TW200725174A - Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device - Google Patents

Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device

Info

Publication number
TW200725174A
TW200725174A TW095133894A TW95133894A TW200725174A TW 200725174 A TW200725174 A TW 200725174A TW 095133894 A TW095133894 A TW 095133894A TW 95133894 A TW95133894 A TW 95133894A TW 200725174 A TW200725174 A TW 200725174A
Authority
TW
Taiwan
Prior art keywords
display device
photosensitive composition
substrate
color filter
production method
Prior art date
Application number
TW095133894A
Other languages
English (en)
Inventor
Akira Hatakeyama
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200725174A publication Critical patent/TW200725174A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
TW095133894A 2005-09-16 2006-09-13 Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device TW200725174A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005270872 2005-09-16

Publications (1)

Publication Number Publication Date
TW200725174A true TW200725174A (en) 2007-07-01

Family

ID=37865122

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133894A TW200725174A (en) 2005-09-16 2006-09-13 Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device

Country Status (5)

Country Link
JP (1) JP5025642B2 (zh)
KR (1) KR20080046240A (zh)
CN (1) CN101263424B (zh)
TW (1) TW200725174A (zh)
WO (1) WO2007032552A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI758439B (zh) * 2017-05-23 2022-03-21 日商木本股份有限公司 層積遮光薄膜，以及使用其的光學機器用遮光環，透鏡單元及攝影機模組

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452425B (zh) * 2011-01-27 2014-09-11 Echem Solutions Corp A developerizable photosensitive resin composition for use in a panel structure
TWI788434B (zh) * 2017-10-27 2023-01-01 日商東京威力科創股份有限公司 光罩圖案形成方法、記憶媒體及基板處理裝置
CN111524921A (zh) * 2019-02-03 2020-08-11 同泰电子科技股份有限公司 互补式金属氧化物半导体感光组件、防护玻璃模块及制法
CN116157741A (zh) * 2020-08-25 2023-05-23 富士胶片株式会社 转印膜、层叠体的制造方法、电路配线的制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227009A (ja) * 1995-02-21 1996-09-03 Dainippon Printing Co Ltd カラーフィルタ
JPH11172150A (ja) * 1997-10-09 1999-06-29 Dainippon Printing Co Ltd 非導電性遮光層用組成物、非導電性遮光層、およびカラーフィルター
DE69911558T2 (de) * 1998-07-14 2004-06-24 Brewer Science, Inc. Fotoempfindliche zusammensetzung für schwarzmatrix und verfahren zur herstellung der zusammensetzung
JP2000194132A (ja) * 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
JP4528548B2 (ja) * 2003-04-18 2010-08-18 富士フイルム株式会社 表示装置用遮光膜
JP2004334181A (ja) * 2003-04-18 2004-11-25 Fuji Photo Film Co Ltd 表示装置用遮光膜
JP4223487B2 (ja) * 2005-02-17 2009-02-12 住友大阪セメント株式会社 黒色微粒子と黒色微粒子分散液及び黒色遮光膜並びに黒色遮光膜付き基材
JP4437063B2 (ja) * 2004-09-21 2010-03-24 住友大阪セメント株式会社 黒色材料
JP2006267998A (ja) * 2005-02-28 2006-10-05 Fuji Photo Film Co Ltd 記録材料用樹脂組成物、感光性転写材料、表示装置用遮光膜及びその形成方法、遮光膜付基板、液晶表示素子、並びに液晶表示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI758439B (zh) * 2017-05-23 2022-03-21 日商木本股份有限公司 層積遮光薄膜，以及使用其的光學機器用遮光環，透鏡單元及攝影機模組

Also Published As

Publication number Publication date
WO2007032552A1 (en) 2007-03-22
KR20080046240A (ko) 2008-05-26
CN101263424B (zh) 2011-12-14
CN101263424A (zh) 2008-09-10
JP2009509176A (ja) 2009-03-05
JP5025642B2 (ja) 2012-09-12

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