JP6285424B2 - 絶縁材料の導電部 - Google Patents
絶縁材料の導電部 Download PDFInfo
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- JP6285424B2 JP6285424B2 JP2015517557A JP2015517557A JP6285424B2 JP 6285424 B2 JP6285424 B2 JP 6285424B2 JP 2015517557 A JP2015517557 A JP 2015517557A JP 2015517557 A JP2015517557 A JP 2015517557A JP 6285424 B2 JP6285424 B2 JP 6285424B2
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- 239000011810 insulating material Substances 0.000 title claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 90
- 229910021389 graphene Inorganic materials 0.000 claims description 69
- 150000002500 ions Chemical class 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 31
- 238000010884 ion-beam technique Methods 0.000 claims description 25
- 229910052799 carbon Inorganic materials 0.000 claims description 20
- 229910052760 oxygen Inorganic materials 0.000 claims description 17
- 239000001301 oxygen Substances 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- -1 phosphorus ion Chemical class 0.000 claims description 7
- 239000003990 capacitor Substances 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 claims 2
- 230000004907 flux Effects 0.000 description 13
- 238000004088 simulation Methods 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 7
- 125000004430 oxygen atom Chemical group O* 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 238000001237 Raman spectrum Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000009466 transformation Effects 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 238000006392 deoxygenation reaction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 229910014033 C-OH Inorganic materials 0.000 description 1
- 229910014570 C—OH Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 108091092889 HOTTIP Proteins 0.000 description 1
- 238000001530 Raman microscopy Methods 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/005—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile
- B32B9/007—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising one layer of ceramic material, e.g. porcelain, ceramic tile comprising carbon, e.g. graphite, composite carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
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- H—ELECTRICITY
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/24—Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon or silicon
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- H—ELECTRICITY
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
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- H01B3/004—Inhomogeneous material in general with conductive additives or conductive layers
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- H—ELECTRICITY
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- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/32—Carbon-based
- H01G11/36—Nanostructures, e.g. nanofibres, nanotubes or fullerenes
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- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
- H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02115—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material being carbon, e.g. alpha-C, diamond or hydrogen doped carbon
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76823—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. transforming an insulating layer into a conductive layer
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
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- B32B2307/00—Properties of the layers or laminate
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- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
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Description
・未処理の合成酸化グラフェンは、本発明者の装置の検出限界に満たない導電率を有しており、図3cの横線として現れる。
・27.9C/m2のイオン束の場合、導電率は、4.0±0.2×10−2s/mである。
・13.95C/m2のイオン束の場合、導電率は、2.0±0.5×10−2s/mである。
・4.65C/m2のイオン束の場合、導電率は、0.46±0.01×10−2s/mである。
表1 1MのNa2SO4におけるGO、FIBRGO及びレーザで還元したGOの平坦電極の静電容量の値
Claims (10)
- 絶縁材料に導電部を形成する方法であって、
前記絶縁材料が、炭素及び少なくとも1の他の構成要素を有しており、
前記方法が、前記絶縁材料にイオンを照射して、前記絶縁材料をアモルファス化することなく前記他の構成要素を優先的に除去するステップを有し、
前記イオンの照射が、集束イオンビームを動作させるステップを有し、前記ビームが、実質的に5C/m 2 乃至30C/m 2 の範囲のイオン束を有し、
前記照射が、実質的に1keV乃至60keVの範囲の電圧を印加するステップを有することを特徴とする方法。 - 前記他の構成要素が、酸素であり又は酸素を含むことを特徴とする請求項1に記載の方法。
- 前記絶縁材料が、酸化グラフェンであることを特徴とする請求項2に記載の方法。
- 前記導電部が、少なくとも主にグラフェン及び/又は還元した酸化グラフェンから成ることを特徴とする請求項3に記載の方法。
- 前記導電部は、20nm未満の幅であることを特徴とする請求項1乃至4のいずれか1項に記載の方法。
- 前記イオンが、実質的に、ガリウムイオン、リンイオン、ヒ素イオン及び窒素イオンのうちの1又はそれ以上を有し、又は1又はそれ以上のそれらのイオンから成ることを特徴とする請求項1乃至5のいずれか1項に記載の方法。
- 前記イオンが、ガリウムイオンであることを特徴とする請求項1乃至5のいずれか1項に記載の方法。
- 前記照射が、約30keVの電圧を印加するステップを有することを特徴とする請求項1乃至7のいずれか1項に記載の方法。
- 請求項1乃至8のいずれか1項にしたがって形成された導電部を有することを特徴とするデバイス。
- コンデンサであることを特徴とする請求項9に記載のデバイス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2012902606 | 2012-06-21 | ||
AU2012902606A AU2012902606A0 (en) | 2012-06-21 | Conductive portions in insulating materials | |
PCT/AU2013/000668 WO2013188924A1 (en) | 2012-06-21 | 2013-06-21 | Conductive portions in insulating materials |
Publications (2)
Publication Number | Publication Date |
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JP2015528198A JP2015528198A (ja) | 2015-09-24 |
JP6285424B2 true JP6285424B2 (ja) | 2018-02-28 |
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Application Number | Title | Priority Date | Filing Date |
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JP2015517557A Active JP6285424B2 (ja) | 2012-06-21 | 2013-06-21 | 絶縁材料の導電部 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9558887B2 (ja) |
EP (1) | EP2864239B1 (ja) |
JP (1) | JP6285424B2 (ja) |
KR (1) | KR102081669B1 (ja) |
AU (1) | AU2013277941B2 (ja) |
WO (1) | WO2013188924A1 (ja) |
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US9099376B1 (en) | 2014-06-06 | 2015-08-04 | Nano And Advanced Materials Institute Limited | Laser direct patterning of reduced-graphene oxide transparent circuit |
AU2017320331B2 (en) * | 2016-08-30 | 2022-08-11 | Royal Melbourne Institute Of Technology | Capacitors, electrodes, reduced graphene oxide and methods and apparatuses of manufacture |
CN108597648B (zh) * | 2018-01-03 | 2020-05-08 | 京东方科技集团股份有限公司 | 一种图案化的电极层、电极层的图案化方法、显示装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPS62128116A (ja) * | 1985-11-28 | 1987-06-10 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
DE3854238T2 (de) | 1987-04-08 | 1996-03-21 | Hitachi Ltd | Verfahren zur Herstellung eines supraleitenden Elements. |
JP2003231097A (ja) | 2002-02-08 | 2003-08-19 | Mitsubishi Gas Chem Co Inc | 炭素からなる骨格を持つ薄膜状粒子を基板に載せた構造物およびその作製方法 |
US7071258B1 (en) * | 2002-10-21 | 2006-07-04 | Nanotek Instruments, Inc. | Nano-scaled graphene plates |
US20080089829A1 (en) | 2006-10-13 | 2008-04-17 | Rensselaer Polytechnic Institute | In-situ back-contact formation and site-selective assembly of highly aligned carbon nanotubes |
WO2008108383A1 (ja) | 2007-03-02 | 2008-09-12 | Nec Corporation | グラフェンを用いる半導体装置及びその製造方法 |
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