TW201222143A - Color photosensitive resin composition, method of forming a pattern, method of producing a color filter, and color filter and display device having the same - Google Patents

Abstract

A colored photo-sensitive resin composition, a method for forming patterns, a method for manufacturing a color filter, the color filter, and a display device including the same are provided to reduce the brightness reduction of patterns after a post baking process and to suppress the generation of corrugations in a developing process. A colored photo-sensitive resin composition includes a coloring agent, a binder resin, a polymerizable compound, a photo-polymerization initiator, and a solvent. The photo-polymerization initiator is represented by chemical formula III. The binder rein includes a structural unit in a molecule. The content of the photo-polymerization initiator is 5-15 weight% of the total solid components in the resin composition. The structural unit is selected from a group including a structural unit represented by chemical formula I, a structural unit with N-substituted maleimide group, and a structural unit represented by chemical formula II.

Description

201222143 6. Technical Field of the Invention The present invention relates to a colored photosensitive resin composition, a pattern forming method, a method of manufacturing a color filter, a color filter, and a display device therewith . [Prior Art] In recent years, the development of liquid crystal display devices has been carried out by the use of personal computers and monitors having a relatively small kneading area, and has been used for large-sized televisions requiring high-definition television. . In television applications, more image quality, ie contrast and color purity, is required compared to previous monitor applications. In order to increase the contrast degree, the coloring agent (organic pigment or the like) used for the coloring photosensitive resin composition for forming a color filter is required to have a smaller particle size. Further, in order to improve the color purity, it is required that the content of the coloring agent (organic pigment) in the solid content of the colored photosensitive resin composition is higher. In view of the above requirements, a pigment dispersion composition in which the particle diameter of the pigment is more fine and the dispersion is higher is required. In order to improve the dispersibility of the pigment, the pigment is dispersed, for example, by modifying the surface of the naphthyl pigment with a derivative compound thereof, and using a dispersant such as a low molecular weight resin having a polar functional group which is easily adsorbed on the surface to be modified. Properties and Dispersion Stability' At the same time, a pigment dispersion composition containing a pigment, a surface modifier, and a dispersant is obtained. Thereafter, the obtained pigment is dispersed in an M-form, and an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and other components are added to prepare a composition, and the photo-component is used. A color filter is obtained by photolithography or the like. 201222143 When the pigment is refined and the content of the pigment is increased, there is a problem that the line width sensitivity is reduced (the line width is thinned) when the image pattern is formed by the photolithography method. In the use of τν, it is particularly desirable to provide a color filter inexpensively. In order to cope with the above-mentioned problems mainly caused by the development step, it is necessary to increase the exposure amount in the exposure step, that is, to extend the exposure time. Since the above situation will lower the yield and deteriorate the productivity, it is required to be improved. In order to solve the above problems, there has been an attempt to increase the line width of the photopolymerization initiator used for the photosensitive resin composition for color filters by a large number of errors. For example, a photopolymerizable composition using a triacyl compound having a specific structure (for example, refer to JP-A-6-2896 1 1), or a diphenyl ketone compound, an acetophenone compound, and 9-oxygen sulfur. A photoresist for a color-based light-receiving sheet which is used in combination with one or more of the hawthorn compounds (for example, see JP-A-H09-80225). In addition, as for the other proposals, it is disclosed that the average double bond equivalent in the organic compound obtained by combining the binder resin and the polymerizable compound in the coloring photosensitive resin composition is specified, and the adhesive resin is further specified. A molecular weight, and a technique of forming a fr-rward tapered by calcination (refer to Japanese Laid-Open Patent Publication No. Hei. Further, it is proposed to use a coloring photosensitive resin composition for exposure by ultraviolet light, but to use a binder resin containing a weak propyl group to prepare a sensibility and develop a mandarin Ρ \ I# # H Zhilong Valley The latitude is a relatively large coloring resin composition (for example, refer to Japanese τ 4 4 付 Kaiping 1 ο - 2 0 4 9 6 , International Publication 2007/2987 No. 1 booklet, 201222143 phenyl maleicene The imine copolymer is used for the binder resin, and the blue color of the color reproducibility is not good, and the false color supply color is "/color/lighting sheet with the sense of radiation linearity (for example, refer to the scorpion special thorn flute, and the object + Seeking the benefit of the 3632532唬 bulletin. However, the exposure step and the development step of the laser are not sufficient to ensure sufficient productivity. Therefore, the price of the color = film cannot be reduced. The exposure step and the development step are performed by exposure with laser light (for example, reference numeral), and the laser and the commonly used mercury lamp have higher linearity, larger output, and can also be focused as a benefit. Pattern in the exposure step It is expected that the characteristics of the reticle are: However, 'even if the above-mentioned prior art is used, the surface of the pixel becomes rough in the developing step or the line width sensitivity of the image f is insufficient, and the coloring photosensitive resin is not satisfied. The characteristics required for the composition. Further, in terms of reducing the cost of the color filter, it is proposed that the exposure apparatus does not use a large photomask (for example, refer to Japanese Patent Laid-Open No. Hei 2〇〇8_767〇9曰本特开2008-5 1 866号). However, no specific materials have been suggested, and we are looking forward to suggesting materials suitable for such devices. Also, among the blue colored photosensitive resin compositions, we are expecting A strong and highly sensitive initiator for the blue colorant itself in the exposed area. For such an initiator, although a ruthenium initiator or a ketone oxime initiator is contemplated, it is highly desirable to originate from the initiation. In the coloring of the agent, the brightness after the baking is greatly reduced, and the coloring agent is not colored. [Explanation] [Problem to be solved by the invention] 201222143 An object of the present invention is to provide an ultraviolet laser exposure & a Mp; < Light-based resin composition, which is a heat-resistant film of a film having a high line width sensitivity and which is less prone to occurrence of wrinkles (^"1111") (wrinkle) and hardened film A colored photosensitive resin composition which is excellent in the reduction in brightness after post-baking and which is capable of forming a coloring pattern having excellent linearity, and is particularly suitable for formation of colored pixels of a color light sheet, etc. Another object of the present invention is Provided is a pattern forming method using the colored pattern having excellent shape and brightness of the colored light-sensitive resin composition, a method for producing a color light-receiving sheet, and a color filter having a color pattern having a good image shape and brightness, A display device having the color light film. [Means for Solving the Problems] As a result of intensive research, the inventors have found that the above problems can be solved by the following methods. At least (A) coloring

< 1 > A colored photosensitive resin composition, 201222143

6

1 ο R I a CIC 〇 1R—0—R1 4 5

1-RIC 3

1 21RICHR

VI / ✓ (N In the formula (I), R11 to R15 each independently represent a hydrogen atom, and a halogen R16 represents a hydrogen atom or a ruthenium atom, a cyano group, an alkyl group or an aryl group.

-ch2—C

c=o

I ο R22

I (II)

R 23

R 24 In the formula (II), R21 represents a hydrogen atom or a fluorenyl group, and R22 represents an alkylene group having 1 to 6 carbon atoms. R23 and R24 are each independently a group having a carbon atom number of 4 or less, either an argon atom and the other being an alkyl group having 4 or less carbon atoms, or a bond between R23 and R24, and 201222143

(III) In the formula (III), each of γ x of x1, χ2 and X3 independently represents a halogen atom, a halogen atom or a burnt group, and R1 represents no R, -OR, -COR, -SR, -CONRR, or -CN ' R2 and R3 each independently represent -R, -OR, -COR, -SR, or -NRR, 〇〇^ KK ° R and R' each independently represent an alkyl group, a carbonyl group, or an aryl group' or The group of such a heteropoly group may be substituted by (10) or more selected from the group consisting of a halogen-containing atom and a heterocyclic group, and constitutes a carbon atom of the alkyl group in the alkyl group and the aromatic group. More than one can also use unsaturated keys, +

He is replaced by an oxime bond or an ester bond, and R and R' may be bonded to each other to form a ring. <2> The colored photosensitive resin composition according to <1>, which further comprises a sensitizer selected from the (F) polyfunctional thiol compound. (3) The colored photosensitive resin composition according to the above, wherein the (B) binder resin is contained in the molecule and contains (B-1) represented by the formula (1) The structural unit, (B 2) has a structural unit having a N-substituted maleimide group, and (B-3) is a fluorene represented by the formula (II). The group of structural units is selected from at least one structural unit 5 0 mol % to 90 mol % and a structural unit having an acidic group, and is 201222143 resin having a weight average molecular weight of 10,000 to 100,000. &lt;4&gt; The composition according to any one of <1>, which is an ultraviolet laser exposure repelling &lt;5&gt; pattern forming method, which comprises coloring the color as described in item 1 The resin composition forms a coloring layer forming step of forming a coloring layer, an exposure step of exposing to a pattern by ultraviolet laser exposure, and a developing step of forming a pattern by development by development. &lt;6&gt; The pattern forming method according to <5>, wherein the exposure wavelength of 300 nm to 380 nm is &lt;7&gt;, and the pattern shape y laser as described in <5> or &lt;6&gt; is 20 Hz to 2000 Hz. Frequency &lt; 8 &gt; A method of producing a color filter, wherein the pattern described in any one of j &lt; 7 &gt; is formed into a colored pattern. &lt; 9 &gt; A color filter manufactured by &lt;8. &lt; 1 0 &gt; A display device having &lt; 9 sheets. [Effect of the Invention] According to the present invention, it is possible to provide an ultraviolet photosensitive resin composition which has a line width sensitivity, a wrinkle texture (wrinkle) which is less likely to occur, is excellent in hardening, and has a small decrease in brightness after post-baking, and is shapeable. The coloring photosensitive resin I ° &lt;1&gt; to &lt;4&gt; is applied to the substrate, and the exposed portion is cured in the uncured portion of the color layer and the ultraviolet ray is in the L-circle . The 乞 method, the aforementioned pulsed laser with ultraviolet shock. Qin contains a shape on the substrate by the &lt;5&gt;~ method; &gt; The manufacturing method described in the color light ray for laser light exposure is high, and the heat resistance of the film is linear. Excellent work -10- 201222143 The color-coded photosensitive resin composition of the color pattern is particularly suitable for the formation of colored pixels of color filters. Moreover, according to the present invention, it is possible to provide a pattern forming method and a method for producing a color filter using a colored pattern excellent in shape and vanity of the colored photosensitive resin composition, and a method having a good pattern shape and brightness. A color filter of a colored pattern, and a display device having the color filter. [Embodiment] [Embodiment for Carrying Out the Invention] Hereinafter, a mode for carrying out the present invention will be described in detail. &lt;&lt;Coloring photosensitive resin composition&gt;&gt; The coloring photosensitive resin composition of the present invention is characterized in that (A) a coloring agent is added to + humans, and (B) is contained in a molecule selected from the group consisting of (Β_;) Below ^ ^

The structure of the structural unit represented by the formula (I) is at least locally referred to as "(B) bonded to the colored photosensitive resin group of the following formula (III), the content of the initiator The content of the hair component is described in detail below. (A) Colorant> The coloring photosensitive resin coloring agent of the present invention. The composition contains at least one kind of (A) 11 - 201222143 _ with respect to the coloring photosensitive resin The solid content of the composition, the content of the (4) coloring agent in the colored photosensitive steep fat fraction of the present invention is 15% by mass to 60% by mass based on the mass fraction. If the content of the coloring agent is less than 15% by mass. In order to go to _ horse to achieve the desired color tone must be set to a thick film thickness, and the cone u ~ difficult to develop, the interval time (tact time) and other issues ° other aspects - if (A) colorant content When the amount exceeds 60% by mass, the development time is delayed by Β μ ^ , and the shape of the profile becomes a reverse edge shape, which is not preferable. The so-called colored photosensitive resin composition of the present invention Solid component 'system means (E) The total content of the total components of the colored photosensitive resin composition of the component (E) of the composition of the photosensitive resin composition. The "solid-forming knife" of the colored photosensitive resin composition in the present invention It is meant that a component which is colored in a photosensitive resin composition to form a coating film having a thickness of 2_0 μm and then dried at 15 Torr for 6 minutes to form a cured film in the cured photosensitive resin composition of the present invention has been used. ''Check out (E) &gt; all components of the colored photosensitive resin composition of the granules. The content of the (Α) coloring agent in the colored photosensitive resin composition of the present month is more preferably from 2% by mass to 50% by mass, even more preferably 25%, based on the total solid content of the coloring photosensitive resin composition. Mass%~4〇% by mass. For the coloring agent, a dye and a pigment can be appropriately selected and used. From the viewpoint of heat resistance and the like, it is more preferably a pigment. The pigment used as the (Α) coloring agent may be an inorganic pigment or a pigment having -12-201222143, and it is preferable to use a gun early size from the viewpoint of obtaining a high transmittance p2 &amp; As small as possible. The h ± , u 颜料 of the pigment is preferably an average of the primary particle diameter of the scorpion 〇 〇 1 1 1 1 , , 兔 兔 兔 兔 兔 兔 兔 兔 兔 兔 兔 兔 ΟΙ ΟΙ ΟΙ 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 0.05 Photosensitive tree of the ancient eight four eight #钊日Γ舳,, and the adult, the wrong use is described later

When Ll Tian Yan's size is small, it can also make the dispersion and dispersion stability of the pigments change from the "good", so even if the film thickness is good, the color pigment with excellent color purity can be formed. Flat guide

Further, in the present invention, the ratio of the pigment which is preferably - the secondary particle diameter is less than 〇〇 2 (4) in the pigment contained in the photosensitive resin composition of the product is in the total amount of the pigment. The ratio of the pigment which is less than 1 G% and the secondary particle diameter exceeds Μ is less than 5% of the total amount of the pigment. By making the ratio of the pigment having a primary particle diameter of less than 2 μm to less than Η%%, the heat resistance can be improved, and the chromaticity change can be prevented, and the ratio of the pigment having a primary particle diameter of more than 0.08 μm is less than 5%. The contrast can be made good, and the stability of the colored photosensitive resin composition with time can be prevented from malfunctioning. From the viewpoint of heat resistance and prevention of change in chromaticity, the ratio of the pigment having a primary particle diameter of less than 0.02 μm is more preferably less than 5%. From the viewpoint of optimizing the contrast, the ratio of the pigment having a primary particle diameter exceeding 〇 8 μm is preferably less than 3%. The primary particle diameter of the pigment can be measured using a TEM (transmissi〇n electron microscope). That is, it is performed by performing image analysis on the tem photo and investigating the particle size distribution. For example, it is possible to grasp the particle size distribution 201222143 by measuring the total number of particles in the observation sample at 30,000 to 10,000 times and the number of particles of the pigment which is less than 0·02 μm and more than 〇.〇8μηι. More specifically, 'through a transmission electron microscope, the pigment powder was observed at 3 times magnification, photographs were taken, and the primary particle diameter was measured to calculate the primary particle size and particle diameter of 0 2 μιη. The ratio of the primary particles above 〇. The parts of the pigment powder are changed, and the operation is performed in total, and the results are averaged. As the inorganic pigment which can be used as the (A) coloring agent, a metal compound such as an oxide or a metal salt may be listed, specifically, iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium may be listed. , zinc, antimony, etc. are vaporized 'and composite oxides of the above metals. Examples of the aforementioned organic pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 23' 31' 38 &gt; 41' 48: 1 , 48 : 2 , 48 : 3 , 48 : 4 , 49 : 1 , 49 : 2 ' 52 : 1 , 52 : 2 , 53 : 1 , 57 : 1 , 60 63 : 1 , 66 , 67 , 81 : 1 , 81 : 2 , 81: 3, 83, 88, 105 &gt; 112, 119, 122, 123, 144, 146, 149, 150, 166, 168 '169, 170, 171, 172, 175, 176, 177, 179, 184, 185 , 187' 188, 190, 200, 202, 206, 208' 209, 210, 216, 220, 224, 226, 242, 246, 255, 264, 270, 272, 279, CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1 ' 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 98, 100, 101 '104, 106' 108, 109, 110, 113, 115, 116, 117, 118, 119, 120, 123, 125, 126, 100,000 long 0 8 μιη 3 at the gold : 金 ' 22 ' 49, : 1 ' 90 ' 155 ' 178, 207 ' 254, 14, ' 36, .62, 97 ' 114, 127, -14- 201222143 128, 129, 137, 138, 139, 147 , 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173 '174, 175, 176, 177, 179, 180 , 181, 182, 185, 187, 188, 193, 194, 199, 213, 214 C-Ι. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43' 46' 48' 49' 51' 52' 55' 59, 60, 61, 62, 64, 71, 73, CI Pigment Green 7, 10, 36, 37, 58 CI Pigment Blue 1, 2, 15, 15: 1, 15 : 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66, 79, 79 Cl substituents were changed to OH, 8 〇, CI Pigment Violet 1, B, 23, 27, 32, 37, 42, CI pigment brown 25, 28 and so on. The following may be mentioned as a pigment which can be suitably used among these. However, the present invention is not limited to this. CI Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185, CI Pigment Dial 36, 71, CI·Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255 '264, C · I. Pigment Violet 9, 9 3, 3 2 CI Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66, CI Pigment green 7,36,37. These organic pigments can be used singly or in order to improve the color purity -15-201222143 can be used in combination. The following is called small, one-~ hole 31 example. For example, for the red layer (R) used for __ ^ 枓 枓 枓 5 , , , , , , , , , , , , , , , 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可 可a yellow pigment mixed with a bismuth ancestor, a fluorene-based porphyrin pigment, a quinoline-based pigment, or a quinone-based pigment, a quinone-based pigment, a quinone-based pigment, The diketones are 0 to 0 each. It is a mixture of at least one kind of ruthenium, and a red pigment such as an anthraquinone pigment, an anthraquinone pigment, a condensed disazo pigment, or an η-pyrenepyrazole pigment. 4# For example, in the case of 蒽S Kunyu pigment, it can be classified as r τ ★ parent + l. I · pigment • red 17 7 ; in the case of 糸 pigments, it can be cited as C·1·pigment·red 155, CI pigment·

Red 2 (4) in the case of condensed bisazo red pigments, can be listed as a T material • red 242; as far as the diketone mouth is more than D and L + + ' 丨 丨 ' ' 而言 而言 而言 而言 而言 而言 而言 而言 而言τ pigment•red 254; at the point of color reproducibility, preferably j cow C·1. 254 and CI pigment•yellow 139 or c.1. pigment•red 丄 枓. red 177, red pigment and other pigments Quality A. . The pigment) is preferably 1 〇〇: 5 to 100: 80. In \ (red pigment: other colors will be difficult to suppress light from 400 nm to 500 nm 4, sometimes color purity. Also, at 100: 8 1 or more, there is permeability and cannot be improved, especially in terms of the above mass ratio The best is 'coloring, this force will drop. Scope. In addition, the red pigments are adjusted to each other 厶 0 · 10~100 : 65 chromaticity. In the case of S, it can be combined with the green layer (G) The pigment used in the sapphire pigment, or a mixture of the naphthalene yellow pigment, the azo sulfhydryl yellow color pigment, and the quinoline yellow pigment can be used alone. For example, such an example ^ : 异(四)琳 is a yellow color ° is preferably C · I. Pigment · -16- 201222143 Green 7, 36, 37, 58 and [1. Pigment. Yellow 138, (: 1 pigment. Yellow 139, CI pigment • Yellow 150, C_I. Pigment • Yellow 18〇 or c” pigment. Yellow 185 '/邑. From the viewpoint of obtaining sufficient color purity and suppressing the deviation from the target hue of NTSC (Nati〇nal Television System C〇mmittee) Look, the mass ratio of green pigment to yellow pigment (green pigment: yellow pigment) is preferably 100: 5~1〇〇: 150, Preferably, it is 1〇〇: 3〇~1〇〇: the range of 12〇. For the pigment used in the blue layer (B), the naphthoquinone pigment can be used alone or in combination with the purple pigment of the double family. For example, it is preferably a mixture of C丄 pigment•blue 15:6 and C&gt;1. Pigment. Violet 23. Mass ratio of pigment to purple pigment (blue pigment: purple pigment) 100: 0 ～100: 50, more佳为100: 5~1〇〇: 3〇. The phrase "the color-sensitive photosensitive composition of the present invention, especially when applied to a photosensitive composition, does not color yellow even if the colored layer is heated. In the present invention, it is particularly preferable to use an organic pigment as a coloring agent, and to use an organic compound to coat a pigment in a micronizing step or a dispersing step of a pigment. #用用聚合物合合:二:匕:二The finer pigment is more preferably used to inhibit the formation of secondary coagulation; and it can be dispersed in the state of primary particles. The two-part coated pigment can stably maintain the dispersed primary particles. Coated pigments, dispersion stability, preferred aspects of the invention The material is coated with pigments, but the coating is made of = sub-combination, 'the surface of the surface produced by Tianhua-17-201222143. The new interface of the pigment with higher activity' is based on the strong electrostatic interaction with the polymer compound. In the present invention, it is considered that a pigment having a higher dispersion stability can be obtained. In the present invention, the pigment after the coating treatment is washed with an organic solvent capable of dissolving the polymer compound. The polymer compound to be coated is also hardly released. In the present invention, the term "coated pigment" means that the pigment particles such as an organic pigment are coated with a polymer compound having a polar group such as a hetero ring in the side chain, and a part of the surface of the pigment particle is strongly coated by the polymer compound or All of them can exert a higher dispersion stability effect, unlike those in which a polymer dispersant is adsorbed on a pigment. The state of the coating can be confirmed by measuring the free amount (freeness) of the polymer compound by the use of an organic solvent: washing as shown below. In other words, the polymer compound which has been adsorbed by the organic solvent alone is removed by washing with an organic solvent, and most of the polymer compound is removed by 65% or more. However, as the surface-coated pigment of the present invention, The liberation rate is extremely small or less. J υ The coated pigment was washed with 1-methoxy-2-propanol to calculate the amount of free (free rate). That is, the pigment i〇g was put into i "methoxymethanol 2 propanol 1 OGml" and shaken at room temperature for 3 hours using a vibrating machine. After straight, 'using a centrifugal separator' at 8 Torr, 〇〇〇 rpm The mass of the solid component in the supernatant fraction was determined by the drying method in 8 hours, and the liberation rate (%) was calculated from the ratio of the mass of the two-component component to the mass of the polymer compound used for the coating treatment. The aforementioned free amount (free rate) of a commercially available pigment can be determined by the method of 201222143. That is, a solvent capable of dissolving a pigment (for example, dimethyl sulfoxide, dimethylformamide, citric acid, After the total pigment is dissolved, the polymer compound and the pigment are separated by an organic solvent by the difference in solubility, and the mass of the polymer compound used for the coating treatment of the pigment is calculated. Further, the pigment is washed with 1-methoxy-2-propanol as described above, and the above-mentioned free amount (mass of the polymer compound free from the pigment) is divided by the polymer used for the coating treatment of the pigment. The mass of the compound "to determine the liberation rate (%). The smaller the liberation ratio, the higher the coating of the pigment, and the better the dispersibility and dispersion stability. The preferred range of the liberation ratio is 30% or less, more preferably 2% by weight or less, and most preferably 15% or less, and desirably 0%. The coating treatment is preferably carried out simultaneously with the step of refining the pigment, specifically, by performing the steps of: adding (1) a pigment, (ii) a water-soluble inorganic salt, (iii) substantially insoluble (ii) a small amount of water-soluble Organic solvent 4, and (iv) 鬲 molecular compound 'step of mechanical kneading by a kneader or the like (referred to as a saU milling step); the mixture is put into water using an idle speed mixer (high-speed mixer) And the like is a step of preparing a slurry to form a slurry; and the step of filtering the slurry, washing with water, and drying as necessary. Hereinafter, the salt milling described above will be specifically described. First, a small amount of (iii) a water-soluble organic solvent as a wetting agent is added to a mixture of (1) an organic pigment f and (ii) a water-soluble inorganic salt, and the mixture is vigorously kneaded by a kneader or the like, and then the mixture is poured into water to utilize a high speed. A mixer or the like is mixed to form a slurry. Next, the slurry is over-washed, washed with water, and dried as needed, thereby obtaining a finely divided pigment. Furthermore, in the case of the use of the oil varnish, the Japanese temple can be dispersed by removing the water from the pre-drying treatment pigment (called crepe cake) by a method called flashing. In varnish. Further, in the case of dispersion into a varnish, the treated pigment does not need to be dried and is directly dispersed to the varnish.盐 In salt milling, by using the above (iii) organic solvent together with (iv) at least hydrazine, a soluble resin (polymer compound), it is more fine. I. The surface of the coating pigment which is coated with at least a portion of the soluble resin and which has less agglomeration during drying. Further, the timing of adding the (iv) polymer compound may be added at the beginning of the salt milling step, or may be added separately. Also; * also added the knife step. The polymer compound to be coated with the pigment may be any one as long as it has an adsorptive base. It is particularly preferable that the side chain has a polymer compound which is miscellaneous. The binder (B) which will be described later in the present invention is also preferably a polymer compound to be coated with a pigment. For such a polymer compound, for example, paragraph number [〇〇29] to [〇〇3〇] of JP-A-2008-83089, and paragraph number [0044] of JP-A-2009-62457 can be used. ~ [〇〇47] revealed in the person. In the case of using the above-mentioned coated pigment, it is preferred to use a dispersion of at least a pigment to disperse the pigment and use it as a pigment dispersion composition. By containing this dispersant, the dispersibility of the pigment can be further improved. As the dispersant, for example, a known pigment dispersant -20-201222143 or a surfactant can be appropriately selected. Specifically, a plurality of compounds can be used, and examples thereof include an organic aluminoxane polymer ΚΡ341 (manufactured by Shin-Etsu Chemical Co., Ltd.), and a methacrylic acid (co)polymer POLYFLOW Νο. .75, Νο.90, Νο·95 (Kyoeisha Chemical Co., Ltd.), W001 (Yu Shang)

Specialized cationic surfactants made by Yusho Co., Ltd.; polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether , non-ionic surfactants such as polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester; W004, W005, WO 1 Anionic surfactants such as 7 (Yu Shang Co., Ltd.); EFKA-46, EFKA-47, EFKA-47EA, EFKA Polymer 100, EFKA Polymer 400, EFKA Polymer 401, EFKA Polymer 450 ( All are Ciba · Speciality · Chemicals (Ciba Japan Κ·Κ·), 'DISPERSE AID 6, DISPERSE AID 8, DISPERSE AID 15, DISPERSE AID 9100 (all manufactured by San Nopco Co., Ltd.) Polymer dispersant; various SOLSPERSE dispersants such as SOLSPERSE 3000, 5000, 9000, 12000, 13240, 13940, 17000, 24000, 26000, 28000, etc. (The Lubrizol Co., Ltd.); ADEKA PLURONIC L31 , F38, L42, L44, L61, L64, F68 L72, P95, F77, P84, F87, P94, L1 (H, P103 'F108, L121, P-123 (made by ADEKA Corporation) and IONET S-20 (Sanyo Chemical Co., Ltd.) Chemical Industries -21 - 201222143

Ltd.), Disperbyk 101, 103, 106, 108, 109, 111, 112, 116, 130, 140, 142, 161, 162, 163, 164, 166, 167, 170, 171, 174, 176, 180 182, 2000, 2001, 2050, 2150 (BYK-Chemie) (BYK Chemie). Other examples include an oligomer or a polymer having a polar group at a molecular terminal or a side chain, such as an acrylic copolymer, and a dispersant in a pigment dispersion composition, relative to the mass of the pigment described. It is preferably from 1 to 100% by mass, more preferably from 3 to 7% by mass. m. The powder has its own adsorption to prevent the pigment from being introduced into the chain. There are pigments, isoindole, benzopyrene, and awakening. As for the bulletin, what is the organism - ... ... and ... the sickle - Dinghua Ganchuzhi is added to the pigment dispersion composition as needed. By deriving the affinity to the pigment or introducing a pigment having a polar group onto the surface of the pigment, it is used as a point of adsorption of the dispersant, and can be dispersed as a fine particle to the photosensitive resin composition _, which is further Aggregation can effectively form a high contrast, transparent and excellent color calender. The compound derivative is specifically a compound pigment having an organic pigment as a matrix and an acid group or m and an aromatic group as a substituent, and specifically, a ketone pigment, a naphthalene phthalocyanine-azo pigment, Quinoline yellow pigment, isomeric, porphyrin pigment, anthraquinone pigment, porphyrin pigment, diketopyrrolopyrrole pigment, s homologous pigment, and the like. Also included is usually $ #一%々% by pigments of naphthalene, diterpene, quinoline, etc., yellowish &amp; + $ square aromatic polycyclic compound Bajing He biological, Japanese can be used曰本特开平1 1-49974 曰本特开平1 1 - 1 89732号八琥公告, Japan Special Kaiping-22- 201222143

Japanese Patent Publication No. ZOOi-hQio, and the like. The content of the pigment derivative in the pigment dispersion composition is preferably from 1% by mass to 30% by mass based on the mass of the pigment, and is more preferably from 1 to 5% by mass. Good for 3 mass% ~ 20 mass%. If the content is within the above range, the viscosity can be suppressed to be low, and dispersion can be performed well, and the dispersion stability after dispersion can be improved, and excellent color characteristics with high transmittance can be obtained, and when a color filter is produced, Forms a high contrast with good color characteristics. The method of dispersing is carried out by mixing a pigment with a dispersing agent in advance, and dispersing it in advance using a homogenizer or the like, and finely dispersing it by using a bead dispersing machine such as oxidized beads. In the case of using a dye as the (A) coloring agent in the present invention, a uniformly colored colored photosensitive resin composition can be obtained. The dye which can be used as the (A) coloring agent is not particularly limited, and a known dye which is used as a color filter for the prior art can be used. For example, Japanese Laid-Open Patent Publication No. SHO-64-90403, Japanese Laid-Open Patent Publication No. H-91102, Japanese Patent Application Laid-Open No. Hei No. Hei. No. Hei. No. Hei. No. 4,808,501, U.S. Patent No. 5,667,92, the specification of U.S. Patent No. 5,059,500, U.S. Patent Publication No. 5-3 3 3 207, Sakamoto Kaiping 6-35 1 83, and Sakamoto Kaiping 6-5 1115, 曰本特开平6- 1 94828, 曰本特开平8-2 1 1 599号, Japanese Unexamined 4-249549号 -23-201222143, Japan Special Kaiping 10- Japanese Laid-Open Patent Publication No. H07-302283, Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open No. Hei 8-2977, No. 8-14621, No. 8-14621, Japanese Unexamined Patent Publication No. 1 1 - 3 4 3 4 3 7 , Japanese Special Report No. 8 · 2 2 4 1 6 Japanese Patent Publication No. 2002-14220, Japanese Patent Laid-Open Publication No. 2002-14221, Sakamoto Special Publication No. 2002-14222, and Japanese Special Open 2002 A pigment described in, for example, Japanese Laid-Open Patent Publication No. Hei 8- No. Hei. No. Hei. As the chemical structure, a pyrazole azo type, an anilino azo type, a triphenylmethane type, an anthraquinone type, an acridone type, a benzylidene type, or an oxaphthalene type can be used. Bisazotriazole azo, anthraquinone azo, cyanine thiophenanthene, pyrrolopyrazole methine azo, dibenzopyran, naphthalene, benzopyrene Dyes, indigo and other dyes. (B) containing, in the molecule, a structural unit selected from the group consisting of (B-1) a structural unit represented by the formula (I) (B_2) having an N-substituted maleimide group and (B-3) (Binder resin of at least i kinds of structural units in the group of structural units represented by the general formula („)> The colored photosensitive resin composition of the present month contains at least one of (B) a binder resin. B) The binder resin contains, in the molecule, a structural unit selected from the group consisting of a structural unit represented by the following formula (1), (B_2) having a fluorene-substituted cis-butylene-imide group, and (B_3) having the following formula ( At least one of the structural units of the group of 7G in the early stage is linked. -24- 201222143 [(B-1) structural unit represented by the general formula (1)] The following 'will be expressed by the following general formula (丨) The structural unit is appropriately referred to as "structural unit (; B -1 &gt; ^

16ο R II c丨c

Two RIC 4 ί 5RIC-R IIo 3

1·1RIGIR %f/ tmmmmw ✓f\ 2 The general formula (1), and R15 each independently represent an atom, a cyano group, an alkyl group or an aryl group, and R16 represents a hydrogen atom or a fluorenyl group. R11 to Ris in the general formula (I) are preferably each independently a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 12 carbon atoms or an aryl group having 5 to 14 atoms, more Preferably, it is a hydrogen atom, a bromine atom, an atom, a cyano group, an alkyl group having 1 to 7 carbon atoms or an aryl group having 5 to 10 carbon atoms. The above-mentioned alkyl group may have a substituent, and in the case of an alkyl group, 'may be a straight bond or a ring, and an alkyl group having a carbon number of 丨~7, preferably a group, a n-propyl group, an isopropyl group, or a Tributyl and the like. Further, the aryl group may have a substituent, and examples of the substituent include a carbon number of 1 to 7 @. The violent or slave atomic number 5~丨4 is preferably a phenyl group, a furyl group or a naphthyl group. The group A, the preferred one of the formula (1) is Rn~R, 5 each independently -25- 201222143 A hydrogen atom, a methyl group, a phenyl group or a halogen atom, and R16 is a hydrogen atom or a fluorenyl group. [(B-2) Structural unit having an N-substituted maleimide group] Hereinafter, a structural unit having a N-substituted maleimide group of (B-2) is appropriately referred to It is "Structural Unit (B-2)". The structural unit (B-2) includes, for example, the structural unit shown below.

[(B-3) Structural unit represented by the formula (II)] Hereinafter, the structural unit represented by the following formula (II) is appropriately referred to as a structural unit (B-3).

〇 R22 Ο

R23

-26- 201222143 In the formula (II), R2! represents a hydrogen atom or a fluorenyl group, and R22 represents a stretching group having a carbon number of 16. Each of r23 and r24 independently represents a hydrogen atom or an alkyl group having an anaerobic number of 4 or less. R23 and r24 may be bonded to each other to form a carbon atom ring. Preferably, the formula (Π) is a hydrogen atom, R22 is a fluorenylene group or an ethyl group, and R23 and R24 are bonded to each other to form a 6-membered ring. - (8) The binder resin may have at least one of the group consisting of a single π (Β-1), a structural unit (Β2), and a structural unit (β_3) in the molecule. 2 or more types. In the combination of the EQ (4) and the structural unit (Β_2) including a plurality of the foregoing structural units, they may be grouped with each other: the mutual units of the constituent units may belong to the same structural unit, such as a structural unit (Β-1). The mutually different structural units are mutually of each other. Further, in the case of the (Β) binder resin in the present invention, it is preferable to have a structural unit (B l) among the above respective structural units. The (Β) binder resin preferably contains 5 〇 mol% or more and 90 mol% or less (β" in a molecule, and has a structural unit represented by the formula (1), and (B 2) 3 has an n-position-substituted cis The structural unit of the butylenediimide group and (B-3) the structural unit represented by the formula (11), more preferably 5 〇 mol% or more and 80 mol% or less 'further more preferably 6 More than 5% by mole, less than 80% by mole. When the total amount of the structural unit 之中 in the binder resin is within the above range, the development latitude becomes good, the film reduction at the time of development after exposure becomes small, and the surface smoothness of the obtained cured film becomes good. Further, the knot -27-201222143 structural unit (B-1) containing 20 mol% or more and 9 mol% or less is more preferably 'detailed' and preferably contains 5 〇 mol% or more and 80 mol%. The following structural unit (Β-1), 50 mol% or more, 8 〇 mol% or less of the structural unit (Β-2), 50 mol% or more and 80 mol% or less of the structural unit (Β-3) kind. [Structural unit having an acidic group] Further, the '()) binder resin may have a structural unit having an acidic group in the molecule. The structural unit having an acidic group may, for example, be a structural unit derived from an unsaturated monomer containing a mercapto group. In the case of a carboxyl group-containing unsaturated monomer, it is an unsaturated monobasic acid such as acrylic acid, methacrylic acid, crotonic acid, α-gas acrylic acid or cinnamic acid; maleic acid, maleic anhydride, and anti-butyl Unsaturated dibasic acid such as enedic acid, itaconic acid, itaconic anhydride, methyl maleic acid, anhydrous methyl maleic acid or mesaconic acid or its anhydride a polyvalent carboxylic acid or an anhydride thereof; succinic acid mono [2-(indenyl) propylene oxyethyl] ester, phthalic acid mono [2 (indenyl) propylene oxiranyl ethyl ester] Mono-[(meth)acryloxyalkylene] ester of a polyvalent carboxylic acid having a valence of two or more; ω-carboxypolycaprolactone monomethacrylate or the like having a carboxyl group and a hydroxyl group at both terminals Molecular monodecyl acrylates and the like. Among these carboxyl group-containing unsaturated monomers, succinic acid mono(2-propenyloxyethyl) ester and phthalic acid mono(2-propyleneoxyethyl) ester, each of which is Μ-5300 The trade name of Μ_54〇〇 (East Asia Synthetic Co., Ltd.) is sold in the market. The resin may contain or contain two or more kinds of the above carboxyl group-containing unsaturated monomers alone. -28- 201222143 In this specialty, in terms of structural units having a preferred acidic group, it is derived from a carboxylic acid, a chalcogen analog of a carboxylic acid, a hydrazoic acid [RC(== NNH2)OH],曱imino acid [RC(;= NH)OH], indeed acid [rs(o)2oh], sulfinic acid [RS(0)0H], sulfenic acid [RS〇H], selenate [RSe(0) 20H], selenite [RSe(0)0H], selenoic acid [RSeOH], structural units of phosphoric acid and its acid-related compounds, citric acid, boric acid analogs, especially from acrylic acid, methacrylic acid and A structural unit of phosphoric acid. The content of the structural unit having an acidic group in the binder resin is preferably 5 mol% or more and 5 mol% or less, more preferably 1 mol% or more and 30 mol% or less. If it is within this range, the surface smoothness and heat resistance at the time of development are good. ~ (B) The binder resin may have other structural units in addition to the above-described respective structural units. For the other structural units, the following structural units of the unsaturated monomer are listed: r, ethyl, o-vinyltoluene, m-methyl, p-ethyl fluorene, and erbium methoxy Knee-baked, o-nonyloxystyrene door T-milk, stupid B-baked, paired with 訇 訇 野 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 It produces e ^ soil..., + ethyl benzyl methyl ether, adjacent soil oxypropyl ether, m-vinyl-like sample and re-coating oxypropyl scale, oblique sulfhydryl fluorenyl Alkyl quinones for t tones; aromatic phenolic compounds; P, 1-methyl hydrazine, etc.; methyl methacrylate, ethyl methacrylate, isopropyl methacrylate Ester, unsaturated acid, isobutyl enoate, methyl i propylene butyl butyl acrylate, methyl W sputum j S 曰, methacrylic acid - Tian * Le butyl vinegar, methacrylic acid: r_酉曰, methyl propyl benzoic acid-2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Hydroxybutyl ester, methacrylic acid · 3- butyl s, thiol acrylate 4- butyl butyl, methyl acrylate acrylonitrile, benzyl methacrylate, methacrylic acid cyclohexan vinegar, phenyl methyl propylene Acid g, mercapto acrylate 2-methoxyethyl ester, methyl propyl 2-phenoxyethyl ester, methoxy diethylene glycol methyl acrylate, decyloxy three Ethylene glycol methacrylate, methoxypropanediol methacrylate, methoxydipropylene glycol decyl acrylate, decyl methacrylate, methacrylic acid tricyclo [5.2.1.0 ] _8 _ self-destination, methacrylic acid _2 - carboxylic acid esters such as benzyl-3-phenoxypropyl vinegar, glycerol monomethacrylate, etc.; 2-aminoethyl methacrylate, A 2-Chindylaminoethyl acrylate, 2-aminopropyl decyl acrylate, 2-didecyl propyl methacrylate, 3-aminopropyl decyl acrylate, A Aminoalkyl esters of unsaturated carboxylic acids such as 3-didecylaminopropyl acrylate and the like; propylene acrylates of unsaturated carboxylic acids such as methacrylic acid propylene glycol vinegar; Unsaturated carboxylic acid oxetane esters such as cyclobutyl vinegar; acetic acid Vinyl esters of vinyl esters, vinyl vine acetate, vinyl butyrate, vinyl benzoate, etc.; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl epoxy propyl ether a cyanide vinyl compound such as (meth)acrylonitrile, α-gas acrylonitrile or vinyl cyanide; (mercapto) acrylamide, α-aluminoxetamine, hydrazine-2-hydroxyethyl ( Anthracene amides such as acrylamide; unsaturated hydrazines such as cis-butyl diimide, fluorenyl-phenyl-butane quinone imine, ν-cyclohexyl-m-butyleneimine, etc. Imines; -30- 201222143 1,3 - aliphatic conjugated dienes of butadiene, isoprene, chloroprene, etc.; in polystyrene, polymethyl methacrylate, polyfluorenyl A macromonomer having a mono(indenyl)acrylonitrile group at the end of a polymer molecular chain such as n-butyl acrylate or polyoxyalkylene oxide. Two or more constituent components derived from such unsaturated monomers may be contained alone or in combination. Hereinafter, (B) the exemplified compounds 1 -1 to 1 -8 of the binder resin and the exemplified compounds 2 to 40 are disclosed. The (B) binder resin in the present invention is not limited to the above-exemplified compounds as long as it satisfies the above requirements. Exemplary compound composition Mohs weight average molecular weight 1-1 CO 〆 · co2h 80/20 35000 1-2 Same as above 50/50 35000 1-3 Same as above 40/60 35000 1-4 Same as above 80/20 100000 1-5 Same as above 80 /20 10000 1-6 Same as above 80/20 20000 1-7 Ibid 80/20 50000 1-8 Ibid. 95/5 35000 -31 - 201222143 The average molecular weight of the compound composition in the molar specific gravity 2 -{ch2-ch-)-彳Ch2-ch|- C = 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 —CH-^*-c=0 COOH O-CH—C=CH2 0iH3 80/20 35000 5 ~&quot;^CH2-CH as -^CH2&quot;~CH·) C=Q COOH d)CH2CH=CH-&lt ;^^&gt; 80/20 35000 6 ch3 ch3 -^-CH2~C·^:—C·)-— C=0 COOH 1 och2ch=ch CN 80/20 35000 7 CH3 ch3 -^CH2-C- ^- -(CH2'-C·)- 0=0 COOH 1 och2ch=ch Cl 80/20 35000 8 JcVr C〇Cs^ C02H C〇2 /==^ 70/20/10 35000 -32- 201222143 exemplified compound Composition Mohr ratio Weight average molecular weight 9 CY Seven V c : 〇 2 Η ό 70/20/10 35000 10 ( c &gt;r _ ό 70/20/10 35000 -33- 201222143

-34- 201222143

-35- 201222143 Illustrative Compound Composition Moerby

Heavy Dong average molecule S 31 Ο

C02H 6 30/50/20 35000 32 Ο

Cof^ co2h , N ό 30/50/20 35000 33

O

N Ό C02H 6 50/30/20 35000 34

O

C02H 50/30/20 35000 35

O

N co2h 70/30 20000 _^ch2—C^- c=o co2h 36 70/30 20000

O

-36- 201222143 Illustrative compound Cheng Mo Er Bi 遒a average molecular child 37 4^1)· co2h 0乂ό 60/20/20 35000 33 coT^ coo^/C^ 60/20/20 35000 39 0 people 0 people 0°'° ^0Η 60/21/19 14000 40 Kf)- 03⁄4 ^ f 6 , °δ° 25/25/25/25 30000 (B) Weight average molecular weight of the binder resin, preferably in the range of 10,000 100000 More preferably, it is in the range of 10,000 to 50,000, and further preferably in the range of 1 to 0 0 0 to 4 0 0 0. If it is within this range, the developability and linearity of the pattern of the shape become good. The content of the (B) binder resin in the colored photosensitive resin composition of the present invention is preferably in the range of 10% by mass to 50% by mass, and more preferably 15% by mass, based on the solid content of the coloring photosensitive resin composition. ~40% by mass range. The colored photosensitive resin composition of the present invention may contain a resin having a structure other than the above-mentioned (B) binder resin of the specific component of the present invention. For the resin of the structure other than the (B) binder resin, as long as it is a step of the amount of the tree, it can be -37-201222143. The colorant is viscous with respect to the developing treatment liquid, and the soluble olefinic acid copolymer is saturated. Body and other things. When the color filter is manufactured, the developing solution used in the step, particularly preferably alkaline development, is not particularly limited, and it is preferred that the propidyl group having a slow base has one or more retarding groups. In the copolymerization of the ethylene-unsaturated monomer which is not copolymerizable with ethylene, the specific example of the resin which can be used in combination with the structure other than the binder (B) is thiol-acrylic acid. /Methyl methacrylate copolymer, methacrylic acid / benzyl methacrylate copolymer, methacrylic acid / 2-hydroxyethyl methacrylate / benzyl methacrylate copolymer, methyl acrylate / sulfhydryl Methyl acetonate/polystyrene macromonomer copolymer, methacrylic acid/mercapto acrylate styrene/polymethyl methacrylate acrylate macromonomer copolymer, methacrylic acid/mercapto acrylic acid Benzyl ester/polystyrene macromonomer copolymer, methacrylic acid/benzyl methacrylate/polymethylmercaptoacrylate macromonomer copolymer, methyl acrylate/2-methylpropionic acid Ethyl vinegar / methyl methacrylate benzyl vinegar / polystyrene macromonomer copolymer, methacrylic acid / 2 - methyl Hydroxyethyl acrylate / benzyl methacrylate / poly Yue Yue yl acrylate macromonomer copolymer. Further, a resin containing an epoxy group or an oxetane ring as follows may be used. Styrene/methacrylic acid/mercaptoacrylic acid tricyclo [5.2.1.02,6] 癸院_8. •38- 201222143 Ester/glycidyl methacrylate copolymer, styrene/acrylic acid/acrylic tricyclo [5.2 .1.02'6]decane-8-ester/glycidyl acrylate copolymer, benzyl methacrylate/mercaptoacrylic acid/3-(methacryloxycarbonyl) oxetane/methyl Third butyl acrylate copolymer, benzyl methacrylate / methacrylic acid / 3-(mercapto propylene fluorenyl fluorenyl)-3-ethyl oxetane / styrene copolymer, butadiene / Styrene/mercaptoacrylic acid/mercaptoacrylic acid tricyclo [5.2.1.02,6] decane-8-ester/methacrylic acid glycidyl ester copolymer, butadiene/mercaptoacrylic acid/methacrylic acid tricyclic [ 5.2.1.02'6] decane-8-ester/glycidyl methacrylate copolymer, styrene/methacrylic acid/methacrylic acid tricyclo[5.2.1 ·02'6]decane-8-ester /Mercaptoacrylic acid-6,7-epoxyheptyl ester copolymer, styrene/acrylic acid/maleic anhydride/mercaptoacrylic acid-6,7-epoxyheptyl ester copolymer, methacrylic acid tert-butyl Ester/acrylic acid/maleic anhydride/mercaptoacrylic acid-6 , 7-epoxyheptyl ester copolymer, styrene/mercaptoacrylic acid/decyl acrylate/glycidyl methacrylate copolymer, p-nonyl styrene/methacrylic acid/cyclohexyl acrylate/ A methacrylic acid glycidyl acrylate copolymer. &lt;(C) Polymerizable Compound> The colored photosensitive resin composition of the present invention contains (C) a polymerizable compound. The polymerizable compound which can be used in the present invention is an addition polymerizable compound having at least one ethylene-39-201222143 unsaturated double bond, and can have at least one, preferably two or more terminal ethylenically unsaturated bonds. Choose among the compounds. Such a compound group is widely known in the industrial field, and the present invention can be used without any particular limitation. These have the following chemical forms: monomer &quot;prepolymer&quot;, i.e., dimers, trimers, and oligomers&apos; or mixtures thereof, and copolymers thereof. For the case of monomers and their copolymers, § 'Can use unsaturated acid (such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, methacrylic acid, maleic acid, etc.) or its vinegar The S-cylinder amine is preferably an ester of an unsaturated tetacid and an aliphatic polyol compound, an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound. Further, it is also suitably used: an unsaturated carboxylic acid ester having a nucleophilic substituent such as a hydroxyl group, an amine group or a fluorenyl group, or an addition reaction product of a monofunctional or polyfunctional isocyanate or an epoxy compound. And a dehydration condensation reaction product with a monofunctional or polyfunctional carboxylic acid. Further, it is also suitable to use an unsaturated acid vinegar or a guanamine having an electrophilic substituent such as an isocyanate group or a cyclopentyl group, and an addition of a monofunctional or polyfunctional alcohol, an amine or a thiol. a reactant, and a substituted carboxylic acid ester having a detachable substituent such as a halogen group or tolsulfonyloxy group or a substituted reactant of a monofunctional or polyfunctional alcohol, an amine or a thiol. Further, as another example, a compound group in which the above unsaturated carboxylic acid is replaced with an unsaturated phosphonic acid, stupid ethylene or vinyl ether can also be used. Further, in the present specification, acrylate and methacrylate are collectively referred to as methyl acrylate vinegar. As a specific example of the monomer of the aliphatic polyol compound and the ester of the unsaturated carboxylic acid, the methacrylate may, for example, be ethylene glycol dimethacrylate or diethylene glycol dimethacrylate. , 1,3-butanediol dimethacrylate, butanediol dimercapto acrylate, propylene glycol dimercaptoacrylic acid S曰, neopentyl glycol dimercapto acrylate, trimethylolpropane tridecyl acrylate Ester, trimethylolpropane tris((indenyl) propylene methoxypropyl) ether, trisyl ethane trimethacrylate, hexanediol dimercapto acrylate, 1,4 -% hexane Alcohol dimethacrylate, tetraethylene glycol dimercapto acrylate, neopentyl alcohol dimethacrylate, neopentyl alcohol trimethacrylate, neopentyl alcohol tetradecyl acrylate, dioxane Tetracohol dimercapto acrylate, dipentaerythritol penta methacrylate, dipentaerythritol hexamethacrylic acid brewing, sorbitol triacrylate, sorbitol tetramethacrylic acid vinegar, sorbitol penta methacrylic acid Ester, sorbitol hexamethylene acrylate, tris((meth) propylene methoxyethyl Iso-polycyanate, polyester methacrylate oligomer, EO-modified tridecyl acrylate, bis-A dimethacrylate, bisphenol a dimethacrylate EO Plastid, trihydroxymercaptopropane trimethacrylate, trishydroxypropyl propane bis((indenyl) propylene methoxypropyl) ether, trimethylolethane trimethyl propyl acid i, four Ethylene glycol dimercapto acrylate, neopentyl alcohol diacrylic acid, acid ester, ester E 〇 is preferably pentaerythritol tridecyl acrylate, neopentyl alcohol tetradecyl propylene dipentaerythritol Authors such as tetramethacrylate, neopentyl alcohol tetrapropyl benzoate, dipentaerythritol hexaacrylate E 0 modified body. In the case of itaconate, there are ethylene glycol diconic acid, glycerol-iconic acid day, neconate, 1,3-butanediol diconconate, 1,4-butane Alcohol _ ester, butanediol diconcanate, neopentyl alcohol diconcon 201222143 tetraconate ester and the like. ▲ Butanediol dicropped in terms of t crotonate, there are ethylene glycol dicrotonate, crotonate, etc., esters, pentaerythritol dicrotonate, sorbitol tetra (diester, In the case of pentaerythritol-isomethacrylate, there are ethylene glycol diisocrotonate, maleic acid, isosorbide, sorbitol tetraisocrotonate, etc. 'Ethylene glycol dimaleate, triethylene glycol, etc.. Tetrakiol dimaleate, sorbitol tetramaleate, for other esters, No. 5 1 - 47334, 'eight', For example, it is also possible to use, as appropriate, an aliphatic alcohol described in Japanese Patent Publications, Japanese Laid-Open Patent Publication No. SHO 57-196-23A, or Japanese Laid-Open Patent Publication No. 59-5240. In the bulletin of the Japanese Unexamined-Japanese-Patent No. 2, 226 149 κ, the aromatic skeleton, etc. A specific example of a monomer of a polyamine compound and a decylamine of an unsaturated carboxylic acid, and s 'methylenebisbisacrylamide, methylene bismethyl propylene Amine, methylene bis propylene amide, 1,6-hexamethylene dimethyl propylene amine, diethylene triamine propylene amide, benzodimethyl propylene amide, benzodimethyl bis Methyl acrylamide and the like. Examples of other preferred amide-based monomers include those having a cyclohexylene structure as described in JP-A-54-2 1726. Further, the use of isocyanate and In the case of the addition of a hydroxy group, the addition of a polymerizable compound to the hydroxy group of the hydroxy group is also suitable. For the specific example, for example, it is described in Japanese Patent Publication No. Sho 48_4 1708. Addition of a polyisocyanate compound having an isocyanate group to a vinylamine having two or more polymerizable vinyl groups in one molecule of a vinyl group-42-201222143 having a hydroxyl group represented by the following formula (ν) Carbamate compound, etc. Formula (V) CH2=C(R4)COOCH2CH(R5)OH (V) (wherein R4 and R5 each independently represent hydrazine or CH3) Also suitable for use in Japan ZHAO 5 1 -37 1 Bulletin No. 93, 曰本特公平2-32-293, 曰本特公平2- 1 6765 The urethane acrylates described in the publication, Japanese Patent Publication No. 5 8-49860, Japanese Patent Publication No. Sho 56-117654, Japanese Patent Publication No. Sho 62-3 9417, and Japanese Patent Publication No. 62- An amino phthalate compound having an ethylene oxide-based skeleton, which is described in Japanese Patent Application Laid-Open No. Hei. No. Hei. No. Hei. No. 63-277653, An addition polymerizable compound having an amine group structure or a thioether structure in the molecule described in Japanese Patent Publication No. Hei 1-105238, a photopolymerizable composition having a very excellent photospeed can be obtained. Other examples include polyester acrylates described in each of the publications of Japanese Patent Publication No. Sho-48-641-83, Japanese Patent Publication No. SHO-49-43-119, and Japanese Patent Publication No. Sho 52-30490. A polyfunctional acrylate or mercapto acrylate such as an epoxy acrylate obtained by reacting an epoxy resin with methacrylic acid. In addition, the specific unsaturated compound described in Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. The vinyl phosphonic acid-based compound described above. Further, a structure containing a perfluoroalkyl group described in JP-A-61-22048 may be suitably used. Further, in the case of a commercially available product, an amino phthalate oligomer UAS-10, UAB-140 (manufactured by Nippon Paper Industries Co., Ltd.) is preferred. , DPHA (manufactured by Nippon Kayaku Co., Ltd.), UA-30 6H, UA-3 06T, UA-306I, AH-600, T-600, AI-600 (Kyoeisha Chemical Co., Ltd.) Industrial (Kyoei Chemical Co., Ltd.)). Further, photocurable monomers and oligomers described in Journal of the Adhesion Society of Japan vol. 20, No. 7, 300-308 (1 984) can also be used. In a preferred embodiment of the (C) polymerizable compound in the colored photosensitive resin composition of the present invention, a compound containing 5 or more and 15 or less polymerizable groups in the molecule is used, and one or more molecules are contained in the molecule. A mixture of the following polymeric groups of compounds. The compound containing five or more polymerizable groups in the molecule and one or more polymerizable groups having four or less in the molecule are preferably the following compounds. Examples of the compound containing 5 or more and 15 or less polymerizable groups in the molecule include dipentaerythritol pentamethyl acrylate, dipentaerythritol hexamethacrylate, and sorbitol Acrylate, sorbitol hexamethacrylate and U-6HA, U-15HA, UA-32P, ϋΑ-7200 (above, Shin-Nakamura Chemical Co., Ltd. (Shin_Nakamura)

Chemical Co., Ltd.), TO-2248, 2349, 1382 (above, manufactured by Toagosei Co., Ltd.) and the like. Further, examples thereof include neopentyl glycol oligomeric methacrylate, 1,4-butanediol oligomeric methacrylic acid S, 1,6-hexanediol mercapto acrylate, and tris-propyl propyl acrylate. Oligomeric methacrylate, neopentyl alcohol condensed methacrylate, amino phthalic acid-44 - 201222143 ester methacrylate and epoxy methacrylate, etc., more than 5 in the molecule 1 5 The following (fluorenyl) propylene fluorenyl compound, in the case of the oligomer, is preferably in the range of 1 000 Å in terms of molecular weight. Examples of the polymerizable composition containing one or more and four or less polymerizable groups in the molecule include trihydroxymercaptopropane tridecyl acrylate and mercaptopropene PO (propylene oxide group) modified tridecyl acrylate. , triethyl propane EO (ethylene oxide) modified tridecyl acrylate, neopentyl tetramethacrylate, neopentyl alcohol trimethacrylate, tetrahydroxy decane tetradecyl acrylate, neopenta tetra Alcohol tetramethacrylate, di(methylpropane) tetramethacrylate, ethoxylated pentaerythritol tetracarboxylic acid vinegar, and the like. When a compound containing 5 or more and 15 or less polymerizations in a molecule and a compound containing 1 or more and 4 or less polymerizations in a molecule are used, a compound having 5 or more and 15 or less poly groups in the molecule is used. a ratio of a compound having one or more polymer groups of four or less in the molecule (that is, a compound containing five or more polymerizable groups in the molecule: one or more polymerizable groups in the molecule) The compound of the base is preferably in the range of 60:40 to 5, more preferably 70:30 to 90:10 in terms of mass. In the total solid content in the colored photosensitive resin composition layer of the present invention, the total content of the (C) polymerizable compound is preferably from 1 to 50% by mass, more preferably from 15 to 40% by mass, more preferably from 15% by mass to 40% by mass. A good one is 15% by mass to 30% by mass. (C) The content of the polymerizable compound is in the above range, and is contained in a trihydroxy hydroxymethanol tetrakis(3-hydroxypropyl) group having a reactivity of, for example, 5,000. Step-more -45- 201222143 The heat resistance of the cured film becomes good, the occurrence of the coating film is suppressed, the wrinkle after the formation of the film or the post-baking is pressed, and the surface roughness is too gland. Thousand slippery hardened film. In the coloring and sensitizing tree of the present invention, m(c), and (c) polymerized sputum and (D) photopolymerization are described as "丨" It is preferable that the polymerizable compound is "〇" in the "(D) photopolymerization start", and 以下 以下 以下 以下 以下 以下 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳 较佳By making the beans within the above range, the pattern forming property A U ^ straw field/, the round system is good, and the adhesion to the substrate is excellent. In addition, the exposure and development of the device # ‧ ρ1 no π hood is large enough to suppress the pattern peeling. &lt; (D) The photopolymerization initiator represented by the formula (III) The photopolymerization resin composition of the present invention contains a photopolymerization initiator represented by the following formula (III) (hereinafter referred to as appropriately At least i of the (D) specific initiators, the coloring after baking for the colored pattern formed by the same day containing the (D) specific initiator, which is hardened under high sensitivity, is suppressed.

In the formula (III), 'X1, X2 and X3 each independently represent a hydrogen atom, a halogen atom or an alkyl group', and R1 represents -R, -OR, -COR, -SR, -CONRR, -46-201222143 or CN R and R3 each independently represents R 〇R, _c〇R or NRR . And R, each independently represents an alkyl group, an aryl group, an aryl group or a heterocyclic group, and these groups may be substituted with one or more selected from the group consisting of a dentate atom and a hetero group, and constitute the alkane. One or more of the ruthenium atoms of the alkyl group and the alkyl chain of the aralkyl group may be replaced by an unsaturated bond or an ether bond, and R and R' may be bonded to each other to form a ring. In the above formula (m), χ1, X2 and X3 represent a dentinogen and a ruthenium atom, and g, and examples thereof include fluorine, gas, bromine, and iodine, and in the case of an alkyl group in the case where X 2 Ji Y ^ represents a burnt group. Examples thereof include methylpropyl group, isopropyl group, butyl group, isobutyl group, second butyl group, I group, pentyl group, isopentyl group, third pentyl group, hexyl group, heptyl group, and octyl group. 2~Ethylhexyl, tert-octyl, decyl, isodecyl, decylhexyl, vinyl, allyl, butenyl, ethynyl, propynyloxyethyl, ethyl ethyl , propoxyethyl, methoxyethylethoxyethoxyethyl, propoxyethoxyethyl, fluorenyl, monofluoromethyl, difluoromethyl, trioxymethyl, triple defeat Ethyl-B-, 2-(benzoxazole-2,yl)vinyl, and the like. Preferably, X8, X2 and X3 each represent a hydrogen atom or a hydrazine 1 alkyl hydrazine and X3 each represent a hydrogen atom. In the above formula (III), the alkyl group represented by the ruler and R may, for example, be a 7-glycolyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutylene group or a t-butyl group. , pentyl, isopentyl, third amyl, hexyl, octyl, isooctyl, 2-ethylhexyl, trioctyl, decyl, isodecyl, vinyl, ally X1, group, third group, group, group of the ester, butenyl group, tert-propargyl group, methoxyethyl group, ethoxyethyl group, propoxyethyl group SR, or an alkyl group ,oxyoxy, fully represented, benzyl, benzyl, ethyl, -47- 201222143 methoxyethoxyethyl, ethoxyethoxyethyl, propoxyethoxyethyl , methoxypropyl, monofluorodecyl, difluorodecyl, trifluoromethyl, trifluoroethyl, perfluoroethyl, 2-(benzoxazole-2'-yl)vinyl, and the like. Examples of the aryl group represented by R and R ' include a phenyl group, a phenylphenyl group, a xylyl group, an ethylphenyl group, a gas phenyl group, a naphthyl group, an anthracenyl group, a phenanthryl group and the like. Examples of the aralkyl group represented by R and R' include a benzyl group, a gas benzyl group, an α-mercaptobenzyl group, an α,α-dimercaptobenzyl group, a phenylethyl group, and a phenylvinyl group. Wait. The heterocyclic group represented by R and R' may, for example, be a pyridyl group or a dense one. Stationary, α-furanyl, thiophenyl, and the like. Further, as for the ring formed by bonding R and R' to each other, for example, a sigma ring, a ruthenium ring or the like can be listed. In the case of R2 and R3 which are composed of the above R and R', the fluorenyl group, the hexyl group, the cyclohexyl group, the -S-Ph, the -S-Ph-Cl or the -S-Ph-Br are each independently excellent. state. In the specific polymerization initiator (D), among the above formula (III), X1, X2 and X3 are each a hydrogen atom; R1 is an alkyl group, especially a fluorenyl group; and R2 is an alkyl group, especially Methyl; R3 is an alkyl group, especially an ethyl group, and is particularly suitable as a photopolymerization initiator. For the preferred specific examples of the specific polymerization initiator represented by the above formula (111), the compounds A to F exemplified below are exemplified. However, the present invention is not limited by the following compounds. -48- 201222143

.0

ο

Compound Β -49- 201222143 Ο

Ό

Ν Ν

XX

Compound C

〇

Compound D -50- 201222143 Ο

Rr〇 Ν

OCH3 compound E Ο r Ν

-51 - 201222143 The specific polymerization initiator represented by the above formula (III) can be synthesized, for example, by the method described in JP-A-2005-220097. The compound represented by the formula (111) used in the present invention has an absorption wavelength in a wavelength region of from 250 nm to 5 Å. More preferably, it has an absorption wavelength in a wavelength region of 30 Å to 380 nm. Particularly preferred are those having a high absorbance at 308 nm and 3 55 nm. The content of the (D) special polymerization initiator used in the present month is required to be in a range of from 5% by mass to 15% by mass based on the total solid content of the colored photosensitive resin composition. If the content is less than 5% by mass, the sensitivity will become insufficient. If the content exceeds 15% by mass, the drug will be used. ρ ί丨 will be insufficient, and the shape of the cone will become a reverse taper, which is not good. The content is preferably in the range of 5% by mass or more and 15% by mass or less, and more preferably in the range of 10% by mass or more and 15% by mass or less. In the coloring photosensitive resin composition of the present invention, in addition to the above (D) special polymerization initiator, other photopolymerizations having different structures of the γt-containing initiator may be used as long as the scope of the present invention is not impaired. Starting agent (hereinafter referred to as (D-2) other photopolymerization initiator). In the case of (D-2) other photopolymerization initiator different from the structure of (D) the specific polymerization initiator, 'as long as it is a compound which starts and promotes polymerization of the above (C) polymerizable compound, it can be used without limitation Previously known. Specifically, the two photopolymerization initiators, the two photopolymerization initiators, the organic halides, and the Zhuo Erkou People's Team, which are different from the above-mentioned i甬4 f 11 T, Xixiang, and ''σ structures, are listed. Sigma, carbonyl compound, ketal compound, benzoin compound, σ丫口定J 焱人焱σ, organic peroxide, azo compound, coumarin-52- 201222143 compound, azide compound, metal aromatic a compound, an organic arsenic compound, a dibasic acid compound, a rust salt compound, a mercaptophosphine (oxide) compound, or the like. As the olefin-based photopolymerization initiator which is (D-2) another photopolymerization initiator, for example, a hexaaryl group can be cited. Sit on the compound. Examples of the hexaarylbiimidazole-based compound include 2,2'-bis(2-phenylphenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-double. (2-Phenylphenyl)-4,4',5,5'-indole (4-ethoxycarbonylphenyl)biimidazole, 2,2'-.bis(2-phenylphenyl)-4,4 ',5,5'-肆(4-phenoxycarbonylphenyl)biimidazole, 2,2'-bis(2,4-diphenyl)-4,4',5,5'-oxime ( 4-ethoxycarbonylphenyl)biimidazole, 2,2'-bis(2,4-diphenyl)-4,4',5,5'-indole (4-phenoxycarbonylphenyl) Biimidazole, 2,2'-bis(2,4,6-triphenyl)-4,4',5,5'-indole (4-ethoxycarbonylphenyl)biimidazole, 2,2' - bis(2,4,6-trisphenyl)-4,4',5,5'-indole (4-phenoxycarbonylphenyl)biimidazole, 2,2'-bis(2-cyano) Phenyl)-4,4',5.5'-indole (4-ethoxycarbonylphenyl)biimidazole, 2,2'-bis(2-cyanophenyl)-4,4',5,5' -肆(4-phenoxycarbonylphenyl)biimidazole, 2,2'-bis(2-mercaptophenyl)-4,4',5,5'-fluorene (4-decyloxycarbonylphenyl) Biimidazole, 2,2'-bis(2-mercaptophenyl)-4,4',5,5 '-肆(4-ethoxycarbonylphenyl)biimidazole, 2,2'-bis(2-methylphenyl)-4,4',5,5'-indole (4-phenoxycarbonylbenzene) Bismuthimide, 2,2'-bis(2-ethylphenyl)-4,4',5,5'-indole (4-indolyloxycarbonylphenyl)biimidazole, 2,2'-double (2-ethylphenyl)-4,4',5,5'-indole (4-ethoxycarbonylphenyl)biimidazole, 2,2'-bis(2-ethylphenyl)-4, 4',5,5'-indole (4-phenoxycarbonylphenyl)biimidazole, 2,2'-bis(2-phenylphenyl)-4,4',5,5'-fluorene (4 -nonyloxycarbonylphenyl)biimidazole, 2,2'-bis(2-phenylphenyl)-4,4',5,5'-indole (4-ethoxycarbonylphenyl)-linked- 53- 201222143 Oxazole, 2,2'-bis(2-phenylphenyl)_4,4,,5,5'-肆(4-phenoxycarbonylphenyl)biimidazole, 2,2'-double ( 2-Phenylphenyl)_4,4,,5,5 '_tetra-(4.methoxyphenyl)biimidazole, 2,2'-bis(2-phenylphenyl)_4,4,,5, 5,-tetra-(3-methoxyphenyl)biimidazole, 2,2'-bis(2-phenylphenyl)_4,4,5,5,_tetra_(3,4-dimethoxy Phenyl)biimidazole, 2,2-bis(2,4-diphenyl)-4,4', 5,5'-tetraphenyl-linked taste 1&gt; Sit, 2,2-bis(2,4,6-diphenyl)-4,4',5,5'-tetraphenyl linkage. Sodium, 2,2,-bis(2,4-dibromophenyl)-4,4 ',5,5 '-tetraphenylbiimidazole, 2,2,-bis(2,4,6-tribromo Phenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2,-bis(2,4-dicyanophenyl)-4,4',5,5,-tetraphenyl Base imidazole, 2,2'-bis(2,4,6-tricyanophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2,-bis (2,4 -didecylphenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,4,6-tridecylphenyl)-4,4',5 , 5'-tetraphenylbiimidazole, 2,2,_bis(2,4-diethylphenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-double (2,4,6-triethylphenyl)-4,4',5,5'-tetraphenylimidazole, 2,2,_bis(2,4-diphenylphenyl)-4, 4',5,5'-tetraphenylbiimidazole, 2,2,_bis(2,4,6-triphenylphenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-fluorophenyl)-4,4',5,5'-tetraphenylbiimidazole and the like. Among the above, as the compound of Tejia, 2,2'-bis(2-(phenyl)-4,4',5,5'-tetraphenylbiimidazole (for example, HODOGAYA CHEMICAL industry) is mentioned. (Hodogaya Chemical Co., Ltd.): B-CIM), 2,2'-bis(o-phenyl)-4,4',5,5,-tetra-(3,4-didecyloxy Phenyl) is a mixture of (i.e., manufactured by Siber Hegner (DKSH Holding Ltd.): HABI1311), 2,2'-bis(2-methylphenyl)-4,4,5,5'·tetraphenyl -54 - 201222143 Biimidazole (for example, Kurogane Kasei cq, for example (j-2), other examples of other photopolymerization initiators, can also be listed as an amine-based acetophenone-based initiator. A specific example of the aminoacetophenone-based initiator is a compound having a structure represented by the following formula, wherein R1 is represented by a hydrogen atom methyl group or an ethyl group. The amino acetophenone-based starter of other first polymerization initiators may also be commercially available, and examples thereof include IRGACURE (Irg) 369 and IRGACURE (Irg) 379 (both c^·

Specialty · Chemicals Co., Ltd. (Ciba has a κ κ system). ·

N

-〇Η O3 O C2H5 CH3 Further, it is an organic compound, an oxadiazole compound, a carbonyl compound, a ketal compound, a benzoin compound, an acridine compound 'organic peroxide, an azo compound, a coumarin compound, a stack Specific examples of the nitrogen compound, the metal aromatic compound, the organoboric acid compound, the disulfonic acid compound, the phosphonium salt compound, and the mercaptophosphine (oxide) compound include Wakabayashi et al., "Bull Chem s〇c Japan". 42 2924 (1969), U.S. Patent No. 3,9,5,815, Japanese Patent Publication No. Sho 46-4605, Japanese Patent Laid-Open No. 48_3628 i, and Sakamoto-55-201222143 JP-A-55-32070 Japanese Laid-Open Patent Publication No. Sho 60-239736, Japanese Laid-Open Patent Publication No. SHO 61-161, No. 6 1 -1 6 9 8 3 5, Japanese Patent Laid-Open No. 6 1 -1 6 9 8 3 7 - 5 8 2 4, Japanese Unexamined Patent Publication No. Hei. No. Hei. No. 62-212401, Japanese Patent Laid-Open Publication No. SHO-63-70243, No. 63-298339, No. 63-298339, 5th Bulletin, MP Hutt "Journal of Heterocyclic Chemistry" 1 (No3), (l 970)", 曰本特公平6- 2 9285 , U.S. Patent No. 3,479,1,85, U.S. Patent No. 4,311,783, U.S. Patent No. 4,622,286, and the like, Japanese Patent Application Laid-Open No. Sho 62-143044, and Japanese Patent Laid-Open No. 62-150242曰本特开平 9-1 8 8 6 8 5, 曰本特开平 9-188686, Japanese Patent Laid-Open No. 9-188710, 曰本特开 2000-1 3 1837, Japan Special Bulletin No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, and Kunz, Martin "Rad

Tech 5 9 8.Proceeding April 1 9-22,1 998,Chicago", etc., organic borate, Japanese Patent Laid-Open No. Hei 6-1 57623, Japanese Patent Laid-Open No. Hei 6-175 5 64, Japanese Patent Laid-Open No. 6- Japanese Patent Laid-Open No. Hei 6- 1 75554, Japanese Patent Laid-Open No. Hei 6- 1755553, Japanese Laid-Open Patent Publication No. Hei 9- 1 8 8 7 1 0, and Japanese Patent Laid-Open No. 6 - 3 4 8 0 1 Japanese Patent Laid-Open No. Hei 7-128785, Japanese Patent Laid-Open No. Hei 7-140589, Japanese Patent Laid-Open No. Hei 7-306527, Japanese Patent Laid-Open No. Hei 7-292014, and J. Perkin 11 (1979) 1 653 -1 660), JCS . Perkin 11 (1 979) 1 5 6- 1 62,

Journal of Photopolymer Science and

Technology (1 995) 202-232, JP-A-2000-66385 -56-201222143 Eight Japanese special W-face No. 8 bulletin, Japanese special watch 2 team 534797 ~ Otsuka and other photopolymerization initiators as specific example. In the present invention, 'the content of the component of the specific polymerization initiator (D) is used in combination with (the content of the other photopolymerization initiator is less than or equal to the content of the photopolymerization initiator. Further, for the coloring photosensitive resin, [^ The total amount of the total amount of the polymerization initiator is preferably in the range of preferably from 5% by mass to 20% by mass, and in the range of from two to 15% by mass, preferably further. It is a range of 6 to 15% by mass of ι〇. When using a compound which does not absorb at the exposure wavelength as (D), it is preferably used as a photopolymerization initiator. A compound having a compound as described later is used as a sensitizer. A preferred embodiment of the sensitizing resin composition: (8) has a resin having a structural unit (4) in the molecule. The resin of the structural unit of the acidic group, and the total solid L: the... photopolymerization initiator as (9) specific polymerization initiation &lt; (E) solvent &gt; (H 1 color photosensitive resin composition) It contains (8) solvent and can be prepared by using the agent. In addition, it is prepared by (E)> cereal agent. In other words, it can be distinguished from #正·r, such as ethyl acetate, cerium acetate, isobutyl vinegar, acetic acid, acetic acid, isophthalic acid, iso-57-201222143, butyrate Ester, isopropyl butyrate, ethyl butyrate, alkyl esters, decyl lactate, ethyl lactate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, decyloxy methoxy 3 - oxypropionic acid such as butyl acetate, ethoxyacetic acid decyl ester, ethoxy 3 - oxypropionic acid methyl ester, 3-oxypropionic acid ethyl ester, etc., such as methyl 3-methoxyoxypropionate, 3 - 2-oxopropionate alkyl such as ethyl methoxypropionate, methyl acid or ethyl 3-ethoxypropionate, ethyl 2-oxopropionate or propyl 2-oxopropionate Ester methoxy methoxypropionate, ethyl 2-methoxypropionate, 2-nonyl ester, decyl 2-ethoxypropionate, ethyl 2-ethoxypropionate methyl decanoate, Ethyl 2-oxo-2-mercaptopropionate, methyl 2/ propyl propionate, ethyl 2-ethoxy-2-mercaptopropionate, etc.) ester, ethyl pyruvate, propyl pyruvate, Ethyl phthalate ethyl citrate, 2-oxo-oxybutanoic acid decyl ester, 2-sided oxybutane acid butanediol diacetate, etc.; For example, diethylene glycol didecyl ether, diethylene glycol tetrahydrofuran, ethylene glycol monodecyl ether, ethylene glycol monoethyl alcohol monodecyl ether, diethylene glycol monoethyl ether, diethylene glycol propylene glycol Methyl ether, propylene glycol mono-n-propyl ether, propylene glycol monotripropylene glycol mono-n-butyl ether, propylene glycol phenyl ether, ethoxyethyl acetate, ethyl acetate ethyl acetate, propylene glycol ethyl Ether acetate, propylene glycol ester, diethylene glycol monoethyl ether acetate, diethylene glycol monoester, propylene glycol n-propyl ether acetate, propylene glycol diacetate n-butyl ether acetate, propylene glycol phenyl Ether acetate, butyl butyrate, benzyl, ethyl oxyacetate, ethyl acetate and a complete ester (Example 3 - ethoxypropyl, 2-oxopropene (eg 2-oxypropionic acid) Propylene, 2-oxy-2-foxy-2-methyl, propyl S decanoate, ethyl acetoacetate, 1,3-diethyl ether, ether, diethyldibutyl ether, positive Butyl ether, propylene glycol methyl propyl acetate butyl ether acetate, propylene glycol propylene glycol monomethyl-58- 201222143 ether ether acetate, dipropylene glycol n-propyl ether acetate, two Glycol n-butyl ether acetate, tripropylene glycol decyl ether acetate, etc.; alkoxyalkyl acetates such as 3-methoxybutyl acetate, 4-methoxybutyl acetate, acetic acid -2-indolyl-3-decyloxybutyl ester, 3-methyl-3-decyloxybutyl acetate, 3-mercapto-3-methoxybutyl acetate, 2-ethoxyacetic acid Butyl ester, acetic acid-4-ethoxybutyl ester, acetic acid-2-decyloxypentyl acetate, -3-pentyloxypentyl acetate, 4-methoxypentyl acetate, 2-mercaptoacetate -3-decyloxypentyl ester, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, etc.; ketones such as acetone, mercaptoethyl Ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc.; alcohols such as ethanol, isopropanol, etc.; aromatic hydrocarbons such as toluene, diphenylbenzene, and the like. Among these, it is suitable as 3-ethoxymethyl propionate, 3-ethoxyethyl propionate, ethyl ethoxyethyl acetate, ethyl lactate, diethylene glycol didecyl ether, Butyl acetate, 3-methoxydecyl propionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, propylene glycol fluorenyl Ether acetate, propylene glycol ethyl ether acetate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, and the like. (E) The solvent may be used alone or in combination of two or more. The colored photosensitive resin composition of the present invention may further contain other components such as (F) a sensitizer, a surfactant, and a thermosetting resin. &lt; (F) Sensitizer> In the colored photosensitive resin composition of the present invention, it is preferred to use -59 to 201222143 to absorb the exposure wavelength, and to increase the initial rate of the initiator. The sensitizer enhances the exposure of the wavelength of the sensitizer that can be absorbed by the sensitizer, and promotes (^&gt;) the light from the ingestion. The radical generating reaction of the agent component or the polymerization reaction of the polymerized human ruthenium complex caused thereby. Such an increase of 4 drags; ‘, 、、&amp;' can be exemplified by known spectroscopic sensitizing dyes or dyes or dyes or pigments that absorb light and interact with blood. For the sensitizer used in the 3rd month of the road, the preferred sensitizing dye or dye can be listed as more than #, 夕夕核方香私类 (such as 芘, 茈, 三三伸苯), Dibenzopyrans (eg, fluorescein, eosin, erythromycin, rhodamine beta, rhodamine, rhodopsin, cyanine) , oxycarbophthalocyanines) 'anthocyanins (such as procyanidins, carbon anthocyanins), thioxides (such as thiophene, methylene hydrazine I ue 'aniline aniline Blue), acridines (for example) Acridine orange, chlorsulfurin, acridine flavin, naphthoquinone (such as naphthoquinone, metal naphthoquinone), porphyrins (such as tetraphenylporphyrin, central metal substituted porphyrin), chlorophyll (eg, chlorophyll, chlorophyll, central metal instead of chlorophyll), metal complex, steroid, (eg, hydrazine), squaraine (eg, squaraine), and the following amine compounds, etc. Suitable for sensitizers Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, and tetradecylaminobenzoate. , 4-didecylaminobenzoic acid ethyl, 4 dimethylaminobenzoic acid isopentyl, benzoic acid 2-didecylaminoethyl, 4-dimethylaminobenzoic acid 2- Ethylhexyl, n,N-dimethyl-p-anilide, 4,4,-bis(dimethylamino)diphenyl ketone (commonly known as mazakirone), 4,4, bis(diethylamine) Diphenyl ketone, 4,4,-bis(ethylmethylamino)diphenyl ketone, etc., of which -60-201222143 is preferably 4,4', bis(diethylamino)diphenyl Further, as another example of the sensitizing agent, a thiol compound is preferable. The thiol compound has a sensitivity to increase the sensitivity of the photopolymerization initiator to the active radiation or suppress the polymerization due to oxygen. The role of the polymerization barrier of the compound, etc. In the case of the sterol compound, ethylene glycol dithiopropionic acid is brewed ( ) butyl alcohol dithiopropionic acid S (BDTP), triterpenoid thiophene sulphide多 § 文 g g ( TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM TM Sulfhydryl and imidazole, 2_mercapto_4(3H)_quin Monofunctional thiol compound such as porphyrin, p-decylnaphthalene, &amp; phenyl-mercaptobenzimidazole. k From the viewpoint of time-dependent stability and solubility in a solvent, a monofunctional thiol compound is particularly preferred. The content I of the sensitizer among the colored photosensitive resin compositions of the present invention can be appropriately selected depending on the purpose, but the sensitivity is improved by the spectral sensitization or the hardening speed is increased by the balance between the growth rate of the δ and the chain transfer. From the viewpoint of the above, it is preferably in the range of 0.5 to 5% by mass, more preferably 0 to 5% by mass, based on the total solids of the photosensitive resin composition. &lt;Other Additives&gt; The colored photosensitive resin composition of the present invention may be optionally used in addition to the component (4) to the component (E) and the component (f) which are preferred components. There are other additives. The following describes the four additives. (Surfactant) -61 - 201222143 The colored photosensitive resin composition of the present invention may contain interfacial activity. If the pigment concentration is increased, the thixotropy of the coating liquid is usually increased, so that it is coated on the substrate or When the coloring photosensitive resin composition layer (coloring layer coating film) is formed by the transfer coloring photosensitive tree composition, the film thickness unevenness is likely to occur. In particular, in the formation of the colored photosensitive resin composition layer (colored layer coating film) by the slit coating method, it is important to coat the coating liquid for forming the colored photosensitive resin composition layer to dryness. The coating film having the thickness of the hook is formed. For this reason, it is preferable to contain a suitable surfactant in the above-mentioned coloring photosensitive resin composition, and the above-mentioned surfactant is exemplified by JP-A-2003-337424 and JP-A-336A. The surfactants disclosed in the above are suitable. A nonionic surfactant, a fluorine-based surfactant, a ruthenium surfactant, or the like may be added as a surfactant for improving coatability. ☆ In terms of a nonionic surfactant, for example, polyoxyethylene:polyoxypropylene glycols, polyoxyethylene alkyl ethers, polyoxyethylene oxides: base group, polyoxyethylene alkyl group are preferred. Non-ionic systems such as fermented, polyoxypropylene alkyl, two propylene alkyl aryl ethers, polyoxypropylene alkyl esters, sorbitan bases, single, oil-fired bases, etc. Surfactant. Hydrocarbyl Si: Polyoxyalkylene polyoxyethylene oil such as poly(ethylene glycol), polyoxypropylene glycol, etc.: oxypropylene stearyl ether, polyoxyalkylene alkyl ethers; polyoxygen Ethylene bismuth% oxygen 6-material styrylation _, polyoxyethylene three-section basic earth, polyoxyethylene-propylene polystyrene ether, polyoxyethylene fluorenyl-62- 201222143 polyoxyethylene such as phenyl ether Aryl ethers; polyoxyalkylene dialkyl esters such as polyoxyethylene dilaurate, polyoxyethylene distearate, sorbitan fatty acid esters, polyoxyalkylene sorbitan fatty acid esters A nonionic surfactant such as a class. Specific examples of such are ADEKA PLURONIC series, ADEKANOL series, TETRONIC series (above, ADEKA), EMULGEN series, RHEODOL series (above, Kao Corporation), ELEMINOR series, NONIPOL series , OCTAPOL series, DODECAPOL series, NEWPOL series (above, manufactured by Sanyo Chemical Industries Ltd.), PIONIN series (made by Takemoto Oil &amp; Fat Co., Ltd.), NISSAN NONION series (manufactured by NOF Corporation). Such commercially available persons can be suitably used. The preferred HLB (Hydrophile-Lipophile Balance) is 8 to 20, more preferably 10 to 17. As the fluorine-based surfactant, a compound having a fluoroalkyl group or a fluorine-extended alkyl group at at least any of a terminal, a main chain and a side chain can be suitably used.

For specific commercial products, for example, MEGAFACE F142D, MEGAFACE F172, MEGAFACE F173, MEGAFACE F176, MEGAFACE F177, MEGAFACE F183, MEGAFACE F780, MEGAFACE F78, MEGAFACE F782, MEGAFACE F784, MEGAFACE F552, MEGAFACE F554, MEGAFACE R30, MEGAFACE R08 (above, DIC (DIS) system), FLUORAD FC-135, FLUORAD FC-170C, FLUORAD • 63- 201222143 FC-430, FLUORAD FC-431 (above, Sumitomo 3M (share) (Sumitomo 3M Limited) )), SURFLON S-112, SURFLON S-113, SURFLON S-131, SURFLON S-141, SURFLON S-145, SURFLON S-382 &gt; SURFLON SC-101 'SURFLON SC-102 ' SURFLON SC-103 , SURFLON SC-104, SURFLON SC-105, SURFLON SC-1 06 (above, manufactured by Asahi Glass Co., Ltd.), EFTOP EF351, EFTOP 352, EFTOP 801, EFTOP 802 (above, JEMCO ( Stock system) and so on. Examples of the lanthanide surfactant include TORAY SILICONE DC3PA, TORAY SILICONE DC7PA, TORAY SILICONE SH11PA, TORAY SILICONE SH21PA, TORAY SILICONE SH28PA, TORAY SILICONE SH29PA, TORAY SILICONE SH30PA, TORAY SILICONE SH-190, TORAY SILICONE SH- 193, TORAY SILICONE SZ-6032, TORAY SILICONE SF-8428, TORAY SILICONE DC-57, TORAY SILICONE DC-190 (above, Toray · Dow Corning Silicone Co., Ltd.) , TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4452 (above, manufactured by Momentive Performance Materials Inc.). Among these, among the preferred surfactants of the present invention, there are MEGAFACE F780, MEGAFACE F781, MEGAFACE F782, MEGAFACE F784, MEGAFACE F552 and MEGAFACE F554 (above, DIC). With respect to 100 parts by mass of the coloring photosensitive resin composition, such a boundary - 64 - 201222143 surface: the amount of the biocide, preferably 5 parts by mass or less, more preferably 2 galleries or less. It is better to use 〇.5 parts by mass or less. When the amount of the boundary agent is more than 5 f, it is easy to apply when drying: streaking or surface cracking, and the smoothness is likely to be deteriorated. (thermosetting resin) The color-sensitive photosensitive resin composition of the present invention contains a thermosetting resin such as an epoxy resin or an oxetane resin as may be expected. Examples of the epoxy resin include a bisphenol A type compound, a cresol novolac type compound, a biphenyl type compound, and an alicyclic epoxy compound.

For example, in the case of bisphenol A type compounds, in addition to EPOTOHTO (EPOTOHTO) YD-1 15 ' YD-118T ' YD-127 ' YD-128 ' YD-134, YD-8125, YD-7011R, ZX-1059, YDF- 8170, YDF-170, etc. (above 'Tosho Kasei Co. Ltd.)), DENACOL EX-1 1 (H, EX-1 102, EX-1 103, etc. (above, manufactured by Nagase ChemteX Corporation) In addition to PLACEL GL-61, GL-62, G101, and G102 (above, manufactured by Daicel Chemical Industries Ltd.), similar bisphenol f-type compounds and bisphenol S-type compounds may be mentioned. Epoxy acrylates such as Ebecryl 3700, 370, 600 (above, manufactured by Daicel UCB) can also be used. Examples of the phenolic novolac type compound include EPOTOHTO YDPN-63 8 and YDPN-7 (H). , YDPN-702, YDPN-703, YDPN-704, etc. (above, Dongdu Chemical Co., Ltd.), DENACOLEM-125, etc. (above, Nagase Chemical System), for the biphenyl type compound, 3, 5, 3', 5'-tetramethyl-4,4' diepoxypropylbiphenyl, and the like.

Examples of the alicyclic epoxy compound include CELLOXIDE • 65-201222143 2021, 208 1, 2083, 2085, EPOLEAD GT-301, GT-302, GT-401 'GT-403, EHPE-3 150 (above, Daicel Chemical (manufactured by Daicel Chemical Industries Ltd.), SANTOHTO ST-3000, ST-4000, ST-508 0, ST-5100, etc. (above, manufactured by Tohto Kasei Co., Ltd.). Further, EPOTOHTO YH-434, YH-43 4L, which is an amine type epoxy resin, and a glycidyl ester obtained by dimerizing the skeleton of the bisphenol A type epoxy resin may be used. Among these epoxy resins, 'poxy varnish type epoxides and alicyclic epoxy compounds are preferable, and those having an epoxy group equivalent of from 18 to 250 are particularly preferred. Examples of such materials include EPICL〇N N_66〇, N-670, N-680, N-690, YDCN-704L (above, DIC) and EHPE 3150 (made by Daicel Chemical). As the oxetane resin, ARON ΟΧΕΤΑΝΕ ΟΧΤ.ιοί, 0XT_121, ΟΧΤ-211, ΟΧΤ-221, ΟΧΤ-212, ΟΧΤ-610, OX.SQ, ΡΝΟΧ (above 'East Asia Synthetic) can be used. Further, the oxetane resin may be used singly or in combination with an acrylic copolymer, an epoxy resin or a maleimide resin. In particular, when used in combination with an epoxy resin, the reactivity by the heat generated by ultraviolet laser exposure is high, and it is preferable from the viewpoint of adhesion to the substrate. The content of the epoxy resin and the oxetane resin according to the present invention in the coloring photosensitive resin composition is preferably 4 Q5 to 15 with respect to the total solid content of the coloring photosensitive resin composition, and is also a base From the viewpoint of the solubility and adhesion to the substrate, it is preferred that the alkali solubility of the organic polymer-66-201222143 (organic carboxylic acid) and the coloring photosensitive tree are improved. The molecular weight organic carboxyl group may be decanoic acid, acetic acid, propionic acid, acid, diethyl acetic acid 'heptanoic acid, octane, malonic acid, succinic acid, glutaric acid, azelaic acid, sebacic acid, tridecanedioic acid. An adipic acid such as dimethylmalonic acid, decyl butyl maleic acid, or the like of aliphatic isopropyl benzoic acid or 2,3-dicarboxylic acid Aromatic monobasic acid; phthalic acid, benzoic acid, benzene, etc. aromatic polybasic acid; phenyl ethoxyacetic acid, (X-methyl acetoacetic acid, succinic acid, α-styl acrylic acid, meat Ίλ '2,4-. Manganese such as decyl cinnamic acid seeks to promote further developability of uncured partial fat composition Preferably, the addition of a molecular weight acid is carried out. Specifically, for example, an aliphatic monobasic acid such as butyric acid, oxalic acid, pivalic acid or caproic acid; oxalic acid adipic acid, pimelic acid, suberic acid, acid, Methylmalonic acid, ethylmalonic acid, tetradecylsuccinic acid, methyl acid; propylene tricarboxylate, propylene tricarboxylic acid tribasic acid; benzoic acid, phenylacetic acid, phenylic acid, 3, 5 - dimethyl benzoic acid, m-dibenzoic acid 'p-benzoic acid, tetra-tetracarboxylic acid, pyromellitic acid, oxy-oxycaproic acid, methoxybenzene cinnamic acid, mandelic acid, phenyl A decyl coupling agent can be used for the coloring photosensitive resin composition of the present invention from the viewpoint of further improving the adhesion to the substrate. The oxime coupling agent preferably has an alkoxyalkyl group as a hydrolyzable group capable of chemically bonding with an inorganic material, and preferably has a group which exhibits an affinity or an bond between the organic resins to exhibit affinity. -67- 201222143 For this kind of base, it is preferred to have (fluorenyl) C a fluorenyl group, a benzyl group, a fluorenyl group, a glycidyl group or an oxetanyl group, and particularly preferably having a (methionenyl group or an epoxy propyl group). In the decane coupling agent of the invention, it is preferred that the alkoxy fluorenyl group and the (meth) acryl fluorenyl group or the epoxy group are exemplified. Specifically, a (fluorenyl) propylene fluorene having the following structure may be mentioned. -3; its decane compound, epoxypropyl-trimethoxydecane compound, etc.

Sj(〇CH3)3 (^O^^Si(〇CH3)3 The total solid addition amount in the photoreceptor composition is preferably 〇2 mass 〇 '5 mass% to 3. 〇 mass%. In the coloring body component of the present invention, the range of % to 5.0% by mass in the case of using the breaker coupling agent is more preferably in the production of the (polymerization inhibitor) composition or unnecessary thermal polymerization, and the preparation may be enumerated. In the present invention, in the storage of the colored photosensitive resin, in order to prevent the polymerizable compound from being added with a small amount of a thermal polymerization inhibitor, the thermal polymerization used in the present invention can be used to inhibit the thermal polymerization. Oxylo-, di-t-butyl-p-68-201222143 Third butyl tea, /l/i, bismuth, 4,4,-thiobis(3_mercapto-6- Tributylphenol), 2,2'-methylene, its I bis(4-methyl-tert-butylphenol), N-nitrosophenylhydroxylamine, _ οπ 婶 salt, brown filth, The amount of the thermal polymerization inhibitor added is preferably from 0.01% by mass to 5% by mass based on the coloring of the 4 u ^ ρ 4 precursor resin composition, and is also caused by the milk in the bag 4 In combination with the obstacle, if necessary, add rosin or a southern fatty acid derivative such as rosin, which may be unevenly present on the surface of the photosensitive layer after drying. The amount of the derivative added is preferably from 0.5% by mass to 10% by mass based on the coloring photosensitive resin composition. (Plasticizer) In the case of 9 A ^ L · ♦ ^, in order to improve the coloring photosensitive resin The physical properties of the composition may be ^ ^ '], with an inorganic filler or plasticizer, etc. In terms of plasticizer, 5 'for example, dioctyl phthalate, di(dodecyl) ortho-benzene Rhodium Oxalate Dicarboxylate, Triethyl Glycol Dioctyl Phthalate, Dimethyl Butyrate, Dioctyl Adipate, Dibutyl Citrate, 2 7 Ή - 5% of the glycerin, etc., may be added to the total mass of the (C) polymerizable compound and (8) the binder resin by 10% by mass or less. The colored photosensitive resin composition of the present invention may be known from the prior art. The exposure means harden, but it is hardened by high-sensitivity by exposure to ultraviolet light, especially High adhesion to the substrate. As far as the UV scoop is concerned, either the laser exposure method or the approximate (pr ο X imity) exposure method can be used to suppress the surface wrinkle texture. The laser exposure method is suitable. The colored photosensitive resin composition of the present invention can be suitably used for the coloring pattern of the color, the ground ua, and the 々巴应先片. -69- 201222143 &lt; It is necessary to display the coloring effect of the coloring and the coloring photosensitive resin composition for a liquid crystal display device, and the color filter is used for the production of the color filter. The coloring layer for patterning the coloring photosensitive resin composition of the present invention is not limited, and the coloring layer that forms the image of the latent image that is exposed to the above is developed, and the colored layer is formed by the colored layer. The baking step is collectively referred to as a pattern-shaped colored layer forming step. The colored layer-shaped resin composition in the present invention is imparted to the substrate as far as the substrate is concerned, for example, alkali glass, soda glass, or boron. Shi Xi attached a transparent conductive film to convert the component substrate. Further, a lattice portion is formed by using these substrates' to form a colored pattern. A filter is formed on the substrate for the purpose of mass diffusion or a filter on the surface of the substrate and a method for producing the same, a resin composition and a pattern. Hereinafter, the pattern forming method to be used is formed as a pattern in the liquid method. The method comprises the steps of: applying a pre-formation to the substrate to form a violet exposure step in which the color layer is patterned, and a development step in which the pattern is formed. In addition, the baking step (the step of pre-baking the stepping horse (baking step). The step of forming the step of forming the coloring layer of the present invention is listed for liquid crystal display acid glass, quartz glass, and For the solid-state imaging device, a plastic substrate can also be used. The black matrix of the shape is improved, and the adhesion between the upper layer and the upper layer is flattened as needed. The method is suitable for the layer invented by the crystal display method of the present invention. The outer line has the above-mentioned lightning, and the light that is set to be light-sensitive, etc., etc., is preferably a sub-empty, preventive primer-70-201222143. The substrate is large (large layer. In the point that the effect of the present invention is exerted, it is preferable that one side is 1 m or more. In order to form a coloring layer on a substrate, the method of coloring the photosensitive resin composition of the present invention is described by using slit coating, inkjet method, and rotation. Coating method of coating (10) ^ C〇atlng), casting (east eGating), or coating (four) 1 screen printing. From the viewpoint of accuracy and speed, among the coating methods, slit coating is preferred. Further, a method of imparting a coating film formed on the temporary support by the above-described coating method onto the substrate may be employed. Regarding the transfer method, the present invention is also suitable for use in the present invention.段落6_23696, paragraph number [0023], [0036]~[Q()51], or the paragraph number of [曰9 [0108] of the Japanese Patent Publication No. 2006-47592. In order to obtain sufficient In the color reproduction region and sufficient panel brightness, the layer thickness (for example, the coating thickness) of the coloring layer in the present invention is preferably formed so that the film thickness after drying is 〇·5 μm 3 3 μmη, more preferably formed. 1·5μηι 〜2·5μιη. [Drying step] After the application of the coloring photosensitive resin composition described above is completed, a drying step of drying the solvent by vacuum drying (V c D) may be performed. The coating film is heated and dried (prebaked) to obtain a colored layer. The pre-baking temperature of the coating film is preferably 60 〇c to M0 〇 c, more preferably 8 〇. 〇-71- 201222143 8 0 seconds 〜 200 seconds. [Exposure step] Good for 30 seconds ~ ~120 ° C. Again, pre-bake The time is better than 300 seconds'. In the popping step of the present invention, the step of exposing the coloring layer to the image by using an ultraviolet clip laser and forming the latent image by hardening the exposed region is considered to be a step. By the exposure step of the present invention, in the pattern-like exposed region in the colored photosensitive resin composition, the (c) specific starting compound of the starting agent is used to initiate and carry out (c) polymerization hardening of the polymerizable compound. The reaction 'at the same time, the heat generated by ultraviolet laser exposure is present in the thermal reaction of (B) the allyl group of the binder resin, the n-position-substituted cis-butyl diimide group or the cyclic quinone imine group. Initiating and performing a hardening reaction 'to perform light and heat double hardening by an exposed region to form a pattern composed of a hardened region and an uncured region. In terms of a laser excitation medium, there are crystals, glass, liquid, pigment, gas, etc. A well-known laser having an oscillating wavelength in ultraviolet light, such as a solid-state laser, a liquid laser, a gas laser, a semiconductor laser, or the like, which is emitted from such a medium, can be used. From the viewpoint of the oscillation wavelength, among them, a solid-state laser or a gas laser is preferred. The exposure wavelength of the ultraviolet laser used in the present invention is excellent in the photosensitive wavelength of the coloring photosensitive resin composition. The point is preferably in the range of 30 〇 nm to 380 nm, more preferably in the range of 31 〇 nm to 360 nm, and particularly in the laser exposure method of 3 55 nm wavelength. Specifically, 'especially suitable for use with large output and relative The Nd of the inexpensive solid-state laser, the third harmonic of the YAG laser (3Hnm) or the XeCI (3〇8nm) and XeF (353nm) of the excimer laser. Further, the exposure amount of the object to be exposed (pattern) is in the range of lmJ/cm 2 to 100 mJ/cm 2 , and more preferably in the range of im J/cm 2 to 50 mJ/cm 2 . If the amount of exposure is this range, it is preferable in terms of productivity of pattern formation. From the viewpoint of productivity, the ultraviolet laser used in the present invention is preferably a pulsed laser that oscillates at a frequency of 20 Hz to 2000 Hz. There is no particular limitation on the exposure apparatus used in the present invention. For commercial use, EGIS (V Technology Co., Ltd.) or DF2200G (large copybook) can be used. Displayed by Dainippon Screen MFG Co., Ltd., etc. The devices other than the above are also suitable for use. ^•, the parallel light of the external laser light is good', and the pattern exposure can be performed without using a mask during exposure. The shape of the pattern is affected by the shape and contour of the wheel. Therefore, since the linearity of the pattern becomes high, it is preferable to use a photomask to expose the pattern. [Developing step] The developing step in the present invention will be a step of developing a coloring layer that forms a latent image by curing in the exposed region, and removing the unexposed portion to form a pattern. The exposed region of the ultraviolet light is hardened into a pattern "at the time of development processing" In the alkali development treatment, the unirradiated portion (unhardened portion) in the above exposure step can be dissolved in an aqueous alkali solution to remove a portion which is only cured by light curing, thereby forming In the case of a developer, an organic alkali developer or an inorganic alkali developer or a mixture thereof is used. -73- 201222143 For an alkali agent used in a developer, for example, water, hydrogen, oxygen, potassium, sodium carbonate , sodium bicarbonate, ..., two = "amine amine - methyl alcohol month female, tetramethyl hydrogen peroxide m ethyl ammonium hydroxide, choline, pyrrole, piperidine, 丨8_二Ϊ = 5 sex 4_ °] Preferably, the dendrimer is diluted with pure water to make the concentration into &amp; 〇〇〇1~ ® %, preferably 〇·〇i~1 In addition, when the aqueous solution is used as a developing solution, it is usually washed (rinsed) with pure water after the development of Ur (such as a tetra-aqueous aqueous solution). ~30.==degree and t' Good for the price, better for 2rc 9 〇 good for 30 seconds ~ 120 seconds, more preferably 40 seconds ~ Among these, development temperature and development time Π: lift at temperature (10) next, second, at temperature The heart is 40 seconds ~ 8 〇 seconds. Also 'washing pressure is better Q Q1MPa~Q 〇 〇. 〇 5MPa ~ 〇, 3MPa 权佳 for this chrome du pregnancy 乂隹 '1MPa~0.3MPa By selecting this special material', the shape of the pattern can be designed. ~ Feng Shun tapered and arbitrarily produced the color-sensing green resin composition yarn, which is slippery during development: the occurrence of the crepe pattern is suppressed, and the formed pattern is formed. Flat (post-baking step) In the present invention, in order to fully cure, it is preferred to provide a step of baking the green resin composition. The side of the baking is selected... The method of the rod can benefit from the development and rinsing -74-201222143: pattern: = substrate 'using heating plate or convection (four) (hot air circulation drying:), south frequency heating machine, etc. Heat in continuous or batch mode. In terms of baking conditions, the temperature is preferably from 180 ° C to 260 ° C, preferably from 10 minutes to 150 minutes, more preferably from 20 minutes to 9 minutes. The degree is preferably 15 (TC ~ 26 (TC, more 200 ° C ~ 240. (:. baking time is preferably 20 minutes ~ 120 minutes, most * in addition, in the formation of RGB3 color, light shielding layer, etc., multiple shades In the coloring pattern, the pattern of the coloring layer, the exposure, the development, and the baking may be repeated only in accordance with the desired number of tones; or the coloring layer may be formed, exposed, and developed in each color tone, and finally the entire color tone. A color filter having a coloring element composed of a desired color tone is produced. <Liquid crystal display device> The color filter of the present invention is suitable for the production of a liquid crystal display device. A liquid crystal display device using a color filter manufactured by the pattern forming method of the present invention can display a high-quality image. The definition of the display device or the description of each display device is described, for example, in "Electronic display device" (Sasaki Sasaki, (Stock) Industry Survey (Kogyo Chosakai Publishing Co_, Ltd.) issued in 1990)", "Display components (Ibuki Shunzhang, Industrial Books (shares) (Sangy〇T〇sh〇Publishing Co In addition, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (Edited by Uchida Natsuo, Industrial Research Association, 1994)". The liquid crystal display device is not particularly limited, and for example, it can be used in a liquid crystal display device of the form described in the above-mentioned -75-201222143 "Next Generation Liquid Crystal Display Technology". Color filters for liquid crystal display devices, especially for color TFTs (Thin A liquid crystal display device of the form of a film of the color TF is described in, for example, a "color TFT liquid crystal display (Kyoritsu Shuppan Co., Ltd.) issued in 1996). It is also applicable to liquid crystal display devices, STN (Super Twisted Nematic), TN (Twisted), such as the horizontal electric field drive type such as ips (In-Plane Switching) and the pixel division form such as MVA (Multi-domain Vertical Alignment). Nematic), VA (Vertical Alignment), OCS, FFS (Fringe Field Switching) and R - 〇CB (Reflective Optically) Compensated Bend), etc. The form of such is described in EL, PDP, LCD Display - Technology and Market Trends - (Toray Research Center (Toray Research)

Center, Inc.) Issued in 2001), p. 43. The liquid crystal display device is composed of various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle protective film, in addition to the color filter. The color calender sheet for a liquid crystal display device of the present invention can be applied to a liquid crystal display device comprising such a known member. These components are described, for example, in the market of r, 94 liquid crystal display peripheral materials and chemicals (Island Kentaro Co., Ltd.), V1C (CMC Publishing) issued in 1994), and the current status of the liquid crystal related market in r 2〇〇3 Future Outlook (Vol. 2) (Former Liangji (share) Fuji Chimera General Research (Fuji Chimera)

Research Institute, Inc.) issued in 2003). -76- 201222143

Hereinafter, the present invention will be specifically described by way of Examples, but the present invention is not particularly limited as long as it does not exceed the above (Synthesis Example 1 is not limited to the following examples. In addition, only %" and "parts" are quality standards. (〇玖Η 1 : Synthesis of alkali-soluble resin i having allyl group) 丨_methoxy 2 was added to a 200 mL three-necked flask equipped with a stir bar, a reflux cooling tube, and a thermometer. _Propanol 54 §, heated to 7 (rc under a nitrogen gas stream. Using a plunger pump, it took 2.5 hours to add 10.07 g of allyl methacrylate and 1.93 g of methacrylate in a three-necked flask. a solution obtained by dissolving 2,2,_ azobis(2,4-dimethylvaleronitrile) ruthenium 185 g as a polymerization initiator in 丨·曱oxy-2-propanol 548. After the completion of the addition, the mixture was stirred at 70 ° C for 2 hours. After the completion of the heating, the mixture was poured into water of IL to reprecipitate. The precipitate was filtered and dried under vacuum to obtain 9 g (yield 75%) of the polymer. a compound obtained by taking the obtained polymer 〇〇1g as a weight average molecular weight of -77-201222143, In a 10mL volumetric flask, add too much tetrahydrofuran to about 8 at room temperature, so that the total amount is 1 〇mL. Eclipse L 'Use gel permeation layer 柘 I (GPC) to determine this solution. Η曱 Η曱 丙 丙 丙 嫌 嫌 甲基 = = = = = 80 80 80 80 80 80 80 80 80 丙 丙 丙 丙 丙 丙 丙 丙 丙 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物 化合物80% of A [(D) specific polymerization initiator] &lt;Step 1: Production of °Calazine derivative 1&gt; The following β-kappa derivative 1 was produced in the following manner.

Carbazole derivative 1 2-thiophene carbonyl gas 7.53 g (0. 〇 5 mol), Ν-ethyl odor wow I4.6 g (0.075 mol), chlorinated reverberation. 34 g (〇.〇〇25 Mo The ear and the gas benzene l〇Og were placed and stirred at 75 to 90 ° C for 2 days. Then, 200 g of ethyl acetate and 200 g of water were added, and the oil layer was extracted, and the solvent was distilled off, and then purified by column chromatography (ethyl acetate: n-hexane = 1: 4 to 1: 2). A green viscous liquid was obtained (yield 6 · 5 g, yield 43%, purity 94.3%). -78-201222143 The 1H-NMR chemical shift of the obtained liquid was as follows. The carbazole derivative 1 which confirmed the liquid substance as a target was confirmed. 8_71(s:lH), 8.13(d:lH), 8.10(d:lH), 7.73(d:2H), 7.53(d:lH), 7.46(t:2H), 7.34(d:lH), 7.32 (t: lH), 4.42 (q: 2H) ' 1.48 (t: 3H) &lt;Step 2: Production of acetamidine substrate i&gt; The following acetonitrile substrate 1 was produced in the following manner.

The acetamidine substrate 1 is placed in the carbazole derivative prepared in step 1! 9.1g (0.03 mole), gasification Ming 9_6g (〇.〇72 Moer) and chlorobenzene 50g, spent 2-3 times on 〇t, add 2.62g (0.033mol) of acetonitrile, then at room temperature After stirring for 1 hour, the solvent was decomposed by adding 30 g of ethyl acetate and 40 g of water, and the solvent was distilled off to obtain a green viscous liquid (yield 9.2 g, yield 89%, purity). 94%). The chemical shift of the obtained liquid material by h-NMR was as shown below, and it was confirmed that the liquid material was the target acetonitrile substrate 1. 8.77 (s: 1H), 8.74 (s: lH), 8.17 (d: lH), 8.12 (d: lH), -79-201222143 7.74 (d: 2H), 7.52 (d: 2H), 7.22 (t: lH), 4.44 (q: 2H), 2.74 (s: 3H) &gt; 1.50 (t: 3H) &lt;Step 3: Production of Carcass 1&gt; The following carcass 1 was produced in the following manner.

N

CH ΌΗ 3 肟 1 Put 10.4 g (0.03 mol) of acetamidine substrate 1 prepared in step 2, 9.6 g (0.072 mol) of hydroxylamine hydrochloride and 30 g of dimethylformamide at 80 ° C. Stir under 2 hours. Thereafter, 30 g of ethyl acetate, 10 g of η-hexane and 50 g of water were added to extract an oil layer. The solvent was distilled off and purified by column chromatography (ethyl acetate: s-hexane = 1 : 1 to 1 : 3) to give a pale yellow solid (yield: 3.0 g, yield 28) %, purity 94%). The chemical shift of the 1H-NMR of the obtained solid was as follows, and it was confirmed that the solid was the steroid 1 of the target. 8.72 (s: 1H), 8.38 (s: lH), 8.10 (d: lH), 7.87 (d: 1H), 7.74 (d: 2H), 7_48 (d: 2H), 7.21 (t: lH), 4.42 (q: 2H), 2.43 (s: 3H) ' 1.50 (t: 3H) - 80 - 201222143 &lt;Step 4: Production of Compound A&gt; A polymerization initiator (Compound A) was produced in the following manner. 1.82 g (0.005 mol) of the steroid 1 prepared in the step 3, 0.61 g (0.006 mol) of acetic anhydride, and I5 g of propyl acetate were placed, and a solid was precipitated by stirring at 8 (TC for 2 hours). The solid was filtered off at 30 ° C, and washed with a methanol/propyl acetate mixed solvent to obtain a white solid (yield: 1.4 g, yield: 70%, purity: 98%). The chemical shift is as follows. It is confirmed that the solid is the target compound A (specific polymerization initiator) 8.72 (s: lH), 8.51 (s: lH), 8_12 (d: lH), 7.99 (d) :lH), 7.74(d:2H), 7_52(d:2H), 7.21(t:lH), 4.42(q:2H), 2.53(s:3H), 2.30(s:3H), l_49(t: 3H) 1 - 2· Preparation of coloring photosensitive resin composition (Preparation of pigment dispersion liquid 1) A pigment dispersion liquid 1 was prepared in the following manner, that is, a mixing machine was used to stir and mix at a rotation of several 3,000 rpm according to the composition described below using a homogenizer. The mixed solution was prepared for 3 hours, and then subjected to dispersion treatment for 8 hours using a bead disperser ULTRA APEX MILL (manufactured by Kotobuki Industries Co., Ltd.) using 0.1 mmcp oxidized beads. • C. I · Pigment 1 5 : 6 1 1.8 parts • CI Pigment Violet 2 3 1.0 parts • Disperbykl61 BYK-Chemie (30% solution) 24 parts • Propylene glycol decyl ether acetate (hereinafter referred to as PGMEA) 63.2 Total 1 0 0 Part 201222143 (Preparation of photosensitive resin composition) Further, a component of the following composition was further added to the pigment dispersion 1 obtained in 39.2 parts, and the mixture was stirred and mixed to prepare a photosensitive resin composition for blue (B). Resin 1 (allyl methacrylate/methacrylic acid copolymer, molar ratio = 80/20, weight average molecular weight = 35,000) 20% PGMEA solution 1 6.4 parts. Polymerizable compound: dipentaerythritol hexaacrylic acid Ester (manufactured by Sakamoto Chemical Co., Ltd., KAYARAD DPHA) 3.9 parts. Polymerizable compound: tetrahydrofurfuryl methane tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NKESTER Α-ΤΜΜΤ) 0·69 parts. Photopolymerization Starting agent: compound hydrazine (the following structure; compound obtained in the above synthesis example) 2.74 parts • polyfunctional thiol compound (sensitizer: the following structure) 0.55 parts • epoxy compound: (Daicel Chemical Co., Ltd.) System, ΕΗΡΕ3150)0·60 parts•Solvent 35.9 parts of a mixed solution of PGMEA and 3-ethoxyethylpropionate (=80/20 [mass ratio]) • Polymerization inhibitor: p-methoxyphenol 0·00 1 part • Surfactant 1: MEGAFACE F -554 (manufactured by DIC Corporation) 0.02 parts -82· 201222143 Ο 〇γ-Κ1.0

Ο SH 2 to 14 and Comparative Example 5) 备2): The binder resin, colorant, photopolymerization initiator and discriminating agent of the coloring photosensitive resin composition of Example 1 were changed to In the same manner as the compounds described in Tables 1 to 2, the coloring photosensitivity of the preparation examples 2 to 14 and Comparative Examples 1 to 5 were the same. Further, the (B) binder resin in the following Tables 1 to 2 is an example of a compound which is indicated by the symbol in the description of the binder (B). Further, the structure of the comparative binder resin used in Comparative Example 1 is as follows. -83- 201222143

-84- 201222143 (Π sensitizer mmmmmm 坭αλ ο m P) Photopolymerization initiator Compound A Compound A Compound A Compound A Compound A &gt; V d ^-Η&gt; I 广 广* Γϊ, 4&gt; Mass ratio (1)/{2) 80/20 80/20 | 80/20 80/20 80/20 80/20 80/20 80/20 80/20 80/20 Military (2) ATMMT ATMMT ATMMT ATMMT ATMMT ATMMT ATMMT ATMMT ATMMT ATMMT Military 醴 (1) DPHA DPHA DPHA DPHA DPHA DPHA DPHA DPHA DPHA DPHA (B} binder resin weight average molecular weight 35000 35000 35000 35000 35000 35000 35000 35000 35000 35000 Compound exemplified compound 1·1 exemplified compound 1-1 Exemplary compounds exemplified compound 1-1 exemplified compound 1-1 Comparative adhesive resin exemplified compound 1-1 exemplified compound 埘1-1 I exemplified compound 1-1 exemplified compound 1-1 (A) colorant content 30% 30% 30% 35% 40% I i 30% 30% I 10% 65% 30% Pigment I Butterfly 4 驽 Butterfly exposure approximation Twilight i 阁朱1 Laser; Laser shot | Laser laser shot Example 9 Blind Example 10 Blind Example 11 Example 12 Example 13 Comparison Example 1 Comparative Example 2 Example 3 Example 4 Comparative Example s -85- 201222143 ratio of ammonium

—Evaluation of coloring photosensitive resin composition (formation of patterned pixels) Heavy average molecular weight: 35,000 Using a slit coater (Hirata Corporation, HC-6000) The colored photosensitive resin compositions of Examples i to 13 and Comparative Examples 1 to 5 prepared in the above manner were applied to the surface of an alkali-free glass substrate (Corning, 1737, 550 mm x 660 mm), and then were cleaned at 90 C. In a clean oven, pre-baking was performed for 120 seconds to form a coating film (colored layer) having a film thickness of 2.0 μm to obtain a substrate having a coating film. (Colored layer forming step) Next, using EGIS (V Technology, YAG laser third harmonic (355 nm) 'pulse width (6 nS) as a laser exposure device' for the photosensitive resin composition layer The surface of the (colored layer) was irradiated with a pulse of about lmJ/cm2 20 times through a mask to harden the exposed portion (exposure step). Thereafter, 'developing device was used (Hitachi High-Technologies, Hitachi High-Technol〇gies (manufactured by the Corporation), a potassium hydroxide-based developer CDK-1 (manufactured by Fujifilm Electronics Materials Co., Ltd.), 1% by mass of developer (1 part by mass of CDK-1, 99 parts by mass of pure water-86-201222143 diluted liquid '25. 〇 set the rinsing pressure to 〇.2 〇 MPa, develop the substrate for 50 seconds, then wash with pure water, then air dry (development step Thereafter, post-baking was performed in a dust-free oven of 2201 for 3 minutes to form a blue stripe-shaped halogen matrix on the substrate. (Evaluation of line width sensitivity) Using a line and gap mask having a width of 20 μm Make The gap between the surface of the photosensitive resin composition layer on the substrate of the coating film and the photomask was 200 μm, and then exposed to an exposure amount of 20 mJ/cm 2 to form an exposed substrate. For the exposure obtained in this manner The substrate was subjected to the above-mentioned development, washing, air drying, and post-baking treatment. The obtained line pattern was observed with an optical microscope, and the line width was measured and evaluated according to the following criteria: A 3 0 μ m or more and B 2 7 μmη or more. Less than 30 μ C 2 5 μηι or more and less than 27 μ D Less than 2 5 μηι E · The pattern was not formed or peeled off and could not be evaluated. (Evaluation of linearity) The optical width microscope (200 times) was used to observe the linear width sensitivity. The linearity (the situation of the rugged area) of the visual line pattern of the evaluation system 4 was evaluated based on the following criteria. Evaluation criteria A: No roughness or defect, the line is straight. B: You can see the ruggedness of several places. The line is almost straight. C: A line deviation of about 2 μmη (relative to the line width of 10% -87 to 201222143) due to ruggedness or defect. D: About 5 μmη due to ruggedness or defect (relative to Line deviation: 2〇% or more of the line width. Ε : The pattern is not formed or peeled off and cannot be evaluated. (Evaluation of heat resistance) The dust-free supply box of the substrate at 240 °C was obtained by evaluating the linear width sensitivity. Additional baking for 60 minutes, using Otsuka Electronics Co., Ltd. (〇tsuka

Spectrophotometer MCPD-2000 manufactured by Electronics Co., Ltd.) evaluated the discoloration (ΔΕ* ab) before and after additional baking. Here, ΔΕ* ab means a color difference in the L*a*b* color system. The change in chromatic aberration Δ ε ab was measured and evaluated on the basis of the following criteria. Evaluation criteria 5 : ΔΕ* ab is 0 or more and less than 1.0. 4.5 : ΔΕΊί is 1.0 or more and less than 2.0. 4: AE*ab is 2.0 or more ~ less than 3.0. 3.5 : ΔΕ*αΐ3 is 3.0 or more ~ not up to 3.5» 3 : AE*ab is 3.5 or more ~ less than 4.0. 2.5: AE*ab is 4.0 or more ~ not up to 5.0. 2 : ΔΕ* ab is 5.0 or more 1 : There is peeling. (Evaluation of Wrinkle Texture) Using a mask having a line width and a gap of 1 μm width, the gap between the surface of the photosensitive resin composition layer on the substrate having the coating film and the mask is 200 μm, and then Exposure was carried out at an exposure amount of 20 mJ/cm 2 to form an exposed substrate. For the exposed substrate prepared in this manner, the line pattern prepared by -88-201222143, washing, air drying, and post-baking is as follows. The unevenness of the observation surface of the developing microscope (200 times) was applied by the optical reference evaluation table. Evaluation criteria A: The surface is flat and uneven. B: A small number of irregularities on the surface C: Up and down of the line D: The whole of the line, μ Ε : The entire line of the line can be fully recognized by the (comprehensive evaluation) method. It is identifiable, but almost all of the bumps are identifiable and convex. See deep bumps. It is flat. I Linearity and heat resistance The overall evaluation was 5. The line width sensitivity and the property were comprehensively evaluated based on the following criteria. The results are shown in Table 3. Usually used, or 4 is preferred. Evaluation Benchmark 5: Very good. 4: Usually no problem is used. 3. Use ¥ as a barely acceptable level. 2: Levels where performance is insufficient and cannot be used normally. The level. 1 : At least 3 items of the above evaluations are obviously poor -89 - 201222143 [Table 3] Film thickness (wra) Line width sensitivity Linear heat resistance (BY) Development time (second 1 Shrinkage netting comprehensive performance Example 1 2.00 AA 5 30 A 5 Example 2 2. 00 BA 5 30 A 5 Example 3 2. 00 AA 5 30 A 5 Example 4 2. 00 BA 5 30 A 5 Example 5 2. 00 BB 4 30 A 4 Example 6 2. 00 B 8 4 30 A 4 Example 7 2. 00 BB 4 25 A 4 Example 8 2. 00 BB 4 30 A 4 Example 9 2.00 AA 5 30 A 5 Example 10 2. 00 AA 5 30 A 5 Example 11 2. 00 AA 5 30 A 5 Example 12 2.00 AA 5 25 A 5 Example 13 2. 00 AA 5 25 A 5 Example 14 2. 00 8 A 4 25 B 4 Comparative Example 1 2. 00 EE 1 30 E 1 Comparative Example 2 2.00 AB 2 30 A 2 Comparative Example 3 2. 00 EE 5 30 E 1 Comparative Example 4 2. 00 C c 3 30 B 3 Comparative Example 5 2. 00 c C 3 30 C 2 is apparent from Table 3, and the color-sensitive photosensitive resin compositions of Examples 1 to 14 according to the present invention have a good line width sensitivity and excellent linearity of the obtained pattern, and the color is generated even if the colored pattern is heated. Discoloration is also small, wrinkle during development The occurrence of the texture is also suppressed, and a good coloring pattern can be obtained. On the other hand, in Comparative Example 1 using an adhesive resin which does not have the specific structural unit in the present invention, the line width sensitivity, the linearity of the pattern, The heat resistance and the wrinkle-removed texture were all inferior, and Comparative Example 2 using the -90-201222143 oxime ester-based photopolymerization initiator outside the scope of the present invention, the heat resistance of Ganyi W 2 was insufficient, and other than oxime ester oxime was used. The ratio of the photopolymerization initiator to the flat examples 3 to 5 is that the line width sensitivity, linearity, and wrinkle texture are more poorly compared with the examples. [Example 1 5~1 8] 2-1. Preparation of Pigment Dispersion (Synthesis Example 2: Synthesis of Zinc Halide Naphthalocyanine Pigment) Manufacture of zinc naphthoquinone by using Nakamoto Ayumi's gasification as a shield 1 + as a horse 3. Mix sulphur bismuth gas, anhydrous aluminum sulphide. 3 · / injury, sodium chloride 〇. 4 6 parts, zinc naphthoquinone 1 part at 40. (: under mixing, narrow ..., set drop 2 2 parts of bromine is halogenated. After reacting at 80 ° C for 15 hours, f β J, the reaction mixture was poured into water to precipitate a part of zinc bromide naphthalene. This aqueous slurry was filtered&apos; and then subjected to a water-repellent signature at 80 °C. ..., 7 冼竽, and dried at 90 ° C to obtain 2.6 parts of purified partially bromine VIII | knife broadened zinc naphthoquinone cyanine pigment. This part of zinc bromide naphthalene phthalocyanine pigment 1 part, pulverized gasification nano 7 parts, diethylene glycol, xylene G.G9 parts placed double wrist type kneading machine, in H) G ° Mix for 6 hours under C. After mixing, take it out and place it in 8 inches. (In the water (10) parts, after the mixing for 1 hour, the transition, hot water washing and drying were carried out to obtain a partially pulverized zinc naphthoquinone pigment. The dentin content analysis using the reserve analysis shows that The average composition of the zinc bromide naphthoquinone pigment is ZnPcBriGCi4H2 (Pc: naphthoquinone), which contains an average of 10 brooks per molecule. In addition, a penetrating electron microscope (JEM, manufactured by JEOL Ltd.) is used. -2010) The average value of the primary particle diameter measured was 〇〇65 μΓη. (Synthesis Example 3: Synthesis of polyester resin (i-1)) -91. 201222143 Mixed n-octanoic acid 6.4 g, ε_内内内The ester 2〇〇g and the titanyl (IV) tetraester 5 g' were heated at 16 0 C for 8 hours, and then cooled to room temperature to obtain a poly(S) resin (i-1).

The synthetic path is shown below. + HO 丄 C7H15-n —JK〇Bu&gt;4

Ο HO Ο 〇7Ηΐ5-η (Synthesis Example 4: Synthesis of Resin (J-1)) Mixed Polyethylenimine (SP-018, number average molecular weight ι, 8 〇〇, Nippon Catalyst (Nippon Shokubai Co., Ltd) ;;) 10g and the polyester resin (il) l〇〇g obtained in the above Synthesis Example 3, obtained by heating at 12 (TC for 3 hours) to obtain an intermediate (J-1B). Thereafter, it was left to cool to 65. 〇c, 200 g of PGMEA (solvent) containing 3.8 g of succinic anhydride was slowly added, and the mixture was stirred for 2 hours. Thereafter, PGMEA was added to obtain a PGMEA 10 mass% solution of the resin (J-1). Resin (J-1) It is a side chain derived from polyester resin oxime and a carboxyl group derived from succinic anhydride. The synthetic route is shown below. -92- 201222143 Ο 1-C7H15-n + polyethyleneimine 4〇

Ic^CHj-N^ 〇|CH2CH2-Isl{|2 -[cH2CH2-NH2l-mi +CH2CH2AH*2}m2 f ΟΗ2ΟΚ2-ΝΗ-[-ηΗ °t5-&lt; * O -]^-Η Intermediate J-1B) • i-CH2CH2-N-^ j-CHoCHg-N^. Ί&quot;ΟΗ2^Η2-Ν-]-|2

〇fJ^-^〇|—*-07Η15-η 〇fkA^-〇|-H, co2h y +CH2CH2-NH2fmi +CH2CH;rNH*2}m2 +CH2CH2-NH4n Resin (J-1) v (Pigment dispersion Preparation of Liquid 2) Preparation of Naphthalene-Pigment Dispersion 2: Green Pigment Zinc Halide Naphthalocyanine Dispersion 1 Once zirconia beads of 0.5 mm in diameter are placed

AIMEX Co., Ltd. (AIMEX Co., Ltd.) high-speed disperser "TSC-6H" placed part of the zinc bromide naphthoquinone prepared in the above Synthesis Example 2 (hereinafter 'appropriately referred to as PG58) 14.9 9.4 parts of BYK-Chemie's acrylic dispersant "BYK-2001" and 78 parts of PGMEA were stirred at 2000 rpm for 8 hours to prepare a dispersion of partially brominated zinc halide eucalyptus pigment (green pigment PG58). Pigment dispersion 2). (Preparation of Pigment Dispersion 3) Pigment Dispersion 3: Yellow Pigment Pigment Yellow 1 50 Dispersion - Under, use the bead mill (oxidized wrong bead. 3 mm) to CI Pig Yellow 1 5 0 (to be properly called It is 15 parts of PY150: average particle diameter of 60 nm), 75 parts of resin (J_1) obtained by the above-mentioned -93-201222143:4, ρ(}ΜΕΑ 77 5 parts, mixed and dispersed for 3 hours to prepare yellow pigment ργΐ5〇 Dispersion: 3) as a pigment. π 刀 艾 2 2-2. Preparation of coloring photosensitive resin composition A component of the following composition was added, and then stirred and mixed to prepare a green (G) coloring photosensitive resin composition of Example 15 (color resist) Liquid)). • Dispersion of green pigment PG58 (pigment dispersion 2)...53.42 parts •Dispersion of coloring pigment PY150 (pigment dispersion 3). 23 8 1 part. Polymerizable compound: dipentaerythritol hexa(hexaacrylate) a mixture of succinic acid derivative with dipentaerythritol pentaacrylate, acid value: 67 mg KOH (trade name: τ〇_2349 East Asia Synthetic) u (9) parts • Photopolymerization initiator: (The following structure: compound A2)..· 1.536 parts • Sensitizer: Polyfunctional thiol...丨5 3 6 parts (trade name: KARENZ MTBD1 Showa Denko KK) • Alkali-soluble resin...〇· 1 〇9 [Allyl methacrylate / methacrylic acid (= 8 〇 / 2 〇 [mole ratio]) copolymer (weight average molecular weight: 3 〇〇〇〇)] • Solvent: propylene glycol monomethyl ether acetate 57 47 • Polymerization inhibitor: 5 parts of p-oxyphenol phenolphthalein • II type surfactant (trade name: MEGAFACE F554 DIC system) ... 0.027 parts • 3-ethoxyethyl propionate..3 〇〇〇份-94 - 201222143

Compound A 2 (Example 16) - In the case of Example 15 except that (F) was used as a sensitizer, the polyalcohol (trade name: KARENZ MTBD 1 manufactured by Showa Denko) was changed to the evening S warehouse. A coloring photosensitive resin composition (color resist liquid) of Example 16 was prepared in the same manner as in the yoke example 15 except for the thiol (trade name: KARENZ MTPE1). (Example 17) In the example of the invention, except that (product name: TO-2349 East Asian synthesis) was used as the (c) polymerizable compound (trade name: M-5 20 East Asian synthesis), The colored photosensitive resin composition (color resist liquid) of Example 17 was prepared in the same manner as in Example 5. Further, M-520 is a mixture of dipentaerythritol hexa(hexaacrylate) and dipentaerythritol pentaacrylate succinic acid derivative and is a polymerizable compound having an acid value of 3 〇 mgKOH. (Example 18) In the example of the invention, the product (product name: TO-2349 East Asia Synthetic) was used as the (C) polymerizable compound, and the product name was KAYARAD DPHA. In the table, the coloring photosensitive resin composition (color resist liquid) which carried out w18 was prepared in the same manner as in Example 15 except that it was "DPH A") -95-201222143. The Αβ 々Λ coloring photosensitive resin composition used in the above-mentioned Examples 15 to 18 (着色) colorant, (Β) binder resin, (c) arm, conjugate compound, (D) photopolymerization Details of the starting agent and (F) sensitizer _ Λ ^衣τκ are shown in Table 4 below. Further, the (Β) binder resin in the following Table 4 is an exemplary compound which can be exemplified in the description column of the above (Β) binder resin. In addition, the approximate exposure is denoted as r proxy" in Table 4. -96- 201222143 inch °, a. H )=〇°N 0 ) m Ξ ( NZ &gt; ( .1. UJ a: &lt; 1.. Ο &quot;Λ 蘅S3 OJ CM CSi &lt;Ν &lt;&lt;&lt;&lt;&lt;&lt;&lt; Φ Μ Q Aa &lt;a &lt; & aj AJ &lt;0 T0-2349 &lt;1 mouth embedded TO-2349 M-520 DPHA 〇nim 〇〇〇Ο 屮 屮&lt;RS CO s CO S CO g CO 蘅a 琏II τ— 彘ffl i T~» 5 i S &lt;α &lt;a &lt;n &lt;Π &lt;〇JJ AJ -v- AJ AJ ig iK i iS _ &lt;〇co &lt ;〇&lt;ra uo oo LO CO ΙΟ CO L〇CO 蘅_ &lt;龚藤费紫费紫&gt;&gt;&gt;&gt; aldehyde 0 α oa ο Q. a in ϊ (Ω T- 匡卜 i 00 I 闺 闺 舾 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 97 The coloring photosensitive resin compositions of Examples 15 to 18 which were obtained in the above manner were applied to a glass substrate of 55 mm×65 mm by the conditions of the gap 1 ΟΟμηη and the coating flow rate of 1.3 mi/s. 1737, manufactured by c〇rning Co., Ltd.) After forming a coating film, it was vacuum dried in a vacuum drying chamber to reach a pressure of 〇5T〇rr, and then dried in a tank at 80 °C for 120 seconds. Baking] 'Forming a coloring photosensitive resin composition layer having a film thickness of 2. Ομηη. Thereafter, a stripe pattern having a mask size of 20 μm was used, and an ultrahigh pressure mercury lamp was used to form a gap of 200 μm with a gap of 20 mJ/cm 2 (illuminance of 35 mW/cm 2 ). The coloring photosensitive resin composition layer was subjected to approximate exposure, and the exposed coloring photosensitive resin composition layer ' was rinsed with a 1% aqueous solution of an alkali developer CDK-1 (trade name: manufactured by Shishi Electronic Materials Co., Ltd.). 4 leap seconds' then rinsed with pure water for 60 seconds, and the developer was washed away. Next, in the oven at 203 ° C, the colored photosensitive resin composition subjected to the exposure and development treatment as described above was applied. The layer was subjected to heat treatment (post-bake) for 40 minutes to form a colored pattern of colored pixels constituting the color filter on the glass substrate, and a green striped pixel array (color filter) was formed on the glass substrate. With respect to the color filter formed, the linear width sensitivity, the linearity of the formed pattern, the heat resistance, the development time, and the wrinkle texture were evaluated and comprehensively evaluated in the same manner as in the first embodiment. The results are shown in Table 5 below. -98 - 201222143 [Table 5] Film thickness (Um) Line width sensitivity Linear heat resistance (BY) Development time (seconds) Wrinkle texture comprehensive performance Example 15 2.0 AAA 20 A 5 Example 16 2.0 AAA 20 A 5 Example 17 2.0 ABA 25 A 4 Example 18 2.0 ABA 30 A 4 It is apparent from Table 5 that the color-sensitive photosensitive dendrimer compositions of Examples 15 to 18 relating to the present invention are subjected to approximation even in the exposure step. In the case of exposure, as in the case of using the laser exposure, the linearity of the line width is good and the pattern obtained is excellent in linearity, and even if the coloring pattern is added with a color, the color is small, and the color is reduced during development. The occurrence of wrinkles is also suppressed' can produce a good color pattern. (Example 19) '1. Preparation of coloring photosensitive resin composition The component of the following composition was added, and it stirred by mixing to prepare the coloring photosensitive resin composition for green (G) of Example 19 (color photoresist liquid). . • Dispersion of green pigment PG58 (pigment dispersion 2) ~ 53 Dispersion of 42 parts of vapor pigment PY150 (pigment dispersion 3) 23 8 1 part • Polymerizable compound: dipentaerythritol six (hexaacrylate) Mixture with dipentaerythritol tetraacetate and succinic acid derivative of dipentaerythritol pentaacrylate (trade name: TO-2349 East Asia Synthetic) 1 1 · 68 parts • Photopolymerization start Agent: (The following structure: Compound A3)...1.636 parts of sensitizer: Polyfunctional thiol...丨_ 5 3 6 parts-99- 201222143 (trade name: KARENZ MTBD1 manufactured by Showa Denko) • Alkali-soluble resin..·0109 [Allyl methacrylate / methacrylic acid (= 8 0 / 20 [mole ratio]) copolymer (weight average molecular weight: 30,000)] • Solvent: propylene glycol monomethyl ether acetate ... 57.47 • Polymerization inhibitor: p-methoxyphenol: 0 005 parts • Fluoride-based surfactant (trade name: MEGAFACEF554 DIC system) ····0_〇27 parts • Propionate-3-ethoxyethyl ester...30.00 Share

Compound A 3 (Example 20) The polyfunctional thiol (trade name: KARENZ MTBD1, manufactured by Showa Denko), which is used as the (F) sensitizer, was changed to a polyfunctional thiol (product). A colored photosensitive resin composition (color resist liquid) of Example 20 was prepared in the same manner as in Example 19 except that the name was KARENZ MTPE1. (Example 2 1) In the example 19, except for the (c) polymerizable compound, -100-201222143 (trade name: το·2349 East Asia Synthetic System) was changed to (trade name. M-52〇) A colored photosensitive resin composition (color resist liquid) of Example 21 was prepared in the same manner as in Example 19 except for the synthesis of East Asia. (Example 22) In the example 19, except that the product (product name: TO-2349 East Asia Synthetic) was used as the (C) polymerizable compound, the product name was changed to (product name: KAYARAD DPHA). In the same manner as in Example 19, only the colored photosensitive resin composition (color resist liquid) of Example 22 was prepared. The coloring agent used in the coloring photosensitive resin compositions of the above Examples 19 to 22, (Β) The details of the binder resin, (c) polymerizable compound, (... photopolymerization initiator, and (F) sensitizer are shown in the following Table 6. In addition, (B) binder in Table 6 below The resin is represented by the symbol of the exemplified compound in the description column of the above (B) binder resin. The approximate exposure is shown in Table 6 as "pr〇xy". -101 - 201222143 [9&lt;] ( F) Sensitizer 1 〇4 KAREN2 MTPE1 0 \ A SH Ο Ο SH (D) Polymerization initiator Compound A 3 Compound A 3 Compound A 3 I ______ — Compound A 3 (C) Polymerizable compound T0-2349 T0- 2349 LO rs I DPHA (B) Binder Resin Molecular Weight 35000 35000 35000 35000 Adhesive Resin Illustrative Compound 1-1 Illustrative Compound 1-1 Illustrative Compound 1-1 I___ Illustrative Compound 1-1 (A) Colorant t 35. 6% 35. 6% 35.6% 35. 6% Pigment Violet Probably Proxy Proxy Proxy EMBODIMENT Example 19 Example 20 Example 21 Example 22 -102-201222143 - Evaluation of coloring photosensitive resin composition (Formation of patterned pixels) The same as Example 1 5 to 1 7 Each of the colored photosensitive resin compositions of Examples 19 to 22 obtained in the above manner was formed into a colored photosensitive resin composition layer, exposed to a pattern, subjected to development treatment, and post-baked, on a glass substrate. Forming a colored pattern of colored enamel constituting the color filter and forming a green striped pixel array (color filter) on the glass substrate. Regarding the formed color filter, and in Embodiments 15 to 17 In the same manner, the linear width sensitivity, the linearity of the formed pattern, the heat resistance, the development time, the evaluation of the wrinkle texture, and the overall evaluation were performed. The results are shown in Table 7 below. Table 7] Film thickness (/ / m) Line width sensitivity linear resistance (BY) Development time (seconds) Wrinkle texture comprehensive performance Example 19 2.0 AAA 20 A 5 Example 20 2.0 AAA 20 A 5 Example 21 2.0 ABA 25 A 4 Example 22 2.0 ABA 30 A 4 From Table 7 It is apparent that the colored photosensitive resin composition of Examples 19 to 22 according to the present invention has the same line width sensitivity as in Examples 15 to 17 and is obtained in the same manner as in the case of changing the initiator. The pattern has excellent linearity, and even if the colored pattern is heated, color discoloration is small, and occurrence of wrinkle texture during development is suppressed, and a good coloring pattern can be obtained. -103- 201222143 [Description of simple figure] 4E 〇 J ί ΛΝ [Description of main component symbols] Μ 〇 y\\\ -104-

Claims (1)

201222143 VII. Patent application scope: 1. A colored photosensitive resin composition containing at least (A) a colorant, (B) a binder resin '(C) a polymerizable compound, and (D) having the following formula (III) The photopolymerization initiator and (E) solvent, wherein the (B) binder resin contains, in the molecule, a structural unit selected from the group consisting of (B-1) represented by the following formula (I), and (B-2) a structural unit having a N-substituted maleimide group and (B-3) a structural unit of at least one of the group of structural units represented by the following formula (II); The total solid content of the resin composition, the content of the (D) photopolymerization initiator is from 5% by mass to 15% by mass: R14r13r11 I i I Ο — —C — C=C In the formula (I), R 11 to R 15 each independently represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group or an aryl group, and R 16 represents a hydrogen atom or a fluorenyl group; -105- 201222143 In the formula (II), R21矣-p represents a gas atom or a sulfhydryl group, and R22 represents a carbon atom number of 1 ' &quot; 6 stunned. 2 3 soil 'R and R24 are each independently carbon The number of atoms, the sinter group is a hydrogen atom and the other is a group having 4 or less carbon atoms or the group *r23 &amp; is bonded to each other to form a ring of a carbon atom; In the formula (III), 'χΐ, X2 and X3 each independently represent a hydrogen atom, a dentate atom or a burnt group, and R1 represents -R, -OR, -COR, -SR, -CONRR' or _CN 'R2 and R3 Each independently represents _R, _〇R, -COR, -SR or -NRR, and R and R each independently represent an alkyl group, a (III) aryl group, an aromatic group or a heterocyclic group, etc. The group may be substituted with one or more selected from the group consisting of a halogen atom and a heterocyclic group, and one or more of the carbon atoms constituting the alkyl chain among the alkyl group and the aralkyl group may be substituted with an unsaturated bond. , an ether bond or an ester bond, R and R ' may be bonded to each other to form a ring. 2. The colored photosensitive resin composition of claim 1, further comprising (F) a sensitizer selected from the group consisting of polyfunctional thiol compounds. 3. The colored photosensitive resin composition of claim 1, wherein the (B) binder resin contains: 50 mol% to 90 mol% of the binder selected from the group consisting of (B-1) The formula (1) represents a structural unit of -106 to 201222143, (B-2) a structural unit having an N-substituted maleimide group, and (B-3) a group of structural units represented by the formula (II) At least one structural unit in the group and a structural unit having an acidic group, and the (B) binder resin is a resin having a weight average molecular weight in the range of 10,000 to 1,000,000. 4. For the coloring photosensitive resin composition of the first application of the patent scope, it is used for ultraviolet laser exposure. A pattern forming method comprising: a coloring layer forming step of forming a colored layer by applying a colored photosensitive resin composition according to any one of claims 1 to 4 to a substrate, and the colored layer An exposure step of exposing a pattern shape by ultraviolet laser irradiation and hardening the exposed portion, and a developing step of removing the uncured portion of the front colored layer by development to form a pattern. 6. The pattern forming method of claim 5, wherein the ultraviolet laser has an exposure wavelength in a range of 300 nm to 380 nm. 7. The pattern forming method of claim 5, wherein the ultraviolet laser is a pulsed laser oscillated at a frequency of 20 Hz to 2000 Hz. A method of producing a color filter comprising the step of forming a colored pattern on a substrate by a pattern forming method according to item 5 of the patent application. A color filter manufactured by the manufacturing method of claim 8 of the patent application. A display device comprising a color filter as in claim 9 of the patent application. -107- 201222143 IV. Designation of Representative Representatives (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 命〇201222143 Revision page (Amended on May 15, 2012) Patent Specification PD1117532(9 (In the format and order of this manual, please do not change it arbitrarily. ※Please do not fill in the mark.) ※Application number, 001 14370 ※Application date: Do not classify PC: 1. Name of the invention: (Chinese/English) Composition of colored photosensitive resin , pattern forming method, color filter manufacturing method, color filter, and display device therewith COLOR PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING A PATTERN, METHOD OF PRODUCING A COLOR FILTER, AND COLOR FILTER AND DISPLAY DEVICE HAVING THE SAME 2. SUMMARY OF THE INVENTION An object of the present invention is to provide a colored photosensitive resin composition, a pattern forming method using the same, a method for producing a color filter, a color filter, and a display device. In the coloring photosensitive resin composition, it is possible to form a pattern having high line width sensitivity, excellent linearity, suppression of wrinkles during development, formation of a cured film excellent in heat resistance, and low brightness reduction after post-baking. The solution to the problem is to provide a colored photosensitive resin composition containing (A) a colorant, (B) a binder resin, (C) a polymerizable compound, and (D) a photopolymer represented by the formula (ΙΠ). Starting agent and (E) solvent. The (B) binder resin contains a structure selected from the group consisting of (B-1) a structural unit represented by the formula (I) and (B-2) having an N-substituted maleimide group. The unit and (B-3) are structural units of the structural unit represented by the formula (II). The content of the (D) photopolymerization initiator is from 5% by mass to 15% by mass. 201222143 Amendment page (Amended on May 15th, 2012) Patent Specification PD1117532(9) (Please do not change the format and order of this manual, please do not fill in the ※ part) ※Application number, 001 14370 ※Application date: PC classification: 1. Invention name: (Chinese/English) Coloring photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device therewith COLOR PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING A PATTERN, METHOD OF PRODUCING A COLOR FILTER, AND COLOR FILTER AND DISPLAY DEVICE HAVING THE SAME 2. SUMMARY OF THE INVENTION An object of the present invention is to provide a colored photosensitive resin composition, a pattern forming method using the same, and a color filter Manufacturing method, color filter and display device. In the coloring photosensitive resin composition, it is possible to form a pattern having high line width sensitivity, excellent linearity, suppression of wrinkles during development, formation of a cured film excellent in heat resistance, and low brightness reduction after post-baking. The solution to the problem is to provide a colored photosensitive resin composition containing (A) a colorant, (B) a binder resin, (C) a polymerizable compound, and (D) a photopolymer represented by the formula (ΙΠ). Starting agent and (E) solvent. The (B) binder resin contains a structure selected from the group consisting of (B-1) a structural unit represented by the formula (I) and (B-2) having an N-substituted maleimide group. The unit and (B-3) are structural units of the structural unit represented by the formula (II). The content of the (D) photopolymerization initiator is from 5% by mass to 15% by mass. 201222143 (ill) , English invention summary: None.