KR20070114391A - 도금기재 - Google Patents

도금기재 Download PDF

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Publication number
KR20070114391A
KR20070114391A KR1020077023727A KR20077023727A KR20070114391A KR 20070114391 A KR20070114391 A KR 20070114391A KR 1020077023727 A KR1020077023727 A KR 1020077023727A KR 20077023727 A KR20077023727 A KR 20077023727A KR 20070114391 A KR20070114391 A KR 20070114391A
Authority
KR
South Korea
Prior art keywords
plating
film
electroless
less
plating film
Prior art date
Application number
KR1020077023727A
Other languages
English (en)
Korean (ko)
Inventor
아키히로 아이바
가즈미 가와무라
히로후미 다카하시
Original Assignee
닛코킨조쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닛코킨조쿠 가부시키가이샤 filed Critical 닛코킨조쿠 가부시키가이샤
Publication of KR20070114391A publication Critical patent/KR20070114391A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1651—Two or more layers only obtained by electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/072—Electroless plating, e.g. finish plating or initial plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/073—Displacement plating, substitution plating or immersion plating, e.g. for finish plating
KR1020077023727A 2005-04-01 2006-03-13 도금기재 KR20070114391A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00105625 2005-04-01
JP2005105625 2005-04-01

Publications (1)

Publication Number Publication Date
KR20070114391A true KR20070114391A (ko) 2007-12-03

Family

ID=37114947

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077023727A KR20070114391A (ko) 2005-04-01 2006-03-13 도금기재

Country Status (6)

Country Link
JP (1) JP4926053B2 (ja)
KR (1) KR20070114391A (ja)
CN (2) CN101151399B (ja)
HK (1) HK1116838A1 (ja)
TW (1) TWI316095B (ja)
WO (1) WO2006112215A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007031740A (ja) * 2005-07-22 2007-02-08 Shinko Electric Ind Co Ltd 電子部品及びその製造方法
JP5288362B2 (ja) * 2007-01-17 2013-09-11 奥野製薬工業株式会社 多層めっき皮膜及びプリント配線板
JP5013077B2 (ja) 2007-04-16 2012-08-29 上村工業株式会社 無電解金めっき方法及び電子部品
EP2177646B1 (en) * 2008-10-17 2011-03-23 ATOTECH Deutschland GmbH Stress-reduced Ni-P/Pd stacks for bondable wafer surfaces
JP5680342B2 (ja) * 2009-09-02 2015-03-04 Tdk株式会社 めっき膜、プリント配線板及びモジュール基板
WO2011099597A1 (ja) * 2010-02-15 2011-08-18 荏原ユージライト株式会社 プリント配線板の製造方法
CN102802364B (zh) * 2012-09-11 2014-11-05 深圳市和美精艺科技有限公司 一种在印刷电路板的导电层中设置金属钯层的方法及其层状结构
JP6466521B2 (ja) * 2017-06-28 2019-02-06 小島化学薬品株式会社 無電解めっきプロセス
EP3730671A4 (en) * 2017-12-19 2021-08-18 JX Nippon Mining & Metals Corporation SEMICONDUCTOR WAFER AND METHOD OF MANUFACTURING THEREOF

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04307736A (ja) * 1991-04-04 1992-10-29 Canon Inc 微細多層構造半導体素子の配線方法
JPH081980B2 (ja) * 1993-11-25 1996-01-10 大日工業株式会社 プリント配線板及びその製造方法
JP2785102B2 (ja) * 1994-03-31 1998-08-13 株式会社ジャパンエナジー 無電解金めっき方法
JP3345529B2 (ja) * 1995-06-20 2002-11-18 日立化成工業株式会社 ワイヤボンディング用端子とその製造方法並びにそのワイヤボンディング端子を用いた半導体搭載用基板の製造方法
JPH09172236A (ja) * 1995-12-20 1997-06-30 Seiichi Serizawa プリント配線板
JPH10287994A (ja) * 1997-04-14 1998-10-27 World Metal:Kk ボンディング部のメッキ構造
JP2001358164A (ja) * 2000-06-13 2001-12-26 Ne Chemcat Corp 無電解多層めっき皮膜が形成された電極及びその製造方法
CN1143656C (zh) * 2001-01-10 2004-03-31 中国科学院上海原子核研究所 一种32p放射性血管支架及其制作方法
JP2003226993A (ja) * 2002-02-01 2003-08-15 Electroplating Eng Of Japan Co 金メッキ液及び金メッキ処理方法

Also Published As

Publication number Publication date
WO2006112215A1 (ja) 2006-10-26
HK1116838A1 (en) 2009-01-02
TWI316095B (en) 2009-10-21
JP4926053B2 (ja) 2012-05-09
CN101151399B (zh) 2010-12-29
CN101942652B (zh) 2012-06-27
CN101151399A (zh) 2008-03-26
TW200643215A (en) 2006-12-16
JPWO2006112215A1 (ja) 2008-12-04
CN101942652A (zh) 2011-01-12

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application
J201 Request for trial against refusal decision
J301 Trial decision

Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20091104

Effective date: 20111028