KR20210083168A - 노광 장치 및 물품제조방법 - Google Patents

노광 장치 및 물품제조방법 Download PDF

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Publication number
KR20210083168A
KR20210083168A KR1020200169142A KR20200169142A KR20210083168A KR 20210083168 A KR20210083168 A KR 20210083168A KR 1020200169142 A KR1020200169142 A KR 1020200169142A KR 20200169142 A KR20200169142 A KR 20200169142A KR 20210083168 A KR20210083168 A KR 20210083168A
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KR
South Korea
Prior art keywords
mark
marks
exposure apparatus
substrate
sub
Prior art date
Application number
KR1020200169142A
Other languages
English (en)
Korean (ko)
Inventor
마사히로 이토
토모야스 하타
토시로 아리이
히로카즈 쿠사야나기
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20210083168A publication Critical patent/KR20210083168A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
  • Developing Agents For Electrophotography (AREA)
KR1020200169142A 2019-12-26 2020-12-07 노광 장치 및 물품제조방법 KR20210083168A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019236968A JP7361599B2 (ja) 2019-12-26 2019-12-26 露光装置および物品製造方法
JPJP-P-2019-236968 2019-12-26

Publications (1)

Publication Number Publication Date
KR20210083168A true KR20210083168A (ko) 2021-07-06

Family

ID=76508055

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200169142A KR20210083168A (ko) 2019-12-26 2020-12-07 노광 장치 및 물품제조방법

Country Status (4)

Country Link
JP (1) JP7361599B2 (zh)
KR (1) KR20210083168A (zh)
CN (1) CN113050394B (zh)
TW (1) TWI821617B (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227847A (ja) 1995-02-21 1996-09-03 Nikon Corp 投影露光装置
JP2004063905A (ja) 2002-07-30 2004-02-26 Canon Inc ディストーション計測方法と露光装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08130181A (ja) * 1994-10-28 1996-05-21 Nikon Corp 投影露光装置
JPH1027736A (ja) * 1996-07-09 1998-01-27 Nikon Corp 投影露光装置
JP3612903B2 (ja) * 1996-12-06 2005-01-26 株式会社ニコン 収差測定方法及び収差測定装置並びにそれを備えた露光装置及びデバイス製造方法
KR20010089453A (ko) 1998-11-18 2001-10-06 시마무라 테루오 노광방법 및 장치
WO2002025711A1 (fr) * 2000-09-21 2002-03-28 Nikon Corporation Procede de mesure des caracteristiques d'une image, et procede d'exposition
JP2004006527A (ja) * 2002-05-31 2004-01-08 Canon Inc 位置検出装置及び位置検出方法、露光装置、デバイス製造方法並びに基板
TWI396225B (zh) 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置
JP4984038B2 (ja) 2006-07-27 2012-07-25 株式会社ニコン 管理方法
JP2010123793A (ja) 2008-11-20 2010-06-03 Nikon Corp 光学特性計測方法、露光方法、及びデバイス製造方法
KR20100094143A (ko) 2009-02-18 2010-08-26 삼성전자주식회사 리소그래피 장치의 위치 에러 보정방법
JP2011049284A (ja) 2009-08-26 2011-03-10 Nikon Corp 計測方法及び装置、並びに露光方法及び装置
WO2011087129A1 (ja) 2010-01-18 2011-07-21 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
JP2011222921A (ja) 2010-04-14 2011-11-04 Nikon Corp 光学特性計測方法及び装置、並びに露光方法及び装置
JP5773735B2 (ja) 2011-05-09 2015-09-02 キヤノン株式会社 露光装置、および、デバイス製造方法
KR102357577B1 (ko) * 2014-08-28 2022-01-28 가부시키가이샤 오크세이사쿠쇼 투영 노광 장치, 투영 노광 방법, 투영 노광 장치용 포토마스크, 및 기판의 제조 방법
JP6552312B2 (ja) * 2015-07-16 2019-07-31 キヤノン株式会社 露光装置、露光方法、およびデバイス製造方法
JP6774269B2 (ja) * 2016-08-26 2020-10-21 キヤノン株式会社 計測方法、計測装置、露光装置及び物品の製造方法
JP6882091B2 (ja) * 2017-06-21 2021-06-02 キヤノン株式会社 露光装置及び物品の製造方法
JP6978926B2 (ja) * 2017-12-18 2021-12-08 キヤノン株式会社 計測方法、計測装置、露光装置、および物品製造方法
KR20200119235A (ko) * 2018-02-08 2020-10-19 가부시키가이샤 브이 테크놀로지 근접 노광 장치, 근접 노광 방법, 및 근접 노광 장치용 광조사 장치
JP7075278B2 (ja) * 2018-05-08 2022-05-25 キヤノン株式会社 計測装置、露光装置及び物品の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227847A (ja) 1995-02-21 1996-09-03 Nikon Corp 投影露光装置
JP2004063905A (ja) 2002-07-30 2004-02-26 Canon Inc ディストーション計測方法と露光装置

Also Published As

Publication number Publication date
TW202125588A (zh) 2021-07-01
TWI821617B (zh) 2023-11-11
JP2021105665A (ja) 2021-07-26
CN113050394B (zh) 2024-11-01
CN113050394A (zh) 2021-06-29
JP7361599B2 (ja) 2023-10-16

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