KR20130045343A - 다실형 열처리 장치 - Google Patents

다실형 열처리 장치 Download PDF

Info

Publication number
KR20130045343A
KR20130045343A KR1020137002397A KR20137002397A KR20130045343A KR 20130045343 A KR20130045343 A KR 20130045343A KR 1020137002397 A KR1020137002397 A KR 1020137002397A KR 20137002397 A KR20137002397 A KR 20137002397A KR 20130045343 A KR20130045343 A KR 20130045343A
Authority
KR
South Korea
Prior art keywords
chamber
cooling
heat treatment
cooling chamber
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020137002397A
Other languages
English (en)
Korean (ko)
Inventor
가즈히코 가츠마타
Original Assignee
가부시키가이샤 아이에이치아이 기카이 시스템
가부시키가이샤 아이에이치아이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 아이에이치아이 기카이 시스템, 가부시키가이샤 아이에이치아이 filed Critical 가부시키가이샤 아이에이치아이 기카이 시스템
Publication of KR20130045343A publication Critical patent/KR20130045343A/ko
Abandoned legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K10/00—Welding or cutting by means of a plasma
    • B23K10/02—Plasma welding
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/06—Surface hardening
    • C21D1/09—Surface hardening by direct application of electrical or wave energy; by particle radiation
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/34—Methods of heating
    • C21D1/38—Heating by cathodic discharges
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B19/00—Combinations of different kinds of furnaces that are not all covered by any single one of main groups F27B1/00 - F27B17/00
    • F27B19/04—Combinations of different kinds of furnaces that are not all covered by any single one of main groups F27B1/00 - F27B17/00 arranged for associated working
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/10—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated heated by hot air or gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/02—Supplying steam, vapour, gases or liquids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00—Cooling of furnaces or of charges therein

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Tunnel Furnaces (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Furnace Details (AREA)
  • Drying Of Solid Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020137002397A 2010-07-02 2011-07-01 다실형 열처리 장치 Abandoned KR20130045343A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010151563A JP5658928B2 (ja) 2010-07-02 2010-07-02 多室型熱処理装置
JPJP-P-2010-151563 2010-07-02
PCT/JP2011/065179 WO2012002532A1 (ja) 2010-07-02 2011-07-01 多室型熱処理装置

Publications (1)

Publication Number Publication Date
KR20130045343A true KR20130045343A (ko) 2013-05-03

Family

ID=45402234

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137002397A Abandoned KR20130045343A (ko) 2010-07-02 2011-07-01 다실형 열처리 장치

Country Status (6)

Country Link
US (1) US20130153547A1 (enExample)
EP (1) EP2589910A4 (enExample)
JP (1) JP5658928B2 (enExample)
KR (1) KR20130045343A (enExample)
CN (1) CN103038593B (enExample)
WO (1) WO2012002532A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9731990B2 (en) * 2013-05-30 2017-08-15 Johns Manville Submerged combustion glass melting systems and methods of use
JP6515370B2 (ja) * 2014-05-29 2019-05-22 株式会社Ihi 冷却装置及び多室型熱処理装置
JP6418830B2 (ja) 2014-07-25 2018-11-07 株式会社Ihi 冷却装置及び多室型熱処理装置
JP6418832B2 (ja) 2014-07-28 2018-11-07 株式会社Ihi 熱処理装置用の搬送装置及び熱処理装置
JP6297471B2 (ja) * 2014-11-10 2018-03-20 中外炉工業株式会社 熱処理設備
DE112015005248B4 (de) 2014-11-20 2019-07-11 Ihi Corporation Wärmebehandlungsvorrichtung und kühlvorrichtung
JP6596703B2 (ja) * 2015-03-04 2019-10-30 株式会社Ｉｈｉ 多室型熱処理装置
DE112016002361T5 (de) 2015-05-26 2018-02-22 Ihi Corporation Wärmebehandlungsvorrichtung
JP6721466B2 (ja) * 2016-09-12 2020-07-15 株式会社Ihi 熱処理装置
FR3073937B1 (fr) 2017-11-21 2020-08-14 Ceritherm Installation de traitement thermique pour la fabrication de produits industriels.
CN115096076B (zh) * 2021-04-07 2025-03-11 江苏天海特种装备有限公司 乙炔瓶填料蒸养固化用隧道式推杆加热炉的连续固化工艺
CN114197056B (zh) * 2022-01-14 2024-07-09 浙江大学杭州国际科创中心 一种半导体材料退火装置及退火方法
PL448051A1 (pl) * 2024-03-20 2025-09-22 Seco/Warwick Spółka Akcyjna Piec próżniowy z chłodzeniem w wodzie

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3403451A (en) * 1965-03-30 1968-10-01 Fluid Energy Proc & Equipment Method for drying or treating wet solid and semisolid materials
US3886760A (en) * 1970-09-03 1975-06-03 Stephen Wyden Method of indirect heat exchange
NO135672C (enExample) * 1972-11-21 1977-05-11 Prolizenz Ag
DE4005956C1 (enExample) * 1990-02-26 1991-06-06 Siegfried Dipl.-Ing. Dr. 5135 Selfkant De Straemke
JP3310997B2 (ja) * 1991-11-28 2002-08-05 株式会社日立製作所 連続処理装置
CN100367461C (zh) * 1993-11-05 2008-02-06 株式会社半导体能源研究所 一种制造薄膜晶体管和电子器件的方法
JP3490791B2 (ja) * 1994-12-20 2004-01-26 光洋サーモシステム株式会社 多室熱処理炉
US6059507A (en) * 1997-04-21 2000-05-09 Brooks Automation, Inc. Substrate processing apparatus with small batch load lock
JPH11153386A (ja) * 1997-11-25 1999-06-08 Ishikawajima Harima Heavy Ind Co Ltd 多室式マルチ冷却真空炉
JP3820950B2 (ja) * 2001-10-03 2006-09-13 大同特殊鋼株式会社 雰囲気熱処理炉とそのシーズニング方法
US8530359B2 (en) * 2003-10-20 2013-09-10 Novellus Systems, Inc. Modulated metal removal using localized wet etching
US7841582B2 (en) * 2004-06-02 2010-11-30 Applied Materials, Inc. Variable seal pressure slit valve doors for semiconductor manufacturing equipment
US9799536B2 (en) * 2005-02-07 2017-10-24 Planar Semiconductor, Inc. Apparatus and method for cleaning flat objects in a vertical orientation with pulsed liquid jet
US7845891B2 (en) * 2006-01-13 2010-12-07 Applied Materials, Inc. Decoupled chamber body
US8124907B2 (en) * 2006-08-04 2012-02-28 Applied Materials, Inc. Load lock chamber with decoupled slit valve door seal compartment
US20090001057A1 (en) * 2007-06-29 2009-01-01 Cheng-Hsin Ma Dual damascene trench depth detection and control using voltage impedance RF probe
US20110155192A1 (en) * 2008-02-27 2011-06-30 Nadeem Ahmad System and apparatus for automatic built-in vehicle washing and other operations
JP2010014290A (ja) * 2008-07-01 2010-01-21 Ihi Corp 多室型熱処理炉
JP2010038531A (ja) * 2008-07-10 2010-02-18 Ihi Corp 熱処理装置
US20100024847A1 (en) * 2008-08-01 2010-02-04 Breese Ronald G Semiconductor wafer cleaning with dilute acids
JP5203986B2 (ja) * 2009-01-19 2013-06-05 東京エレクトロン株式会社 フォーカスリングの加熱方法、プラズマエッチング方法、プラズマエッチング装置及びコンピュータ記憶媒体

Also Published As

Publication number Publication date
JP5658928B2 (ja) 2015-01-28
EP2589910A1 (en) 2013-05-08
CN103038593A (zh) 2013-04-10
JP2012013341A (ja) 2012-01-19
WO2012002532A1 (ja) 2012-01-05
EP2589910A4 (en) 2016-08-24
CN103038593B (zh) 2015-09-16
US20130153547A1 (en) 2013-06-20

Similar Documents

Publication Publication Date Title
KR20130045343A (ko) 다실형 열처리 장치
JP4784599B2 (ja) 真空処理装置及び真空処理方法並びに記憶媒体
JP3194036B2 (ja) 乾燥処理装置及び乾燥処理方法
US20120171632A1 (en) Device and treatment chamber for thermally treating substrates
JP5470471B2 (ja) 搬送装置及び搬送熱処理システム
KR20060109852A (ko) 로드 록 장치 및 처리 방법
KR20120062729A (ko) 가열 용융 처리 장치 및 가열 용융 처리 방법
WO2010005083A1 (ja) 熱処理装置
JP6043551B2 (ja) 熱処理方法
JP2012013341A5 (enExample)
KR20180135760A (ko) 나노 분말의 제조 장치 및 이 제조 장치를 이용한 제조 방법
KR20100105354A (ko) 기판 처리 장치
US20140263273A1 (en) Chamber apparatus and heating method
JP2019515140A (ja) 液体金属を蒸発装置に供給するための装置を操作するための方法
KR101231309B1 (ko) 기판 처리 장치, 기판 처리 방법 및 프로그램을 기록한 컴퓨터로 판독가능한 기록 매체
JP5571291B2 (ja) 熱処理装置
US20060112973A1 (en) Method and apparatus for substrate processing
JP6341625B2 (ja) 熱処理装置
KR101898340B1 (ko) 로드록 장치에 있어서의 기판 냉각 방법, 기판 반송 방법, 및 로드록 장치
US12377433B2 (en) Apparatus for surface treatment of a workpiece in a production line
JP5634127B2 (ja) 熱処理炉
EP1801862A1 (en) Vertical heat treatment apparatus and method for using the same
JP6296657B2 (ja) 熱処理装置
JP5184477B2 (ja) 乾燥室、洗浄・乾燥処理装置、乾燥処理方法、および記録媒体
JP2001068425A (ja) 半導体熱処理装置及び方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20130129

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20140423

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20140625

NORF Unpaid initial registration fee
PC1904 Unpaid initial registration fee