KR870001687A - 반도체 레이저 - Google Patents
반도체 레이저 Download PDFInfo
- Publication number
- KR870001687A KR870001687A KR1019860005967A KR860005967A KR870001687A KR 870001687 A KR870001687 A KR 870001687A KR 1019860005967 A KR1019860005967 A KR 1019860005967A KR 860005967 A KR860005967 A KR 860005967A KR 870001687 A KR870001687 A KR 870001687A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- active layer
- semiconductor laser
- algainp
- trapping
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02461—Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32325—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm red laser based on InGaP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Semiconductor Lasers (AREA)
Abstract
내용 없음.
Description
제1도는 본원 발명에 의한 바도체 레이저의 일례의 약선적 확대 단면도.
* 도면의 주요부분에 대한 부호의 설명
1 : GaAs 기판 2,4 : 제1 및 제2의 클래드층
4a : AlGaInp층 4b : 저굴절률 고열전도도의 AlGaAs 층
3 : 활성층 5 : 캡층
6,7 : 전극 9 : 히이트싱크
Claims (1)
- 최소한 히이트싱크(heat sink)측에서 활성층에 인접하는 클래드층(clad 層)이, 상기 활성층에 대한 캐리어를 가두어 넣는 효과를 나타내는 범위에서 작은 두께를 가지며, 상기 활성층에 비해 큰 에너지 밴드갭폭을 갖는 AlGaInP층과, 이 AlGaInP층에 비해 열전도도가 높으며 상기 활성층에 비해 굴절들이 작고 주로 빛을 가두어 넣는 기능을 갖는 AlGaAs층으로 이루어진 것을 특징으로 하는 반도체 레이저.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP85-166325 | 1985-07-26 | ||
JP60166325A JPH0728084B2 (ja) | 1985-07-26 | 1985-07-26 | 半導体レーザー |
Publications (2)
Publication Number | Publication Date |
---|---|
KR870001687A true KR870001687A (ko) | 1987-03-17 |
KR950000115B1 KR950000115B1 (ko) | 1995-01-09 |
Family
ID=15829263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860005967A KR950000115B1 (ko) | 1985-07-26 | 1986-07-23 | 반도체 레이저 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4740977A (ko) |
JP (1) | JPH0728084B2 (ko) |
KR (1) | KR950000115B1 (ko) |
DE (1) | DE3625145C2 (ko) |
FR (1) | FR2585522B1 (ko) |
GB (1) | GB2178595B (ko) |
NL (1) | NL194185C (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9664470B2 (en) | 2012-08-31 | 2017-05-30 | Kci Co., Ltd. | Drum-type magazine |
KR20220093804A (ko) * | 2020-12-28 | 2022-07-05 | 배주환 | 총열 교체형 소총에 사용되는 드럼 탄창 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0766976B2 (ja) * | 1987-02-27 | 1995-07-19 | 三菱電機株式会社 | 赤外線検知器 |
GB2226447B (en) * | 1987-02-27 | 1990-10-31 | Mitsubishi Electric Corp | An infrared ray detector |
EP0397691B1 (en) * | 1988-01-06 | 2000-02-09 | Telstra Corporation Limited | Current injection laser |
JPH069282B2 (ja) * | 1988-09-09 | 1994-02-02 | 株式会社東芝 | 半導体レーザ装置 |
US4924471A (en) * | 1989-03-13 | 1990-05-08 | Amoco Corporation | Method for increasing the output power of a laser diode |
US5048036A (en) * | 1989-09-18 | 1991-09-10 | Spectra Diode Laboratories, Inc. | Heterostructure laser with lattice mismatch |
US4984242A (en) * | 1989-09-18 | 1991-01-08 | Spectra Diode Laboratories, Inc. | GaAs/AlGaAs heterostructure laser containing indium |
EP0695006B1 (en) * | 1990-05-09 | 1998-03-04 | Sharp Kabushiki Kaisha | A method for producing a compound semiconductor laser device |
US5200972A (en) * | 1991-06-17 | 1993-04-06 | The United States Of America As Represented By The Secretary Of The Navy | ND laser with co-doped ion(s) pumped by visible laser diodes |
JP2869279B2 (ja) * | 1992-09-16 | 1999-03-10 | 三菱電機株式会社 | 半導体レーザダイオード及びその製造方法並びに半導体レーザダイオードアレイ |
US5559819A (en) * | 1994-04-19 | 1996-09-24 | Nippondenso Co., Ltd. | Semiconductor laser device |
US5811839A (en) * | 1994-09-01 | 1998-09-22 | Mitsubishi Chemical Corporation | Semiconductor light-emitting devices |
JPH08264898A (ja) * | 1995-03-23 | 1996-10-11 | Mitsubishi Electric Corp | 半導体レーザ装置 |
US6298078B1 (en) * | 1999-02-25 | 2001-10-02 | Opto Power Corporation | Laser diodes with composite material systems which decouple refractive index and band gap profiles |
US6657237B2 (en) * | 2000-12-18 | 2003-12-02 | Samsung Electro-Mechanics Co., Ltd. | GaN based group III-V nitride semiconductor light-emitting diode and method for fabricating the same |
US6646777B2 (en) | 2002-02-27 | 2003-11-11 | Jds Uniphase Corporation | Optical isolator with improved mounting characteristics |
US6773532B2 (en) * | 2002-02-27 | 2004-08-10 | Jds Uniphase Corporation | Method for improving heat dissipation in optical transmitter |
JP2005167137A (ja) * | 2003-12-05 | 2005-06-23 | Mitsubishi Electric Corp | 半導体レーザ装置 |
KR100689501B1 (ko) * | 2005-02-03 | 2007-03-02 | 삼성전자주식회사 | 광대역 반도체 광소자 |
JP2007053242A (ja) * | 2005-08-18 | 2007-03-01 | Fuji Xerox Co Ltd | 半導体レーザ装置およびその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1263835A (en) * | 1970-10-15 | 1972-02-16 | Standard Telephones Cables Ltd | Improvements in or relating to injection lasers |
US3946334A (en) * | 1973-11-14 | 1976-03-23 | Nippon Electric Company, Limited | Injection semiconductor laser device |
CA1137605A (en) * | 1979-01-15 | 1982-12-14 | Donald R. Scifres | High output power laser |
JPS5627987A (en) * | 1979-08-15 | 1981-03-18 | Kokusai Denshin Denwa Co Ltd <Kdd> | Semiconductor laser |
JPS5637687A (en) * | 1979-09-04 | 1981-04-11 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS5688388A (en) * | 1979-12-19 | 1981-07-17 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
US4585491A (en) * | 1983-09-02 | 1986-04-29 | Xerox Corporation | Wavelength tuning of quantum well lasers by thermal annealing |
JPH0654821B2 (ja) * | 1985-06-05 | 1994-07-20 | 日本電気株式会社 | 半導体発光素子 |
-
1985
- 1985-07-26 JP JP60166325A patent/JPH0728084B2/ja not_active Expired - Lifetime
-
1986
- 1986-07-23 KR KR1019860005967A patent/KR950000115B1/ko not_active IP Right Cessation
- 1986-07-24 GB GB08618049A patent/GB2178595B/en not_active Expired
- 1986-07-25 NL NL8601929A patent/NL194185C/nl not_active IP Right Cessation
- 1986-07-25 DE DE3625145A patent/DE3625145C2/de not_active Expired - Fee Related
- 1986-07-25 FR FR8610793A patent/FR2585522B1/fr not_active Expired - Fee Related
- 1986-07-28 US US06/889,961 patent/US4740977A/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9664470B2 (en) | 2012-08-31 | 2017-05-30 | Kci Co., Ltd. | Drum-type magazine |
KR20220093804A (ko) * | 2020-12-28 | 2022-07-05 | 배주환 | 총열 교체형 소총에 사용되는 드럼 탄창 |
Also Published As
Publication number | Publication date |
---|---|
US4740977A (en) | 1988-04-26 |
DE3625145A1 (de) | 1987-01-29 |
KR950000115B1 (ko) | 1995-01-09 |
FR2585522A1 (fr) | 1987-01-30 |
FR2585522B1 (fr) | 1994-07-08 |
GB2178595A (en) | 1987-02-11 |
DE3625145C2 (de) | 1999-12-16 |
JPH0728084B2 (ja) | 1995-03-29 |
NL194185B (nl) | 2001-04-02 |
GB2178595B (en) | 1988-07-20 |
NL8601929A (nl) | 1987-02-16 |
NL194185C (nl) | 2001-08-03 |
GB8618049D0 (en) | 1986-09-03 |
JPS6226885A (ja) | 1987-02-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR870001687A (ko) | 반도체 레이저 | |
KR900005656A (ko) | 반도체 레이저 장치 | |
GB1385818A (en) | Semiconductor double heterostructure diode laser | |
KR860700373A (ko) | 발광 다이오드 | |
KR860006851A (ko) | 반도체 레이저 | |
KR870002669A (ko) | 반도체 레이저다이오드 | |
KR880003459A (ko) | 반도체 레이저 장치 | |
KR970063768A (ko) | 단부면 발광형 광반도체 소자 및 그 제조방법 | |
KR890013839A (ko) | 반도체 레이저 장치 및 그 제조방법 | |
KR950004667A (ko) | 반도체레이저소자 및 그 제작방법 | |
KR920020797A (ko) | 반도체레이저 | |
KR890005935A (ko) | 반도체 레이저 | |
KR930024241A (ko) | 반도체 레이저장치 및 이의 제조방법 | |
KR970060603A (ko) | 높은 주변 온도에서도 저잡음으로 동작이 가능한 반도체 레이저 디바이스 | |
KR920011003A (ko) | 화합물 반도체 레이저 | |
KR950034943A (ko) | 광디바이스 | |
KR950010243A (ko) | 반도체 레이저 소자 | |
KR950012847A (ko) | 반도체 레이저 다이오드 | |
KR960043385A (ko) | 반도체 레이저 다이오드 | |
KR950007214A (ko) | 반도체 레이저 소자 및 그의 제조방법 | |
KR950012891A (ko) | 반도체 레이저 다이오드 | |
KR920020801A (ko) | 고출력 가시광 반도체 레이저 소자의 제조방법 | |
KR920009007A (ko) | 레이저다이오드 및 그 제조방법 | |
KR950007212A (ko) | 반도체 레이져 다이오드 | |
KR920009008A (ko) | 레이저 다이오드의 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20060102 Year of fee payment: 12 |
|
EXPY | Expiration of term |