KR20050057017A - 고순도 황산동 및 그 제조방법 - Google Patents
고순도 황산동 및 그 제조방법 Download PDFInfo
- Publication number
- KR20050057017A KR20050057017A KR1020057003425A KR20057003425A KR20050057017A KR 20050057017 A KR20050057017 A KR 20050057017A KR 1020057003425 A KR1020057003425 A KR 1020057003425A KR 20057003425 A KR20057003425 A KR 20057003425A KR 20050057017 A KR20050057017 A KR 20050057017A
- Authority
- KR
- South Korea
- Prior art keywords
- copper sulfate
- ppm
- high purity
- purity
- less
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/10—Sulfates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G3/00—Compounds of copper
- C01G3/12—Sulfides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B15/00—Obtaining copper
- C22B15/0063—Hydrometallurgy
- C22B15/0084—Treating solutions
- C22B15/0089—Treating solutions by chemical methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Abstract
Description
Claims (13)
- 황산동 결정을 순수로 용해한 후, 증발 농축을 행하여, 초기에 석출하는 결정을 제거한 후, 다시 증발 농축하는 것에 의해 결정화시켜, 이것을 여과하여 고순도 황산동으로 하며, 다시 건조하는 것을 특징으로 하는 고순도 황산동의 제조방법
- 제1항에 있어서, 황산동을 순수로 용해한 용액의 초기 pH를 2~4로 하며, 초기에 석출하는 결정을 제거한 후의 용액의 pH를 2 이하로 하는 것을 특징으로 하는 고순도 황산동의 제조방법
- 제1항 또는 제2항에 있어서, 초기 투입량에 대하여 10 wt% 이상의 초기 결정을 제거하는 것을 특징으로 하는 고순도 황산동의 제조방법
- 제1항 내지 제3항 중 어느 한 항에 있어서, 최종 여과 후의 여과액을 원(元) 액량의 2~40%로 하는 것을 특징으로 하는 고순도 황산동의 제조방법
- 제1항 내지 제4항 중 어느 한 항에 있어서, 건조 온도가 40~100℃인 것을 특징으로 하는 고순도 황산동의 제조방법
- 순도가 99.99 wt% 이상이며, Fe, Cr, Ni 등의 천이금속이 3 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 제1항 내지 제5항 중 어느 한 항의 방법으로 제조된, 순도가 99.99 wt% 이상이며, Fe, Cr, Ni 등의 천이금속이 3 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 순도가 99.99 wt% 이상이며, Ag, Cl 함유량이 각각 1 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 제7항에 있어서, 순도가 99.99 wt% 이상이며, Ag, Cl 함유량이 각각 1 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 순도가 99.99 wt% 이상이며, Na, K, Ca, Mg의 알칼리 금속, 알칼리 토류 금속 함유량이 각각 1 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 제9항에 있어서, 순도가 99.99 wt% 이상이며, Na, K, Ca, Mg의 알칼리 금속, 알칼리 토류 금속 함유량이 각각 1 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 순도가 99.99 wt% 이상이며, 산화물을 포함하는 Si 함유량이 Si 환산으로 10 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
- 제11항에 있어서, 순도가 99.99 wt% 이상이며, 산화물을 포함하는 Si 함유량이 Si 환산으로 10 wt ppm 이하인 것을 특징으로 하는 고순도 황산동
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002259755 | 2002-09-05 | ||
JPJP-P-2002-00259755 | 2002-09-05 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077015227A Division KR20070086900A (ko) | 2002-09-05 | 2003-08-12 | 고순도 황산동 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050057017A true KR20050057017A (ko) | 2005-06-16 |
KR100745355B1 KR100745355B1 (ko) | 2007-08-02 |
Family
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Application Number | Title | Priority Date | Filing Date |
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KR1020077015227A KR20070086900A (ko) | 2002-09-05 | 2003-08-12 | 고순도 황산동 및 그 제조방법 |
KR1020057003425A KR100745355B1 (ko) | 2002-09-05 | 2003-08-12 | 고순도 황산동 및 그 제조방법 |
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KR1020077015227A KR20070086900A (ko) | 2002-09-05 | 2003-08-12 | 고순도 황산동 및 그 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7887603B2 (ko) |
JP (1) | JP3987069B2 (ko) |
KR (2) | KR20070086900A (ko) |
CN (1) | CN1301910C (ko) |
TW (1) | TW200404746A (ko) |
WO (1) | WO2004022486A1 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20070086900A (ko) * | 2002-09-05 | 2007-08-27 | 닛코킨조쿠 가부시키가이샤 | 고순도 황산동 및 그 제조방법 |
KR20070120622A (ko) * | 2003-09-04 | 2007-12-24 | 닛코킨조쿠 가부시키가이샤 | 고순도 황산동 및 그 제조방법 |
JP4931196B2 (ja) * | 2005-11-08 | 2012-05-16 | 学校法人早稲田大学 | 無電解銅めっき浴、無電解銅めっき方法及びulsi銅配線形成方法 |
JP5066025B2 (ja) * | 2007-08-01 | 2012-11-07 | パンパシフィック・カッパー株式会社 | 硫酸銅の製造方法 |
EP2684970A4 (en) * | 2011-03-07 | 2015-03-04 | Jx Nippon Mining & Metals Corp | COPPER OR COPPER ALLOY HAVING REDUCED RAY EMISSION AND CONNECTING WIRE OBTAINED FROM COPPER OR COPPER ALLOY AS RAW MATERIAL |
CN103842561B (zh) * | 2011-09-28 | 2016-03-30 | 日立金属株式会社 | 镍电镀液中的稀土杂质的除去方法 |
CN105051263B (zh) * | 2013-03-25 | 2018-05-29 | 日立金属株式会社 | 镍电镀液中的稀土类杂质的除去方法 |
US9873953B2 (en) * | 2013-03-25 | 2018-01-23 | Hitachi Metals, Ltd. | Method for removing rare earth impurities from nickel-electroplating solution |
CN108689426A (zh) * | 2017-03-31 | 2018-10-23 | Jx金属株式会社 | 硫酸铜、其制造方法及其溶液、镀敷液、半导体电路基板的制造方法及电子机器的制造方法 |
US10519558B2 (en) | 2017-04-28 | 2019-12-31 | Jx Nippon Mining & Metals Corporation | Copper sulfate, copper sulfate solution, plating solution, method for producing copper sulfate, method for producing semiconductor circuit board, and method for producing electronic apparatus |
KR102147753B1 (ko) | 2018-10-15 | 2020-08-25 | 조창덕 | 빵 제조기 |
KR102375042B1 (ko) | 2021-05-06 | 2022-03-15 | 김동현 | 폐황산구리용액 필터링장치 |
KR102632733B1 (ko) | 2021-05-18 | 2024-02-02 | 주식회사 삼경이엔씨 | 폐황산구리용액 재사용 필터링장치 |
CN113213525B (zh) * | 2021-05-25 | 2023-06-20 | 广东致卓环保科技有限公司 | 一种晶形为球体的五水硫酸铜的制备工艺 |
CN114016047A (zh) * | 2021-12-03 | 2022-02-08 | 江苏艾森半导体材料股份有限公司 | 一种五水硫酸铜晶体及其制备方法 |
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KR20070086900A (ko) | 2002-09-05 | 2007-08-27 | 닛코킨조쿠 가부시키가이샤 | 고순도 황산동 및 그 제조방법 |
KR20070120622A (ko) * | 2003-09-04 | 2007-12-24 | 닛코킨조쿠 가부시키가이샤 | 고순도 황산동 및 그 제조방법 |
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2003
- 2003-08-12 KR KR1020077015227A patent/KR20070086900A/ko active Search and Examination
- 2003-08-12 US US10/522,273 patent/US7887603B2/en active Active
- 2003-08-12 CN CNB038200295A patent/CN1301910C/zh not_active Expired - Lifetime
- 2003-08-12 JP JP2004534102A patent/JP3987069B2/ja not_active Expired - Lifetime
- 2003-08-12 WO PCT/JP2003/010251 patent/WO2004022486A1/ja active Application Filing
- 2003-08-12 KR KR1020057003425A patent/KR100745355B1/ko active IP Right Grant
- 2003-08-14 TW TW092122337A patent/TW200404746A/zh not_active IP Right Cessation
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2010
- 2010-10-21 US US12/908,972 patent/US8152864B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1678532A (zh) | 2005-10-05 |
US20050232849A1 (en) | 2005-10-20 |
US7887603B2 (en) | 2011-02-15 |
US8152864B2 (en) | 2012-04-10 |
WO2004022486A1 (ja) | 2004-03-18 |
JPWO2004022486A1 (ja) | 2005-12-22 |
US20110033369A1 (en) | 2011-02-10 |
JP3987069B2 (ja) | 2007-10-03 |
CN1301910C (zh) | 2007-02-28 |
TW200404746A (en) | 2004-04-01 |
TWI297325B (ko) | 2008-06-01 |
KR20070086900A (ko) | 2007-08-27 |
KR100745355B1 (ko) | 2007-08-02 |
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