KR20010066246A - 액정 표시장치용 배선 형성방법 - Google Patents
액정 표시장치용 배선 형성방법 Download PDFInfo
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- KR20010066246A KR20010066246A KR1019990067841A KR19990067841A KR20010066246A KR 20010066246 A KR20010066246 A KR 20010066246A KR 1019990067841 A KR1019990067841 A KR 1019990067841A KR 19990067841 A KR19990067841 A KR 19990067841A KR 20010066246 A KR20010066246 A KR 20010066246A
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- metal
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- layer
- crystal display
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76885—By forming conductive members before deposition of protective insulating material, e.g. pillars, studs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53214—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being aluminium
- H01L23/53223—Additional layers associated with aluminium layers, e.g. adhesion, barrier, cladding layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
- H01L23/53228—Conductive materials based on metals, e.g. alloys, metal silicides the principal metal being copper
- H01L23/53238—Additional layers associated with copper layers, e.g. adhesion, barrier, cladding layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133565—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements inside the LC elements, i.e. between the cell substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
Description
Claims (11)
- 기판 상에 제 1 금속층과 제 2 금속층을 순차적으로 증착하는 단계와;상기 제 2 금속층상에 포토-레지스터를 도포하는 단계와;상기 포토-레지스터 상에 소정의 패턴을 형성하는 단계와;상기 패턴된 포토-레지스터를 마스크로 하여 제 1 금속층과 제 2 금속층을 동시에 식각하는 단계와;상기 패턴된 제 1, 2 금속층 상의 상기 포토-레지스터를 제거하는 단계와;상기 패턴된 제 1, 2 금속층 및 기판 전면에 걸쳐 유기절연막을 도포하는 단계을 포함하는 액정 표시장치용 배선형성방법.
- 청구항 1에 있어서,상기 제 1 금속층은 알루미늄(Al), 알루미늄-네오디뮴(AlNd), 구리(Cu) 및 이들의 합금으로 구성된 집단에서 선택된 물질인 액정 표시장치용 배선형성방법.
- 청구항 1에 있어서,상기 제 2 금속층은 크롬(Cr), 몰리브덴(Mo), 탄탈(Ta), 텅스텐(W) 및 이들의 합금으로 구성된 집단에서 선택된 물질인 액정 표시장치용 배선형성방법.
- 청구항 1에 있어서,상기 유기절연막은 BCB(benzocyclobutene),올레핀(olefin)계열, 아크릴, 실리콘 계열의 화합물로 구성된 집단에서 선택된 물질인 액정 표시장치용 배선형성방법.
- 기판과;상기 기판 상에 형성된 제 1 금속과, 상기 제 1 금속 상에 형성되며, 상기 제 1 금속의 폭 보다 큰 오버행이 형성된 제 2 금속을 갖는 게이트 전극과;상기 게이트 전극 및 기판 전면을 덮는 유기절연막과;상기 게이트 전극 상부 상기 유기절연막 상에 형성된 액티브층과;상기 액티브층과 접촉하는 소스 및 드레인 전극과;상기 소스 및 드레인 전극 및 기판 전면을 덮고, 드레인 전극이 노출된 콘택홀을 갖는 보호막과;상기 보호막 상에 형성되고, 상기 콘택홀을 통해 드레인 전극과 접촉하는 화소전극을 포함하는 액정 표시장치의 어레이 기판.
- 청구항 5에 있어서,상기 제 1 금속층은 알루미늄(Al), 알루미늄-네오디뮴(AlNd), 구리(Cu) 및 이들의 합금으로 구성된 집단에서 선택된 물질인 액정 표시장치용 어레이 기판.
- 청구항 5에 있어서,상기 제 2 금속층은 크롬(Cr), 몰리브덴(Mo), 탄탈(Ta), 텅스텐(W) 및 이들의 합금으로 구성된 집단에서 선택된 물질인 액정 표시장치용 어레이 기판.
- 청구항 5에 있어서,상기 유기절연막은 BCB(benzocyclobutene), 올레핀(olefin)계열, 아크릴, 실리콘 계열의 화합물로 구성된 집단에서 선택된 물질인 액정 표시장치용 어레이 기판.
- 기판과;상기 기판 상에 형성된 제 1 금속배선과;상기 제 1 금속배선 상부에 위치한 제 2 금속배선과;상기 제 1, 2 금속배선에 개재되며, 상기 제 1, 2 금속층의 폭보다 큰 폭을 가지고, 상기 제 1 금속배선에 대해 오버행 구조를 가지는 제 3 금속배선과;상기 제 2 금속배선 및 기판 전면을 덮는 유기절연막을 포함하는 액정 표시장치용 배선.
- 청구항 9에 있어서,상기 제 3 금속배선은 알루미늄(Al), 알루미늄-네오디뮴(AlNd), 구리(Cu) 및 이들의 합금으로 구성된 집단에서 선택된 물질로 이루어진 액정 표시장치용 배선.
- 청구항 9에 있어서,상기 유기절연막은 BCB(benzocyclobutene), 올레핀(olefin)계열, 아크릴, 실리콘 계열의 화합물로 구성된 집단에서 선택된 물질인 액정 표시장치용 배선.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990067841A KR100660811B1 (ko) | 1999-12-31 | 1999-12-31 | 액정 표시장치용 배선 형성방법 |
US09/742,473 US6806933B2 (en) | 1999-12-31 | 2000-12-22 | Array substrate with multi-layer electrode line |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990067841A KR100660811B1 (ko) | 1999-12-31 | 1999-12-31 | 액정 표시장치용 배선 형성방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010066246A true KR20010066246A (ko) | 2001-07-11 |
KR100660811B1 KR100660811B1 (ko) | 2006-12-26 |
Family
ID=19634932
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019990067841A KR100660811B1 (ko) | 1999-12-31 | 1999-12-31 | 액정 표시장치용 배선 형성방법 |
Country Status (2)
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US (1) | US6806933B2 (ko) |
KR (1) | KR100660811B1 (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100811086B1 (ko) * | 2007-03-20 | 2008-03-06 | 덕산약품공업주식회사 | 마이크로 렌즈 어레이 몰드의 제조방법 및 이를 이용한마이크로 렌즈 어레이의 제조방법 |
KR100825317B1 (ko) * | 2001-12-31 | 2008-04-28 | 엘지디스플레이 주식회사 | 유기전계발광소자 |
KR100835402B1 (ko) * | 2002-07-26 | 2008-06-04 | 비오이 하이디스 테크놀로지 주식회사 | 고개구율 액정표시장치 |
KR100889536B1 (ko) * | 2002-11-14 | 2009-03-23 | 엘지디스플레이 주식회사 | 액정표시장치 및 이를 이용한 액정표시소자의 제조방법 |
KR20130126479A (ko) * | 2012-05-10 | 2013-11-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 배선의 형성 방법, 반도체 장치, 및 반도체 장치의 제작 방법 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100751185B1 (ko) * | 2000-08-08 | 2007-08-22 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 및 그 제조방법 |
KR101213871B1 (ko) * | 2005-12-15 | 2012-12-18 | 엘지디스플레이 주식회사 | 박막 트랜지스터 어레이 기판 및 그 제조 방법 |
US20070155180A1 (en) * | 2006-01-05 | 2007-07-05 | Chunghwa Picture Tubes, Ltd. | Thin film etching method |
JP5214858B2 (ja) * | 2006-06-22 | 2013-06-19 | 三菱電機株式会社 | Tftアレイ基板及びその製造方法 |
KR102607407B1 (ko) * | 2016-06-03 | 2023-11-28 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
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US5183533A (en) * | 1987-09-28 | 1993-02-02 | Mitsubishi Denki Kabushiki Kaisha | Method for etching chromium film formed on substrate |
US5162933A (en) * | 1990-05-16 | 1992-11-10 | Nippon Telegraph And Telephone Corporation | Active matrix structure for liquid crystal display elements wherein each of the gate/data lines includes at least a molybdenum-base alloy layer containing 0.5 to 10 wt. % of chromium |
JP2952075B2 (ja) * | 1991-06-12 | 1999-09-20 | キヤノン株式会社 | 液晶素子の製造法 |
US6188452B1 (en) * | 1996-07-09 | 2001-02-13 | Lg Electronics, Inc | Active matrix liquid crystal display and method of manufacturing same |
KR100241287B1 (ko) * | 1996-09-10 | 2000-02-01 | 구본준 | 액정표시소자 제조방법 |
US6081308A (en) * | 1996-11-21 | 2000-06-27 | Samsung Electronics Co., Ltd. | Method for manufacturing liquid crystal display |
US6445004B1 (en) * | 1998-02-26 | 2002-09-03 | Samsung Electronics Co., Ltd. | Composition for a wiring, a wiring using the composition, manufacturing method thereof, a display using the wiring and a manufacturing method thereof |
JP2985124B2 (ja) * | 1997-06-12 | 1999-11-29 | 株式会社日立製作所 | 液晶表示装置 |
KR100494677B1 (ko) * | 1997-12-22 | 2005-11-11 | 비오이 하이디스 테크놀로지 주식회사 | 액정표시소자의제조방법 |
KR100276442B1 (ko) * | 1998-02-20 | 2000-12-15 | 구본준 | 액정표시장치 제조방법 및 그 제조방법에 의한 액정표시장치 |
KR100720082B1 (ko) * | 1998-03-13 | 2007-11-12 | 삼성전자주식회사 | 액정표시장치의제조방법 |
KR100430950B1 (ko) * | 1998-09-01 | 2004-06-16 | 엘지.필립스 엘시디 주식회사 | 박막트랜지스터 및 그 제조방법 |
TWI255957B (en) * | 1999-03-26 | 2006-06-01 | Hitachi Ltd | Liquid crystal display device and method of manufacturing the same |
-
1999
- 1999-12-31 KR KR1019990067841A patent/KR100660811B1/ko active IP Right Grant
-
2000
- 2000-12-22 US US09/742,473 patent/US6806933B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100825317B1 (ko) * | 2001-12-31 | 2008-04-28 | 엘지디스플레이 주식회사 | 유기전계발광소자 |
KR100835402B1 (ko) * | 2002-07-26 | 2008-06-04 | 비오이 하이디스 테크놀로지 주식회사 | 고개구율 액정표시장치 |
KR100889536B1 (ko) * | 2002-11-14 | 2009-03-23 | 엘지디스플레이 주식회사 | 액정표시장치 및 이를 이용한 액정표시소자의 제조방법 |
KR100811086B1 (ko) * | 2007-03-20 | 2008-03-06 | 덕산약품공업주식회사 | 마이크로 렌즈 어레이 몰드의 제조방법 및 이를 이용한마이크로 렌즈 어레이의 제조방법 |
KR20130126479A (ko) * | 2012-05-10 | 2013-11-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 배선의 형성 방법, 반도체 장치, 및 반도체 장치의 제작 방법 |
Also Published As
Publication number | Publication date |
---|---|
US20010050743A1 (en) | 2001-12-13 |
US6806933B2 (en) | 2004-10-19 |
KR100660811B1 (ko) | 2006-12-26 |
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