KR900014935A - 방사선-경화성 혼합물 및 이로부터 제조된 고에너지 방사를 위한 방사선 감응성 기록 물질 - Google Patents
방사선-경화성 혼합물 및 이로부터 제조된 고에너지 방사를 위한 방사선 감응성 기록 물질 Download PDFInfo
- Publication number
- KR900014935A KR900014935A KR1019900003092A KR900003092A KR900014935A KR 900014935 A KR900014935 A KR 900014935A KR 1019900003092 A KR1019900003092 A KR 1019900003092A KR 900003092 A KR900003092 A KR 900003092A KR 900014935 A KR900014935 A KR 900014935A
- Authority
- KR
- South Korea
- Prior art keywords
- radiation
- group
- curable
- acid
- curable mixture
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (15)
- 지방족에 결합된 할로겐(염소 또는 브롬)을 함유하고 pka값이 12미만이며 고 에너지 방사선의 작용하에서 상을 형성하는, 화합물과 산-경화성 물질을 함유함을 특징으로 하는 고에너지 방사에 의해 경화가능한 방사선-경화성 혼합물.
- 제1항에 있어서, 산-형성 화합물이 6내지 10의 pak값을 갖는 방사선-경화성 혼합물.
- 제1항에 있어서, 산-형성 화합물이 페놀성 OH그룹, 부근에 강력한 전자구인성 치환체를 지닌 지방족 OH그룹, 방향족SH그룹, 지방족 또는 방향족 설폰아미드 그룹, 지방족 또는 방향족 이미드 그룹, N-아실-치환된 카바메이트 그룹 또는 N-아실-치환된 카바메이트 그룹 및 CH-산성 그룹중에서 선택된 적어도 하나이상의 그룹을 함유하는 방사선-경화성 혼합물.
- 제1항에 있어서, 산-형성 화합물이 페놀성 OH그룹, 이미드 그룹, N-아실-치환된 카바메이트 그룹 또는 N-아실-치환된 카바메이트 그룹 또는 CH-산성 그룹을 함유하는 방사선-경화성 혼합물.
- 제1항에 있어서, 할로겐원자가 Sp3-하이브리드화 탄소원자에 결합되어 있는 방사선-경화성 혼합물.
- 제1항 내지 제5항중 어느 한항에 있어서, 산-형성 화합물이 염소 또는 브롬 치환체를 지닌 탄소원자에 대해 a-위치에서 수소원자를 함유하지 않는 방사선-경화성 혼합물.
- 제5항 또는 제6항에 있어서, 산-형성 화합물이 염소화 또는 브롬화 아세틸 그룹을 함유하는 방사선 경화성 혼합물.
- 제1항에 있어서, 산-형성 화합물이 염소화 또는 브롬하 3급-부틸 그룹을 함유하는 방사선 경화성 혼합물.
- 제1항에 있어서, 할로겐-치환된 탄소원자에 대해 a-탄소원자를 지닌 산-형성 화합물이 할로겐 원자에 대해 트랜스-위치에서 어떠한 수소원자도 함유하지 않는 방사선 경화성 혼합물.
- 제1항에 있어서, 산-형성 화합물이 지방족에 결합된 할로겐원자 이외에 방향족에 결합된 할로겐원자도 함유하는 방사선-경화성 혼합물.
- 제10항에 있어서, 방향족에 결합된 할로겐원자가 페놀성 OH그룹에 대해 O-위치로 존재하는 방사선-경화성 혼합물.
- 제1항에 있어서, 지방족에 결합된 브롬 또는 염소를 함유하는 치환제가 알칼리-가용성 중합체에 결합되어 있는 방사선-경화성 혼합물.
- 제1항 내지 제13항중 어느 한항에 있어서, 혼합물이 추가로 알칼리-가용성 중합체를 함유하는 방사선-경화성 혼합물.
- 기질과 제1항 내지 제13항중 어느 한항에서 청구한 방사선-경화성 혼합물을 함유하는 방사선-감응성 피복물을 필수적으로 포함함을 특징으로 하는, 방사선-경화성 기록물질.
- 제1항 내지 제13항에서 청구한 방사선-경화성 혼합물을 임의로 접착 촉진제로 피복된 기질에 적용시키고, 이 물질을 건조시킨후, 고-에너지 방사선, 특히 X-선 또는 전자방사선 또는 단파 UV 방사선을 사용하여 화상으로(imagewise)조사한 다음, 경우에 따라, 이 물질을 승온하에서 콘디셔닝(conditioning)하고, 최종적으로 수성 알칼리 현상액을 사용하여 피복물의 비조사된 영역을 제거함으로서 화상(image)을 현상시킴을 특징으로 하여, 제14항에서 청구한 방사선 경화성 기록물질을 이용하여 고-에너지 방사선을 기록시키는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3907953A DE3907953A1 (de) | 1989-03-11 | 1989-03-11 | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
DEP3907953.8 | 1989-03-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR900014935A true KR900014935A (ko) | 1990-10-25 |
Family
ID=6376121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900003092A KR900014935A (ko) | 1989-03-11 | 1990-03-09 | 방사선-경화성 혼합물 및 이로부터 제조된 고에너지 방사를 위한 방사선 감응성 기록 물질 |
Country Status (10)
Country | Link |
---|---|
US (1) | US5614351A (ko) |
EP (1) | EP0388677A3 (ko) |
JP (1) | JPH0333747A (ko) |
KR (1) | KR900014935A (ko) |
AU (1) | AU630675B2 (ko) |
BR (1) | BR9001121A (ko) |
CA (1) | CA2011726A1 (ko) |
DE (1) | DE3907953A1 (ko) |
FI (1) | FI901179A0 (ko) |
ZA (1) | ZA901796B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2722870B2 (ja) * | 1991-06-14 | 1998-03-09 | 日本ゼオン株式会社 | レジスト組成物 |
JP3010607B2 (ja) * | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
DE69526119T2 (de) * | 1994-12-28 | 2002-08-29 | Clariant Finance Bvi Ltd | Strahlungsempfindliche zusammensetzung und daraus hergestelltes aufzeichnungsmedium |
US5852823A (en) * | 1996-10-16 | 1998-12-22 | Microsoft | Image classification and retrieval system using a query-by-example paradigm |
JP3732139B2 (ja) | 2001-10-29 | 2006-01-05 | 三菱電機株式会社 | メモリ制御回路及びメモリバスの調停方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3502476A (en) * | 1965-10-20 | 1970-03-24 | Konishiroku Photo Ind | Light-sensitive photographic materials |
GB1248036A (en) * | 1968-01-12 | 1971-09-29 | Agfa Gevaert | Photopolymerisation of ethylenically unsaturated organic compounds |
US3692560A (en) * | 1969-09-18 | 1972-09-19 | Bayer Ag | Acid hardening resins which can be activated by ultraviolet light |
NL7205384A (ko) * | 1972-04-21 | 1973-10-23 | ||
US3912606A (en) * | 1974-11-21 | 1975-10-14 | Eastman Kodak Co | Photosensitive compositions containing benzoxazole sensitizers |
CH621416A5 (ko) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
US4193799A (en) * | 1976-07-09 | 1980-03-18 | General Electric Company | Method of making printing plates and printed circuit |
US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
US4289845A (en) * | 1978-05-22 | 1981-09-15 | Bell Telephone Laboratories, Inc. | Fabrication based on radiation sensitive resists and related products |
DE2928636A1 (de) * | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
US4398001A (en) * | 1982-03-22 | 1983-08-09 | International Business Machines Corporation | Terpolymer resist compositions |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
ATE68272T1 (de) * | 1984-06-01 | 1991-10-15 | Rohm & Haas | Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern. |
DE3442756A1 (de) * | 1984-11-23 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen |
CA1307695C (en) * | 1986-01-13 | 1992-09-22 | Wayne Edmund Feely | Photosensitive compounds and thermally stable and aqueous developablenegative images |
US4699289A (en) * | 1986-03-31 | 1987-10-13 | San Far You | Structure of switch box |
DE3821585A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
DE3730783A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3907954A1 (de) * | 1989-03-11 | 1990-09-13 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
-
1989
- 1989-03-11 DE DE3907953A patent/DE3907953A1/de not_active Withdrawn
-
1990
- 1990-03-01 EP EP19900104008 patent/EP0388677A3/de not_active Withdrawn
- 1990-03-08 ZA ZA901796A patent/ZA901796B/xx unknown
- 1990-03-08 FI FI901179A patent/FI901179A0/fi not_active Application Discontinuation
- 1990-03-08 CA CA002011726A patent/CA2011726A1/en not_active Abandoned
- 1990-03-09 KR KR1019900003092A patent/KR900014935A/ko not_active Application Discontinuation
- 1990-03-09 BR BR909001121A patent/BR9001121A/pt unknown
- 1990-03-09 AU AU51230/90A patent/AU630675B2/en not_active Expired - Fee Related
- 1990-03-12 US US07/491,813 patent/US5614351A/en not_active Expired - Fee Related
- 1990-03-12 JP JP2060900A patent/JPH0333747A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE3907953A1 (de) | 1990-09-13 |
CA2011726A1 (en) | 1990-09-11 |
AU630675B2 (en) | 1992-11-05 |
FI901179A0 (fi) | 1990-03-08 |
EP0388677A2 (de) | 1990-09-26 |
JPH0333747A (ja) | 1991-02-14 |
EP0388677A3 (de) | 1991-07-31 |
US5614351A (en) | 1997-03-25 |
BR9001121A (pt) | 1991-03-05 |
ZA901796B (en) | 1990-11-28 |
AU5123090A (en) | 1990-09-13 |
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E902 | Notification of reason for refusal | ||
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |