KR20190044085A - 캐패시터들, 전극들, 환원된 그래핀 산화물 및 제조 방법 및 장치 - Google Patents

캐패시터들, 전극들, 환원된 그래핀 산화물 및 제조 방법 및 장치 Download PDF

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KR20190044085A
KR20190044085A KR1020197008413A KR20197008413A KR20190044085A KR 20190044085 A KR20190044085 A KR 20190044085A KR 1020197008413 A KR1020197008413 A KR 1020197008413A KR 20197008413 A KR20197008413 A KR 20197008413A KR 20190044085 A KR20190044085 A KR 20190044085A
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graphene oxide
rgo
porous
film
solution
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Korean (ko)
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한 린
바오후아 지아
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스윈번 유니버시티 오브 테크놀로지
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/198Graphene oxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
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    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/19Preparation by exfoliation
    • C01B32/192Preparation by exfoliation starting from graphitic oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/24Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/26Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/26Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
    • H01G11/28Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features arranged or disposed on a current collector; Layers or phases between electrodes and current collectors, e.g. adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/32Carbon-based
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/32Carbon-based
    • H01G11/36Nanostructures, e.g. nanofibres, nanotubes or fullerenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
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    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00Structure or properties of graphene
    • C01B2204/20Graphene characterized by its properties
    • C01B2204/22Electronic properties
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    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/30Particle morphology extending in three dimensions
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
KR1020197008413A 2016-08-30 2017-08-29 캐패시터들, 전극들, 환원된 그래핀 산화물 및 제조 방법 및 장치 Ceased KR20190044085A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
AU2016903449A AU2016903449A0 (en) 2016-08-30 Capacitors, electrodes and methods of manufacture
AU2016903449 2016-08-30
PCT/AU2017/050916 WO2018039710A1 (en) 2016-08-30 2017-08-29 Capacitors, electrodes, reduced graphene oxide and methods and apparatuses of manufacture

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KR20190044085A true KR20190044085A (ko) 2019-04-29

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US (2) US20210065996A1 (enExample)
EP (1) EP3507823B8 (enExample)
JP (1) JP2019532887A (enExample)
KR (1) KR20190044085A (enExample)
CN (1) CN109906499B (enExample)
AU (1) AU2017320331B2 (enExample)
WO (1) WO2018039710A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062708A (ko) * 2018-11-27 2020-06-04 한양대학교 산학협력단 그래핀 기반 물질의 프랙탈 차원을 조절하는 방법
KR20250153018A (ko) 2024-04-17 2025-10-24 경상국립대학교산학협력단 듀얼 펄스 레이저를 이용하는 환원된 그래핀 산화물 촉매 제조방법 및 이에 따라 제조된 환원된 그래핀 산화물 촉매

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10396365B2 (en) 2012-07-18 2019-08-27 Printed Energy Pty Ltd Diatomaceous energy storage devices
AU2017320331B2 (en) 2016-08-30 2022-08-11 Royal Melbourne Institute Of Technology Capacitors, electrodes, reduced graphene oxide and methods and apparatuses of manufacture
US20200399131A1 (en) * 2018-03-09 2020-12-24 Royal Melbourne Institute Of Technology A method of forming porous graphene-based structures
WO2019182874A1 (en) * 2018-03-20 2019-09-26 Printed Energy Pty Ltd Diatomaceous energy storage devices
ES2734729B2 (es) * 2018-06-07 2020-04-23 Consejo Superior Investigacion Procedimiento de obtencion de un electrodo flexible
US12054395B2 (en) 2019-02-25 2024-08-06 Royal Melbourne Institute Of Technology Reduced graphene oxide electrodes and supercapacitors
CN110265228B (zh) * 2019-05-30 2021-07-13 北京理工大学 一种空间整形飞秒激光加工石墨烯基超级电容的制作方法
EP3772086A1 (en) * 2019-08-01 2021-02-03 Fundació Institut Català de Nanociència i Nanotecnologia (ICN2) Method to form a laser-scribed rgo pattern on a substrate
US11139397B2 (en) * 2019-09-16 2021-10-05 Taiwan Semiconductor Manufacturing Co., Ltd. Self-aligned metal compound layers for semiconductor devices
CN111360395B (zh) * 2020-03-27 2021-08-20 伊诺福科光学技术有限公司 一种用于激光加工的表面自动跟踪方法及系统、存储介质
CN111390377B (zh) * 2020-03-27 2021-08-20 伊诺福科光学技术有限公司 一种用于激光加工的表面自动聚焦方法及系统、存储介质
US20220015474A1 (en) * 2020-07-16 2022-01-20 City University Of Hong Kong Anti-bacterial and anti-viral, smart facemask
CN111943178A (zh) * 2020-08-21 2020-11-17 伊诺福科光学技术有限公司 一种自给自足还原制备石墨烯材料的方法、石墨烯材料、石墨烯薄膜、电极和电容器
CN113096973B (zh) * 2021-04-12 2024-05-10 王晓京 用于制备多孔石墨烯膜的方法、多孔石墨烯膜和电极
CN113670484B (zh) * 2021-08-18 2023-07-21 吉林大学重庆研究院 一种具有互补螺旋结构柔性压力传感器、制备方法及其应用
CN114103125B (zh) * 2021-09-30 2022-06-28 哈尔滨工业大学(威海) 一种高导热微型器件的制备方法
CN114520333B (zh) * 2022-02-11 2023-11-03 山东威固新能源科技有限公司 一种氮化铝掺杂还原氧化石墨烯-锂复合材料及其制备方法和应用
CN114560460B (zh) * 2022-03-11 2023-05-12 南方科技大学 一种lig材料、其制备方法及应用
JP7478455B2 (ja) 2022-03-24 2024-05-07 シーズテクノ株式会社 酸化グラフェンの還元方法
CN114804080B (zh) * 2022-04-14 2024-09-24 伊诺福科光学技术有限公司 一种低成本大面积制备石墨烯薄膜的方法
US20250293147A1 (en) * 2024-03-15 2025-09-18 Qualcomm Incorporated Package substrate with a reserve capacitor
CN118483285A (zh) * 2024-04-18 2024-08-13 微智帆途科技(苏州)有限公司 一种基于激光调制技术的氧化石墨烯湿度传感器
CN119560314B (zh) * 2024-11-11 2025-11-18 东北师范大学 一种基于飞秒激光加工表面微纳结构化石墨烯超级电容器及其制备方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004091252A (ja) * 2002-08-30 2004-03-25 Mitsubishi Gas Chem Co Inc 炭素からなる骨格を持つ薄膜状粒子の還元方法
CN101723310B (zh) * 2009-12-02 2013-06-05 吉林大学 一种利用氧化石墨烯制备导电微纳结构的光加工方法
US8315039B2 (en) * 2009-12-28 2012-11-20 Nanotek Instruments, Inc. Spacer-modified nano graphene electrodes for supercapacitors
US8810996B2 (en) * 2010-11-22 2014-08-19 The Trustees Of The Stevens Institute Of Technology Inkjet-printed flexible electronic components from graphene oxide
US8920764B2 (en) * 2011-02-11 2014-12-30 University of Pittsburgh—of the Commonwealth System of Higher Education Graphene composition, method of forming a graphene composition and sensor system comprising a graphene composition
JP2013035739A (ja) * 2011-07-11 2013-02-21 National Institute Of Advanced Industrial Science & Technology 酸化グラフェン構造体、その製造方法、およびそれらによる電界効果トランジスタ作成工程
CN102408109B (zh) * 2011-08-23 2013-07-24 中国科学院上海应用物理研究所 一种还原氧化石墨烯及其制备方法
KR101290690B1 (ko) * 2011-10-24 2013-07-29 포항공과대학교 산학협력단 광촉매반응을 통한 물에 녹는 고순도의 그래핀 합성
JP6285424B2 (ja) * 2012-06-21 2018-02-28 モナッシュ ユニバーシティMonash University 絶縁材料の導電部
TWI466818B (zh) * 2012-08-10 2015-01-01 國立清華大學 磁性石墨烯奈米複合物的製備方法
US20140050910A1 (en) * 2012-08-15 2014-02-20 Rensselaer Polytechnic Institute Rapid macro-scale synthesis of free-standing graphene, high performance, binder-free graphene anode material, and methods of synthesizing the anode material
WO2014028978A1 (en) 2012-08-23 2014-02-27 Monash University Graphene-based materials
US9899120B2 (en) * 2012-11-02 2018-02-20 Nanotek Instruments, Inc. Graphene oxide-coated graphitic foil and processes for producing same
CN102924274B (zh) * 2012-11-05 2015-03-18 北京航空航天大学 一种导电仿贝壳层状石墨烯复合材料的制备方法
US9388049B2 (en) * 2013-06-12 2016-07-12 Research & Business Foundation Sungkyunkwan University Method of producing graphene using surfactant
WO2015053744A1 (en) * 2013-10-07 2015-04-16 Empire Technology Development Llc Photoswitchable graphene membranes
US9580325B2 (en) 2014-02-06 2017-02-28 Nanotek Instruments, Inc. Process for producing highly oriented graphene films
US9382117B2 (en) 2014-04-03 2016-07-05 Nanotek Instruments, Inc. Process for producing highly conducting graphitic films from graphene liquid crystals
US9099376B1 (en) * 2014-06-06 2015-08-04 Nano And Advanced Materials Institute Limited Laser direct patterning of reduced-graphene oxide transparent circuit
WO2016030811A1 (en) 2014-08-27 2016-03-03 Semiconductor Energy Laboratory Co., Ltd. Storage battery electrode, manufacturing method thereof, storage battery, electronic device, and graphene
EP3016178B1 (en) * 2014-10-30 2018-01-03 Nokia Technologies OY A method of forming a graphene oxide-reduced graphene oxide junction
US20160228846A1 (en) * 2015-02-05 2016-08-11 National Cheng Kung University Three-dimensional graphene oxide microstructure and method for making the same
CN104733717A (zh) * 2015-03-31 2015-06-24 扬州大学 一种α-Fe2O3/rGO复合材料的微波制备方法
US10655020B2 (en) 2015-12-22 2020-05-19 The Regents Of The University Of California Cellular graphene films
CN105679725B (zh) * 2016-01-25 2018-05-11 电子科技大学 一种用于激光显示的散热装置的制备方法
AU2017320331B2 (en) 2016-08-30 2022-08-11 Royal Melbourne Institute Of Technology Capacitors, electrodes, reduced graphene oxide and methods and apparatuses of manufacture
US20190224628A1 (en) 2016-08-30 2019-07-25 Swinburne University Of Technology Porous Graphene-Based Films And Processes For Preparing The Films
KR101977675B1 (ko) 2016-11-22 2019-05-13 기초과학연구원 환원된 그래핀 옥사이드 필름의 제조 방법
CN108622880B (zh) 2017-03-15 2021-05-18 国家纳米科学中心 一种还原过氧化石墨烯、包含其的中间层材料及锂硫电池
US12054395B2 (en) 2019-02-25 2024-08-06 Royal Melbourne Institute Of Technology Reduced graphene oxide electrodes and supercapacitors
KR102365020B1 (ko) 2019-07-25 2022-02-21 한양대학교 산학협력단 환원 그래핀 산화물을 함유하는 슬러리를 이용한 복합 소재의 제조방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062708A (ko) * 2018-11-27 2020-06-04 한양대학교 산학협력단 그래핀 기반 물질의 프랙탈 차원을 조절하는 방법
KR20250153018A (ko) 2024-04-17 2025-10-24 경상국립대학교산학협력단 듀얼 펄스 레이저를 이용하는 환원된 그래핀 산화물 촉매 제조방법 및 이에 따라 제조된 환원된 그래핀 산화물 촉매

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EP3507823A1 (en) 2019-07-10
US20210065996A1 (en) 2021-03-04
AU2017320331B2 (en) 2022-08-11
EP3507823B1 (en) 2023-03-22
CN109906499B (zh) 2024-07-19
EP3507823B8 (en) 2023-04-26
WO2018039710A1 (en) 2018-03-08
CN109906499A (zh) 2019-06-18
JP2019532887A (ja) 2019-11-14
AU2017320331A1 (en) 2019-03-21
US12272496B2 (en) 2025-04-08
US20230118294A1 (en) 2023-04-20
EP3507823A4 (en) 2020-04-15

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