KR920005622B1 - 음극 스퍼터링 장치 - Google Patents

음극 스퍼터링 장치 Download PDF

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Publication number
KR920005622B1
KR920005622B1 KR1019900005014A KR900005014A KR920005622B1 KR 920005622 B1 KR920005622 B1 KR 920005622B1 KR 1019900005014 A KR1019900005014 A KR 1019900005014A KR 900005014 A KR900005014 A KR 900005014A KR 920005622 B1 KR920005622 B1 KR 920005622B1
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KR
South Korea
Prior art keywords
cathode
receiving member
substrate receiving
substrate
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019900005014A
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English (en)
Korean (ko)
Other versions
KR900016492A (ko
Inventor
체주다 자로스라브
슈마첼 만프레드
Original Assignee
레이볼드 앗크티엔게젤샤프트
베. 데. 밧텐슈라그 에. 투테
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Publication date
Application filed by 레이볼드 앗크티엔게젤샤프트, 베. 데. 밧텐슈라그 에. 투테 filed Critical 레이볼드 앗크티엔게젤샤프트
Publication of KR900016492A publication Critical patent/KR900016492A/ko
Application granted granted Critical
Publication of KR920005622B1 publication Critical patent/KR920005622B1/ko
Expired legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
KR1019900005014A 1989-04-14 1990-04-11 음극 스퍼터링 장치 Expired KR920005622B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3912295A DE3912295C2 (de) 1989-04-14 1989-04-14 Katodenzerstäubungsanlage
DEP3912295.6 1989-04-14

Publications (2)

Publication Number Publication Date
KR900016492A KR900016492A (ko) 1990-11-13
KR920005622B1 true KR920005622B1 (ko) 1992-07-10

Family

ID=6378678

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900005014A Expired KR920005622B1 (ko) 1989-04-14 1990-04-11 음극 스퍼터링 장치

Country Status (5)

Country Link
US (1) US4943363A (enExample)
JP (1) JP2602976B2 (enExample)
KR (1) KR920005622B1 (enExample)
CH (1) CH681016A5 (enExample)
DE (1) DE3912295C2 (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4009603A1 (de) * 1989-03-30 1990-10-04 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer
EP0448782B1 (de) * 1990-03-26 1993-06-16 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
DE4110490C2 (de) * 1991-03-30 2002-02-28 Unaxis Deutschland Holding Kathodenzerstäubungsanlage
DE4143177C2 (de) * 1991-12-30 1999-08-12 Leybold Ag Beschichtungsanlage
DE4232959C2 (de) * 1992-10-01 2001-05-10 Leybold Ag Vorrichtung zum Ein- und Ausschleusen scheibenförmiger Substrate
CH691377A5 (de) 1992-10-06 2001-07-13 Unaxis Balzers Ag Kammeranordnung für den Transport von Werkstücken und deren Verwendung.
GB2272225B (en) * 1992-10-06 1996-07-17 Balzers Hochvakuum A method for masking a workpiece and a vacuum treatment facility
CH686445A5 (de) * 1992-10-06 1996-03-29 Balzers Hochvakuum Kammer und Kammerkombination fuer eine Vakuumanlage und Verfahren zum Durchreichen mindestens eines Werkstueckes.
EP1179611B1 (de) 1992-10-06 2004-09-15 Unaxis Balzers Aktiengesellschaft Kammer für den Transport von Werkstücken
DE4235676C2 (de) * 1992-10-22 1997-08-28 Balzers Hochvakuum Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage
DE4235674C2 (de) * 1992-10-22 2000-12-28 Balzers Ag Liechtenstein Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes
DE4235677C2 (de) * 1992-10-22 1996-10-31 Balzers Hochvakuum Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren
DE4302851A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat
DE4302794A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Ein- und/oder Ausschleusen einer Maske in die bzw. aus der Kammer einer Vakuum-Beschichtungsanlage
JP3398452B2 (ja) * 1994-01-19 2003-04-21 株式会社ソニー・ディスクテクノロジー スパッタリング装置
KR0129582B1 (ko) * 1994-06-23 1998-04-06 김주용 다중 기판 전달 장치
US6086728A (en) * 1994-12-14 2000-07-11 Schwartz; Vladimir Cross flow metalizing of compact discs
NL1000138C2 (nl) * 1995-04-13 1996-10-15 Od & Me Bv Inrichtingen voor het bewerken van een substraat alsmede werkwijze geschikt voor toepassing bij dergelijke inrichtingen.
NL1000139C2 (nl) * 1995-04-13 1996-10-15 Od & Me Bv Magnetronsputtersysteem.
US5709785A (en) * 1995-06-08 1998-01-20 First Light Technology Inc. Metallizing machine
DE19540255A1 (de) * 1995-10-28 1997-04-30 Leybold Ag Vorrichtung zum Beschichten eines Substrats
DE59611403D1 (de) 1995-10-27 2007-01-25 Applied Materials Gmbh & Co Kg Vorrichtung zum Beschichten eines Substrats
DE19540053A1 (de) * 1995-10-27 1997-04-30 Leybold Ag Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
US5855465A (en) * 1996-04-16 1999-01-05 Gasonics International Semiconductor wafer processing carousel
US5863170A (en) * 1996-04-16 1999-01-26 Gasonics International Modular process system
DE29716440U1 (de) * 1997-09-12 1997-12-11 Balzers Ag, Balzers Sputterstation
US6730194B2 (en) * 1997-11-05 2004-05-04 Unaxis Balzers Aktiengesellschaft Method for manufacturing disk-shaped workpieces with a sputter station
TW461923B (en) * 1998-02-17 2001-11-01 Sharp Kk Movable sputtering film forming apparatus
DE19826949A1 (de) * 1998-06-17 1999-12-23 Georg Kunkel Vorrichtung zum Transport von plattenartigen Substraten, beispielsweise von Glasplatten für Flachbildschirme
DE19831032C2 (de) * 1998-07-11 2002-10-31 Asys Gmbh & Co Kg Greiferkopf für ein in der Herstellung und/oder Bearbeitung scheibenförmiger planarer Substrate eingesetztes Handhabungsgerät
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
DE102005035904B4 (de) * 2005-07-28 2012-01-12 Leybold Optics Gmbh Vorrichtung zum Behandeln von Substraten
TWI491756B (zh) * 2012-11-09 2015-07-11 Ind Tech Res Inst 濺鍍製程之隔壓系統

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532072A (en) * 1966-10-17 1970-10-06 Inland Steel Co Spray coating apparatus
US3594301A (en) * 1968-11-22 1971-07-20 Gen Electric Sputter coating apparatus
US3664948A (en) * 1969-11-19 1972-05-23 Texas Instruments Inc Sputtering system
US3904930A (en) * 1974-04-17 1975-09-09 Estey Dynamics Corp Automatic powder spray apparatus and method for spraying the inside surfaces of containers
US4315705A (en) * 1977-03-18 1982-02-16 Gca Corporation Apparatus for handling and treating wafers
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
US4433951A (en) * 1981-02-13 1984-02-28 Lam Research Corporation Modular loadlock
DE3306870A1 (de) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
US4620359A (en) * 1983-11-14 1986-11-04 Charlton Associates Apparatus for manufacturing rigid computer memory disc substrates
US4584045A (en) * 1984-02-21 1986-04-22 Plasma-Therm, Inc. Apparatus for conveying a semiconductor wafer
DE3413001A1 (de) * 1984-04-06 1985-10-17 Leybold-Heraeus GmbH, 5000 Köln Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen
US4548699A (en) * 1984-05-17 1985-10-22 Varian Associates, Inc. Transfer plate rotation system
CH659485A5 (de) * 1984-05-30 1987-01-30 Balzers Hochvakuum Mehrfach-haltevorrichtung fuer zu behandelnde substrate.
US4638360A (en) * 1985-09-03 1987-01-20 Rca Corporation Timing correction for a picture-in-picture television system
US4816116A (en) * 1985-10-24 1989-03-28 Texas Instruments Incorporated Semiconductor wafer transfer method and arm mechanism
US4670126A (en) * 1986-04-28 1987-06-02 Varian Associates, Inc. Sputter module for modular wafer processing system
US4770590A (en) * 1986-05-16 1988-09-13 Silicon Valley Group, Inc. Method and apparatus for transferring wafers between cassettes and a boat
JPH0623562Y2 (ja) * 1986-11-21 1994-06-22 日新電機株式会社 エンドステ−シヨン
DE3717712A1 (de) * 1987-05-26 1988-12-15 Leybold Ag Vorrichtung zur halterung von werkstuecken
JPS6425981A (en) * 1987-07-17 1989-01-27 Nissin Electric Co Ltd Producing device for thin film
US4808291A (en) * 1987-09-09 1989-02-28 Denton Vacuum Inc. Apparatus for coating compact disks

Also Published As

Publication number Publication date
KR900016492A (ko) 1990-11-13
DE3912295C2 (de) 1997-05-28
JPH02294474A (ja) 1990-12-05
JP2602976B2 (ja) 1997-04-23
CH681016A5 (enExample) 1992-12-31
US4943363A (en) 1990-07-24
DE3912295A1 (de) 1990-10-18

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