KR20180031082A - 리소그라피 시스템에서 기판을 전달하기 위한 장치 - Google Patents

리소그라피 시스템에서 기판을 전달하기 위한 장치 Download PDF

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Publication number
KR20180031082A
KR20180031082A KR1020187007800A KR20187007800A KR20180031082A KR 20180031082 A KR20180031082 A KR 20180031082A KR 1020187007800 A KR1020187007800 A KR 1020187007800A KR 20187007800 A KR20187007800 A KR 20187007800A KR 20180031082 A KR20180031082 A KR 20180031082A
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KR
South Korea
Prior art keywords
substrate
passageway
load lock
clamped
robot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020187007800A
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English (en)
Korean (ko)
Inventor
빈센트 실버스타 쿠퍼
에르윈 슬롯
마르셀 니콜라스 제이콥스 반 커빈크
가이도 데 보어
헨드릭 얀 데 종
Original Assignee
마퍼 리쏘그라피 아이피 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 마퍼 리쏘그라피 아이피 비.브이. filed Critical 마퍼 리쏘그라피 아이피 비.브이.
Publication of KR20180031082A publication Critical patent/KR20180031082A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H01L21/67178—
    • H01L21/67225—
    • H01L21/67745—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0452—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the layout of the process chambers
    • H10P72/0458—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the layout of the process chambers vertical arrangement
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H10P72/0474—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one lithography chamber
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3304—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber characterised by movements or sequence of movements of transfer devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020187007800A 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치 Ceased KR20180031082A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161480163P 2011-04-28 2011-04-28
US61/480,163 2011-04-28
PCT/EP2012/057959 WO2012146789A1 (en) 2011-04-28 2012-05-01 Apparatus for transferring a substrate in a lithography system

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020167009917A Division KR101892460B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치

Publications (1)

Publication Number Publication Date
KR20180031082A true KR20180031082A (ko) 2018-03-27

Family

ID=46017897

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020187007800A Ceased KR20180031082A (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치
KR1020167009917A Active KR101892460B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치
KR1020137031510A Active KR101614475B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치
KR1020137031509A Expired - Fee Related KR101607618B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 프로세싱하는 방법

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020167009917A Active KR101892460B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치
KR1020137031510A Active KR101614475B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 전달하기 위한 장치
KR1020137031509A Expired - Fee Related KR101607618B1 (ko) 2011-04-28 2012-05-01 리소그라피 시스템에서 기판을 프로세싱하는 방법

Country Status (7)

Country Link
US (4) US9176397B2 (enExample)
EP (1) EP2702452B1 (enExample)
JP (2) JP5787331B2 (enExample)
KR (4) KR20180031082A (enExample)
CN (3) CN103649837B (enExample)
TW (2) TWI486723B (enExample)
WO (2) WO2012146789A1 (enExample)

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Also Published As

Publication number Publication date
WO2012146789A1 (en) 2012-11-01
KR101892460B1 (ko) 2018-08-28
EP2702452A1 (en) 2014-03-05
JP5805851B2 (ja) 2015-11-10
US20130034421A1 (en) 2013-02-07
CN106919006B (zh) 2020-03-13
EP2702452B1 (en) 2016-08-03
CN106919006A (zh) 2017-07-04
KR20160047590A (ko) 2016-05-02
JP2014514769A (ja) 2014-06-19
USRE48903E1 (en) 2022-01-25
KR101607618B1 (ko) 2016-04-11
TW201250403A (en) 2012-12-16
US20160004173A1 (en) 2016-01-07
TWI514089B (zh) 2015-12-21
KR101614475B1 (ko) 2016-04-21
CN103649837B (zh) 2017-04-12
US9575418B2 (en) 2017-02-21
JP5787331B2 (ja) 2015-09-30
US8936994B2 (en) 2015-01-20
CN106896650A (zh) 2017-06-27
TWI486723B (zh) 2015-06-01
CN103649837A (zh) 2014-03-19
TW201250402A (en) 2012-12-16
US9176397B2 (en) 2015-11-03
US20130044305A1 (en) 2013-02-21
KR20140025495A (ko) 2014-03-04
KR20140041501A (ko) 2014-04-04
JP2014513429A (ja) 2014-05-29
WO2012146788A1 (en) 2012-11-01

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