KR20110121571A - 처리 장치, 처리 시스템 및 좌표 보정 방법 - Google Patents

처리 장치, 처리 시스템 및 좌표 보정 방법 Download PDF

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Publication number
KR20110121571A
KR20110121571A KR1020110040487A KR20110040487A KR20110121571A KR 20110121571 A KR20110121571 A KR 20110121571A KR 1020110040487 A KR1020110040487 A KR 1020110040487A KR 20110040487 A KR20110040487 A KR 20110040487A KR 20110121571 A KR20110121571 A KR 20110121571A
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KR
South Korea
Prior art keywords
substrate
coordinates
actual
recipe
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020110040487A
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English (en)
Korean (ko)
Inventor
요시아끼 스게
Original Assignee
올림푸스 가부시키가이샤
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Publication date
Application filed by 올림푸스 가부시키가이샤 filed Critical 올림푸스 가부시키가이샤
Publication of KR20110121571A publication Critical patent/KR20110121571A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/004—Measuring arrangements characterised by the use of mechanical techniques for measuring coordinates of points
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/0015—Orientation; Alignment; Positioning

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
KR1020110040487A 2010-04-30 2011-04-29 처리 장치, 처리 시스템 및 좌표 보정 방법 Withdrawn KR20110121571A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-105475 2010-04-30
JP2010105475A JP5663192B2 (ja) 2010-04-30 2010-04-30 処理装置、座標補正方法および座標補正プログラム

Publications (1)

Publication Number Publication Date
KR20110121571A true KR20110121571A (ko) 2011-11-07

Family

ID=44887797

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110040487A Withdrawn KR20110121571A (ko) 2010-04-30 2011-04-29 처리 장치, 처리 시스템 및 좌표 보정 방법

Country Status (4)

Country Link
JP (1) JP5663192B2 (enrdf_load_stackoverflow)
KR (1) KR20110121571A (enrdf_load_stackoverflow)
CN (1) CN102237262A (enrdf_load_stackoverflow)
TW (1) TWI519777B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103075970B (zh) * 2012-12-27 2015-07-01 深圳市华星光电技术有限公司 测长装置直交度补偿方法及使用该方法的测长装置
US9080865B2 (en) 2012-12-27 2015-07-14 Shenzhen China Star Optoelectronics Technology Co., Ltd Orthogonality compensation method for length measurement device and length measurement device using same
CN103292709B (zh) * 2013-05-24 2015-09-09 深圳市华星光电技术有限公司 测长机日常检测与自动补正方法
JP5808454B1 (ja) 2014-04-25 2015-11-10 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体
CN105047581A (zh) * 2014-04-25 2015-11-11 株式会社日立国际电气 衬底处理装置及半导体器件的制造方法
CN106814307B (zh) * 2017-01-10 2020-05-12 深圳鼎缘电子科技有限公司 一种腔体滤波器自动调试方法及系统
CN108226179B (zh) * 2018-01-10 2021-01-22 京东方科技集团股份有限公司 自动光学检测设备的校准方法及自动修复系统
CN110111383B (zh) * 2018-05-08 2022-03-18 广东聚华印刷显示技术有限公司 玻璃基板的偏移校正方法、装置和系统
CN112666164B (zh) * 2020-11-23 2023-06-16 上海新时达机器人有限公司 针对多品类混线生产控制柜的机器人视觉检测方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002107137A (ja) * 2000-09-29 2002-04-10 Toshiba Corp 検査ステージの制御方法
US7127098B2 (en) * 2001-09-13 2006-10-24 Hitachi, Ltd. Image detection method and its apparatus and defect detection method and its apparatus
JP3903889B2 (ja) * 2001-09-13 2007-04-11 株式会社日立製作所 欠陥検査方法及びその装置並びに撮像方法及びその装置
JP4207689B2 (ja) * 2003-07-15 2009-01-14 株式会社ニコン 位置ずれ測定装置
JP2005310833A (ja) * 2004-04-16 2005-11-04 Olympus Corp 基板検査装置および方法
CN100547757C (zh) * 2006-11-07 2009-10-07 中芯国际集成电路制造(上海)有限公司 一种新型晶圆定位偏移纠正方法
JP2009300230A (ja) * 2008-06-12 2009-12-24 Olympus Corp 位置合わせを行う装置、方法、およびプログラム、ならびに基準モデルを作成する装置、方法、およびプログラム

Also Published As

Publication number Publication date
TW201207382A (en) 2012-02-16
CN102237262A (zh) 2011-11-09
JP5663192B2 (ja) 2015-02-04
JP2011232298A (ja) 2011-11-17
TWI519777B (zh) 2016-02-01

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Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20110429

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid