KR20160003445U - 에피택셜 성장 장치를 위한 챔버 컴포넌트들 - Google Patents

에피택셜 성장 장치를 위한 챔버 컴포넌트들 Download PDF

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KR20160003445U
KR20160003445U KR2020160001599U KR20160001599U KR20160003445U KR 20160003445 U KR20160003445 U KR 20160003445U KR 2020160001599 U KR2020160001599 U KR 2020160001599U KR 20160001599 U KR20160001599 U KR 20160001599U KR 20160003445 U KR20160003445 U KR 20160003445U
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South Korea
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susceptor
substrate
epitaxial growth
growth apparatus
supporting
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Korean (ko)
Inventor
신이치 오키
요시노부 모리
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어플라이드 머티어리얼스, 인코포레이티드
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
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    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
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