KR20080046240A - 감광성 조성물, 전사재료, 차광막과 그 제조방법,표시장치용 컬러필터, 표시장치용 기판, 및 표시장치 - Google Patents

감광성 조성물, 전사재료, 차광막과 그 제조방법,표시장치용 컬러필터, 표시장치용 기판, 및 표시장치 Download PDF

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Publication number
KR20080046240A
KR20080046240A KR1020087008604A KR20087008604A KR20080046240A KR 20080046240 A KR20080046240 A KR 20080046240A KR 1020087008604 A KR1020087008604 A KR 1020087008604A KR 20087008604 A KR20087008604 A KR 20087008604A KR 20080046240 A KR20080046240 A KR 20080046240A
Authority
KR
South Korea
Prior art keywords
light shielding
substrate
display device
photosensitive
shielding film
Prior art date
Application number
KR1020087008604A
Other languages
English (en)
Korean (ko)
Inventor
아키라 하타케야마
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20080046240A publication Critical patent/KR20080046240A/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
KR1020087008604A 2005-09-16 2006-09-14 감광성 조성물, 전사재료, 차광막과 그 제조방법,표시장치용 컬러필터, 표시장치용 기판, 및 표시장치 KR20080046240A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00270872 2005-09-16
JP2005270872 2005-09-16

Publications (1)

Publication Number Publication Date
KR20080046240A true KR20080046240A (ko) 2008-05-26

Family

ID=37865122

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087008604A KR20080046240A (ko) 2005-09-16 2006-09-14 감광성 조성물, 전사재료, 차광막과 그 제조방법,표시장치용 컬러필터, 표시장치용 기판, 및 표시장치

Country Status (5)

Country Link
JP (1) JP5025642B2 (ja)
KR (1) KR20080046240A (ja)
CN (1) CN101263424B (ja)
TW (1) TW200725174A (ja)
WO (1) WO2007032552A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452425B (zh) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
JP6403911B1 (ja) * 2017-05-23 2018-10-10 株式会社きもと 積層遮光フィルム、並びに、これを用いた光学機器用遮光リング、レンズユニット及びカメラモジュール
TWI788434B (zh) * 2017-10-27 2023-01-01 日商東京威力科創股份有限公司 光罩圖案形成方法、記憶媒體及基板處理裝置
CN111524921A (zh) * 2019-02-03 2020-08-11 同泰电子科技股份有限公司 互补式金属氧化物半导体感光组件、防护玻璃模块及制法
CN116157741A (zh) * 2020-08-25 2023-05-23 富士胶片株式会社 转印膜、层叠体的制造方法、电路配线的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227009A (ja) * 1995-02-21 1996-09-03 Dainippon Printing Co Ltd カラーフィルタ
JPH11172150A (ja) * 1997-10-09 1999-06-29 Dainippon Printing Co Ltd 非導電性遮光層用組成物、非導電性遮光層、およびカラーフィルター
DE69911558T2 (de) * 1998-07-14 2004-06-24 Brewer Science, Inc. Fotoempfindliche zusammensetzung für schwarzmatrix und verfahren zur herstellung der zusammensetzung
JP2000194132A (ja) * 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
JP4528548B2 (ja) * 2003-04-18 2010-08-18 富士フイルム株式会社 表示装置用遮光膜
JP2004334181A (ja) * 2003-04-18 2004-11-25 Fuji Photo Film Co Ltd 表示装置用遮光膜
JP4223487B2 (ja) * 2005-02-17 2009-02-12 住友大阪セメント株式会社 黒色微粒子と黒色微粒子分散液及び黒色遮光膜並びに黒色遮光膜付き基材
JP4437063B2 (ja) * 2004-09-21 2010-03-24 住友大阪セメント株式会社 黒色材料
JP2006267998A (ja) * 2005-02-28 2006-10-05 Fuji Photo Film Co Ltd 記録材料用樹脂組成物、感光性転写材料、表示装置用遮光膜及びその形成方法、遮光膜付基板、液晶表示素子、並びに液晶表示装置

Also Published As

Publication number Publication date
WO2007032552A1 (en) 2007-03-22
TW200725174A (en) 2007-07-01
CN101263424B (zh) 2011-12-14
CN101263424A (zh) 2008-09-10
JP2009509176A (ja) 2009-03-05
JP5025642B2 (ja) 2012-09-12

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