KR20160127079A - 가스 배리어성 필름 및 그 제조 방법과, 이것을 사용한 전자 디바이스 및 그 제조 방법 - Google Patents

가스 배리어성 필름 및 그 제조 방법과, 이것을 사용한 전자 디바이스 및 그 제조 방법 Download PDF

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Publication number
KR20160127079A
KR20160127079A KR1020167026481A KR20167026481A KR20160127079A KR 20160127079 A KR20160127079 A KR 20160127079A KR 1020167026481 A KR1020167026481 A KR 1020167026481A KR 20167026481 A KR20167026481 A KR 20167026481A KR 20160127079 A KR20160127079 A KR 20160127079A
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KR
South Korea
Prior art keywords
layer
gas barrier
film
gas
protective film
Prior art date
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KR1020167026481A
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English (en)
Korean (ko)
Inventor
레이코 오부치
Original Assignee
코니카 미놀타 가부시키가이샤
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Publication of KR20160127079A publication Critical patent/KR20160127079A/ko

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10Substrates, e.g. flexible substrates
    • H10K77/111Flexible substrates
    • H01L51/0097
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/048Encapsulation of modules
    • H01L51/5253
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020167026481A 2014-03-31 2015-03-31 가스 배리어성 필름 및 그 제조 방법과, 이것을 사용한 전자 디바이스 및 그 제조 방법 KR20160127079A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-074403 2014-03-31
JP2014074403 2014-03-31
PCT/JP2015/060269 WO2015152302A1 (fr) 2014-03-31 2015-03-31 Film barrière contre les gaz, procédé de production associé, dispositif électronique utilisant ledit film et procédé de fabrication de dispositif électronique

Publications (1)

Publication Number Publication Date
KR20160127079A true KR20160127079A (ko) 2016-11-02

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167026481A KR20160127079A (ko) 2014-03-31 2015-03-31 가스 배리어성 필름 및 그 제조 방법과, 이것을 사용한 전자 디바이스 및 그 제조 방법

Country Status (4)

Country Link
JP (1) JP6614136B2 (fr)
KR (1) KR20160127079A (fr)
CN (1) CN106132695B (fr)
WO (1) WO2015152302A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190082668A (ko) * 2018-01-02 2019-07-10 동우 화인켐 주식회사 편광판 및 이를 포함하는 화상 표시 장치
KR20190132990A (ko) * 2017-03-28 2019-11-29 린텍 가부시키가이샤 가스 배리어성 적층체

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101910188B1 (ko) * 2016-09-30 2018-10-19 한국생산기술연구원 Uv 펄스를 이용한 실라잔 개질방법
JP6998734B2 (ja) * 2016-11-29 2022-01-18 住友化学株式会社 積層体及びこれを含むデバイス
CN106531908A (zh) * 2016-11-30 2017-03-22 四川赛尔雷新能源科技有限公司 一种双膜软包锂电池
US12104075B2 (en) * 2016-12-09 2024-10-01 Lg Chem, Ltd. Encapsulating composition
CN107482131B (zh) * 2017-08-14 2019-05-10 宁波安特弗新材料科技有限公司 一种阻隔膜
KR20210120990A (ko) 2018-11-09 2021-10-07 소프레시 인코포레이티드 블로운 필름 재료 및 그것의 제조를 위한 프로세스들 및 그것의 용도들
CN111211246B (zh) * 2020-01-16 2023-01-10 合肥鑫晟光电科技有限公司 柔性衬底、显示面板及柔性衬底的制备方法
CN111190303B (zh) * 2020-03-18 2022-08-23 惠州市华星光电技术有限公司 显示面板
CN111775518A (zh) * 2020-07-01 2020-10-16 汕头万顺新材集团股份有限公司 一种耐候性高的阻隔膜结构
CN115635699B (zh) * 2022-11-07 2023-08-18 江苏耐斯数码科技股份有限公司 一种热塑性弹性体油囊布制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012052170A (ja) 2010-08-31 2012-03-15 Fujifilm Corp 機能性フィルムの製造方法
JP2013208855A (ja) 2012-03-30 2013-10-10 Fujifilm Corp 機能性フィルムの製造方法、及びその製造装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5093107B2 (ja) * 2006-05-25 2012-12-05 コニカミノルタホールディングス株式会社 ガスバリア性樹脂基材の製造方法及びガスバリア性樹脂基材の製造装置
US20120107607A1 (en) * 2009-07-17 2012-05-03 Mitsui Chemicals, Inc. Multilayered material and method of producing the same
WO2012014653A1 (fr) * 2010-07-27 2012-02-02 コニカミノルタホールディングス株式会社 Film barrière contre les gaz, procédé de production de film barrière contre les gaz et dispositif électronique
JP2012067193A (ja) * 2010-09-24 2012-04-05 Konica Minolta Holdings Inc ガスバリア性フィルムの洗浄方法、ガスバリア性包装体及び有機電子デバイス
WO2012173040A1 (fr) * 2011-06-15 2012-12-20 コニカミノルタホールディングス株式会社 Film barrière contre la vapeur d'eau, son processus de production et appareil électronique incluant celui-ci
JP6073549B2 (ja) * 2011-12-16 2017-02-01 コニカミノルタ株式会社 ガスバリアーフィルム、電子機器及びガスバリアーフィルムの製造方法
WO2013089046A1 (fr) * 2011-12-16 2013-06-20 コニカミノルタ株式会社 Film barrière contre les gaz
JP2013226758A (ja) * 2012-04-26 2013-11-07 Konica Minolta Inc ガスバリア性フィルムの製造方法
JP5899044B2 (ja) * 2012-05-08 2016-04-06 三菱樹脂株式会社 ガスバリア性フィルム
CN104379340B (zh) * 2012-07-06 2016-06-15 三井化学株式会社 层叠体

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012052170A (ja) 2010-08-31 2012-03-15 Fujifilm Corp 機能性フィルムの製造方法
JP2013208855A (ja) 2012-03-30 2013-10-10 Fujifilm Corp 機能性フィルムの製造方法、及びその製造装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190132990A (ko) * 2017-03-28 2019-11-29 린텍 가부시키가이샤 가스 배리어성 적층체
KR20190082668A (ko) * 2018-01-02 2019-07-10 동우 화인켐 주식회사 편광판 및 이를 포함하는 화상 표시 장치
WO2019135541A1 (fr) * 2018-01-02 2019-07-11 동우화인켐 주식회사 Plaque de polarisation et dispositif d'affichage d'image la comprenant

Also Published As

Publication number Publication date
CN106132695A (zh) 2016-11-16
JP6614136B2 (ja) 2019-12-04
CN106132695B (zh) 2019-09-20
WO2015152302A1 (fr) 2015-10-08
JPWO2015152302A1 (ja) 2017-04-13

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