KR20220060474A - 부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 - Google Patents
부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 Download PDFInfo
- Publication number
- KR20220060474A KR20220060474A KR1020210132804A KR20210132804A KR20220060474A KR 20220060474 A KR20220060474 A KR 20220060474A KR 1020210132804 A KR1020210132804 A KR 1020210132804A KR 20210132804 A KR20210132804 A KR 20210132804A KR 20220060474 A KR20220060474 A KR 20220060474A
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- mask
- sheet member
- conductive sheet
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
- H05K1/0209—External configuration of printed circuit board adapted for heat dissipation, e.g. lay-out of conductors, coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/243—Reinforcing of the conductive pattern characterised by selective plating, e.g. for finish plating of pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2020-184591 | 2020-11-04 | ||
| JP2020184591A JP7569202B2 (ja) | 2020-11-04 | 2020-11-04 | 部分めっき用マスク、そのマスクを用いた絶縁回路基板の製造方法および部分めっき方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20220060474A true KR20220060474A (ko) | 2022-05-11 |
Family
ID=78413839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020210132804A Pending KR20220060474A (ko) | 2020-11-04 | 2021-10-07 | 부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11761108B2 (https=) |
| EP (1) | EP3995606A1 (https=) |
| JP (1) | JP7569202B2 (https=) |
| KR (1) | KR20220060474A (https=) |
| CN (1) | CN114438561A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025018659A (ja) * | 2023-07-27 | 2025-02-06 | トヨタ自動車株式会社 | マスキング材およびこれを用いた金属皮膜の成膜装置 |
| JP2025078514A (ja) * | 2023-11-08 | 2025-05-20 | トヨタ自動車株式会社 | 金属皮膜の成膜装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004250762A (ja) | 2003-02-21 | 2004-09-09 | Dowa Mining Co Ltd | 金属セラミック複合部材に対するメッキ方法、パターン製造成方法、および湿式処理装置、並びにパワーモジュール用金属セラミックス複合部材 |
| JP2014196540A (ja) | 2013-03-29 | 2014-10-16 | Dowaメタルテック株式会社 | 電気めっき方法およびそれに用いるマスク部材 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62243791A (ja) * | 1986-04-15 | 1987-10-24 | Matsushita Electric Ind Co Ltd | 電解めつき層の選択的形成方法 |
| JP3328812B2 (ja) | 2000-10-06 | 2002-09-30 | 株式会社山本鍍金試験器 | 電気めっき試験器の陰極カートリッジおよび陽極カートリッジ |
| JP4390491B2 (ja) * | 2003-07-25 | 2009-12-24 | 株式会社フジクラ | めっきレジスト用ドライフィルムおよびプリント基板の回路形成方法 |
| JP4923224B2 (ja) * | 2007-10-01 | 2012-04-25 | Dowaメタルテック株式会社 | 金属セラミック複合部材に対するメッキ方法、および金属セラミック複合部材に対するパターン製造方法 |
| US20170253988A1 (en) | 2016-03-01 | 2017-09-07 | The Boeing Company | Electromodification of Conductive Surfaces |
-
2020
- 2020-11-04 JP JP2020184591A patent/JP7569202B2/ja active Active
-
2021
- 2021-10-07 KR KR1020210132804A patent/KR20220060474A/ko active Pending
- 2021-10-27 CN CN202111253617.0A patent/CN114438561A/zh active Pending
- 2021-10-27 US US17/511,638 patent/US11761108B2/en active Active
- 2021-10-27 EP EP21205068.6A patent/EP3995606A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004250762A (ja) | 2003-02-21 | 2004-09-09 | Dowa Mining Co Ltd | 金属セラミック複合部材に対するメッキ方法、パターン製造成方法、および湿式処理装置、並びにパワーモジュール用金属セラミックス複合部材 |
| JP2014196540A (ja) | 2013-03-29 | 2014-10-16 | Dowaメタルテック株式会社 | 電気めっき方法およびそれに用いるマスク部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20220136126A1 (en) | 2022-05-05 |
| JP7569202B2 (ja) | 2024-10-17 |
| JP2022074500A (ja) | 2022-05-18 |
| US11761108B2 (en) | 2023-09-19 |
| EP3995606A1 (en) | 2022-05-11 |
| CN114438561A (zh) | 2022-05-06 |
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St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| A201 | Request for examination | ||
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St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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