JP4460288B2 - 基板処理装置及び電力分配方法 - Google Patents

基板処理装置及び電力分配方法 Download PDF

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Publication number
JP4460288B2
JP4460288B2 JP2003522128A JP2003522128A JP4460288B2 JP 4460288 B2 JP4460288 B2 JP 4460288B2 JP 2003522128 A JP2003522128 A JP 2003522128A JP 2003522128 A JP2003522128 A JP 2003522128A JP 4460288 B2 JP4460288 B2 JP 4460288B2
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electrode
variable impedance
impedance element
substrate support
power source
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Japanese (ja)
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JP2005500684A5 (enExample
JP2005500684A (ja
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マイケル， エス． バーンズ，
ジョン ホーランド，
アレキサンダー パターソン，
ヴァレンティン トドロフ，
ファルハド モグハダム，
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2003522128A 2001-08-16 2002-08-15 基板処理装置及び電力分配方法 Expired - Fee Related JP4460288B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/931,324 US6706138B2 (en) 2001-08-16 2001-08-16 Adjustable dual frequency voltage dividing plasma reactor
PCT/US2002/026008 WO2003017318A1 (en) 2001-08-16 2002-08-15 Plasma reactor with adjustable dual frequency voltage division

Publications (3)

Publication Number Publication Date
JP2005500684A JP2005500684A (ja) 2005-01-06
JP2005500684A5 JP2005500684A5 (enExample) 2009-01-15
JP4460288B2 true JP4460288B2 (ja) 2010-05-12

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JP2003522128A Expired - Fee Related JP4460288B2 (ja) 2001-08-16 2002-08-15 基板処理装置及び電力分配方法

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US (1) US6706138B2 (enExample)
EP (1) EP1417697A1 (enExample)
JP (1) JP4460288B2 (enExample)
KR (1) KR20040018561A (enExample)
CN (1) CN1317731C (enExample)
MY (1) MY132614A (enExample)
TW (1) TW554437B (enExample)
WO (1) WO2003017318A1 (enExample)

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KR20040018561A (ko) 2004-03-03
US20030037881A1 (en) 2003-02-27
CN1317731C (zh) 2007-05-23
CN1543662A (zh) 2004-11-03
TW554437B (en) 2003-09-21
MY132614A (en) 2007-10-31
EP1417697A1 (en) 2004-05-12
US6706138B2 (en) 2004-03-16
JP2005500684A (ja) 2005-01-06
WO2003017318A1 (en) 2003-02-27

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