KR20220107234A - 기판 액 처리 장치 - Google Patents

기판 액 처리 장치 Download PDF

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Publication number
KR20220107234A
KR20220107234A KR1020227021391A KR20227021391A KR20220107234A KR 20220107234 A KR20220107234 A KR 20220107234A KR 1020227021391 A KR1020227021391 A KR 1020227021391A KR 20227021391 A KR20227021391 A KR 20227021391A KR 20220107234 A KR20220107234 A KR 20220107234A
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KR
South Korea
Prior art keywords
nozzle
unit
liquid
nozzles
processing
Prior art date
Application number
KR1020227021391A
Other languages
English (en)
Korean (ko)
Inventor
히로후미 다케구치
유스케 하시모토
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20220107234A publication Critical patent/KR20220107234A/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020227021391A 2019-12-06 2020-11-24 기판 액 처리 장치 KR20220107234A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019221552 2019-12-06
JPJP-P-2019-221552 2019-12-06
PCT/JP2020/043677 WO2021111927A1 (ja) 2019-12-06 2020-11-24 基板液処理装置

Publications (1)

Publication Number Publication Date
KR20220107234A true KR20220107234A (ko) 2022-08-02

Family

ID=76222194

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227021391A KR20220107234A (ko) 2019-12-06 2020-11-24 기판 액 처리 장치

Country Status (4)

Country Link
JP (1) JP7292417B2 (ja)
KR (1) KR20220107234A (ja)
CN (1) CN114762088A (ja)
WO (1) WO2021111927A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074725A (ja) 1996-09-02 1998-03-17 Tokyo Electron Ltd 洗浄装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013026381A (ja) * 2011-07-20 2013-02-04 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP6456793B2 (ja) * 2015-08-11 2019-01-23 東京エレクトロン株式会社 基板処理装置および昇華性物質の析出防止方法
JP6762184B2 (ja) * 2016-09-26 2020-09-30 株式会社Ｓｃｒｅｅｎホールディングス 回収配管洗浄方法および基板処理装置
JP6914050B2 (ja) * 2017-02-15 2021-08-04 東京エレクトロン株式会社 基板処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074725A (ja) 1996-09-02 1998-03-17 Tokyo Electron Ltd 洗浄装置

Also Published As

Publication number Publication date
JP7292417B2 (ja) 2023-06-16
WO2021111927A1 (ja) 2021-06-10
JPWO2021111927A1 (ja) 2021-06-10
CN114762088A (zh) 2022-07-15

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