DE29716440U1 - Sputterstation - Google Patents

Sputterstation

Info

Publication number
DE29716440U1
DE29716440U1 DE29716440U DE29716440U DE29716440U1 DE 29716440 U1 DE29716440 U1 DE 29716440U1 DE 29716440 U DE29716440 U DE 29716440U DE 29716440 U DE29716440 U DE 29716440U DE 29716440 U1 DE29716440 U1 DE 29716440U1
Authority
DE
Germany
Prior art keywords
sputtering station
sputtering
station
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE29716440U
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Priority to DE29716440U priority Critical patent/DE29716440U1/de
Priority to US08/964,962 priority patent/US6416640B1/en
Publication of DE29716440U1 publication Critical patent/DE29716440U1/de
Priority to CH01816/98A priority patent/CH693508A5/de
Priority to NL1010046A priority patent/NL1010046C2/nl
Priority to SE9803067A priority patent/SE521639C2/sv
Priority to JP10256388A priority patent/JPH11140645A/ja
Priority to CNB98119253XA priority patent/CN1213163C/zh
Priority to HK99105430A priority patent/HK1020287A1/xx
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32788—Means for moving the material to be treated for extracting the material from the process chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Robotics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
DE29716440U 1997-09-12 1997-09-12 Sputterstation Expired - Lifetime DE29716440U1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE29716440U DE29716440U1 (de) 1997-09-12 1997-09-12 Sputterstation
US08/964,962 US6416640B1 (en) 1997-09-12 1997-11-05 Sputter station
CH01816/98A CH693508A5 (de) 1997-09-12 1998-09-04 Sputterstation.
NL1010046A NL1010046C2 (nl) 1997-09-12 1998-09-09 Sproeistation.
SE9803067A SE521639C2 (sv) 1997-09-12 1998-09-10 Sputterstation
JP10256388A JPH11140645A (ja) 1997-09-12 1998-09-10 スパッタ・ステーション
CNB98119253XA CN1213163C (zh) 1997-09-12 1998-09-14 溅射镀膜装置和真空表面处理设备
HK99105430A HK1020287A1 (en) 1997-09-12 1999-11-24 A sputtering station and a vacuum surface treatment system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE29716440U DE29716440U1 (de) 1997-09-12 1997-09-12 Sputterstation
US08/964,962 US6416640B1 (en) 1997-09-12 1997-11-05 Sputter station

Publications (1)

Publication Number Publication Date
DE29716440U1 true DE29716440U1 (de) 1997-12-11

Family

ID=26060719

Family Applications (1)

Application Number Title Priority Date Filing Date
DE29716440U Expired - Lifetime DE29716440U1 (de) 1997-09-12 1997-09-12 Sputterstation

Country Status (4)

Country Link
US (1) US6416640B1 (de)
JP (1) JPH11140645A (de)
CN (1) CN1213163C (de)
DE (1) DE29716440U1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1166180A1 (de) * 1999-04-02 2002-01-02 Silicon Valley Group Thermal Systems LLC Halbleiter-wafer etwicklungsgerät mit vertikal gestapelteentwicklungsraüme und einachsiges dual-wafer transfer system
EP1172842A2 (de) 2000-06-22 2002-01-16 Unaxis Balzers Aktiengesellschaft Beschichtungsanlage für scheibenförmige Werkstücke
EP1197988A2 (de) * 2000-10-10 2002-04-17 Applied Materials, Inc. Mehrfach-Waferhebervorrichtung und Verfahren dafür

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10244433B4 (de) * 2002-09-24 2005-12-15 Adidas International Marketing B.V. Gleitelement und Schuhsohle
KR100692585B1 (ko) * 2003-12-22 2007-03-13 어플라이드 매터리얼스 게엠베하 운트 컴퍼니 카게 장입용 잠금 장치를 구비한 코팅 플랜트 및 이를 위한 장치
CN100339730C (zh) * 2004-05-26 2007-09-26 精碟科技股份有限公司 光学元件镀膜器具
CN101886248B (zh) * 2009-05-15 2013-08-21 鸿富锦精密工业（深圳）有限公司 溅镀式镀膜装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
US4523985A (en) * 1983-12-22 1985-06-18 Sputtered Films, Inc. Wafer processing machine
JPH0613751B2 (ja) * 1986-03-07 1994-02-23 株式会社日立製作所 連続スパッタ装置
DE3912295C2 (de) * 1989-04-14 1997-05-28 Leybold Ag Katodenzerstäubungsanlage
DE4117969C2 (de) * 1991-05-31 2000-11-09 Balzers Ag Liechtenstein Vakuumkammer
JPH05271934A (ja) * 1992-03-23 1993-10-19 Hitachi Ltd スパッタリング装置
US5766360A (en) * 1992-03-27 1998-06-16 Kabushiki Kaisha Toshiba Substrate processing apparatus and substrate processing method
GB2272225B (en) * 1992-10-06 1996-07-17 Balzers Hochvakuum A method for masking a workpiece and a vacuum treatment facility
US5738767A (en) * 1994-01-11 1998-04-14 Intevac, Inc. Substrate handling and processing system for flat panel displays
DE29505497U1 (de) * 1995-03-31 1995-06-08 Balzers Hochvakuum Beschichtungsstation
US5709785A (en) * 1995-06-08 1998-01-20 First Light Technology Inc. Metallizing machine

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1166180A1 (de) * 1999-04-02 2002-01-02 Silicon Valley Group Thermal Systems LLC Halbleiter-wafer etwicklungsgerät mit vertikal gestapelteentwicklungsraüme und einachsiges dual-wafer transfer system
US6610150B1 (en) 1999-04-02 2003-08-26 Asml Us, Inc. Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
US6846149B2 (en) 1999-04-02 2005-01-25 Aviza Technology, Inc. Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
EP1172842A2 (de) 2000-06-22 2002-01-16 Unaxis Balzers Aktiengesellschaft Beschichtungsanlage für scheibenförmige Werkstücke
EP1172842A3 (de) * 2000-06-22 2002-04-03 Unaxis Balzers Aktiengesellschaft Beschichtungsanlage für scheibenförmige Werkstücke
US6656330B2 (en) 2000-06-22 2003-12-02 Unaxis Balzers Aktiengesellschaft Coating installation for disk-form workpieces
EP1197988A2 (de) * 2000-10-10 2002-04-17 Applied Materials, Inc. Mehrfach-Waferhebervorrichtung und Verfahren dafür
EP1197988A3 (de) * 2000-10-10 2006-02-08 Applied Materials, Inc. Mehrfach-Waferhebervorrichtung und Verfahren dafür

Also Published As

Publication number Publication date
CN1213163C (zh) 2005-08-03
US6416640B1 (en) 2002-07-09
JPH11140645A (ja) 1999-05-25
CN1217390A (zh) 1999-05-26

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Legal Events

Date Code Title Description
R207 Utility model specification

Effective date: 19980129

R150 Utility model maintained after payment of first maintenance fee after three years

Effective date: 20001214

R151 Utility model maintained after payment of second maintenance fee after six years

Effective date: 20031028

R152 Utility model maintained after payment of third maintenance fee after eight years

Effective date: 20051006

R071 Expiry of right