KR20040018561A - 이중 주파수로 전압 분배가 조절되는 플라즈마 반응기 - Google Patents

이중 주파수로 전압 분배가 조절되는 플라즈마 반응기 Download PDF

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Publication number
KR20040018561A
KR20040018561A KR10-2004-7002243A KR20047002243A KR20040018561A KR 20040018561 A KR20040018561 A KR 20040018561A KR 20047002243 A KR20047002243 A KR 20047002243A KR 20040018561 A KR20040018561 A KR 20040018561A
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KR
South Korea
Prior art keywords
electrode
variable impedance
high frequency
low frequency
chamber
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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KR10-2004-7002243A
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English (en)
Korean (ko)
Inventor
마이클 에스. 바네스
존 홀랜드
알렉산더 패터슨
발렌틴 토도로프
파하드 모가담
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20040018561A publication Critical patent/KR20040018561A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR10-2004-7002243A 2001-08-16 2002-08-15 이중 주파수로 전압 분배가 조절되는 플라즈마 반응기 Ceased KR20040018561A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/931,324 2001-08-16
US09/931,324 US6706138B2 (en) 2001-08-16 2001-08-16 Adjustable dual frequency voltage dividing plasma reactor
PCT/US2002/026008 WO2003017318A1 (en) 2001-08-16 2002-08-15 Plasma reactor with adjustable dual frequency voltage division

Publications (1)

Publication Number Publication Date
KR20040018561A true KR20040018561A (ko) 2004-03-03

Family

ID=25460600

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2004-7002243A Ceased KR20040018561A (ko) 2001-08-16 2002-08-15 이중 주파수로 전압 분배가 조절되는 플라즈마 반응기

Country Status (8)

Country Link
US (1) US6706138B2 (enExample)
EP (1) EP1417697A1 (enExample)
JP (1) JP4460288B2 (enExample)
KR (1) KR20040018561A (enExample)
CN (1) CN1317731C (enExample)
MY (1) MY132614A (enExample)
TW (1) TW554437B (enExample)
WO (1) WO2003017318A1 (enExample)

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KR100947678B1 (ko) * 2006-10-31 2010-03-16 어플라이드 머티어리얼스, 인코포레이티드 하부 피쳐의 레지스트 제거 및 퍼시트 제어를 위한플라즈마
KR20100120602A (ko) * 2009-05-06 2010-11-16 위순임 혼합형 플라즈마 반응기
KR20150037621A (ko) * 2013-09-30 2015-04-08 어플라이드 머티어리얼스, 인코포레이티드 고 주파수 무선 주파수에 대한 전극 임피던스를 튜닝하고 저 주파수 무선 주파수를 접지로 종단하기 위한 장치 및 방법
KR20150131093A (ko) * 2013-03-15 2015-11-24 어플라이드 머티어리얼스, 인코포레이티드 프로세싱 챔버에서 튜닝 전극을 사용하여 플라즈마 프로파일을 튜닝하기 위한 장치 및 방법

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KR100947678B1 (ko) * 2006-10-31 2010-03-16 어플라이드 머티어리얼스, 인코포레이티드 하부 피쳐의 레지스트 제거 및 퍼시트 제어를 위한플라즈마
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KR20150131093A (ko) * 2013-03-15 2015-11-24 어플라이드 머티어리얼스, 인코포레이티드 프로세싱 챔버에서 튜닝 전극을 사용하여 플라즈마 프로파일을 튜닝하기 위한 장치 및 방법
KR20150037621A (ko) * 2013-09-30 2015-04-08 어플라이드 머티어리얼스, 인코포레이티드 고 주파수 무선 주파수에 대한 전극 임피던스를 튜닝하고 저 주파수 무선 주파수를 접지로 종단하기 위한 장치 및 방법

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US6706138B2 (en) 2004-03-16
JP2005500684A (ja) 2005-01-06
JP4460288B2 (ja) 2010-05-12
CN1543662A (zh) 2004-11-03
TW554437B (en) 2003-09-21
EP1417697A1 (en) 2004-05-12
WO2003017318A1 (en) 2003-02-27
CN1317731C (zh) 2007-05-23
US20030037881A1 (en) 2003-02-27
MY132614A (en) 2007-10-31

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