 불량을 방지하기 위하여 게이트로서 폴리실리콘/비정질실리콘/게이트절연막의 구조를 증착하고 BF2 +를 이온주입한 고융점 금속을 증착하고 실리사이드화 하여 폴리사이드를 형성한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도 및 제 2 도는 본 발명의 제 1 실시예를 나타낸 도면, 제 3 도 내지 제 4 도는 본 발명의 제 2 실시예를 나타낸 도면이다.
Claims (5)
- 반도체기판상에 형성된 게이트절연막상에 비정질실리콘과 폴리실리콘을 연속적으로 증착한 후, 소정의 불순물을 이온주입하고 열처리하는 공정을 포함함을 특징으로 하는 반도체장치의 게이트형성방법.
- 제 1 항에 있어서, 상기 불순물로 BF2 +를 이온주입함을 특징으로 하는 반도체장치의 게이트형성방법.
- 제 1 항에 있어서, 상기 공정후에 상기 폴리실리콘층 상에 고융점 금속을 증착하고 열처리하여 폴리사이드를 형성하는 공정이 더 포함됨을 특징으로 하는 반도체장치의 게이트형성방법.
- 제 3 항에 있어서, 상기 고융점 금속으로 Co를 증착함을 특징으로 하는 반도체장치의 게이트형성방법.
- 제 3 항에 있어서, 상기 폴리실리콘을 폴리사이드 형성시 소모되리라고 예상되는 두께만큼 증착함을 특징으로 하는 반도체장치의 게이트형성방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930013692A KR0135166B1 (ko) | 1993-07-20 | 1993-07-20 | 반도체장치의 게이트 형성방법 |
DE4420052A DE4420052C2 (de) | 1993-07-20 | 1994-06-08 | Verfahren zur Herstellung eines Silizid-Gates für MOS-Halbleitereinrichtungen |
JP6189005A JP2707415B2 (ja) | 1993-07-20 | 1994-07-20 | 半導体装置のゲート形成方法 |
US08/565,634 US5712181A (en) | 1993-07-20 | 1995-11-29 | Method for the formation of polycide gate in semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930013692A KR0135166B1 (ko) | 1993-07-20 | 1993-07-20 | 반도체장치의 게이트 형성방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950004410A true KR950004410A (ko) | 1995-02-18 |
KR0135166B1 KR0135166B1 (ko) | 1998-04-25 |
Family
ID=19359624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930013692A KR0135166B1 (ko) | 1993-07-20 | 1993-07-20 | 반도체장치의 게이트 형성방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5712181A (ko) |
JP (1) | JP2707415B2 (ko) |
KR (1) | KR0135166B1 (ko) |
DE (1) | DE4420052C2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100425988B1 (ko) * | 1999-12-18 | 2004-04-03 | 엘지전자 주식회사 | 교환기에서 가입자 보드 메시지 표시 장치 |
Families Citing this family (19)
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---|---|---|---|---|
US6703672B1 (en) * | 1995-09-29 | 2004-03-09 | Intel Corporation | Polysilicon/amorphous silicon composite gate electrode |
JPH09115833A (ja) * | 1995-10-07 | 1997-05-02 | Hyundai Electron Ind Co Ltd | 半導体素子のポリシリコン膜製造方法 |
US5981364A (en) * | 1995-12-06 | 1999-11-09 | Advanced Micro Devices, Inc. | Method of forming a silicon gate to produce silicon devices with improved performance |
US5994182A (en) * | 1996-01-18 | 1999-11-30 | Micron Technology, Inc. | Method of reducing outdiffusion from a doped three-dimensional polysilicon film into substrate by using angled implants |
US5665611A (en) * | 1996-01-31 | 1997-09-09 | Micron Technology, Inc. | Method of forming a thin film transistor using fluorine passivation |
US5767004A (en) * | 1996-04-22 | 1998-06-16 | Chartered Semiconductor Manufacturing, Ltd. | Method for forming a low impurity diffusion polysilicon layer |
US5837598A (en) * | 1997-03-13 | 1998-11-17 | Lsi Logic Corporation | Diffusion barrier for polysilicon gate electrode of MOS device in integrated circuit structure, and method of making same |
US5885861A (en) * | 1997-05-30 | 1999-03-23 | Advanced Micro Devices, Inc. | Reduction of dopant diffusion by the co-implantation of impurities into the transistor gate conductor |
US6406952B2 (en) * | 1997-07-14 | 2002-06-18 | Agere Systems Guardian Corp. | Process for device fabrication |
TW401613B (en) * | 1998-04-24 | 2000-08-11 | Mosel Vitelic Inc | Method of forming the channel of metal oxide semiconductor in the integrated circuit |
US6114196A (en) * | 1999-01-11 | 2000-09-05 | United Microelectronics Corp. | Method of fabricating metal-oxide semiconductor transistor |
US6566181B2 (en) * | 1999-02-26 | 2003-05-20 | Agere Systems Inc. | Process for the fabrication of dual gate structures for CMOS devices |
KR100289372B1 (ko) * | 1999-03-10 | 2001-05-02 | 김영환 | 폴리사이드 형성방법 |
US6797601B2 (en) | 1999-06-11 | 2004-09-28 | Micron Technology, Inc. | Methods for forming wordlines, transistor gates, and conductive interconnects |
US6730584B2 (en) | 1999-06-15 | 2004-05-04 | Micron Technology, Inc. | Methods for forming wordlines, transistor gates, and conductive interconnects, and wordline, transistor gate, and conductive interconnect structures |
US7135423B2 (en) | 2002-05-09 | 2006-11-14 | Varian Semiconductor Equipment Associates, Inc | Methods for forming low resistivity, ultrashallow junctions with low damage |
US20050136633A1 (en) * | 2003-12-18 | 2005-06-23 | Taylor William J.Jr. | Blocking layer for silicide uniformity in a semiconductor transistor |
KR100596880B1 (ko) * | 2004-09-01 | 2006-07-05 | 동부일렉트로닉스 주식회사 | 반도체 소자의 게이트 형성 방법 |
US7642205B2 (en) * | 2005-04-08 | 2010-01-05 | Mattson Technology, Inc. | Rapid thermal processing using energy transfer layers |
Family Cites Families (23)
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JPS63119574A (ja) * | 1986-11-07 | 1988-05-24 | Toshiba Corp | 半導体装置の製造方法 |
US5185279A (en) * | 1987-03-31 | 1993-02-09 | Kabushiki Kaisha Toshiba | Method of manufacturing insulated-gate type field effect transistor |
JPH0277161A (ja) * | 1988-09-13 | 1990-03-16 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
JP2508818B2 (ja) * | 1988-10-03 | 1996-06-19 | 三菱電機株式会社 | 半導体装置の製造方法 |
JPH0744275B2 (ja) * | 1988-10-06 | 1995-05-15 | 日本電気株式会社 | 高耐圧mos型半導体装置の製造方法 |
KR920010062B1 (ko) * | 1989-04-03 | 1992-11-13 | 현대전자산업 주식회사 | 반도체 장치의 실리사이드 형성방법 |
JPH04100219A (ja) * | 1990-08-20 | 1992-04-02 | Seiko Epson Corp | 半導体装置の製造方法 |
JP2585860B2 (ja) * | 1990-11-30 | 1997-02-26 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
US5279976A (en) * | 1991-05-03 | 1994-01-18 | Motorola, Inc. | Method for fabricating a semiconductor device having a shallow doped region |
KR970009976B1 (ko) * | 1991-08-26 | 1997-06-19 | 아메리칸 텔리폰 앤드 텔레그라프 캄파니 | 증착된 반도체상에 형성된 개선된 유전체 |
US5147820A (en) * | 1991-08-26 | 1992-09-15 | At&T Bell Laboratories | Silicide formation on polysilicon |
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JPH05144730A (ja) * | 1991-11-21 | 1993-06-11 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
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US5364803A (en) * | 1993-06-24 | 1994-11-15 | United Microelectronics Corporation | Method of preventing fluorine-induced gate oxide degradation in WSix polycide structure |
DE4440857C2 (de) * | 1993-11-16 | 2002-10-24 | Hyundai Electronics Ind | Verfahren zur Herstellung einer Gateelektrode einer Halbleitervorrichtung |
US5393682A (en) * | 1993-12-13 | 1995-02-28 | Taiwan Semiconductor Manufacturing Company | Method of making tapered poly profile for TFT device manufacturing |
US5393687A (en) * | 1993-12-16 | 1995-02-28 | Taiwan Semiconductor Manufacturing Company | Method of making buried contact module with multiple poly si layers |
US5438006A (en) * | 1994-01-03 | 1995-08-01 | At&T Corp. | Method of fabricating gate stack having a reduced height |
-
1993
- 1993-07-20 KR KR1019930013692A patent/KR0135166B1/ko not_active IP Right Cessation
-
1994
- 1994-06-08 DE DE4420052A patent/DE4420052C2/de not_active Expired - Fee Related
- 1994-07-20 JP JP6189005A patent/JP2707415B2/ja not_active Expired - Fee Related
-
1995
- 1995-11-29 US US08/565,634 patent/US5712181A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100425988B1 (ko) * | 1999-12-18 | 2004-04-03 | 엘지전자 주식회사 | 교환기에서 가입자 보드 메시지 표시 장치 |
Also Published As
Publication number | Publication date |
---|---|
DE4420052C2 (de) | 1997-07-17 |
JPH07147260A (ja) | 1995-06-06 |
US5712181A (en) | 1998-01-27 |
KR0135166B1 (ko) | 1998-04-25 |
JP2707415B2 (ja) | 1998-01-28 |
DE4420052A1 (de) | 1995-01-26 |
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