KR20140006811A - 경화성 수지 조성물 및 경화물 - Google Patents
경화성 수지 조성물 및 경화물 Download PDFInfo
- Publication number
- KR20140006811A KR20140006811A KR1020137016336A KR20137016336A KR20140006811A KR 20140006811 A KR20140006811 A KR 20140006811A KR 1020137016336 A KR1020137016336 A KR 1020137016336A KR 20137016336 A KR20137016336 A KR 20137016336A KR 20140006811 A KR20140006811 A KR 20140006811A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- ladder
- silsesquioxane
- resin composition
- curable resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34924—Triazines containing cyanurate groups; Tautomers thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/852—Encapsulations
- H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010262919A JP2012111875A (ja) | 2010-11-25 | 2010-11-25 | 硬化性樹脂組成物及び硬化物 |
| JPJP-P-2010-262919 | 2010-11-25 | ||
| PCT/JP2011/076792 WO2012070525A1 (ja) | 2010-11-25 | 2011-11-21 | 硬化性樹脂組成物及び硬化物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20140006811A true KR20140006811A (ko) | 2014-01-16 |
Family
ID=46145867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137016336A Withdrawn KR20140006811A (ko) | 2010-11-25 | 2011-11-21 | 경화성 수지 조성물 및 경화물 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2012111875A (enExample) |
| KR (1) | KR20140006811A (enExample) |
| CN (1) | CN103154145B (enExample) |
| WO (1) | WO2012070525A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5933932B2 (ja) * | 2011-05-06 | 2016-06-15 | 株式会社カネカ | 硬化性組成物 |
| JPWO2013008842A1 (ja) * | 2011-07-14 | 2015-02-23 | 積水化学工業株式会社 | 光半導体装置用封止剤及び光半導体装置 |
| JP5937798B2 (ja) * | 2011-09-07 | 2016-06-22 | 株式会社ダイセル | ラダー型シルセスキオキサン及びその製造方法、並びに、硬化性樹脂組成物及びその硬化物 |
| JP6059010B2 (ja) * | 2012-12-28 | 2017-01-11 | 東レ・ダウコーニング株式会社 | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| TWI523914B (zh) * | 2013-01-09 | 2016-03-01 | 大賽璐股份有限公司 | Hardened resin composition and hardened product thereof |
| EP2957599A4 (en) | 2013-02-14 | 2015-12-23 | Daicel Corp | HARDENABLE RESIN COMPOSITION, HARDENED PRODUCT, SEALING ELEMENT AND SEMICONDUCTOR ELEMENT |
| MY170153A (en) * | 2013-08-01 | 2019-07-09 | Daicel Corp | Curable resin composition and semiconductor device using same |
| MY158023A (en) | 2013-08-02 | 2016-08-30 | Daicel Corp | Curable resin composition and semiconductor device using same |
| MY157548A (en) * | 2013-08-06 | 2016-06-16 | Daicel Corp | Curing resin composition and semiconductor device employing same |
| JP2015110694A (ja) * | 2013-12-06 | 2015-06-18 | サンユレック株式会社 | シリコーン樹脂組成物 |
| JP6474801B2 (ja) * | 2014-06-06 | 2019-02-27 | 株式会社ダイセル | 硬化性樹脂組成物、硬化物、封止材、及び半導体装置 |
| JP6496185B2 (ja) * | 2015-05-20 | 2019-04-03 | 株式会社ダイセル | 硬化性シリコーン樹脂組成物及びその硬化物 |
| JP6344333B2 (ja) * | 2015-08-05 | 2018-06-20 | 信越化学工業株式会社 | 付加硬化性シリコーンゴム組成物 |
| JP2021536519A (ja) * | 2018-08-31 | 2021-12-27 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | 硬化性オルガノポリシロキサン組成物、封止材及び半導体デバイス |
| CN111909527B (zh) * | 2019-05-10 | 2021-09-28 | 中国科学院化学研究所 | 可交联的有机硅组合物及反应产物及制备方法和应用 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1058730C (zh) * | 1994-01-21 | 2000-11-22 | 中国科学院化学研究所 | 高规整性梯形聚氢倍半硅氧烷及其共聚物和它们的制法 |
| JP2002348473A (ja) * | 2001-05-23 | 2002-12-04 | Asahi Denka Kogyo Kk | 硬化性組成物 |
| JP5225528B2 (ja) * | 2001-05-30 | 2013-07-03 | 株式会社Adeka | ケイ素含有重合体の製造方法 |
| JP4267404B2 (ja) * | 2003-08-22 | 2009-05-27 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 光学材料用硬化性組成物 |
| JP4908736B2 (ja) * | 2003-10-01 | 2012-04-04 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物および半導体装置 |
| JP4494077B2 (ja) * | 2004-04-22 | 2010-06-30 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 光学材料封止用硬化性組成物 |
| JP5392805B2 (ja) * | 2005-06-28 | 2014-01-22 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン樹脂組成物および光学部材 |
| JP5705416B2 (ja) * | 2008-04-11 | 2015-04-22 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 半導体用硬化性シリコーン組成物及びそれを用いた半導体装置 |
| JP5667740B2 (ja) * | 2008-06-18 | 2015-02-12 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物及び半導体装置 |
| JP5972512B2 (ja) * | 2008-06-18 | 2016-08-17 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物及び半導体装置 |
| JP5426482B2 (ja) * | 2010-05-31 | 2014-02-26 | 信越化学工業株式会社 | 発光ダイオード用付加硬化型シリコーン樹脂組成物 |
-
2010
- 2010-11-25 JP JP2010262919A patent/JP2012111875A/ja active Pending
-
2011
- 2011-11-21 WO PCT/JP2011/076792 patent/WO2012070525A1/ja not_active Ceased
- 2011-11-21 KR KR1020137016336A patent/KR20140006811A/ko not_active Withdrawn
- 2011-11-21 CN CN201180050103.3A patent/CN103154145B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN103154145B (zh) | 2015-09-16 |
| WO2012070525A1 (ja) | 2012-05-31 |
| JP2012111875A (ja) | 2012-06-14 |
| CN103154145A (zh) | 2013-06-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| PC1203 | Withdrawal of no request for examination |
St.27 status event code: N-1-6-B10-B12-nap-PC1203 |
|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid | ||
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |