KR20230146473A - 기판 세정 장치 및 기판 세정 방법 - Google Patents

기판 세정 장치 및 기판 세정 방법 Download PDF

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Publication number
KR20230146473A
KR20230146473A KR1020230047349A KR20230047349A KR20230146473A KR 20230146473 A KR20230146473 A KR 20230146473A KR 1020230047349 A KR1020230047349 A KR 1020230047349A KR 20230047349 A KR20230047349 A KR 20230047349A KR 20230146473 A KR20230146473 A KR 20230146473A
Authority
KR
South Korea
Prior art keywords
substrate
cleaning liquid
spray nozzle
spray
cleaning
Prior art date
Application number
KR1020230047349A
Other languages
English (en)
Korean (ko)
Inventor
요시히로 야마다
Original Assignee
아이메카테크 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아이메카테크 가부시키가이샤 filed Critical 아이메카테크 가부시키가이샤
Publication of KR20230146473A publication Critical patent/KR20230146473A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
KR1020230047349A 2022-04-12 2023-04-11 기판 세정 장치 및 기판 세정 방법 KR20230146473A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2022-065855 2022-04-12
JP2022065855A JP7471671B2 (ja) 2022-04-12 2022-04-12 基板洗浄装置及び基板洗浄方法

Publications (1)

Publication Number Publication Date
KR20230146473A true KR20230146473A (ko) 2023-10-19

Family

ID=88421215

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230047349A KR20230146473A (ko) 2022-04-12 2023-04-11 기판 세정 장치 및 기판 세정 방법

Country Status (3)

Country Link
JP (1) JP7471671B2 (ja)
KR (1) KR20230146473A (ja)
TW (1) TW202349486A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015201627A (ja) 2014-04-01 2015-11-12 株式会社荏原製作所 洗浄装置及び洗浄方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001170584A (ja) 1999-12-17 2001-06-26 Sharp Corp 超音波処理装置
JP3778815B2 (ja) 2001-06-21 2006-05-24 大日本スクリーン製造株式会社 基板洗浄装置
JP6180811B2 (ja) 2013-06-19 2017-08-16 株式会社荏原製作所 基板処理装置
JP6338275B2 (ja) 2014-06-27 2018-06-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015201627A (ja) 2014-04-01 2015-11-12 株式会社荏原製作所 洗浄装置及び洗浄方法
JP2019041116A (ja) 2014-04-01 2019-03-14 株式会社荏原製作所 洗浄装置及び洗浄方法
JP2021016007A (ja) 2014-04-01 2021-02-12 株式会社荏原製作所 洗浄装置及び洗浄方法

Also Published As

Publication number Publication date
JP7471671B2 (ja) 2024-04-22
TW202349486A (zh) 2023-12-16
JP2023156161A (ja) 2023-10-24

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