KR890010132A - 경화도막의 형성방법 - Google Patents

경화도막의 형성방법 Download PDF

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Publication number
KR890010132A
KR890010132A KR1019880016353A KR880016353A KR890010132A KR 890010132 A KR890010132 A KR 890010132A KR 1019880016353 A KR1019880016353 A KR 1019880016353A KR 880016353 A KR880016353 A KR 880016353A KR 890010132 A KR890010132 A KR 890010132A
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South Korea
Prior art keywords
group
resin
coating film
polymerizable unsaturated
moles
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KR1019880016353A
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English (en)
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KR910009718B1 (ko
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나오즈미 이와사와
오사무 이소자끼
Original Assignee
야마다 모또조오
간사이뻬인또 가부시끼가이사
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Priority claimed from JP62311651A external-priority patent/JP2631853B2/ja
Priority claimed from JP63144985A external-priority patent/JP2686283B2/ja
Application filed by 야마다 모또조오, 간사이뻬인또 가부시끼가이사 filed Critical 야마다 모또조오
Publication of KR890010132A publication Critical patent/KR890010132A/ko
Application granted granted Critical
Publication of KR910009718B1 publication Critical patent/KR910009718B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

내용 없음

Description

경화 도막의 형성방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 하기 식(Ⅰ)의 비양성자성 오늄 함유기 및 중합성 불포화기를 함유하는 수지로 이루어지거나 또는 이를 주성분으로서 함유하는 피복 조성물을 화학선 또는 전자비임에 노출시켜 교차 반응을 유발시키고 이어서 조성물을 80℃이상의 온도로 열처리함을 특징으로 하는 경화도막의 형성방법.
    식중, R1은 수소원자이거나, 히드록실기, 알콕시기, 에스테르기 또는 할로겐원자로 임의 치환될 수 있는 탄소수 1∼8의 탄화수소기이고,
    (여기서, Z는 질소원자 또는 인원자를 나타내고, Y는 황원자를 나타낸다)를 나타내며, R2, R3, 및 R4는 동일 또는 상이하게 각각 탄소수 1∼14의 유기기를 나타내고, 단, R2와 R3또는 R2, R3및 R4는 인접한 질소원자, 인원자 또는 황원자와 함께 복소환기를 형성할 수 있다.
  2. 제1항에 있어서, 언급된 수지가 겔 투과 크로마토그래퍼로 측정한 피이크 분자량 약 250∼100,000을 가지는 방법.
  3. 제1항에 있어서, 언급된 수지가 분자당 적어도 1개의 중합성 불포화기를 가지는 방법.
  4. 제1항에 있어서, 언급된 수지가 수지고체 1㎏당. 0.1∼10몰의 중합성 불포화기 함량 및 0.1-5몰의 오늄 함유기 함량을 가지는 방법.
  5. 제1항에 있어서, 언급된 중합성 불포화기가 아크릴로일, 메타크릴로일, 이타코노일, 말레오일, 푸마로일, 크로토노일, 아크밀아미도, 메타크릴아미도, 신나모일, 비닐 및 알릴로 이루어진 군으로부터 선택된 적어도 하나의 기인 방법.
  6. 제1항에 있어서, 언급된 수지가 아크릴계, 폴리에스테르계, 우레탄계, 폴리부타디엔계, 알키드계, 에폭시계 또는 페놀계 수지인 방법.
  7. 제1항에 있어서, 언급된 피복 조성물이 수용액 또는 수분산액의 형태로 사용되는 방법.
  8. 제1항에 있어서, 중합성 불포화기 및 비양성자성 오늄 함유기를 함유하는 수지가 그 수지 1kg당, 0.3-10몰의 중합성 불포화기 및 0.1-3몰의 식(Ⅰ)의 비양성자성 오늄 함유기를 함유하는 방향족 에폭시 수지 유도체인 방법.
  9. 제8항에 있어서, (A)주성분으로서 방향족 에폭시수지 유도체를 함유하고 추가로 광중합 개시제를 함유하는 피복 조성물을 기판에 도포하여 기판상에 미경화 도막을 형성하는 단계 및 (B)화학선을 조사하여 미경화 도막을 경화시키는 단계로 이루어진 방법.
  10. 제9항에 있어서, 기판에 도포된 피복 조성물을 건조시키는 단계, 도막에 포토마스크를 통하여 화학선을 조사하는 단계, 도막을 물 또는 묽은 산수용액으로 현상하여 비노출 부위를 용해 제거하는 단계 및 현상된 도막을 열처리하는 단계로 이루어지는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880016353A 1987-12-08 1988-12-08 경화 도막의 형성방법 KR910009718B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP311651 1987-12-08
JP62-311651 1987-12-08
JP62311651A JP2631853B2 (ja) 1987-12-08 1987-12-08 被膜の硬化方法
JP63144985A JP2686283B2 (ja) 1988-06-13 1988-06-13 光重合性組成物
JP63-144985 1988-06-13

Publications (2)

Publication Number Publication Date
KR890010132A true KR890010132A (ko) 1989-08-07
KR910009718B1 KR910009718B1 (ko) 1991-11-29

Family

ID=26476256

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880016353A KR910009718B1 (ko) 1987-12-08 1988-12-08 경화 도막의 형성방법

Country Status (5)

Country Link
US (1) US5093223A (ko)
KR (1) KR910009718B1 (ko)
CA (1) CA1334952C (ko)
DE (1) DE3841422A1 (ko)
GB (1) GB2213487B (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
DE3914407A1 (de) * 1989-04-29 1990-10-31 Basf Ag Strahlungsempfindliche polymere und positiv arbeitendes aufzeichnungsmaterial
EP0536272B1 (en) * 1990-06-27 1999-09-22 Coates Brothers Plc Image-forming process
JPH05127378A (ja) * 1991-11-01 1993-05-25 Kansai Paint Co Ltd 光重合性組成物
DE4217688A1 (de) * 1992-05-29 1993-12-02 Basf Lacke & Farben Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
JPH05343837A (ja) * 1992-06-05 1993-12-24 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物及びソルダーレジストパターン形成方法
JPH07114183A (ja) * 1993-10-15 1995-05-02 Sony Corp 光重合性組成物及びこれを用いた硬化塗膜パターンの形成方法
JPH08234432A (ja) * 1994-11-11 1996-09-13 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物
JP3134037B2 (ja) * 1995-01-13 2001-02-13 太陽インキ製造株式会社 メラミンの有機酸塩を用いた熱硬化性もしくは光硬化性・熱硬化性コーティング組成物
US5847022A (en) * 1995-03-27 1998-12-08 Dainippon Ink And Chemicals, Inc. Radiation curable resin composition and method therefor
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
US5681684A (en) * 1995-09-20 1997-10-28 National Starch And Chemical Investment Holding Corporation Photosensitive resin composition
US6375786B1 (en) 1996-03-04 2002-04-23 Awi Licensing Company Surface covering having a precoated, E-beam cured wearlayer coated film and process of making the same
GB2347881B (en) * 1996-03-04 2000-11-01 Armstrong World Ind Inc Process for manufacturing a surface covering and surface coverings made by the process
JPH1121333A (ja) * 1997-07-04 1999-01-26 Takeda Chem Ind Ltd エポキシエステル樹脂の製造法およびそれを含む感光性樹脂組成物
JP2001270919A (ja) * 2000-01-17 2001-10-02 Toyo Gosei Kogyo Kk 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法
US7473444B2 (en) * 2002-01-21 2009-01-06 Kansai Paint Co., Ltd. Method of forming coating film
JP7433888B2 (ja) * 2019-12-24 2024-02-20 東亞合成株式会社 電子線硬化型組成物を使用する塗装材料の製造方法

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DE3231144A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von tiefdruckformen mit kunststoff-druckschichten
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JPH0639518B2 (ja) * 1986-04-28 1994-05-25 東京応化工業株式会社 耐熱性感光性樹脂組成物

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Publication number Publication date
CA1334952C (en) 1995-03-28
GB2213487A (en) 1989-08-16
GB2213487B (en) 1992-01-08
KR910009718B1 (ko) 1991-11-29
DE3841422A1 (de) 1989-06-22
US5093223A (en) 1992-03-03
DE3841422C2 (ko) 1991-02-07
GB8827839D0 (en) 1988-12-29

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