KR940009174B1 - Lift-off process for forming wiring on a substrate - Google Patents

Lift-off process for forming wiring on a substrate Download PDF

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Publication number
KR940009174B1
KR940009174B1 KR87009328A KR870009328A KR940009174B1 KR 940009174 B1 KR940009174 B1 KR 940009174B1 KR 87009328 A KR87009328 A KR 87009328A KR 870009328 A KR870009328 A KR 870009328A KR 940009174 B1 KR940009174 B1 KR 940009174B1
Authority
KR
South Korea
Prior art keywords
lift
substrate
forming wiring
wiring
forming
Prior art date
Application number
KR87009328A
Other languages
English (en)
Other versions
KR880003550A (ko
Inventor
Hiroshi Watanabe
Osamu Miura
Kunio Miyajaki
Shunichi Numada
Kanji Otsuka
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of KR880003550A publication Critical patent/KR880003550A/ko
Application granted granted Critical
Publication of KR940009174B1 publication Critical patent/KR940009174B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/312—Organic layers, e.g. photoresist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
KR87009328A 1986-08-27 1987-08-26 Lift-off process for forming wiring on a substrate KR940009174B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP200971 1986-08-27
JP20097186 1986-08-27

Publications (2)

Publication Number Publication Date
KR880003550A KR880003550A (ko) 1988-05-17
KR940009174B1 true KR940009174B1 (en) 1994-10-01

Family

ID=16433363

Family Applications (1)

Application Number Title Priority Date Filing Date
KR87009328A KR940009174B1 (en) 1986-08-27 1987-08-26 Lift-off process for forming wiring on a substrate

Country Status (5)

Country Link
US (1) US4886573A (ko)
EP (1) EP0261400B1 (ko)
JP (1) JPH07120647B2 (ko)
KR (1) KR940009174B1 (ko)
DE (1) DE3782389T2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020040378A1 (ko) * 2018-08-20 2020-02-27 삼성디스플레이 주식회사 표시 장치의 제조 방법

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5006488A (en) * 1989-10-06 1991-04-09 International Business Machines Corporation High temperature lift-off process
US5198298A (en) * 1989-10-24 1993-03-30 Advanced Micro Devices, Inc. Etch stop layer using polymers
US5077382A (en) * 1989-10-26 1991-12-31 Occidental Chemical Corporation Copolyimide odpa/bpda/4,4'-oda or p-pda
US5426071A (en) * 1994-03-04 1995-06-20 E. I. Du Pont De Nemours And Company Polyimide copolymer film for lift-off metallization
US6303488B1 (en) 1997-02-12 2001-10-16 Micron Technology, Inc. Semiconductor processing methods of forming openings to devices and substrates, exposing material from which photoresist cannot be substantially selectively removed
US6495468B2 (en) 1998-12-22 2002-12-17 Micron Technology, Inc. Laser ablative removal of photoresist
DE602006020865D1 (de) * 2005-06-07 2011-05-05 Fujifilm Corp Struktur zur formung eines musters für eine funktionelle folie und verfahren zur herstellung der funktionellen folie
KR100643404B1 (ko) * 2005-09-22 2006-11-10 삼성전자주식회사 디스플레이장치 및 그 제조방법
US7993972B2 (en) * 2008-03-04 2011-08-09 Stats Chippac, Ltd. Wafer level die integration and method therefor
JP5786548B2 (ja) * 2011-08-15 2015-09-30 住友電気工業株式会社 窒化物半導体発光素子を作製する方法
JP2013243263A (ja) * 2012-05-21 2013-12-05 Internatl Business Mach Corp <Ibm> ３次元積層パッケージにおける電力供給と放熱（冷却）との両立
US11878640B2 (en) * 2019-03-29 2024-01-23 Autonetworks Technologies, Ltd. Wiring module

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3179633A (en) * 1962-01-26 1965-04-20 Du Pont Aromatic polyimides from meta-phenylene diamine and para-phenylene diamine
GB1230421A (ko) * 1967-09-15 1971-05-05
US4218283A (en) * 1974-08-23 1980-08-19 Hitachi, Ltd. Method for fabricating semiconductor device and etchant for polymer resin
JPS52156583A (en) * 1976-06-23 1977-12-27 Hitachi Ltd Electrode formation method in semiconductor device
FR2392495A1 (fr) * 1977-05-25 1978-12-22 Radiotechnique Compelec Procede de realisation de dispositifs semi-conducteurs a reseau de conducteurs mono ou multicouche et dispositifs ainsi obtenus
JPS54138068A (en) * 1978-04-18 1979-10-26 Toray Ind Inc Polyimide film
JPS5527326A (en) * 1978-08-17 1980-02-27 Ube Ind Ltd Polyimide resin composition and its preparation
JPS5565227A (en) * 1978-11-09 1980-05-16 Ube Ind Ltd Production of polyimide solution
EP0019391B1 (en) * 1979-05-12 1982-10-06 Fujitsu Limited Improvement in method of manufacturing electronic device having multilayer wiring structure
US4367119A (en) * 1980-08-18 1983-01-04 International Business Machines Corporation Planar multi-level metal process with built-in etch stop
JPS5744618A (en) * 1980-08-29 1982-03-13 Hitachi Chem Co Ltd Preparation of polyimide copolymer
JPS5792849A (en) * 1980-12-01 1982-06-09 Mitsubishi Electric Corp Manufacture of semiconductor device
US4451971A (en) * 1982-08-02 1984-06-05 Fairchild Camera And Instrument Corporation Lift-off wafer processing
US4428796A (en) * 1982-08-02 1984-01-31 Fairchild Camera And Instrument Corporation Adhesion bond-breaking of lift-off regions on semiconductor structures
US4497684A (en) * 1983-02-22 1985-02-05 Amdahl Corporation Lift-off process for depositing metal on a substrate
EP0133533B1 (en) * 1983-08-01 1993-04-21 Hitachi, Ltd. Low thermal expansion resin material for a wiring insulating film.
JPS60110140A (ja) * 1983-11-21 1985-06-15 Hitachi Ltd 配線構造体形成方法
JPS60120723A (ja) * 1983-11-30 1985-06-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 電子装置
JPS60157286A (ja) * 1984-01-27 1985-08-17 株式会社日立製作所 フレキシブルプリント基板の製造方法
JPS60212428A (ja) * 1984-04-06 1985-10-24 Mitsui Toatsu Chem Inc ポリイミド樹脂プレポリマ溶液の調整方法
US4519872A (en) * 1984-06-11 1985-05-28 International Business Machines Corporation Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes
US4606998A (en) * 1985-04-30 1986-08-19 International Business Machines Corporation Barrierless high-temperature lift-off process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020040378A1 (ko) * 2018-08-20 2020-02-27 삼성디스플레이 주식회사 표시 장치의 제조 방법

Also Published As

Publication number Publication date
EP0261400B1 (en) 1992-10-28
DE3782389D1 (de) 1992-12-03
KR880003550A (ko) 1988-05-17
US4886573A (en) 1989-12-12
DE3782389T2 (de) 1993-05-06
EP0261400A3 (en) 1989-05-24
EP0261400A2 (en) 1988-03-30
JPH07120647B2 (ja) 1995-12-20
JPS63170925A (ja) 1988-07-14

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee