KR20010013173A - 다이 본딩용 솔더재료 - Google Patents
다이 본딩용 솔더재료 Download PDFInfo
- Publication number
- KR20010013173A KR20010013173A KR19997011157A KR19997011157A KR20010013173A KR 20010013173 A KR20010013173 A KR 20010013173A KR 19997011157 A KR19997011157 A KR 19997011157A KR 19997011157 A KR19997011157 A KR 19997011157A KR 20010013173 A KR20010013173 A KR 20010013173A
- Authority
- KR
- South Korea
- Prior art keywords
- solder material
- eutectic
- tin
- gold
- solder
- Prior art date
Links
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 82
- 239000000463 material Substances 0.000 title claims abstract description 68
- 239000010931 gold Substances 0.000 claims abstract description 58
- 229910052737 gold Inorganic materials 0.000 claims abstract description 41
- 230000005496 eutectics Effects 0.000 claims abstract description 31
- 239000000374 eutectic mixture Substances 0.000 claims abstract description 30
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 26
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000011135 tin Substances 0.000 claims description 45
- 229910052718 tin Inorganic materials 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 21
- 239000000654 additive Substances 0.000 claims description 18
- 230000000996 additive effect Effects 0.000 claims description 15
- 230000008018 melting Effects 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 13
- 229910052787 antimony Inorganic materials 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims 1
- 229910018731 Sn—Au Inorganic materials 0.000 description 24
- 239000004065 semiconductor Substances 0.000 description 21
- 229910000765 intermetallic Inorganic materials 0.000 description 18
- 238000001816 cooling Methods 0.000 description 15
- 239000013078 crystal Substances 0.000 description 15
- 238000005476 soldering Methods 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 229910020836 Sn-Ag Inorganic materials 0.000 description 7
- 229910020988 Sn—Ag Inorganic materials 0.000 description 7
- 238000005304 joining Methods 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910015367 Au—Sb Inorganic materials 0.000 description 3
- 229910020935 Sn-Sb Inorganic materials 0.000 description 3
- 229910008757 Sn—Sb Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910017401 Au—Ge Inorganic materials 0.000 description 2
- 229910015365 Au—Si Inorganic materials 0.000 description 2
- 229910005939 Ge—Sn Inorganic materials 0.000 description 2
- 229910008355 Si-Sn Inorganic materials 0.000 description 2
- 229910006453 Si—Sn Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- 229910007637 SnAg Inorganic materials 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/4823—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a pin of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15151—Shape the die mounting substrate comprising an aperture, e.g. for underfilling, outgassing, window type wire connections
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Die Bonding (AREA)
Abstract
Description
열팽창계수(/℃) | 녹는점(℃) | 영 율(Youngratio)(MPa) | 실온 부근의 신장율 | 실온 부근의 인장강도(MPa) | |
SnAu 공융혼합물 | 136×10-7 | 217 | 5610-6850 | 33 | 58 |
SnAg 공융혼합물 | 142×10-7 | 221 | 5660-21600 | 18 | 35 |
Claims (7)
- 주석과 금을 포함하고 그들의 실제적인 조성비는 금보다 주석의 함량이 더 높은 상태의 공융점을 갖는 것을 특징으로 하는 다이 본딩용 솔더재료.
- 제 1 항에 있어서,주석과 금에 부가적으로 첨가제가 첨가되고 상기 첨가제는 주석보다 녹는점이 높고, 주석과의 공융 혼합물을 형성하지 않으며, 금과의 공융점이 주석 및 금과의 공융 혼합물의 녹는점 보다 높은 금속으로 이루어짐을 특징으로 하는 다이 본딩용 솔더재료.
- 제 2 항에 있어서,상기 첨가제는 0.1wt% 내지 9wt%의 범위로 첨가되는 것을 특징으로 하는 다이 본딩용 솔더재료.
- 제 2 항에 있어서,상기 첨가제는 안티몬(Sb)인 것을 특징으로 하는 다이 본딩용 솔더재료.
- 제 2 항에 있어서,상기 첨가제는 게르마늄(Ge)인 것을 특징으로 하는 다이 본딩용 솔더재료.
- 제 2 항에 있어서,상기 첨가제는 실리콘(Si)인 것을 특징으로 하는 다이 본딩용 솔더재료.
- 제1항에 있어서,상기 주석과 금의 조성비는 실제적으로 주석이 95wt% 내지 90wt%이고, 금이 5wt% 내지 10wt% 임을 특징으로 하는 다이 본딩용 솔더재료.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8375698 | 1998-03-30 | ||
JP?10-83756 | 1998-03-30 | ||
PCT/JP1999/001586 WO1999050901A1 (fr) | 1998-03-30 | 1999-03-29 | Matiere de brasage tendre utilise pour fixer des puces |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010013173A true KR20010013173A (ko) | 2001-02-26 |
KR100361591B1 KR100361591B1 (ko) | 2002-11-21 |
Family
ID=13811408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019997011157A KR100361591B1 (ko) | 1998-03-30 | 1999-03-29 | 다이 본딩용 솔더재료 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6656422B2 (ko) |
EP (1) | EP0986098B1 (ko) |
JP (1) | JP3601722B2 (ko) |
KR (1) | KR100361591B1 (ko) |
CN (1) | CN1123924C (ko) |
DE (1) | DE69941764D1 (ko) |
WO (1) | WO1999050901A1 (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6739879B2 (en) * | 2002-07-03 | 2004-05-25 | Intel Corporation | Ball grid array circuit board jumper |
US8698184B2 (en) * | 2011-01-21 | 2014-04-15 | Cree, Inc. | Light emitting diodes with low junction temperature and solid state backlight components including light emitting diodes with low junction temperature |
US9443903B2 (en) | 2006-06-30 | 2016-09-13 | Cree, Inc. | Low temperature high strength metal stack for die attachment |
DE102007053859A1 (de) * | 2007-11-09 | 2009-05-14 | Endress + Hauser Gmbh + Co. Kg | Druck-Messeinrichtung |
US8128868B2 (en) * | 2009-02-12 | 2012-03-06 | International Business Machines Corporation | Grain refinement by precipitate formation in PB-free alloys of tin |
US8493746B2 (en) | 2009-02-12 | 2013-07-23 | International Business Machines Corporation | Additives for grain fragmentation in Pb-free Sn-based solder |
KR20120100299A (ko) * | 2011-03-03 | 2012-09-12 | 삼성전자주식회사 | 제어된 금 함량비를 가지는 연결 부재를 포함하는 반도체 패키지 |
JP2016092051A (ja) * | 2014-10-30 | 2016-05-23 | 東京エレクトロン株式会社 | 凹部を充填する方法及び処理装置 |
CN105499736A (zh) * | 2016-01-13 | 2016-04-20 | 合肥工业大学 | 一种电子封装用高体积分数SiCp/Al复合材料基板表面金属化及钎焊方法 |
CN106271177B (zh) * | 2016-09-23 | 2018-10-26 | 哈尔滨工业大学深圳研究生院 | 一种互连钎料及其互连成形方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3416979A (en) * | 1964-08-31 | 1968-12-17 | Matsushita Electric Ind Co Ltd | Method of making a variable capacitance silicon diode with hyper abrupt junction |
JPS5516525A (en) * | 1978-07-20 | 1980-02-05 | Seiko Epson Corp | Mount material of crystal vibrator |
JPS55127027A (en) | 1979-03-26 | 1980-10-01 | Toshiba Corp | Semiconductor device |
JPS59135654A (ja) | 1983-01-21 | 1984-08-03 | Toshiba Corp | 光学式デイスクレコ−ド再生装置 |
JPS61125139A (ja) | 1984-11-22 | 1986-06-12 | Nec Corp | 半導体装置 |
US4875617A (en) * | 1987-01-20 | 1989-10-24 | Citowsky Elya L | Gold-tin eutectic lead bonding method and structure |
JPS63178535A (ja) | 1987-01-20 | 1988-07-22 | Mitsubishi Metal Corp | 半導体装置組立て用Au合金ろう材 |
JP2891432B2 (ja) * | 1989-12-27 | 1999-05-17 | 田中電子工業株式会社 | 半導体材料の接続方法,それに用いる接続材料及び半導体装置 |
US5280414A (en) * | 1990-06-11 | 1994-01-18 | International Business Machines Corp. | Au-Sn transient liquid bonding in high performance laminates |
JPH05259201A (ja) | 1992-03-11 | 1993-10-08 | Nec Corp | 半導体装置及びその製造方法 |
DE69426090T2 (de) * | 1993-04-27 | 2001-03-01 | Nec Corp., Tokio/Tokyo | Verfahren zur Herstellung einer optische Halbleitervorrichtung |
EP0652072A1 (en) * | 1993-11-09 | 1995-05-10 | Matsushita Electric Industrial Co., Ltd. | Solder |
JP3184449B2 (ja) | 1996-02-20 | 2001-07-09 | 松下電子工業株式会社 | 半導体素子用ダイボンド材 |
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1999
- 1999-03-29 DE DE69941764T patent/DE69941764D1/de not_active Expired - Lifetime
- 1999-03-29 US US09/445,022 patent/US6656422B2/en not_active Expired - Lifetime
- 1999-03-29 CN CN99800427A patent/CN1123924C/zh not_active Expired - Fee Related
- 1999-03-29 EP EP99909344A patent/EP0986098B1/en not_active Expired - Lifetime
- 1999-03-29 WO PCT/JP1999/001586 patent/WO1999050901A1/ja active IP Right Grant
- 1999-03-29 KR KR1019997011157A patent/KR100361591B1/ko not_active IP Right Cessation
- 1999-03-29 JP JP54918999A patent/JP3601722B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6656422B2 (en) | 2003-12-02 |
EP0986098A4 (en) | 2006-04-05 |
EP0986098B1 (en) | 2009-12-09 |
WO1999050901A1 (fr) | 1999-10-07 |
CN1262783A (zh) | 2000-08-09 |
EP0986098A1 (en) | 2000-03-15 |
KR100361591B1 (ko) | 2002-11-21 |
CN1123924C (zh) | 2003-10-08 |
US20030143103A1 (en) | 2003-07-31 |
DE69941764D1 (de) | 2010-01-21 |
JP3601722B2 (ja) | 2004-12-15 |
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