KR20050109476A - 감광성 수지 조성물 및 그 경화물 - Google Patents
감광성 수지 조성물 및 그 경화물 Download PDFInfo
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- KR20050109476A KR20050109476A KR1020057014185A KR20057014185A KR20050109476A KR 20050109476 A KR20050109476 A KR 20050109476A KR 1020057014185 A KR1020057014185 A KR 1020057014185A KR 20057014185 A KR20057014185 A KR 20057014185A KR 20050109476 A KR20050109476 A KR 20050109476A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/773—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur halogens
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/067—Polyurethanes; Polyureas
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/4833—Polyethers containing oxyethylene units
- C08G18/4837—Polyethers containing oxyethylene units and other oxyalkylene units
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/50—Polyethers having heteroatoms other than oxygen
- C08G18/5003—Polyethers having heteroatoms other than oxygen having halogens
- C08G18/5015—Polyethers having heteroatoms other than oxygen having halogens having fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/50—Polyethers having heteroatoms other than oxygen
- C08G18/5021—Polyethers having heteroatoms other than oxygen having nitrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/50—Polyethers having heteroatoms other than oxygen
- C08G18/5072—Polyethers having heteroatoms other than oxygen containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Abstract
Description
주 | 실시예 1 | 실시예 2 | 실시예 4 | 실시예 5 | ||
수지 용액 | A-1 | 51.80 | ||||
A-2 | 51.80 | |||||
A-6 | 51.80 | |||||
A-7 | 51.80 | |||||
반응성 가교제 (C) | DPCA-60 | 1 | 3.38 | 3.38 | ||
HX-220 | 2 | 3.38 | 3.38 | |||
광중합 개시제 (B) | 이르가큐어907 | 3 | 4.50 | 4.50 | 4.50 | 4.50 |
DETX-S | 4 | 0.45 | 0.45 | 0.45 | 0.45 | |
경화 성분 (D) | YX-4000 | 5 | 17.62 | 17.62 | ||
NC-3000 | 6 | 17.62 | 17.62 | |||
열경화 촉매 | 멜라민 | 1.00 | 1.00 | 1.00 | 1.00 | |
필러 등 | 황산바륨 | 15.15 | 15.15 | 15.15 | 15.15 | |
프탈로시아닌 블루 | 0.45 | 0.45 | 0.45 | 0.45 | ||
첨가제 | BYK-354 | 7 | 0.39 | 0.39 | 0.39 | 0.39 |
KS-66 | 8 | 0.39 | 0.39 | 0.39 | 0.39 | |
용제 | CA | 9 | 4.87 | 4.87 | 4.87 | 4.87 |
평가 항목 | 실시예 1 | 실시예 2 | 실시예 4 | 실시예 5 |
택성 | ○ | ○ | ○ | ○ |
현상성 | ○ | ○ | ○ | ○ |
해상성 | ○ | ○ | ○ | ○ |
광감도 | 10 | 10 | 10 | 11 |
표면 광택 | ○ | ○ | ○ | ○ |
표면 휨 | ○ | ○ | ○ | ○ |
굴곡성 | ○ | ○ | ○ | ○ |
밀착성 | ○ | ○ | ○ | ○ |
연필 경도 | 5H | 4H | 4H | 5H |
내용제성 | ○ | ○ | ○ | ○ |
내산성 | ○ | ○ | ○ | ○ |
내열성 | ○ | ○ | △ | ○ |
내금도금성 | ○ | ○ | ○ | ○ |
내 PCT 성 | ○ | ○ | ○ | ○ |
내열 충격성 | ○ | ○ | ○ | ○ |
Claims (12)
- ① 디이소시아네이트 화합물 (a), 분자 중에 에틸렌성 불포화기를 갖는 디올 화합물 (b), 분자 중에 카르복실기를 갖는 디올 화합물 (c), 임의 성분으로서, 분자 중에 에틸렌성 불포화기 또는 카르복실기를 갖지 않는 디올 화합물 (d) 를 무촉매 하에서 우레탄화 반응시키고, 환상 산무수물 (e) 를 반응시켜 얻어지는 알칼리 수용액 가용성 우레탄 수지 (A),② 광중합 개시제 (B),③ 반응성 가교제 (C)를 함유하는 것을 특징으로 하는 감광성 수지 조성물.
- 제 1 항에 있어서, 추가로, 임의 성분으로서 경화 성분 (D) 를 함유하는 것을 특징으로 하는 감광성 수지 조성물.
- 제 1 항 또는 제 2 항에 있어서, 알칼리 수용액 가용성 우레탄 수지 (A) 의 고형분 산가가 30 ∼ 150 ㎎KOH/g 인 감광성 수지 조성물.
- 제 1 항 내지 제 3 항 중 어느 한 항에 있어서, 분자 중에 에틸렌성 불포화기를 갖는 디올 화합물 (b) 가, 분자 중에 2 개의 에폭시기를 갖는 에폭시 화합물과, (메트)아크릴산 또는 신남산의 반응 생성물이고, 환상 산무수물 (e) 가 2염기산 1무수물 및/또는 3염기산 1무수물인 감광성 수지 조성물.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서, 디이소시아네이트 화합물 (a) 가 이소포론디이소시아네이트 및/또는 트리메틸헥사메틸렌디이소시아네이트이고, 분자 중에 에틸렌성 불포화기를 갖는 디올 화합물 (b) 가, 비스페놀-A 형 에폭시 수지와 메타크릴산의 반응 생성물이고, 분자 중에 카르복실기를 갖는 디올 화합물 (c) 가 디메틸올프로피온산이며, 환상 산무수물 (e) 가 무수숙신산인 감광성 수지 조성물.
- 제 1 항 또는 제 2 항에 있어서, 알칼리 수용액 가용성 우레탄 수지 (A) 가, 비스페놀-A 형 에폭시 수지와 메타크릴산의 반응 생성물과, 디메틸올프로피온산의 혼합물에 트리메틸헥사메틸렌디이소시아네이트를 첨가하여 반응시키고, 이어서 무수숙신산을 반응시켜 얻어지는 수지인 감광성 수지 조성물.
- 제 5 항 또는 제 6 항에 있어서, 비스페놀-A 형 에폭시 수지의 에폭시 당량이 100 ∼ 900 g/당량인 감광성 수지 조성물.
- 제 6 항에 있어서, 알칼리 수용액 가용성 우레탄 수지 (A) 를 얻는 반응시에, 트리메틸헥사메틸렌디이소시아네이트의 이소시아네이트기에 대한, 비스페놀-A 형 에폭시 수지와 메타크릴산의 반응 생성물과, 디메틸올프로피온산의 혼합물 중의 수산기의 당량비가 1.1 ∼ 2.0 인 감광성 수지 조성물.
- 제 1 항 내지 제 8 항 중 어느 한 항에 기재된 감광성 수지 조성물에 활성 에너지선을 조사하는 것을 특징으로 하는 경화물의 제조법.
- 제 9 항에 기재된 제조법에 의한 경화물의 층을 갖는 기재.
- 제 10 항에 기재된 기재를 갖는 물품.
- 제 1 항 내지 제 8 항 중 어느 한 항에 기재된 감광성 수지 조성물을 도포하고, 활성 에너지선을 조사하여 경화시키고, 알칼리 처리 및/또는 열 처리하는 공정을 포함하는 것을 특징으로 하는 플렉서블 프린트 배선판용 솔더 마스터, 다층 프린트 배선판용 층간 절연막 또는 감광성 광도파로의 제조법.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003059309 | 2003-03-06 | ||
JPJP-P-2003-00059309 | 2003-03-06 | ||
JP2003166038 | 2003-06-11 | ||
JPJP-P-2003-00166038 | 2003-06-11 |
Publications (2)
Publication Number | Publication Date |
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KR20050109476A true KR20050109476A (ko) | 2005-11-21 |
KR100725432B1 KR100725432B1 (ko) | 2007-06-07 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020057014185A KR100725432B1 (ko) | 2003-03-06 | 2004-03-04 | 감광성 수지 조성물 및 그 경화물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7374862B2 (ko) |
EP (1) | EP1600812A1 (ko) |
JP (1) | JP4462500B2 (ko) |
KR (1) | KR100725432B1 (ko) |
CA (1) | CA2518457A1 (ko) |
TW (1) | TWI301559B (ko) |
WO (1) | WO2004079452A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20110039452A (ko) * | 2008-08-07 | 2011-04-18 | 다이요 홀딩스 가부시키가이샤 | 난연성 광 경화성 수지 조성물, 그의 드라이 필름 및 경화물, 및 이들을 사용한 인쇄 배선판 |
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JP2006243563A (ja) * | 2005-03-04 | 2006-09-14 | Fuji Photo Film Co Ltd | 感光性ソルダーレジスト組成物及び感光性ソルダーレジストフィルム、並びに、永久パターン及びその形成方法 |
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KR100738126B1 (ko) | 2006-06-21 | 2007-07-10 | 현대자동차주식회사 | 고내열 자외선 경화 수성폴리우레탄 수지의 제조 방법 |
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JP5395552B2 (ja) * | 2009-07-28 | 2014-01-22 | 京セラケミカル株式会社 | 感光性熱硬化型樹脂組成物及びフレキシブルプリント配線板 |
JP5638866B2 (ja) * | 2009-12-09 | 2014-12-10 | 日本化薬株式会社 | ポリウレタン化合物、それを含有する活性エネルギー線硬化型樹脂組成物及びその用途 |
KR101405765B1 (ko) * | 2010-04-13 | 2014-06-10 | 쇼와 덴코 가부시키가이샤 | 부가 공중합체, 감광성 수지 조성물 및 컬러 필터 |
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JP2012181281A (ja) * | 2011-02-28 | 2012-09-20 | Fujifilm Corp | プリント配線基板 |
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CN110684177A (zh) * | 2019-10-15 | 2020-01-14 | 桂林理工大学 | 一种水性紫外光固化涂料专用酒石酸酐改性环氧丙烯酸酸酯树脂及其制备方法 |
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- 2004-03-04 EP EP04717285A patent/EP1600812A1/en not_active Withdrawn
- 2004-03-04 WO PCT/JP2004/002718 patent/WO2004079452A1/ja active Application Filing
- 2004-03-04 JP JP2005503090A patent/JP4462500B2/ja not_active Expired - Lifetime
- 2004-03-04 CA CA002518457A patent/CA2518457A1/en not_active Abandoned
- 2004-03-04 US US10/547,907 patent/US7374862B2/en not_active Expired - Fee Related
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20110039452A (ko) * | 2008-08-07 | 2011-04-18 | 다이요 홀딩스 가부시키가이샤 | 난연성 광 경화성 수지 조성물, 그의 드라이 필름 및 경화물, 및 이들을 사용한 인쇄 배선판 |
Also Published As
Publication number | Publication date |
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EP1600812A1 (en) | 2005-11-30 |
WO2004079452A1 (ja) | 2004-09-16 |
CA2518457A1 (en) | 2004-09-16 |
KR100725432B1 (ko) | 2007-06-07 |
JPWO2004079452A1 (ja) | 2006-06-08 |
TW200502690A (en) | 2005-01-16 |
JP4462500B2 (ja) | 2010-05-12 |
US20060102051A1 (en) | 2006-05-18 |
TWI301559B (en) | 2008-10-01 |
US7374862B2 (en) | 2008-05-20 |
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