KR20220121858A - α선 차폐막 형성용 조성물, α선 차폐막, 적층체, 반도체 장치 - Google Patents

α선 차폐막 형성용 조성물, α선 차폐막, 적층체, 반도체 장치 Download PDF

Info

Publication number
KR20220121858A
KR20220121858A KR1020227025962A KR20227025962A KR20220121858A KR 20220121858 A KR20220121858 A KR 20220121858A KR 1020227025962 A KR1020227025962 A KR 1020227025962A KR 20227025962 A KR20227025962 A KR 20227025962A KR 20220121858 A KR20220121858 A KR 20220121858A
Authority
KR
South Korea
Prior art keywords
resin
mass
ray shielding
group
shielding film
Prior art date
Application number
KR1020227025962A
Other languages
English (en)
Korean (ko)
Inventor
테츠시 미야타
쿄헤이 아라야마
노리후미 요코야마
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20220121858A publication Critical patent/KR20220121858A/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09D201/06—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09D201/04—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/65—Additives macromolecular
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
KR1020227025962A 2020-01-30 2021-01-27 α선 차폐막 형성용 조성물, α선 차폐막, 적층체, 반도체 장치 KR20220121858A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020013850 2020-01-30
JPJP-P-2020-013850 2020-01-30
PCT/JP2021/002760 WO2021153588A1 (ja) 2020-01-30 2021-01-27 α線遮蔽膜形成用組成物、α線遮蔽膜、積層体、半導体装置

Publications (1)

Publication Number Publication Date
KR20220121858A true KR20220121858A (ko) 2022-09-01

Family

ID=77079052

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227025962A KR20220121858A (ko) 2020-01-30 2021-01-27 α선 차폐막 형성용 조성물, α선 차폐막, 적층체, 반도체 장치

Country Status (5)

Country Link
JP (1) JPWO2021153588A1 (zh)
KR (1) KR20220121858A (zh)
CN (1) CN115210328B (zh)
TW (1) TW202136412A (zh)
WO (1) WO2021153588A1 (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019093245A1 (ja) 2017-11-09 2019-05-16 富士フイルム株式会社 装置、有機層形成用組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0251520A (ja) * 1988-08-12 1990-02-21 Hitachi Ltd エポキシ樹脂組成物
JP3922318B2 (ja) * 1997-09-30 2007-05-30 日本ゼオン株式会社 難燃性樹脂組成物
JP2004296739A (ja) * 2003-03-26 2004-10-21 Fuji Photo Film Co Ltd 固体撮像装置の製造方法
JP2006107374A (ja) * 2004-10-08 2006-04-20 Canon Inc バインダ文書生成装置、バインダ文書生成方法、プログラムおよび記憶媒体
KR101768929B1 (ko) * 2010-09-30 2017-08-17 디아이씨 가부시끼가이샤 함불소 중합성 수지, 그것을 사용한 활성 에너지선 경화형 조성물 및 그 경화물
JP6047088B2 (ja) * 2011-02-21 2016-12-21 旭化成株式会社 有機無機複合体を含むコーティング材、有機無機複合膜及び反射防止部材
WO2013065448A1 (ja) * 2011-10-31 2013-05-10 富士フイルム株式会社 導電性組成物、並びにこれを用いた導電性膜及び導電性積層体
JP2014216394A (ja) * 2013-04-23 2014-11-17 株式会社ニコン 固体撮像装置及び電子カメラ
JP6528421B2 (ja) * 2015-01-28 2019-06-12 住友ベークライト株式会社 感光性樹脂組成物
TWI781917B (zh) * 2016-02-03 2022-11-01 日商富士軟片股份有限公司 樹脂膜、樹脂膜的製造方法、光學濾波器、積層體、固體攝像元件、圖像顯示裝置以及紅外線感測器
KR102209385B1 (ko) * 2016-12-26 2021-02-01 디아이씨 가부시끼가이샤 수성 수지 조성물, 그것을 사용한 적층체, 광학 필름 및 화상 표시 장치
CN110235033B (zh) * 2017-01-30 2021-10-19 富士胶片株式会社 组合物、膜、近红外线截止滤光片、固体摄像元件、图像显示装置及红外线传感器
JP7455475B2 (ja) * 2020-05-19 2024-03-26 信越化学工業株式会社 熱硬化性マレイミド樹脂組成物並びにこれを用いた接着剤、基板材料、プライマー、コーティング材及び半導体装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019093245A1 (ja) 2017-11-09 2019-05-16 富士フイルム株式会社 装置、有機層形成用組成物

Also Published As

Publication number Publication date
CN115210328A (zh) 2022-10-18
JPWO2021153588A1 (zh) 2021-08-05
TW202136412A (zh) 2021-10-01
WO2021153588A1 (ja) 2021-08-05
CN115210328B (zh) 2024-05-14

Similar Documents

Publication Publication Date Title
WO2016117596A1 (ja) 固体撮像装置、赤外線吸収性組成物及び平坦化膜形成用硬化性組成物
KR102277707B1 (ko) 수지 조성물
JP5061703B2 (ja) 感光性樹脂組成物
KR101930048B1 (ko) β-하이드록시알킬아미드 및 수지 조성물
WO2016117597A1 (ja) 固体撮像装置及び赤外線吸収性組成物
KR20190132233A (ko) 감광성 수지 조성물, 감광성 드라이 필름 및 패턴 형성 방법
KR101846114B1 (ko) 감광성 수지 조성물, 경화막, 보호막, 절연막 및 전자 장치
KR20110122135A (ko) 포지티브형 감광성 수지 조성물, 및 그것을 이용한 경화막, 보호막, 절연막, 반도체 장치 및 표시 장치
CN110447005B (zh) 带导电层的膜、触摸面板、带导电层的膜的制造方法和触摸面板的制造方法
JP6528421B2 (ja) 感光性樹脂組成物
KR102374310B1 (ko) 장치, 유기층 형성용 조성물
KR20220121858A (ko) α선 차폐막 형성용 조성물, α선 차폐막, 적층체, 반도체 장치
JPWO2016158150A1 (ja) 感光性樹脂組成物、感光性シート、半導体装置および半導体装置の製造方法
JP7092261B2 (ja) シンチレータパネルおよびシンチレータパネルの製造方法
JP5117281B2 (ja) 感光性耐熱性樹脂組成物
JP2019144581A (ja) 感光性樹脂組成物、硬化膜、保護膜、絶縁膜および電子装置
KR20200018420A (ko) 고체 촬상 장치
KR20220017361A (ko) 포지티브형 감광성 수지 조성물, 포지티브형 감광성 드라이 필름, 포지티브형 감광성 드라이 필름의 제조 방법, 패턴 형성 방법, 경화 피막 형성 방법, 층간 절연막, 표면 보호막, 및 전자 부품
WO2021153558A1 (ja) α線遮蔽膜形成用組成物、α線遮蔽膜、積層体、半導体装置
JP6707854B2 (ja) ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜および電子装置
JP2016090667A (ja) ポジ型感光性樹脂組成物、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置
JP2019113690A (ja) 感光性接着剤組成物および構造体
JP7264688B2 (ja) 感光性樹脂組成物、ドライフィルム、硬化物、及び、電子部品
CN110967928B (zh) 正感光性树脂组合物、感光性树脂层以及电子装置
JP2024094675A (ja) 光半導体装置