KR920000709A - O-벤질옥심 에테르 및 그를 함유하는 농작물 보호제 - Google Patents
O-벤질옥심 에테르 및 그를 함유하는 농작물 보호제 Download PDFInfo
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Abstract
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Claims (8)
- 하기 일반식(I)의 O-벤질옥심 에테르.상기 식 중, X는 CH2, CH-Cl-C4-알킬. CH-Cl-C4-알록시. CH-C1-C4-알킬티오 또는 N-Cl-C4-알콕시기이고, Y는 0, 5또는 NR5이고, R1R2및 R5는 각각 H또는 Cl-C4-알킬기이고, Z1및 Z2는 동일 또는 상이한 것으로서, 각각 H, 할로겐, 메틸, 메톡시 또는 시아노기이고, R3및 R4는 동일 또는 상이한 것으로서,각각 수소, 시아노, 직쇄 또는 분지쇄형의 Cl-Cl0-알킬, Cl-C4-할로알킬, C3-C6-시클로알킬, C3-C6-할로시클로알릴, C3-C6-시클로알킬-Cl-C4-알킬, Cl-C4-알콕시-Cl-C4-알킬, Cl-C4-알킬티오-C1-C4-알킬, 아릴티오-Cl-C4-알킬, C2-C6-알케닐, C3-C6-할로알케닐, C3-C6-시클로알케닐, C1-C4할로시클로알케닐, C2-C6-알키닐, Cl-C6-알콕시, Cl-C6-할로알콕시, Cl-C4-알킬티오, 벤질티오-알킬카르카닐, 치환되거나 비치환된 궤닐카르보닐, 치환되거나 비치환된 벤질카르보닐, Cl-C4-알콕시카르보닐, 치환되거나 비치환된 페녹시카르보닐, 치환되거나 비치환된 벤질옥시카르보닐, 치환되거나 비치환된 아릴, 치환되거나 비치환된 아릴옥시, 치환되거나 비치환된 아릴티오, 치환되거나 비치환된 아릴-Cl-C4-알킬, 치환되거나, 비치환된 아릴-C1-C4-알케닐, 치환되거나 비치환된 아릴옥시-Cl-C4-알킬, 치환되거나 비치환된 아릴티오-Cl-C4-알킬, 치환되거나 비치환된 헤트아릴, 치환되거나 비치환된 혜트아릴옥시, 치환되거나, 비치환된 헤트아릴티오, 치환되거나 비치환된 헤테로아릴-Cl-C4-알킬, 치환되거나 비치환된 헤트아릴 -C1-C4-알케닐, 치환되거나 비치환된 헤트아릴옥시 -Cl-C4-알킬, 치환되거나 비치환된 혜테로시클릴.치환되거나 비치환된 헤테로시클릴옥시, N(R6)2(여기서, R6은 동일 또는 상이란 것으로서, 각각 H C1-C6-알킬또는 치환되거나 비치환된 페닐기 임) 또는 -C0-N (R7)2, (여기서, R7은 동일 또는 상이한 것으로서, 각각 H 또는Cl-C4-알킬임)이고, 치환되거나 비치환됨이 의미하는 치환기는 수소외에 할로겐. 시아노, 니트로, C1-C4-알킬, C1-C4-알콕시, C1-C4-할로알힐, C1-C4-할로알콕시, Cl-C10-알콕시미노-Cl-C2-알킬. 아릴,아릴옥시, 벤질옥시, 헤트아릴, 헤트아릴옥시, C3-C6-시플로알킬, 헤테로시클릴 또는 헤테로시클릴옥시기이며, R3및 R5는 함게, 상기 치환기에 의해 치환될 수 있는 카르보시클릭 또는 헤테로시를릭 고리를 형성할 수 있고, R3또는 R4가 할로겐이거나, 또는(식 중, n은 1 내지 4의 정수이고, R8또는, n〉1일 경우 R8들은 동일 또는 상이한 것으로서, 각각 H 할로겐,시아노, 니트로, 치환되거나 비치환된 Cl-C4-알킬, Cl-C4-알콕시, Cl-C4-할로알킬, Cl-C4-할로알콕시, 아릴, 아릴옥시, 벤질옥시, 헤트아릴 또는 헤트아릴옥시기임)일 수 있다.
- 하기 일반식 (Ⅱ)의 0-벤질옥심 에테르.상기 식 중 R3내지 R6기는 제1항에 정의한 바와 동일하다.
- 하기 일박식(Ⅲ)의 0-벤질옥심 에테르.상기식중 R3내지 R8기는 제1항에서 정의한 바와 동일하다.
- 1항에 있어서, X는NOCH3또는NOC2H5이고, Y는0이고, R1은C1-C4-알킬기이고, R3는H또는C1-C2-알킬기이고, R3및 R5는 동일 또는 상이한 것으로서 각각수소, 시아노, 직쇄 또는 분지쇄형의 Cl-C10-알킬 Cl-C4-할로알킬, C3-C6-시클로알킬, C3-C6-할로시클로알킬, C3-C6-시클로알킬-Cl-C4-알킬, C1-C4-알콕시 -Cl-C4-알킬, C1-C6-알킬티오-Cl-C4-알킬, 아릴티오-C1-C6-알킬, C2-C6-알케닐, C2-C5-알키닐, C2-C4-할로알케닐, Cl-C6-알콕시, Cl-C6-알킬티오, Cl-C4-알킬카르보닐, Cl-C4-알콕시카르보닐, 치환되거나 비치환된 아릴,, 치환되거나 비치환된 아릴옥시, 치환되거나, 비치환된 아릴티오 치환되거나, 비치환된 아릴-C1-C4-알킬, 치환되거나 비치환된 아릴-C2-C4-알케닐, 치환되거나 비치환된 헤트아릴, 치환되거나 비치환된 헤트아릴옥시, 치환되거나, 비치환된 헤트아릴티오, 치환되거나 비치환된 헤테로시클릴, N(R6)2(여기서, R6은 동일 또는 상이한 것으로서, 각각 H, C1-C6-알킬 C3-C6-시클로알킬 또는 치환되거나 비치환된 페닐임) , -CO-N (R7)2(여기서, R7은 동일 또는 상이한 것으로서, 각각 H또는 C1-C4-알킬임) 이고, 치환되거나 비치환됨이 의미하는 치환기는 제 1항에서 기재한 바와 동일하고, R3및 R4는 함께 상기치환되거나 비치환됨이 외미하는 치환기에 의해 치환될 수 있는 카르보시클릭 또는 헤테로시클릭기를 형성하거나, R3또는 R4가 할로겐일 수 있으며, Z1및 Z2는 각각 수소인 것을 특징으로 하는 화합물
- 불활성 담체 및 살진균 유효량의 하기 일반식(I)의 0-벤질옥심 에테르를 함유하는 살진균제.상기 식에서, X는 CH2, CH-C1-C4-알킬, CH-Cl-C4-알콕시, CH-Cl-C4-알킬티오 또는 N-Cl-C4-알콕시기이고, Y는 0, S 또는 NR5이고, R1,R2및 R5는 각각 H또는 Cl-C4-알킬기이고, Z1및 Z2는 동일 또는 상이한 것으로서, 각각 H 할로겐, 메틸, 메톡시 또는 시아노기이고, R3및 R4는 동일 또는 상이한 것으로서, 각각 수소. 시아노, 직쇄 또는 분지쇄형의 C1-C10-알킬, Cl-C4-할로알킬, C3-C6-시클로알킬, C3-C6-할로시클로알킬, C3-C6-시클로알킬-Cl-C4-알킬, Cl-C4-알콕시-Cl-C4-알킬, Cl-C4-알킬티오-Cl-C4-알킬, 아릴티오-Cl-C4-알킬. C2-C6-알케닐, C2-C5-할로알케닐, C3-C6-시클로알케닐, C3-C6-할로시클로알케닐, C3-C6-알키닐, Cl-C6-알콕시. Cl-C4-할로알콕시, Cl-C4-알킬티오 벤질티오 C1-C4-알킬카르보닐, 치환되거나 비치환된 페닐카르보닐, 치환되거나 비치환된 벤질카르보닐, Cl-C4-알록시 카르보닐, 치환되거나 비치환된 페녹시카르보닐, 치환되거나 비치환된 벤질옥시카르보닐, 치환되거나 비치환된아릴, 치환되거나 비치환된 아릴옥시, 치환되거나 비치환된 아릴티오, 치환되거나 비치환된 아릴-C1-C4-알킬, 치환되거나, 비치환된 아릴-C1-C4-알케닐. 치환되거나 비치환된 아릴옥시-C1-C4-알킬, 치환되거나 비치환된 아릴티오-C1-C4-알킬, 치환되거나 비치환된 헤트아릴, 치환되거나 비치환된 헤트아릴옥시, 치환되거나, 비치환된 헤트아릴티오, 치환되거나 비치환된 헤테로아릴-C1-C4-알킬, 치환되거나 비치환된 헤트아릴 -C2-C4-알케닐, 치환되거나 비치환된 헤트아릴옥시-Cl-C4-알킬, 치환되거나 비치환된 헤테로시클릴, 치환되거나 비치환된 헤테로시클릴옥시, N(R6)2(여기서, R6은 동일 또는 상이한 것으로서, 각각H, C1-C6-알킬 또는 치환되거나 비치환된 페닐기잉) 또는 -CO-N (R7)2(여기서, R7은 동일 또는 상이한 것으로서, 각각 H 또는C1-C4-알킬임)이고. 치환되거나 비치환됨이 의미하는 치환기는 수소외에 할로겐, 시아노, 니트로, Cl-C4-알킬, C1-C4-알폭시, C1-C4-할로알킬, Cl-C4-할로알콕시. Cl-C10-알콕시미노-Cl-Cl-알킬, 아릴,아릴옥시, 벤질옥시, 헤트아릴, 헤트아릴옥시, C3-C6-시클로알킬, 헤테로시클릭 또는 헤테로시클릴옥시기이며, R3및 R4는 함께, 상기 치환기에 의해 치환될 수 있는 카르보시클릭 또는 헤테로시클릭 고리를 형성할 수 있고, R3또는 R4가 할로겐이거나, 또는(식 중, n은 1 내지 4의 정수이고, R8또는. n〉1일 경우 R8들은 동일 또는 상이한 것으로서. 각각 H, 할로겐,시아노, 니트로, 치환되거나 비치환된 C1-C4-알킬, C1-C4-알콕시, C1-C4-할로알킬, C1-C4-할로알콕시, 아릴, 아릴옥시, 벤질옥시, 헤트아릴 또는 헤트아릴옥시기임)일 수 있다.
- 진균, 또는 진균공격의 위험이 있는 개체, 식물 또는 종자, 또는 토양을 살진균 유효량의 하기 일반식(I)의 화합물로 처리하는 것을 특징으로 하는 진균 박멸 방법.상기 식에서. X는 CH2. CH-Cl-C4-알킬, CH-Cl-C4-알콕시, CH-Cl-C4-알킬티오 또는 N-Cl-C4-알콕시기이고, Y는 0, 5 또는 NR5이고, R1,R2및 R5는 각각 H또는 C1-C5-알킬기이고, Z1및 Z2는 동일 또는 상이한 것으로서, 각각 H, 할로겐, 메틸, 메톡시 또는 시아노기이고, R3및 R4는 동일 또는 상이한 것으로서, 각각 수소, 시아노, 직쇄 또는 분지쇄형의 Cl-C10-알킬, Cl-C4-할로알킬, C3-C6-시클로알킬, C3-C6-할로시클로알킬, C3-C6-시클로알킬-Cl-C4-알킬, Cl-C4-알콕시 -Cl-C4-알킬, Cl-C4-알킬티오-Cl-C4-알킬, 아릴티오-Cl-C4-알킬, C2-C6-알케닐. C2-C5-할로알케닐, C3-C6-시클로알케닐. C3-C6-할로시클로알케닐, C2-C6-알키닐, Cl-C6-알콕시, Cl-C6-할로알콕시, C1-C4-알킬티오, 벤질티오, C1-C4-알킬카르보닐, 치환되거나 비치환된 페닐카르보닐, 치환되거나 비치환된 벤질카르보닐, C1-C4-알콕시 카르보닐, 치환되거나 비치환된 페녹시카르보닐, 치환되거나 비치환된 벤질옥시카르보닐, 치환되거나 비치환된 아릴, 치환되거나 비치환된 아릴옥시, 치환되거나 비치환된 아릴티오, 치환되거나 비치환된 아릴-Cl-C4-알킬, 치환되거나, 비치환된 아릴-C2-C4-알케닐, 치환되거나 비치환된 아릴옥시-Cl-C4-알킬, 치환되거나 비치환된 아릴티오-Cl-C4-알킬, 치환되거나 비치환된 헤트아릴. 치환되거나 비치환된 헤트아릴옥시, 치환되거나, 비치환된 헤트아릴티오, 치환되거나 비치환된 헤테로아릴-Cl-C4-알킬, 치환되거나 비치환된 헤트아릴 -C2-C4-알케닐, 치환되거나 비치환된 헤트아릴옥시-Cl-C4-알킬, 치환되거나 비치환된 헤테로시클릴, 치환되거나 비치환된 헤테로시클릴옥시, N(R7)2(여기서, R6은 동일 또는 상이한 것으로서, 각각H. C1-C6-알킬 또는 치환되거나 비치환된 페닐기임) 또는 -CO-N (R7)2(여기서, R7은 동일 또는 상이한 것으로서, 각각 H 또는Cl-C4-알킬임)이고, 치환되거나 비치환됨이 의미하는 치환기는 수소외에 할로겐, 시아노, 니트로. Cl-C4-알릴, Cl-C4-알록시, Cl-C4-할로알킬, C1-C4-할로알콕시, C1-Cl0-알콕시미노-Cl-C2-알킬, 아릴,아릴옥시, 벤질옥시. 헤트아릴, 헤트아릴옥시, C3-C6-시클로알킬, 헤테로시클릴 또는 헤테로시클릴옥시기이며, R3및 R4는 함께, 상기 치환기에 의해 치환될 수 있는 카르보시클릭 또는 헤테로시클릭 고리를 형성할 수 있고. R3또는 R5가 할로겐이거나, 또는(식 중, n은 1 내지 4의 정수이고, R8또는, n〉1일 경우 R8들은 동일 또는 상이한 것으로서, 각각 H, 할로겐,시아노, 니트로, 치환되거나 비치환된 Cl-C4-알킬, Cl-C4-알콕시, Cl-C4-할로알킬, Cl-C4-할로알콕시, 아릴, 아릴옥시, 벤질옥시, 헤트아릴 또는 헤트아릴옥시기임)일 수 있다.
- 제1항에 있어서. R1이 메틸기이고, R2가 H이고, R3가 CN이고, R4가 CH-OCH3이고, Y가 0이고,Z1및 Z2가 수소인 것을 특징으로 하는 화합물.
- 제1항에 있어서, R1이 메틸기이고, R2가 H이고, R3가 CN이고, R4가 시클로프로필기이고, X가 N-OCH3이고, Y가 0이고, Z1및 Z2가 수소인 것을 특징으로 하는 화합물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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1991
- 1991-06-13 DK DK95106324T patent/DK0669319T3/da active
- 1991-06-13 ES ES91109684T patent/ES2110421T5/es not_active Expired - Lifetime
- 1991-06-13 ES ES95106324T patent/ES2120100T3/es not_active Expired - Lifetime
- 1991-06-13 DE DE59108900T patent/DE59108900D1/de not_active Expired - Fee Related
- 1991-06-13 AT AT95106324T patent/ATE170511T1/de not_active IP Right Cessation
- 1991-06-13 DK DK91109684T patent/DK0463488T4/da active
- 1991-06-13 EP EP91109684A patent/EP0463488B2/de not_active Expired - Lifetime
- 1991-06-13 EP EP95106324A patent/EP0669319B1/de not_active Expired - Lifetime
- 1991-06-13 DE DE59109047T patent/DE59109047D1/de not_active Expired - Fee Related
- 1991-06-13 AT AT91109684T patent/ATE161007T1/de not_active IP Right Cessation
- 1991-06-26 KR KR1019910010704A patent/KR100200466B1/ko not_active IP Right Cessation
- 1991-06-26 NZ NZ23871491A patent/NZ238714A/xx unknown
- 1991-06-26 HU HU912143A patent/HU209642B/hu not_active IP Right Cessation
- 1991-06-26 IL IL9862691A patent/IL98626A/en not_active IP Right Cessation
- 1991-06-26 CA CA002045725A patent/CA2045725A1/en not_active Abandoned
- 1991-06-26 AU AU79296/91A patent/AU652159B2/en not_active Ceased
- 1991-06-27 JP JP3156560A patent/JP3009505B2/ja not_active Expired - Fee Related
- 1991-06-27 CZ CS19911966A patent/CZ287402B6/cs not_active IP Right Cessation
- 1991-06-27 SK SK1966-91A patent/SK280842B6/sk unknown
- 1991-06-27 US US07/722,209 patent/US5194662A/en not_active Ceased
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1992
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1993
- 1993-12-13 US US08/165,413 patent/US5387607A/en not_active Expired - Fee Related
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1994
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1995
- 1995-06-16 US US08/490,895 patent/US5563168A/en not_active Expired - Fee Related
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1996
- 1996-04-05 US US08/627,377 patent/USRE37839E1/en not_active Expired - Lifetime
- 1996-04-09 US US08/630,091 patent/US6326399B1/en not_active Expired - Fee Related
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1998
- 1998-02-12 GR GR980400322T patent/GR3026148T3/el unknown
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KR20140111593A (ko) * | 2013-03-11 | 2014-09-19 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 및 기판 처리 방법 |
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