KR20100038170A - 구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법 - Google Patents

구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법 Download PDF

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Publication number
KR20100038170A
KR20100038170A KR1020097025676A KR20097025676A KR20100038170A KR 20100038170 A KR20100038170 A KR 20100038170A KR 1020097025676 A KR1020097025676 A KR 1020097025676A KR 20097025676 A KR20097025676 A KR 20097025676A KR 20100038170 A KR20100038170 A KR 20100038170A
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KR
South Korea
Prior art keywords
organic polymer
particles
silicon compound
hollow
particle
Prior art date
Application number
KR1020097025676A
Other languages
English (en)
Korean (ko)
Inventor
다카시 가와사키
모토하루 후카자와
이사오 스기모토
Original Assignee
덴끼 가가꾸 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 덴끼 가가꾸 고교 가부시키가이샤 filed Critical 덴끼 가가꾸 고교 가부시키가이샤
Publication of KR20100038170A publication Critical patent/KR20100038170A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
KR1020097025676A 2007-06-26 2008-06-26 구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법 KR20100038170A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007167582 2007-06-26
JPJP-P-2007-167582 2007-06-26
JPJP-P-2008-147083 2008-06-04
JP2008147083 2008-06-04
JP2008147820 2008-06-05
JPJP-P-2008-147820 2008-06-05

Publications (1)

Publication Number Publication Date
KR20100038170A true KR20100038170A (ko) 2010-04-13

Family

ID=40185718

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097025676A KR20100038170A (ko) 2007-06-26 2008-06-26 구상 유기 폴리머-실리콘 화합물 복합 입자, 중공 입자 및 그들의 제조 방법

Country Status (5)

Country Link
US (2) US20100204342A1 (fr)
JP (1) JP5457179B2 (fr)
KR (1) KR20100038170A (fr)
CN (1) CN101679049B (fr)
WO (1) WO2009001905A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101518874B1 (ko) * 2013-12-31 2015-05-11 주식회사 효성 방현 특성이 개선된 반사방지 필름용 코팅층 및 이의 제조 방법
KR101659709B1 (ko) * 2016-05-18 2016-09-26 주식회사 나노신소재 중공형 알루미노실리케이트 입자 및 이의 제조방법
KR20170022965A (ko) 2016-12-08 2017-03-02 문봉권 유체 여과용 중공 입자 집합체 및 이를 포함하는 필터
KR20190115633A (ko) 2018-04-03 2019-10-14 문봉권 유체 여과용 중공 입자 집합체를 포함하는 조리용 불판
KR20190115631A (ko) 2018-04-03 2019-10-14 문봉권 유체 여과용 중공 입자 집합체를 포함하는 조리용기 뚜껑
KR20230099291A (ko) * 2021-12-27 2023-07-04 주식회사 케이씨텍 중공 실리카 입자 분산액의 제조방법 및 이를 사용하여 제조된 중공-실리카 입자 분산액

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5576799B2 (ja) * 2008-12-25 2014-08-20 電気化学工業株式会社 複合粒子及びその製造方法、中空粒子、その製造方法及び用途
JP5463099B2 (ja) * 2009-08-21 2014-04-09 電気化学工業株式会社 中空シリカ粉末、その製造方法及び用途
KR101126289B1 (ko) * 2009-11-03 2012-03-19 그레이스 콘티넨탈 코리아 주식회사 실리카로 코팅된 미분쇄 폐실리콘 고무 분말 및 이를 이용한 실리콘 고무 재활용 방법
JP5579512B2 (ja) * 2010-06-24 2014-08-27 電気化学工業株式会社 複合粒子およびその製造方法
JP5672022B2 (ja) * 2011-01-25 2015-02-18 日立化成株式会社 絶縁被覆導電粒子、異方導電性材料及び接続構造体
JP6103950B2 (ja) * 2012-03-26 2017-03-29 キヤノン株式会社 中空粒子の製造方法、反射防止膜の製造方法及び光学素子の製造方法
CN102702966B (zh) * 2012-05-24 2014-08-06 长兴化学材料(珠海)有限公司 减反射组合物及其制造方法与用途
JP2014034488A (ja) * 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
JP6102393B2 (ja) * 2013-03-22 2017-03-29 Dic株式会社 中空シリカナノ粒子の製造方法
CN103242545B (zh) * 2013-04-27 2015-09-02 江汉大学 一种壳聚糖基中空球的制备方法
JP5802821B2 (ja) * 2013-12-06 2015-11-04 花王株式会社 マイクロカプセルの製造方法
JP6474212B2 (ja) * 2014-08-19 2019-02-27 学校法人東京理科大学 中空シリカ粒子の製造方法及び中空シリカ粒子
WO2017125839A1 (fr) * 2016-01-19 2017-07-27 Sabic Global Technologies B.V. Nano- ou micro-catalyseurs de céramique fondue ayant une superficie élevée
WO2019208711A1 (fr) * 2018-04-27 2019-10-31 キヤノン株式会社 Particule et procédé de production de celle-ci
CN108727058B (zh) * 2018-07-16 2020-06-05 江苏省苏安能节能建材科技有限公司 一种有机硅改性中空陶瓷微珠及其制备和应用
MX2021000767A (es) * 2018-07-26 2021-03-29 Basf Se Particulas de vidrio esfericas huecas.

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI77881C (fi) * 1987-04-14 1989-05-10 Kemira Oy Ytbelagda silikatpartiklar.
JP3265653B2 (ja) 1992-11-12 2002-03-11 ジェイエスアール株式会社 複合粒子、中空粒子とそれらの製造方法
JP4036722B2 (ja) * 1993-06-29 2008-01-23 三菱レイヨン株式会社 高純度球状シリカ
JP2644681B2 (ja) * 1994-07-05 1997-08-25 工業技術院長 連結シリカ球状粒子からなる三次元網状構造体と樹脂とによる相互貫入型複合体およびその製造方法
FR2747669B1 (fr) * 1996-04-22 1998-05-22 Rhone Poulenc Chimie Procede de preparation de particules creuses de silice
ATE228883T1 (de) 1998-03-19 2002-12-15 Max Planck Gesellschaft Herstellung von mit mehrlagen gestrichenen partikeln und hohlen schalen durch elektrostatische selbstorganisierung von nanokompositmehrlagen auf zersetzbaren schablonen
JP4046921B2 (ja) 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
JP2004043670A (ja) * 2002-07-12 2004-02-12 Daicel Degussa Ltd 複合分散体及びその製造方法
JP4428923B2 (ja) * 2002-12-25 2010-03-10 日揮触媒化成株式会社 シリカ系中空微粒子の製造方法
CN1247455C (zh) * 2002-12-30 2006-03-29 新加坡纳米材料科技有限公司 一种二氧化硅介孔材料及其制备方法
JP4654428B2 (ja) 2004-03-18 2011-03-23 国立大学法人 名古屋工業大学 高分散シリカナノ中空粒子及びそれを製造する方法
US7790316B2 (en) * 2004-03-26 2010-09-07 Shin-Etsu Chemical Co., Ltd. Silicon composite particles, preparation thereof, and negative electrode material for non-aqueous electrolyte secondary cell
EP1769092A4 (fr) 2004-06-29 2008-08-06 Europ Nickel Plc Lixiviation amelioree de metaux de base
WO2006006207A1 (fr) 2004-07-08 2006-01-19 Catalysts & Chemicals Industries Co.,Ltd. Processus de production de fines particules à base de silice, composition de revêtement pour formation d’un film de revêtement, et base avec film de revêtement
FR2875494B1 (fr) * 2004-09-17 2007-01-19 Sylvain Rakotoarison Microspheres de silice, procede de fabrication, assemblages et utilisations possibles de ces microspheres de silice
CN1781997A (zh) * 2004-12-02 2006-06-07 北京化工大学 一种新型SiO2载体材料及在聚烯烃催化剂中的应用及其制备方法
JP4861634B2 (ja) 2005-03-18 2012-01-25 国立大学法人 名古屋工業大学 シリカ中空粒子の製造方法
JP4883383B2 (ja) * 2005-06-02 2012-02-22 旭硝子株式会社 中空状ＳｉＯ２を含有する分散液、塗料組成物及び反射防止塗膜付き基材
JP5057199B2 (ja) 2005-06-02 2012-10-24 旭硝子株式会社 中空状ＳｉＯ２微粒子分散液の製造方法、塗料組成物及び反射防止塗膜付き基材
US20070036705A1 (en) * 2005-08-10 2007-02-15 Butts Matthew D Hollow silica particles and methods for making same
CN100355654C (zh) * 2005-12-30 2007-12-19 中国科学院上海硅酸盐研究所 一种六方相贯穿介孔孔道的二氧化硅中空球材料的制备方法
US7781060B2 (en) * 2006-12-19 2010-08-24 Nanogram Corporation Hollow silica nanoparticles as well as synthesis processes and applications thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101518874B1 (ko) * 2013-12-31 2015-05-11 주식회사 효성 방현 특성이 개선된 반사방지 필름용 코팅층 및 이의 제조 방법
KR101659709B1 (ko) * 2016-05-18 2016-09-26 주식회사 나노신소재 중공형 알루미노실리케이트 입자 및 이의 제조방법
WO2017200169A1 (fr) * 2016-05-18 2017-11-23 Advanced Nano Products Co., Ltd. Particules creuses d'aluminosilicate et procédé pour leur fabrication
KR20170022965A (ko) 2016-12-08 2017-03-02 문봉권 유체 여과용 중공 입자 집합체 및 이를 포함하는 필터
KR20190115633A (ko) 2018-04-03 2019-10-14 문봉권 유체 여과용 중공 입자 집합체를 포함하는 조리용 불판
KR20190115631A (ko) 2018-04-03 2019-10-14 문봉권 유체 여과용 중공 입자 집합체를 포함하는 조리용기 뚜껑
KR20230099291A (ko) * 2021-12-27 2023-07-04 주식회사 케이씨텍 중공 실리카 입자 분산액의 제조방법 및 이를 사용하여 제조된 중공-실리카 입자 분산액

Also Published As

Publication number Publication date
WO2009001905A1 (fr) 2008-12-31
JP5457179B2 (ja) 2014-04-02
US20100204342A1 (en) 2010-08-12
CN101679049A (zh) 2010-03-24
CN101679049B (zh) 2013-09-25
JPWO2009001905A1 (ja) 2010-08-26
US20120164052A1 (en) 2012-06-28
US8435475B2 (en) 2013-05-07

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