KR850002682A - 세라믹 다층기판 및 그 제조방법 - Google Patents
세라믹 다층기판 및 그 제조방법 Download PDFInfo
- Publication number
- KR850002682A KR850002682A KR1019840005623A KR840005623A KR850002682A KR 850002682 A KR850002682 A KR 850002682A KR 1019840005623 A KR1019840005623 A KR 1019840005623A KR 840005623 A KR840005623 A KR 840005623A KR 850002682 A KR850002682 A KR 850002682A
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- KR
- South Korea
- Prior art keywords
- layer
- multilayer board
- board according
- inner conductor
- insulating layer
- Prior art date
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- 239000000919 ceramic Substances 0.000 title claims 7
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004020 conductor Substances 0.000 claims description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- 239000000945 filler Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910000510 noble metal Inorganic materials 0.000 claims 6
- 229910044991 metal oxide Inorganic materials 0.000 claims 4
- 150000004706 metal oxides Chemical class 0.000 claims 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 239000010949 copper Substances 0.000 claims 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 239000011733 molybdenum Substances 0.000 claims 2
- 229910052755 nonmetal Inorganic materials 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 239000010970 precious metal Substances 0.000 claims 2
- 230000008018 melting Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 239000000843 powder Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4061—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in inorganic insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/705—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thick-film circuits or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5383—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/167—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed resistors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/035—Paste overlayer, i.e. conductive paste or solder paste over conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/247—Finish coating of conductors by using conductive pastes, inks or powders
- H05K3/248—Finish coating of conductors by using conductive pastes, inks or powders fired compositions for inorganic substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
- H05K3/4667—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 다층 기판의 일실시예의 단면도. 제2도는 제1도의 실시예에 있어서의 충전재료근처의 확대 단면도. 제3도는 알루미나기판상에 BaO-B2O3계 유리분과 알루미나분과 은분말을 유기성 비이클과 함께 혼합반죽하여 페이스트화 한 것을 인쇄, 건조 후, 공기중에서 85℃로 소성한 막의 면적저항율을 표시한 그래프. 제4도 (a)는 텅그스텐-알루미나계 다층기판 최상층 작은 구멍에 BaO-B2O3계 유리와 알루미나 분과 은입자로 된 충전재를 형성한 것은 850℃의 열처리를 4회 반복했을 때의 저항치 변화를 표시한 그래프. 여기서 저항치는 충전재와 내층도체의 계면에서의 저항은 극히 작기 때문에 내부도체층의 측정단자까지 저항치를 포함한 형태로 표시하고 있다. 제4도 (b)는 제4도(a)의 특성에 대한 측정방법을 표시한 도면.
Claims (16)
- 세라믹으로 된 절연층과 비금속으로 된 내부도체층을 교호로 적층함과 동시에, 상기 전기절연층의 최상층에는 상기 내부 도체층의 필요개소가 노출하도록 작은 구멍을 형성함과 동시에, 상기 적층체의 최상층 절연층의 작은구멍 부분에 내부 비금속도체와 화학적으로 불활성인 금속산화물과 귀금속으로 된 재료를 충전한 다층기판.
- 제1항에 있어서, 절연층을 알루미나를 주성분으로 한 세라믹으로 하고, 내부도체층을 턴그스텐으로 한 다층기판.
- 제1항에 있어서, 절연층을 알루미나를 주성분으로 한 세라믹으로 하고, 내부도체층을 몰리브덴으로 한 다층기판.
- 제1항에 있어서, 귀금속을 은으로 한 충전재를 사용한 다층기판.
- 제1항에 있어서, 귀금속을 금으로 한 충전재를 사용한 다층기판.
- 제1항에 있어서, 귀금속을 백금으로 한 충전재를 사용한 다층기판.
- 제1항에 있어서, 내부도체층을 구리로 한 다층기판.
- 제1항에 있어서, 금속산화물에 저융점 산화물을 사용한 다층기판.
- 제1항에 있어서, 충적재로 사용하는 금속산화물을 BaO-B2O3계 유리와 알루미나의 혼합계로 한 다층기판.
- 세라믹으로 된 절연층과 비금속으로 된 내부도체층을 교호로 적층함과 동시에, 상기 전기절연층의 최상층에는 상기 내부 도체층의 필요한 개소가 노출하도록 작은 구멍을 형성함과 동시에, 상기 적층체의 최상층 절연층의 작은구멍 부분에 내부 비금속도체와 화학적으로 불활성인 금속산화물과 귀금속으로 된 재료를 충전하고, 상기 충전재의 연설부에 전기적으로 접속된 귀금족계 후막도체와 상기 후막도체를 전극으로 한 후막저항 소자를 형성한 다층기판.
- 제10항에 있어서, 절연층을 알루미나를 주성분으로 한 세라믹으로 하고, 내부도체층을 턴그스텐으로 한 다층기판.
- 제10항에 있어서, 절연층을 알루미나를 주성분으로 한 세라믹으로 하고, 내부도체층을 몰리브덴으로 한 다층기판.
- 제10항에 있어서, 귀금속을 은으로 한 충전재를 사용한 다층기판.
- 제10항에 있어서, 귀금속을 금으로 한 충전재를 사용한 다층기판.
- 제10항에 있어서, 귀금속을 백금으로 한 충 전재를 사용한 다층기판.
- 제10항에 있어서, 내부도체층을 구리로 한 다층기판.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (18)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58-171510 | 1983-09-16 | ||
JP17151083A JPS6063988A (ja) | 1983-09-16 | 1983-09-16 | 多層基板およびその製造方法 |
JP83-171510 | 1983-09-16 | ||
JP19462783A JPS6085598A (ja) | 1983-10-18 | 1983-10-18 | 多層配線基板 |
JP58-194627 | 1983-10-18 | ||
JP83-194627 | 1983-10-18 | ||
JP59-24801 | 1984-02-13 | ||
JP84-24801 | 1984-02-13 | ||
JP59024801A JPS60169194A (ja) | 1984-02-13 | 1984-02-13 | ハイブリツド集積回路用基板 |
JP59-31472 | 1984-02-23 | ||
JP59031471A JPS60176296A (ja) | 1984-02-23 | 1984-02-23 | グレ−ズ抵抗素子一体型多層基板の製造方法 |
JP59031472A JPS60176297A (ja) | 1984-02-23 | 1984-02-23 | ハイブリツドic用多層基板 |
JP84-31471 | 1984-02-23 | ||
JP59-31471 | 1984-02-23 | ||
JP84-96869 | 1984-05-15 | ||
JP84-31472 | 1984-05-15 | ||
JP9686984A JPS60240192A (ja) | 1984-05-15 | 1984-05-15 | 多層基板の製造方法 |
JP59-96869 | 1984-05-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850002682A true KR850002682A (ko) | 1985-05-15 |
KR900004379B1 KR900004379B1 (ko) | 1990-06-23 |
Family
ID=27549213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840005623A KR900004379B1 (ko) | 1983-09-16 | 1984-09-15 | 세라믹 다층기판 및 그 제조방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4732798A (ko) |
KR (1) | KR900004379B1 (ko) |
DE (1) | DE3434449A1 (ko) |
GB (1) | GB2149222B (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3621667A1 (de) * | 1985-06-29 | 1987-01-08 | Toshiba Kawasaki Kk | Mit einer mehrzahl von dickfilmen beschichtetes substrat, verfahren zu seiner herstellung und dieses enthaltende vorrichtung |
JPS62265796A (ja) * | 1986-05-14 | 1987-11-18 | 株式会社住友金属セラミックス | セラミツク多層配線基板およびその製造法 |
US4898767A (en) * | 1987-10-07 | 1990-02-06 | Corning Incorporated | Copper-exuding boroaluminosilicate glasses |
DE3735959A1 (de) * | 1987-10-23 | 1989-05-03 | Bbc Brown Boveri & Cie | Mehrlagige duennschichtschaltung sowie verfahren zu deren herstellung |
US5196915A (en) * | 1988-11-21 | 1993-03-23 | Hitachi, Ltd. | Semiconductor device |
JPH0828577B2 (ja) * | 1989-08-05 | 1996-03-21 | 日本電装株式会社 | セラミック積層基板の製造方法 |
JP2584881B2 (ja) * | 1990-03-12 | 1997-02-26 | 日本碍子株式会社 | セラミックグリーンシート並びにそれを用いた電気化学的素子の製造方法 |
US5173354A (en) * | 1990-12-13 | 1992-12-22 | Cornell Research Foundation, Inc. | Non-beading, thin-film, metal-coated ceramic substrate |
DE4103294C2 (de) * | 1991-02-04 | 2000-12-28 | Altan Akyuerek | Verfahren zum Herstellen von keramischen Leiterplatten mit Durchkontaktierungen |
US5500278A (en) * | 1991-07-17 | 1996-03-19 | Nippondenso Co., Ltd. | Multilayer substrate |
EP0569799B1 (en) * | 1992-05-14 | 2000-09-06 | Matsushita Electric Industrial Co., Ltd. | Method for making via conductors in multilayer ceramic substrates |
US5766670A (en) * | 1993-11-17 | 1998-06-16 | Ibm | Via fill compositions for direct attach of devices and methods for applying same |
DE4318061C2 (de) * | 1993-06-01 | 1998-06-10 | Schulz Harder Juergen | Verfahren zum Herstellen eines Metall-Keramik-Substrates |
JP3286651B2 (ja) * | 1993-12-27 | 2002-05-27 | 株式会社住友金属エレクトロデバイス | セラミック多層配線基板およびその製造法並びにセラミック多層配線基板用導電材料 |
JP3671457B2 (ja) * | 1995-06-07 | 2005-07-13 | 株式会社デンソー | 多層基板 |
US6140906A (en) * | 1996-11-08 | 2000-10-31 | Tdk Corporation | Resistive temperature sensor and manufacturing method therefor |
US6399230B1 (en) | 1997-03-06 | 2002-06-04 | Sarnoff Corporation | Multilayer ceramic circuit boards with embedded resistors |
US6100787A (en) * | 1997-05-28 | 2000-08-08 | Motorola, Inc. | Multilayer ceramic package with low-variance embedded resistors |
JP4032459B2 (ja) * | 1997-08-05 | 2008-01-16 | 株式会社デンソー | 混成集積回路用基板及びその製造方法 |
EP1345271A1 (de) * | 2002-03-14 | 2003-09-17 | AB Mikroelektronik Gesellschaft m.b.H. | Verfahren zum Herstellen elektrischer Schaltkreise |
US7279217B2 (en) * | 2004-05-24 | 2007-10-09 | Tdk Corporation | Multilayer ceramic device, method for manufacturing the same, and ceramic device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3372058A (en) * | 1963-12-18 | 1968-03-05 | Ibm | Electrical device, method and material |
US3827891A (en) * | 1970-12-17 | 1974-08-06 | J Larry | High adhesion metallizing compositions |
US4168344A (en) * | 1975-11-19 | 1979-09-18 | Trw Inc. | Vitreous enamel material for electrical resistors and method of making such resistors |
JPS5328266A (en) * | 1976-08-13 | 1978-03-16 | Fujitsu Ltd | Method of producing multilayer ceramic substrate |
US4283243A (en) * | 1978-10-24 | 1981-08-11 | E. I. Du Pont De Nemours And Company | Use of photosensitive stratum to create through-hole connections in circuit boards |
JPS57184296A (en) * | 1981-05-09 | 1982-11-12 | Hitachi Ltd | Ceramic circuit board |
JPS5817651A (ja) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | 多層回路板とその製造方法 |
-
1984
- 1984-09-15 KR KR1019840005623A patent/KR900004379B1/ko not_active IP Right Cessation
- 1984-09-17 GB GB08423483A patent/GB2149222B/en not_active Expired
- 1984-09-17 DE DE19843434449 patent/DE3434449A1/de not_active Withdrawn
-
1986
- 1986-08-21 US US06/898,892 patent/US4732798A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB2149222B (en) | 1988-03-30 |
US4732798A (en) | 1988-03-22 |
GB2149222A (en) | 1985-06-05 |
GB8423483D0 (en) | 1984-10-24 |
KR900004379B1 (ko) | 1990-06-23 |
DE3434449A1 (de) | 1985-05-02 |
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