KR890008200A - 헥사플루오로 이소프로필리덴기를 함유하는 폴리아미드 및 그로부터 제조된 폴리벤족사졸 및 폴리아미드를 포함하는 조성물 및 물품 - Google Patents
헥사플루오로 이소프로필리덴기를 함유하는 폴리아미드 및 그로부터 제조된 폴리벤족사졸 및 폴리아미드를 포함하는 조성물 및 물품 Download PDFInfo
- Publication number
- KR890008200A KR890008200A KR1019880015374A KR880015374A KR890008200A KR 890008200 A KR890008200 A KR 890008200A KR 1019880015374 A KR1019880015374 A KR 1019880015374A KR 880015374 A KR880015374 A KR 880015374A KR 890008200 A KR890008200 A KR 890008200A
- Authority
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- South Korea
- Prior art keywords
- polyamide
- polybenzoxazole
- substituted
- moiety
- general formula
- Prior art date
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- 239000004952 Polyamide Substances 0.000 title claims 9
- 229920002647 polyamide Polymers 0.000 title claims 9
- 229920002577 polybenzoxazole Polymers 0.000 title claims 7
- -1 hexafluoro isopropylidene groups Chemical group 0.000 title claims 2
- 239000000203 mixture Substances 0.000 title claims 2
- 125000003118 aryl group Chemical group 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 241000282994 Cervidae Species 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- OGBAQIDQMBHMAQ-UHFFFAOYSA-N bromo-chloro-fluoro-lambda3-iodane Chemical compound FI(Cl)Br OGBAQIDQMBHMAQ-UHFFFAOYSA-N 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/40—Polyesters derived from ester-forming derivatives of polycarboxylic acids or of polyhydroxy compounds, other than from esters thereof
- C08G63/44—Polyamides; Polynitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/22—Polybenzoxazoles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
- C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
- C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
- C08G69/32—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24628—Nonplanar uniform thickness material
- Y10T428/24736—Ornamental design or indicia
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polyamides (AREA)
- Liquid Crystal (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (12)
- 중합체 사슬 내에 하기 반복 구조를 포함하는 폴리아미드 ;상기식에서, (1) R은 하기 일반식(1)의 4가 방향족 부분이고 ; (2) R'는 하기 일반식(2) 중에서 독립적으로 선택되는 1가 부분이며 : (3) R" 치환 또는 비치환 알킬렌, 치환족 또는 아릴렌 부분이다 :상기식에서, X는 수소나 치환 또는 비치환 C1-C8저급 알킬 및 치환 또는 비치환 페닐로부터 독립적으로 선택되는 치환체이고 ; Z는 클로로, 브로모, 플루오로, 요오도 및 C1-C8저급알킬에서, 독립적으로 선택되며 ; n은 독립적으로 0 또는 1이다.
- 제1항에 있어서, R 부분이 하기 일반식으로 나타내어지는 폴리아미드 :
- 중합체 사슴 내에서 반복 구조를 포함하는 폴리벤족사졸 :상기식에서, R은 다음 하기 일반식의 4가 방향족 부분이고 ; R"은 알킬렌, 지환족 또는 방향족 부분에서 선택된다 :상기식에서, Z는 클로로, 브로모, 플루오로, 요오드 및 C1-C8저급알킬에서 선택되고 ; n은 독립적으로 0 또는 1이다.
- 제3항에 있어서, R이 하기 일반식인 폴리벤족사졸 :상기식에서, 3 및 3' 고리 결합들은 중합체 사슬내의 질소와 결합되어 있고, 4 및 4' 고리 결합들은 상기 사슬내의 산소와 결합되어 있다.
- 제1항 또는 제2항에 따르는 폴리아미드 및 방사선 증감제(sensitzer)를 포함하는 양화 감광성 내식막조성물.
- 제1항 또는 제2항에 따르는 폴리아미드 및 유기 용매를 포함하는 코팅 용액.
- 제1항 또는 제2항에 따르는 폴리아미드를 포함하는 폴리아미드 필름.
- 제1항 또는 제2항에 따르는 폴리아미드를 포함하는 성형부품.
- 제3항 또는 제4항에 따르는 폴리벤족사졸을 포함하는 기판상 릴리이프(relief)패턴.
- 제3항 또는 제4항에 따르는 폴리벤족사졸을 포함하는 필름.
- 제3항 또는 제4항에 따르는 폴리벤족사졸을 포함하는 성형부품.
- 제3항 또는 제4항에 따르는 폴리벤족사졸을 포함하는 액정표시 배향층.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US124,634 | 1980-02-25 | ||
US07/124,634 US4845183A (en) | 1987-11-24 | 1987-11-24 | Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers |
Publications (1)
Publication Number | Publication Date |
---|---|
KR890008200A true KR890008200A (ko) | 1989-07-10 |
Family
ID=22415977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880015374A KR890008200A (ko) | 1987-11-24 | 1988-11-22 | 헥사플루오로 이소프로필리덴기를 함유하는 폴리아미드 및 그로부터 제조된 폴리벤족사졸 및 폴리아미드를 포함하는 조성물 및 물품 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4845183A (ko) |
EP (1) | EP0317942A3 (ko) |
JP (1) | JPH02138338A (ko) |
KR (1) | KR890008200A (ko) |
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US8487068B2 (en) * | 2011-08-31 | 2013-07-16 | Toho Chemical Industry Co., Ltd. | Method of manufacturing polybenzoxazole precursor |
WO2015124483A1 (en) * | 2014-02-19 | 2015-08-27 | Rolic Ag | Liquid crystal alignment composition, liquid crystal alignment film and liquid crystal display element |
JP6243862B2 (ja) * | 2015-02-17 | 2017-12-06 | 富士フイルム株式会社 | 液晶配向膜の製造方法、液晶表示装置の製造方法および液晶表示装置 |
WO2019009192A1 (ja) * | 2017-07-06 | 2019-01-10 | シャープ株式会社 | 液晶配向剤、及び、液晶パネル |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3449296A (en) * | 1967-05-29 | 1969-06-10 | Du Pont | Polybenzoxazole film |
DE2931297A1 (de) * | 1979-08-01 | 1981-02-19 | Siemens Ag | Waermebestaendige positivresists und verfahren zur herstellung waermebestaendiger reliefstrukturen |
US4477648A (en) * | 1983-04-07 | 1984-10-16 | Trw Inc. | High-temperature polyimides prepared from 2,2-bis-[(2-halo-4-aminophenoxy)-phenyl]hexafluoropropane |
DE3411659A1 (de) * | 1984-03-29 | 1985-10-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyoxazol- und polythiazol-vorstufen |
GB2188936B (en) * | 1986-03-06 | 1988-12-21 | Central Glass Co Ltd | Aromatic polyamides and polybenoxazoles having diphenylhexafluoropropane units |
-
1987
- 1987-11-24 US US07/124,634 patent/US4845183A/en not_active Expired - Lifetime
-
1988
- 1988-11-22 JP JP63295923A patent/JPH02138338A/ja active Pending
- 1988-11-22 EP EP88119369A patent/EP0317942A3/en not_active Withdrawn
- 1988-11-22 KR KR1019880015374A patent/KR890008200A/ko not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9375483B2 (en) | 2012-03-09 | 2016-06-28 | Dong-A St Co., Ltd. | Stable liquid pharmaceutical composition containing piroxicam or its pharmaceutically acceptable salt and hyaluronic acid or its pharmaceutically acceptable salt and the manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
EP0317942A2 (en) | 1989-05-31 |
JPH02138338A (ja) | 1990-05-28 |
EP0317942A3 (en) | 1990-02-28 |
US4845183A (en) | 1989-07-04 |
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