GB8827839D0 - Method of forming cured coating film - Google Patents

Method of forming cured coating film

Info

Publication number
GB8827839D0
GB8827839D0 GB888827839A GB8827839A GB8827839D0 GB 8827839 D0 GB8827839 D0 GB 8827839D0 GB 888827839 A GB888827839 A GB 888827839A GB 8827839 A GB8827839 A GB 8827839A GB 8827839 D0 GB8827839 D0 GB 8827839D0
Authority
GB
United Kingdom
Prior art keywords
coating film
cured coating
forming cured
forming
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB888827839A
Other versions
GB2213487A (en
GB2213487B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62311651A external-priority patent/JP2631853B2/en
Priority claimed from JP63144985A external-priority patent/JP2686283B2/en
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Publication of GB8827839D0 publication Critical patent/GB8827839D0/en
Publication of GB2213487A publication Critical patent/GB2213487A/en
Application granted granted Critical
Publication of GB2213487B publication Critical patent/GB2213487B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
GB8827839A 1987-12-08 1988-11-29 Method of forming a cured coating film Expired - Fee Related GB2213487B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62311651A JP2631853B2 (en) 1987-12-08 1987-12-08 Curing method of coating
JP63144985A JP2686283B2 (en) 1988-06-13 1988-06-13 Photopolymerizable composition

Publications (3)

Publication Number Publication Date
GB8827839D0 true GB8827839D0 (en) 1988-12-29
GB2213487A GB2213487A (en) 1989-08-16
GB2213487B GB2213487B (en) 1992-01-08

Family

ID=26476256

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8827839A Expired - Fee Related GB2213487B (en) 1987-12-08 1988-11-29 Method of forming a cured coating film

Country Status (5)

Country Link
US (1) US5093223A (en)
KR (1) KR910009718B1 (en)
CA (1) CA1334952C (en)
DE (1) DE3841422A1 (en)
GB (1) GB2213487B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
DE3914407A1 (en) * 1989-04-29 1990-10-31 Basf Ag RADIATION-SENSITIVE POLYMERS AND POSITIVE WORKING RECORDING MATERIAL
KR100187942B1 (en) * 1990-06-27 1999-06-01 배트 이안 지 Image-forming process
JPH05127378A (en) * 1991-11-01 1993-05-25 Kansai Paint Co Ltd Photopolymerizable composition
DE4217688A1 (en) * 1992-05-29 1993-12-02 Basf Lacke & Farben Mixture cross-linking by the action of radiation and its use for the production of high-temperature-resistant relief structures
JPH05343837A (en) * 1992-06-05 1993-12-24 Taiyo Ink Mfg Ltd Solder resist ink composition and formation method of resist pattern
JPH07114183A (en) * 1993-10-15 1995-05-02 Sony Corp Photopolymerizable composition and formation of cured coating film pattern using the same
JPH08234432A (en) * 1994-11-11 1996-09-13 Taiyo Ink Mfg Ltd Soldering resist ink composition
JP3134037B2 (en) * 1995-01-13 2001-02-13 太陽インキ製造株式会社 Thermosetting or photocuring / thermosetting coating composition using melamine organic acid salt
US5847022A (en) * 1995-03-27 1998-12-08 Dainippon Ink And Chemicals, Inc. Radiation curable resin composition and method therefor
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
US5681684A (en) * 1995-09-20 1997-10-28 National Starch And Chemical Investment Holding Corporation Photosensitive resin composition
GB2347881B (en) * 1996-03-04 2000-11-01 Armstrong World Ind Inc Process for manufacturing a surface covering and surface coverings made by the process
US6375786B1 (en) 1996-03-04 2002-04-23 Awi Licensing Company Surface covering having a precoated, E-beam cured wearlayer coated film and process of making the same
JPH1121333A (en) * 1997-07-04 1999-01-26 Takeda Chem Ind Ltd Production of epoxy ester resin and photopolymer composition containing epoxy ester resin
JP2001270919A (en) * 2000-01-17 2001-10-02 Toyo Gosei Kogyo Kk Polymer, its production method, photosensitive composition, and method for forming pattern formation
JPWO2003061850A1 (en) * 2002-01-21 2005-05-19 関西ペイント株式会社 Coating method
JP7433888B2 (en) * 2019-12-24 2024-02-20 東亞合成株式会社 Method for producing coating material using electron beam curable composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512814A (en) * 1975-08-13 1978-06-01 Ciba Geigy Ag Epoxide resins
US4338232A (en) * 1977-12-27 1982-07-06 The Dow Chemical Company Radiation-curable resins
US4186069A (en) * 1978-01-30 1980-01-29 Richardson Graphics Company Photopolymerizable latex systems
DE3374413D1 (en) * 1982-06-24 1987-12-17 Ciba Geigy Ag Photopolymerisable coating, photopolymerisable material and its use
DE3231144A1 (en) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING PRINTING FORMS WITH PLASTIC PRINT LAYERS
CA1208835A (en) * 1982-10-04 1986-07-29 Teruaki Kuwajima Aqueous coating composition
JPH0639518B2 (en) * 1986-04-28 1994-05-25 東京応化工業株式会社 Heat resistant photosensitive resin composition

Also Published As

Publication number Publication date
US5093223A (en) 1992-03-03
DE3841422A1 (en) 1989-06-22
KR890010132A (en) 1989-08-07
GB2213487A (en) 1989-08-16
KR910009718B1 (en) 1991-11-29
GB2213487B (en) 1992-01-08
DE3841422C2 (en) 1991-02-07
CA1334952C (en) 1995-03-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19981129