KR890017201A - 질화알루미늄소결체와 그것을 사용한 회로기판 및 반도체패키지 - Google Patents

질화알루미늄소결체와 그것을 사용한 회로기판 및 반도체패키지 Download PDF

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KR890017201A
KR890017201A KR1019890006465A KR890006465A KR890017201A KR 890017201 A KR890017201 A KR 890017201A KR 1019890006465 A KR1019890006465 A KR 1019890006465A KR 890006465 A KR890006465 A KR 890006465A KR 890017201 A KR890017201 A KR 890017201A
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South Korea
Prior art keywords
aluminum nitride
circuit board
sintered body
nitride sintered
thermal conductivity
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KR1019890006465A
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English (en)
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KR920003226B1 (ko
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아끼라 야마가와
마사야 미야께
히또유끼 사까노우에
고오이찌 소가베
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나까하라 쯔네오
스미도모덴기고오교오 가부시기가이샤
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    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/581Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Products (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

내용 없음

Description

질화알루미늄소결체와 그것을 사용한 회로기판 및 반도체패키지
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (3)

  1. 질화알루미늄을 주성분으로 하고, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Fe, Co, Ni, Nd 및 Ho로 이루어진군으로부터 선택된 적어도 1종의 천이금곡원소 및/또는 그 화합물을 1.0중량% 이하, 0.01중량% 이상 함유하고, 착색을 나타내고, 또한 열전도율이 I50w/mk 이상인것을 특징으로 하는 질화알루미늄소결체.
  2. 질화알루미늄을 주성분으로 하고, 열전도율이 150w/mk 이상이고 착색을 나타낸 질화알루미늄소결체상에, 도전성페이스트에 의해 회로를 형성한 것을 특징으로 하는 질화알루미늄회로기판.
  3. 질화알루미늄을 주성분으로 하고, 열전도율이 150w/mk 이상이고 착색을 나타낸 질화알루미늄소결체기판과 반도체소자와 리이드프레임으로 이루어진 고열전도성 세라믹패키지.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890006465A 1988-05-16 1989-05-15 질화알루미늄소결체와 그것을 사용한 회로기판 및 반도체패키지 KR920003226B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11684388 1988-05-16
JP63-116843 1988-05-16

Publications (2)

Publication Number Publication Date
KR890017201A true KR890017201A (ko) 1989-12-15
KR920003226B1 KR920003226B1 (ko) 1992-04-24

Family

ID=14697000

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KR1019890006465A KR920003226B1 (ko) 1988-05-16 1989-05-15 질화알루미늄소결체와 그것을 사용한 회로기판 및 반도체패키지

Country Status (4)

Country Link
EP (1) EP0342595B1 (ko)
KR (1) KR920003226B1 (ko)
CA (1) CA1336334C (ko)
DE (1) DE68909836T2 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03257071A (ja) * 1989-11-30 1991-11-15 Toshiba Corp 遮光性窒化アルミニウム焼結体及びその製造方法
JP2567491B2 (ja) * 1990-04-17 1996-12-25 住友電気工業株式会社 高熱伝導性着色窒化アルミニウム焼結体およびその製造方法
JPH0492864A (ja) * 1990-08-06 1992-03-25 Sumitomo Electric Ind Ltd 窒化アルミニウム粉末および焼結体およびその製造法
JP2943275B2 (ja) * 1990-08-07 1999-08-30 住友電気工業株式会社 高熱伝導性着色窒化アルミニウム焼結体およびその製造方法
US5273700A (en) * 1990-10-29 1993-12-28 Sumitomo Electric Industries Ltd. Aluminum nitride sintered body and process for producing the same
KR102339550B1 (ko) * 2017-06-30 2021-12-17 주식회사 미코세라믹스 질화 알루미늄 소결체 및 이를 포함하는 반도체 제조 장치용 부재
CN114195523A (zh) * 2021-12-21 2022-03-18 河北中瓷电子科技股份有限公司 一种3D-sensor用黑色氮化铝陶瓷外壳及其制备方法
CN115724665A (zh) * 2022-12-09 2023-03-03 南方科技大学 一种氮化铝基板及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3627317A1 (de) * 1985-08-13 1987-02-19 Tokuyama Soda Kk Sinterbare aluminiumnitridzusammensetzung, sinterkoerper aus dieser zusammensetzung und verfahren zu seiner herstellung
DE3608326A1 (de) * 1986-03-13 1987-09-17 Kempten Elektroschmelz Gmbh Praktisch porenfreie formkoerper aus polykristallinem aluminiumnitrid und verfahren zu ihrer herstellung ohne mitverwendung von sinterhilfsmitteln
JPS6389463A (ja) * 1986-09-30 1988-04-20 株式会社東芝 高熱伝導性窒化アルミニウム焼結体
US4833108A (en) * 1987-03-28 1989-05-23 Narumi China Corporation Sintered body of aluminum nitride
JPH01203270A (ja) * 1988-02-08 1989-08-16 Sumitomo Electric Ind Ltd 高熱伝導性窒化アルミニウム焼結体及びその製造法

Also Published As

Publication number Publication date
KR920003226B1 (ko) 1992-04-24
DE68909836D1 (de) 1993-11-18
DE68909836T2 (de) 1994-05-11
EP0342595B1 (en) 1993-10-13
EP0342595A3 (en) 1990-04-11
CA1336334C (en) 1995-07-18
EP0342595A2 (en) 1989-11-23

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