KR20220060474A - 부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 - Google Patents

부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 Download PDF

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Publication number
KR20220060474A
KR20220060474A KR1020210132804A KR20210132804A KR20220060474A KR 20220060474 A KR20220060474 A KR 20220060474A KR 1020210132804 A KR1020210132804 A KR 1020210132804A KR 20210132804 A KR20210132804 A KR 20210132804A KR 20220060474 A KR20220060474 A KR 20220060474A
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KR
South Korea
Prior art keywords
plating
mask
sheet member
conductive sheet
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020210132804A
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English (en)
Korean (ko)
Inventor
마사아키 히고
사토루 이데구치
Original Assignee
도와 메탈테크 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도와 메탈테크 가부시키가이샤 filed Critical 도와 메탈테크 가부시키가이샤
Publication of KR20220060474A publication Critical patent/KR20220060474A/ko
Pending legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing of the conductive pattern
    • H05K3/241Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
    • C25D7/123Semiconductors first coated with a seed layer or a conductive layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0201Thermal arrangements, e.g. for cooling, heating or preventing overheating
    • H05K1/0203Cooling of mounted components
    • H05K1/0209External configuration of printed circuit board adapted for heat dissipation, e.g. lay-out of conductors, coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/188Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing of the conductive pattern
    • H05K3/243Reinforcing of the conductive pattern characterised by selective plating, e.g. for finish plating of pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0548Masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1020210132804A 2020-11-04 2021-10-07 부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법 Pending KR20220060474A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2020-184591 2020-11-04
JP2020184591A JP7569202B2 (ja) 2020-11-04 2020-11-04 部分めっき用マスク、そのマスクを用いた絶縁回路基板の製造方法および部分めっき方法

Publications (1)

Publication Number Publication Date
KR20220060474A true KR20220060474A (ko) 2022-05-11

Family

ID=78413839

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210132804A Pending KR20220060474A (ko) 2020-11-04 2021-10-07 부분 도금용 마스크, 그 마스크를 사용한 절연 회로 기판의 제조 방법 및 부분 도금 방법

Country Status (5)

Country Link
US (1) US11761108B2 (https=)
EP (1) EP3995606A1 (https=)
JP (1) JP7569202B2 (https=)
KR (1) KR20220060474A (https=)
CN (1) CN114438561A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025018659A (ja) * 2023-07-27 2025-02-06 トヨタ自動車株式会社 マスキング材およびこれを用いた金属皮膜の成膜装置
JP2025078514A (ja) * 2023-11-08 2025-05-20 トヨタ自動車株式会社 金属皮膜の成膜装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004250762A (ja) 2003-02-21 2004-09-09 Dowa Mining Co Ltd 金属セラミック複合部材に対するメッキ方法、パターン製造成方法、および湿式処理装置、並びにパワーモジュール用金属セラミックス複合部材
JP2014196540A (ja) 2013-03-29 2014-10-16 Dowaメタルテック株式会社 電気めっき方法およびそれに用いるマスク部材

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62243791A (ja) * 1986-04-15 1987-10-24 Matsushita Electric Ind Co Ltd 電解めつき層の選択的形成方法
JP3328812B2 (ja) 2000-10-06 2002-09-30 株式会社山本鍍金試験器 電気めっき試験器の陰極カートリッジおよび陽極カートリッジ
JP4390491B2 (ja) * 2003-07-25 2009-12-24 株式会社フジクラ めっきレジスト用ドライフィルムおよびプリント基板の回路形成方法
JP4923224B2 (ja) * 2007-10-01 2012-04-25 Dowaメタルテック株式会社 金属セラミック複合部材に対するメッキ方法、および金属セラミック複合部材に対するパターン製造方法
US20170253988A1 (en) 2016-03-01 2017-09-07 The Boeing Company Electromodification of Conductive Surfaces

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004250762A (ja) 2003-02-21 2004-09-09 Dowa Mining Co Ltd 金属セラミック複合部材に対するメッキ方法、パターン製造成方法、および湿式処理装置、並びにパワーモジュール用金属セラミックス複合部材
JP2014196540A (ja) 2013-03-29 2014-10-16 Dowaメタルテック株式会社 電気めっき方法およびそれに用いるマスク部材

Also Published As

Publication number Publication date
US20220136126A1 (en) 2022-05-05
JP7569202B2 (ja) 2024-10-17
JP2022074500A (ja) 2022-05-18
US11761108B2 (en) 2023-09-19
EP3995606A1 (en) 2022-05-11
CN114438561A (zh) 2022-05-06

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