KR20040094871A - 불포화기 함유 다분지 화합물, 그것을 함유하는 경화성조성물 및 그 경화물 - Google Patents
불포화기 함유 다분지 화합물, 그것을 함유하는 경화성조성물 및 그 경화물 Download PDFInfo
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Abstract
Description
Claims (15)
- 말단부에 감광성의 불포화 이중 결합을 2 개 이상 갖는 다분지 구조를 갖는 것을 특징으로 하는 불포화기 함유 다분지 화합물.
- 제1항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b) 분자 중에 2 개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 카르복실기를 갖는 화합물과, (c) 불포화 모노카르복실산과의 반응에 의해 얻어진 것인 불포화기 함유 다분지 화합물.
- 제1항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b) 분자 중에 2개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 카르복실기를 갖는 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어진 것인 불포화기 함유 다분지 화합물.
- 제1항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b') 분자 중에 2 개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 수산기를 갖는 페놀 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어진 것인 불포화기 함유다분지 화합물.
- 제1항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b") 분자 중에 각각 1 개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 합계 관능기 수가 3 개 이상)의 카르복실기 및 페놀성 수산기를 갖는 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어진 것인 불포화기 함유 다분지 화합물.
- 말단부에 감광성의 불포화 이중 결합을 2 개 이상 가지고, 또한 카르복실기를 1 개 이상 갖는 다분지 구조를 갖는 것을 특징으로 하는 불포화기 함유 다분지 화합물.
- 제6항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b) 분자 중에 2개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 카르복실기를 갖는 화합물과, (c) 불포화 모노카르복실산과의 반응에 의해 얻어지는 불포화기 함유 다분지 화합물의 수산기에, 추가로 (d) 다염기산 무수물을 반응시켜 얻어진 것인 불포화기 함유 다분지 화합물.
- 제6항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b) 분자 중에 2개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 카르복실기를 갖는 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어지는 불포화기 함유 다분지 화합물의 수산기에, 추가로 (d) 다염기산 무수물을 반응시켜 얻어진 것인 불포화기 함유 다분지 화합물.
- 제6항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b') 분자 중에 2 개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 3 개 이상)의 수산기를 갖는 페놀 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어지는 불포화기 함유 다분지 화합물의 수산기에, 추가로 (d) 다염기산 무수물을 반응시켜 얻어진 것인 불포화기 함유 다분지 화합물.
- 제6항에 있어서, 상기 화합물이, (a) 분자 중에 2 개 이상의 에폭시기를 갖는 화합물과, (b") 분자 중에 각각 1 개 이상 (단, 상기 (a) 성분이 2 개의 에폭시기를 갖는 화합물인 경우, 합계 관능기 수가 3 개 이상)의 카르복실기 및 페놀성 수산기를 갖는 화합물과, (c') 1 개 이상의 불포화 이중 결합기를 갖는 화합물과의 반응에 의해 얻어지는 불포화기 함유 다분지 화합물의 수산기에, 추가로 (d) 다염기산 무수물을 반응시켜 얻어진 것인 불포화기 함유 다분지 화합물.
- (A) 제1항 내지 제10항 중 어느 한 항에 기재된 불포화기 함유 다분지 화합물 및 (B) 중합 개시제를 필수 성분으로서 함유하는 것을 특징으로 하는 경화성 조성물.
- (A) 제1항 내지 제10항 중 어느 한 항에 기재된 2종류 이상의 불포화기 함유 다분지 화합물, 및 (B) 중합 개시제를 필수 성분으로서 함유하는 것을 특징으로 하는 경화성 조성물.
- 제11항 또는 제12항에 있어서, (C) 열경화성 성분을 더 함유하는 것을 특징으로 하는 경화성 조성물.
- 제11항 내지 제13항 중 어느 한 항에 기재된 경화성 조성물을 활성 에너지선 조사 및(또는) 가열에 의해 경화시켜 얻어지는 경화물.
- 소정의 회로 패턴의 도체층을 갖는 회로 기판 상에 영구 보호막으로서의 솔더 레지스트 피막이 형성된 인쇄 배선판으로서, 상기 솔더 레지스트 피막이 제11항 내지 제13항 중 어느 한 항에 기재된 경화성 조성물의 경화 도막을 포함하는 것을 특징으로 하는 인쇄 배선판.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2002-00097023 | 2002-03-29 | ||
JP2002097023 | 2002-03-29 | ||
JP2002360311 | 2002-12-12 | ||
JPJP-P-2002-00360311 | 2002-12-12 | ||
PCT/JP2003/004121 WO2003087186A1 (fr) | 2002-03-29 | 2003-03-31 | Composes insatures a ramifications multiples, compositions durcissables les contenant, et articles durcis qu'ils permettent de realiser |
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KR20040094871A true KR20040094871A (ko) | 2004-11-10 |
KR100928386B1 KR100928386B1 (ko) | 2009-11-23 |
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US (1) | US20050064336A1 (ko) |
JP (1) | JP3960971B2 (ko) |
KR (1) | KR100928386B1 (ko) |
CN (1) | CN1318473C (ko) |
AU (1) | AU2003221053A1 (ko) |
TW (1) | TW200306339A (ko) |
WO (1) | WO2003087186A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20130004110A (ko) * | 2011-06-29 | 2013-01-09 | 토요켐주식회사 | 감광성 수지 조성물 및 그의 경화물, 그리고 감광성 솔더 레지스트 잉크, 드라이 필름형 감광성 솔더 레지스트 및, 감광성 수지의 제조 방법 |
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JP2005239817A (ja) * | 2004-02-25 | 2005-09-08 | Dainippon Ink & Chem Inc | 酸ペンダント型エポキシアクリレート樹脂の製造方法および硬化性樹脂組成物 |
JPWO2006025236A1 (ja) * | 2004-09-03 | 2008-05-08 | 東洋紡績株式会社 | 活性光線硬化型ハイパーブランチポリマーおよびそれを用いた活性光線硬化型樹脂組成物 |
JP4585843B2 (ja) * | 2004-12-14 | 2010-11-24 | 四国化成工業株式会社 | トリアジン化合物 |
JP2006182834A (ja) * | 2004-12-27 | 2006-07-13 | Shikoku Chem Corp | トリアジン化合物 |
US9244352B2 (en) * | 2009-05-20 | 2016-01-26 | Rohm And Haas Electronic Materials, Llc | Coating compositions for use with an overcoated photoresist |
TW201235783A (en) * | 2010-12-10 | 2012-09-01 | Sumitomo Chemical Co | Photosensitive resin composition |
JP6181907B2 (ja) | 2011-11-15 | 2017-08-16 | 互応化学工業株式会社 | カルボキシル基含有樹脂及びソルダーレジスト用樹脂組成物 |
WO2014109186A1 (ja) * | 2013-01-09 | 2014-07-17 | 日産化学工業株式会社 | レジスト下層膜形成組成物 |
WO2018173679A1 (ja) * | 2017-03-22 | 2018-09-27 | Dic株式会社 | 酸基含有(メタ)アクリレート樹脂及びソルダーレジスト用樹脂材料 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE568567A (ko) * | 1957-06-12 | 1900-01-01 | ||
CA1091690A (en) * | 1976-01-19 | 1980-12-16 | Martin C. Cornell, Iii | Latent catalysts for promoting reaction of epoxides with phenols and/or carboxylic acids |
US4100045A (en) * | 1975-12-29 | 1978-07-11 | The Dow Chemical Company | Radiation curable epoxy coating composition of dimer acid modified vinyl ester resin |
US4129488A (en) * | 1976-11-08 | 1978-12-12 | Scm Corporation | Ultraviolet curable epoxy-polyester powder paints |
US5721076A (en) * | 1992-06-19 | 1998-02-24 | Nippon Steel Corporation | Color filters and materials and resins therefor |
EP0733683A4 (en) * | 1994-10-05 | 1998-04-01 | Goo Chemical Co Ltd | PHOTOSOLDERING RESIST INK, PRINTED CIRCUIT BOARD, AND MANUFACTURING METHOD |
SE503342C2 (sv) * | 1994-10-24 | 1996-05-28 | Perstorp Ab | Hyperförgrenad makromolekyl av polyestertyp samt förfarande för dess framställning |
US5858618A (en) * | 1996-12-02 | 1999-01-12 | Nan Ya Plastics Corporation | Photopolymerizable resinous composition |
JPH1160540A (ja) * | 1997-08-18 | 1999-03-02 | Nippon Steel Chem Co Ltd | 芳香族エステル(メタ)アクリレートデンドリマー及び硬化性樹脂組成物 |
JP2970664B2 (ja) * | 1997-10-27 | 1999-11-02 | 東洋インキ製造株式会社 | 多分岐化合物および硬化性組成物 |
JP2000330278A (ja) * | 1999-05-25 | 2000-11-30 | Taiyo Ink Mfg Ltd | 感光性樹脂組成物 |
JP4558178B2 (ja) * | 2000-11-30 | 2010-10-06 | 新日鐵化学株式会社 | 光又は熱硬化性樹脂組成物及びプリント配線基板 |
-
2003
- 2003-03-31 TW TW092107428A patent/TW200306339A/zh unknown
- 2003-03-31 AU AU2003221053A patent/AU2003221053A1/en not_active Abandoned
- 2003-03-31 KR KR1020047015290A patent/KR100928386B1/ko active IP Right Grant
- 2003-03-31 CN CNB038075512A patent/CN1318473C/zh not_active Expired - Lifetime
- 2003-03-31 WO PCT/JP2003/004121 patent/WO2003087186A1/ja active Application Filing
- 2003-03-31 JP JP2003584140A patent/JP3960971B2/ja not_active Expired - Lifetime
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2004
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20130004110A (ko) * | 2011-06-29 | 2013-01-09 | 토요켐주식회사 | 감광성 수지 조성물 및 그의 경화물, 그리고 감광성 솔더 레지스트 잉크, 드라이 필름형 감광성 솔더 레지스트 및, 감광성 수지의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
CN1318473C (zh) | 2007-05-30 |
CN1646592A (zh) | 2005-07-27 |
AU2003221053A1 (en) | 2003-10-27 |
US20050064336A1 (en) | 2005-03-24 |
JP3960971B2 (ja) | 2007-08-15 |
TW200306339A (en) | 2003-11-16 |
JPWO2003087186A1 (ja) | 2005-08-18 |
WO2003087186A1 (fr) | 2003-10-23 |
KR100928386B1 (ko) | 2009-11-23 |
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