KR20040012481A - 액체방울 토출 장치, 전기 광학 장치의 제조 방법, 전기광학 장치 및 전자 기기 - Google Patents
액체방울 토출 장치, 전기 광학 장치의 제조 방법, 전기광학 장치 및 전자 기기 Download PDFInfo
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- KR20040012481A KR20040012481A KR1020030048675A KR20030048675A KR20040012481A KR 20040012481 A KR20040012481 A KR 20040012481A KR 1020030048675 A KR1020030048675 A KR 1020030048675A KR 20030048675 A KR20030048675 A KR 20030048675A KR 20040012481 A KR20040012481 A KR 20040012481A
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- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 230000003287 optical effect Effects 0.000 title 2
- 239000007788 liquid Substances 0.000 claims abstract description 234
- 238000005259 measurement Methods 0.000 claims abstract description 18
- 230000007246 mechanism Effects 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 33
- 230000015572 biosynthetic process Effects 0.000 claims description 25
- 238000001514 detection method Methods 0.000 claims description 7
- 238000011068 loading method Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 121
- 239000000758 substrate Substances 0.000 description 73
- 239000004973 liquid crystal related substance Substances 0.000 description 59
- 239000010408 film Substances 0.000 description 51
- 238000002347 injection Methods 0.000 description 30
- 239000007924 injection Substances 0.000 description 30
- 230000033001 locomotion Effects 0.000 description 23
- 239000000463 material Substances 0.000 description 23
- 239000000203 mixture Substances 0.000 description 22
- 230000008569 process Effects 0.000 description 18
- 239000011159 matrix material Substances 0.000 description 14
- 238000012545 processing Methods 0.000 description 14
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 13
- 230000001681 protective effect Effects 0.000 description 11
- 239000003566 sealing material Substances 0.000 description 10
- 239000002346 layers by function Substances 0.000 description 9
- 239000012454 non-polar solvent Substances 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 9
- 239000011344 liquid material Substances 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- 238000011010 flushing procedure Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000004381 surface treatment Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000003028 elevating effect Effects 0.000 description 5
- 238000004321 preservation Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000007599 discharging Methods 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000008531 maintenance mechanism Effects 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- HBEDSQVIWPRPAY-UHFFFAOYSA-N 2,3-dihydrobenzofuran Chemical compound C1=CC=C2OCCC2=C1 HBEDSQVIWPRPAY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000008280 blood Substances 0.000 description 2
- 210000004369 blood Anatomy 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- VMTCKFAPVIWNOF-UHFFFAOYSA-N methane tetrahydrofluoride Chemical compound C.F.F.F.F VMTCKFAPVIWNOF-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- -1 or the like Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
- G02F1/13415—Drop filling process
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Coating Apparatus (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Ink Jet (AREA)
- Electroluminescent Light Sources (AREA)
- Common Mechanisms (AREA)
Abstract
Description
Claims (12)
- 워크(work)에 대하여 노즐면을 평행하게 대치(對峙)시켜 배열 설치한 기능 액체방울 토출 헤드와,상기 워크의 표면과 상기 노즐면 사이의 워크 갭을 측정하는 갭 측정 수단과,상기 갭 측정 수단의 측정 결과에 의거하여, 상기 기능 액체방울 토출 헤드 및 상기 워크를 상하 방향으로 상대적으로 이동시켜 상기 워크 갭을 조정하는 갭 조정 수단을 구비한 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 있어서,상기 기능 액체방울 토출 헤드는 캐리지에 탑재되어 있고,상기 갭 조정 수단은 상기 캐리지를 상하 방향으로 슬라이드 가능하게 지지하는 베이스와, 상기 베이스에 고정시킨 액추에이터와, 상기 액추에이터에 의해 정역(正逆) 회전하는 리드 나사와, 상기 캐리지에 설치되어 상기 리드 나사에 나사 결합되는 암나사부를 갖는 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 있어서,상기 갭 조정 수단은 상기 워크에 대하여 상기 기능 액체방울 토출 헤드를 상하 방향으로 이동시키는 것이며,상기 기능 액체방울 토출 헤드에 기능액을 공급하는 기능액 탱크와,상기 갭 측정 수단의 측정 결과에 의거하여, 상기 기능액 탱크를 승강시켜 상기 기능액 탱크에 대한 상기 기능 액체방울 토출 헤드의 수두(水頭)를 조정하는 수두 조정 수단을 더 구비한 것을 특징으로 하는 액체방울 토출 장치.
- 제 3 항에 있어서,상기 기능액 탱크는 탱크 홀더에 유지되어 있고,상기 수두 조정 수단은 상기 탱크 홀더를 상하 방향으로 슬라이드 가능하게 지지하는 탱크 베이스와, 상기 탱크 베이스에 고정시킨 액추에이터와, 상기 액추에이터에 의해 정역 회전하는 리드 나사와, 상기 탱크 홀더에 설치되어 상기 리드 나사에 나사 결합되는 암나사부를 갖는 것을 특징으로 하는 액체방울 토출 장치.
- 제 3 항에 있어서,상기 기능액 탱크에 기능액을 보급(補給)하는 기능액 보급 수단과,상기 기능액 탱크 내의 액위(液位)를 검출하는 액위 센서를 더 구비하고,상기 기능액 보급 수단은 상기 액위 센서의 검출 결과에 의거하여 상기 기능액 탱크 내의 액위가 일정해지도록 기능액을 보급하는 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 있어서,상기 기능 액체방울 토출 헤드는 캐리지에 탑재되어 있고,상기 갭 측정 수단은 상기 캐리지에 탑재되는 동시에 상하 방향에서의 상기 워크 위치를 계측하는 계측 수단과,상기 계측 수단의 계측 결과에 의거하여 상기 워크 갭을 산출하는 산출 수단을 갖는 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 있어서,상기 워크는 워크 테이블 위에 세트되어 있고,상기 갭 측정 수단은 상하 방향에서의 상기 워크 위치 및 상기 워크 테이블의 위치를 계측하는 계측 수단과,상기 계측 수단의 계측 결과에 의거하여 상기 워크 갭을 산출하는 산출 수단을 갖는 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 있어서,서로 충전하는 기능액 및/또는 사양이 상이한 복수 종류의 상기 기능 액체방울 토출 헤드와,상기 복수 종류의 기능 액체방울 토출 헤드를 교환 가능하게 탑재하는 캐리지와,상기 복수 종류의 기능 액체방울 토출 헤드를 교환 가능하게 스톡(stock)하는 스토커(stocker)와,상기 기능 액체방울 토출 헤드를 상기 캐리지 및 상기 스토커 사이에서 이동 적재하는 헤드 이동 적재 기구를 더 구비한 것을 특징으로 하는 액체방울 토출 장치.
- 제 8 항에 있어서,상기 기능액을 상기 복수 종류의 기능 액체방울 토출 헤드에 각각 공급하는 기능액 공급 수단을 더 구비하고,상기 기능액 공급 수단은 상기 복수 종류의 기능 액체방울 토출 헤드에 대응하여 복수의 기능액 탱크를 가지며,상기 복수의 기능액 탱크와 상기 복수 종류의 기능 액체방울 토출 헤드는 각각 튜브를 통하여 접속되어 있는 것을 특징으로 하는 액체방울 토출 장치.
- 제 1 항에 기재된 액체방울 토출 장치를 사용하여, 상기 워크 위에 상기 기능 액체방울에 의한 성막부를 형성하는 것을 특징으로 하는 전기 광학 장치의 제조 방법.
- 제 1 항에 기재된 액체방울 토출 장치를 사용하여, 상기 워크 위에 상기 기능 액체방울에 의한 성막부를 형성한 것을 특징으로 하는 전기 광학 장치.
- 제 11 항에 기재된 전기 광학 장치를 탑재한 것을 특징으로 하는 전자 기기.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2002-00226475 | 2002-08-02 | ||
JP2002226475 | 2002-08-02 | ||
JP2003187837A JP4008387B2 (ja) | 2002-08-02 | 2003-06-30 | 液滴吐出装置、電気光学装置の製造方法、電気光学装置および電子機器 |
JPJP-P-2003-00187837 | 2003-06-30 |
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KR20040012481A true KR20040012481A (ko) | 2004-02-11 |
KR100597018B1 KR100597018B1 (ko) | 2006-07-06 |
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KR1020030048675A Expired - Fee Related KR100597018B1 (ko) | 2002-08-02 | 2003-07-16 | 액체방울 토출 장치, 전기 광학 장치의 제조 방법, 전기광학 장치 및 전자 기기 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7036906B2 (ko) |
JP (1) | JP4008387B2 (ko) |
KR (1) | KR100597018B1 (ko) |
CN (1) | CN1217794C (ko) |
TW (1) | TWI232977B (ko) |
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- 2003-07-31 TW TW092121043A patent/TWI232977B/zh not_active IP Right Cessation
- 2003-07-31 CN CN031524486A patent/CN1217794C/zh not_active Expired - Fee Related
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JP2004122112A (ja) | 2004-04-22 |
CN1475346A (zh) | 2004-02-18 |
CN1217794C (zh) | 2005-09-07 |
TWI232977B (en) | 2005-05-21 |
JP4008387B2 (ja) | 2007-11-14 |
US7036906B2 (en) | 2006-05-02 |
US20040075704A1 (en) | 2004-04-22 |
KR100597018B1 (ko) | 2006-07-06 |
TW200405079A (en) | 2004-04-01 |
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