KR20110119565A - 착색 감광성 수지 조성물, 패턴 형성 방법, 컬러필터의 제조 방법, 컬러필터 및 그것을 구비한 표시 장치 - Google Patents

착색 감광성 수지 조성물, 패턴 형성 방법, 컬러필터의 제조 방법, 컬러필터 및 그것을 구비한 표시 장치 Download PDF

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Publication number
KR20110119565A
KR20110119565A KR1020110038753A KR20110038753A KR20110119565A KR 20110119565 A KR20110119565 A KR 20110119565A KR 1020110038753 A KR1020110038753 A KR 1020110038753A KR 20110038753 A KR20110038753 A KR 20110038753A KR 20110119565 A KR20110119565 A KR 20110119565A
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KR
South Korea
Prior art keywords
group
resin composition
pigment
photosensitive resin
acid
Prior art date
Application number
KR1020110038753A
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English (en)
Korean (ko)
Inventor
히데유키 나카무라
켄타 야마자키
코우타로 오카베
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20110119565A publication Critical patent/KR20110119565A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020110038753A 2010-04-27 2011-04-26 착색 감광성 수지 조성물, 패턴 형성 방법, 컬러필터의 제조 방법, 컬러필터 및 그것을 구비한 표시 장치 KR20110119565A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2010102683 2010-04-27
JPJP-P-2010-102683 2010-04-27
JP2010150508 2010-06-30
JPJP-P-2010-150508 2010-06-30
JPJP-P-2011-042600 2011-02-28
JP2011042600 2011-02-28

Publications (1)

Publication Number Publication Date
KR20110119565A true KR20110119565A (ko) 2011-11-02

Family

ID=44887039

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110038753A KR20110119565A (ko) 2010-04-27 2011-04-26 착색 감광성 수지 조성물, 패턴 형성 방법, 컬러필터의 제조 방법, 컬러필터 및 그것을 구비한 표시 장치

Country Status (4)

Country Link
JP (1) JP2012194516A (zh)
KR (1) KR20110119565A (zh)
CN (1) CN102236256B (zh)
TW (1) TWI495953B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140081465A (ko) * 2012-12-21 2014-07-01 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20200110430A (ko) * 2018-03-05 2020-09-23 후지필름 가부시키가이샤 감광성 조성물

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JP2012220759A (ja) * 2011-04-11 2012-11-12 Toppan Printing Co Ltd 感光性着色組成物及びそれを用いたカラーフィルタ、液晶表示装置
EP3354641B1 (en) 2012-05-09 2019-07-17 Basf Se Oxime ester photoinitiators
TWI668210B (zh) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物
WO2015129443A1 (ja) * 2014-02-26 2015-09-03 株式会社日本触媒 硬化性樹脂組成物及びその用途
TWI763186B (zh) * 2015-03-30 2022-05-01 日商富士軟片股份有限公司 著色感光性組成物、硬化膜、圖案形成方法、帶遮光膜的紅外線截止濾光片、固體攝像元件、圖像顯示裝置及紅外感測器
JP6704675B2 (ja) * 2015-03-30 2020-06-03 住友化学株式会社 着色感光性樹脂組成物
KR102121424B1 (ko) 2016-12-02 2020-06-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
US10738241B2 (en) 2018-01-23 2020-08-11 Shenzhen China Star Optoelectronics Technology Co., Ltd. Resin composition, cured photoresist and display panel
CN108255016A (zh) * 2018-01-23 2018-07-06 深圳市华星光电技术有限公司 树脂组合物、固化光阻以及显示面板
KR20240096881A (ko) * 2018-03-26 2024-06-26 후지필름 가부시키가이샤 감광성 조성물
JP7020341B2 (ja) * 2018-08-10 2022-02-16 信越化学工業株式会社 半導体封止用熱硬化性樹脂組成物及び半導体装置
JP7295666B2 (ja) * 2019-03-13 2023-06-21 東京応化工業株式会社 感光性樹脂組成物、感光性ドライフィルム、感光性ドライフィルムの製造方法、パターン化されたレジスト膜の製造方法、鋳型付き基板の製造方法、及びめっき造形物の製造方法
CN112111028A (zh) 2019-06-21 2020-12-22 江苏英力科技发展有限公司 一种含有酰基咔唑衍生物和咔唑基肟酯的光引发剂组合物及其在光固化组合物中的应用
WO2021075448A1 (ja) * 2019-10-16 2021-04-22 住友ベークライト株式会社 樹脂組成物、ならびに感光性樹脂組成物およびその硬化物
CN114761233A (zh) * 2019-12-03 2022-07-15 王子控股株式会社 粘着片、粘着片的制造方法及选择着色剂的方法

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DE60325890D1 (de) * 2002-12-03 2009-03-05 Ciba Holding Inc Heteroaromatische gruppen enthaltende oximester als photointiatoren
JP4484482B2 (ja) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
JP2005220097A (ja) * 2004-02-06 2005-08-18 Asahi Denka Kogyo Kk チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2008033229A (ja) * 2006-07-07 2008-02-14 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、離画壁及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2009294619A (ja) * 2008-06-09 2009-12-17 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、感光性樹脂積層体、およびパターン形成方法
JP5171506B2 (ja) * 2008-06-30 2013-03-27 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP2010015111A (ja) * 2008-07-07 2010-01-21 Fujifilm Corp 紫外光レーザー露光用着色硬化性組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、及び、それを備えた表示装置。
KR20100005682A (ko) * 2008-07-07 2010-01-15 후지필름 가부시키가이샤 자외광 레이저용 착색 감광성 수지 조성물, 자외광 레이저 노광에 의한 패턴형성방법, 그 패턴형성방법을 사용한 컬러필터를 제조하는 방법, 컬러필터, 및 표시장치
JP2010015106A (ja) * 2008-07-07 2010-01-21 Fujifilm Corp 紫外光レーザー露光用の着色硬化性組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、及び表示装置
US8334085B2 (en) * 2008-09-02 2012-12-18 Fujifilm Corporation Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof
WO2010052882A1 (ja) * 2008-11-05 2010-05-14 東京応化工業株式会社 感光性樹脂組成物及び基材
JP2010127961A (ja) * 2008-11-25 2010-06-10 Dnp Fine Chemicals Co Ltd 感光性着色樹脂組成物
JP2010191119A (ja) * 2009-02-17 2010-09-02 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよび固体撮像素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140081465A (ko) * 2012-12-21 2014-07-01 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20200110430A (ko) * 2018-03-05 2020-09-23 후지필름 가부시키가이샤 감광성 조성물

Also Published As

Publication number Publication date
TWI495953B (zh) 2015-08-11
TW201222143A (en) 2012-06-01
CN102236256B (zh) 2014-10-08
CN102236256A (zh) 2011-11-09
JP2012194516A (ja) 2012-10-11

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