KR102809471B1 - 지지 유리 기판 - Google Patents

지지 유리 기판 Download PDF

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Publication number
KR102809471B1
KR102809471B1 KR1020227002654A KR20227002654A KR102809471B1 KR 102809471 B1 KR102809471 B1 KR 102809471B1 KR 1020227002654 A KR1020227002654 A KR 1020227002654A KR 20227002654 A KR20227002654 A KR 20227002654A KR 102809471 B1 KR102809471 B1 KR 102809471B1
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South Korea
Prior art keywords
glass substrate
ratio
supporting glass
gpa
metal oxide
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KR1020227002654A
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English (en)
Korean (ko)
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KR20220043118A (ko
Inventor
세이지 이나바
야스나리 사이토
기요시 다마이
가즈타카 오노
유하 고바야시
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에이지씨 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • H01L23/15—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • H10W70/692—Ceramics or glasses

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Glass Compositions (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020227002654A 2019-07-29 2019-07-29 지지 유리 기판 Active KR102809471B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/029695 WO2021019654A1 (ja) 2019-07-29 2019-07-29 支持ガラス基板

Publications (2)

Publication Number Publication Date
KR20220043118A KR20220043118A (ko) 2022-04-05
KR102809471B1 true KR102809471B1 (ko) 2025-05-19

Family

ID=71131645

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227002654A Active KR102809471B1 (ko) 2019-07-29 2019-07-29 지지 유리 기판

Country Status (6)

Country Link
US (3) US11021389B2 (https=)
JP (3) JP6715381B1 (https=)
KR (1) KR102809471B1 (https=)
CN (4) CN114222722B (https=)
TW (4) TWI746068B (https=)
WO (2) WO2021019654A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102809471B1 (ko) 2019-07-29 2025-05-19 에이지씨 가부시키가이샤 지지 유리 기판
JP7800444B2 (ja) * 2020-12-23 2026-01-16 Ａｇｃ株式会社 ガラス基板及びガラス基板の製造方法
JP7719339B2 (ja) * 2021-04-06 2025-08-06 Ａｇｃ株式会社 ガラス基板の製造方法及びガラス基板
CN115872617A (zh) * 2021-09-29 2023-03-31 成都光明光电股份有限公司 玻璃组合物
JP2023067765A (ja) * 2021-10-29 2023-05-16 Ａｇｃ株式会社 ガラス及びガラスの製造方法
WO2024219377A1 (ja) * 2023-04-17 2024-10-24 Ａｇｃ株式会社 ガラス
KR20250173495A (ko) 2023-04-17 2025-12-10 에이지씨 가부시키가이샤 유리
WO2024219379A1 (ja) 2023-04-17 2024-10-24 Ａｇｃ株式会社 ガラス
WO2025079639A1 (ja) * 2023-10-13 2025-04-17 Ａｇｃ株式会社 ガラス

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012533776A (ja) 2009-07-22 2012-12-27 セイジ・エレクトロクロミクス，インコーポレイテッド エレクトロクロミック装置
WO2016090303A1 (en) 2014-12-05 2016-06-09 Pax Labs, Inc. Calibrated dose control
WO2017018275A1 (ja) * 2015-07-24 2017-02-02 旭硝子株式会社 ガラス基板、積層基板、積層基板の製造方法、積層体、梱包体、およびガラス基板の製造方法
WO2018025727A1 (ja) 2016-08-05 2018-02-08 旭硝子株式会社 無アルカリガラス基板、積層基板、およびガラス基板の製造方法
WO2018088563A1 (ja) * 2016-11-14 2018-05-17 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6140687U (ja) 1984-08-17 1986-03-14 リズム時計工業株式会社 電池寿命報知時計
DE3935471A1 (de) * 1989-10-25 1991-05-02 Hoechst Ag Keramische stoffzusammensetzung und ihre verwendung
JPH1079122A (ja) * 1996-09-04 1998-03-24 Hoya Corp 情報記録媒体用基板に適した材料の選定方法、この方法を用いて選定した材料、この材料を用いた基板及び磁気ディスク
JP2000063144A (ja) 1998-08-11 2000-02-29 Asahi Glass Co Ltd 情報記録媒体基板用ガラス
JP2001122637A (ja) * 1999-10-26 2001-05-08 Nippon Electric Glass Co Ltd ディスプレイ用ガラス基板
JP2002220256A (ja) * 2001-01-22 2002-08-09 Asahi Glass Co Ltd 無鉛ガラス、電子回路基板用組成物および電子回路基板
JP3995902B2 (ja) 2001-05-31 2007-10-24 Ｈｏｙａ株式会社 情報記録媒体用ガラス基板及びそれを用いた磁気情報記録媒体
JP5359271B2 (ja) * 2006-07-13 2013-12-04 旭硝子株式会社 無アルカリガラス基板及びその製造方法並びに液晶ディスプレイパネル
JP5831838B2 (ja) * 2011-03-08 2015-12-09 日本電気硝子株式会社 無アルカリガラス
KR101409707B1 (ko) * 2011-07-01 2014-06-19 아반스트레이트 가부시키가이샤 평판 디스플레이용 유리 기판 및 그의 제조 방법
CN110698057A (zh) * 2012-12-21 2020-01-17 康宁股份有限公司 具有改进的总节距稳定性的玻璃
JP6443668B2 (ja) 2014-12-17 2018-12-26 日本電気硝子株式会社 支持ガラス基板及びこれを用いた積層体
KR20170110619A (ko) * 2015-02-06 2017-10-11 아사히 가라스 가부시키가이샤 광 선택 투과형 유리 및 적층 기판
CN116199432A (zh) 2015-05-28 2023-06-02 Ａｇｃ株式会社 玻璃基板及层叠基板
CN114920453A (zh) 2017-12-15 2022-08-19 成都光明光电股份有限公司 玻璃组合物
KR102809471B1 (ko) 2019-07-29 2025-05-19 에이지씨 가부시키가이샤 지지 유리 기판

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012533776A (ja) 2009-07-22 2012-12-27 セイジ・エレクトロクロミクス，インコーポレイテッド エレクトロクロミック装置
WO2016090303A1 (en) 2014-12-05 2016-06-09 Pax Labs, Inc. Calibrated dose control
WO2017018275A1 (ja) * 2015-07-24 2017-02-02 旭硝子株式会社 ガラス基板、積層基板、積層基板の製造方法、積層体、梱包体、およびガラス基板の製造方法
WO2018025727A1 (ja) 2016-08-05 2018-02-08 旭硝子株式会社 無アルカリガラス基板、積層基板、およびガラス基板の製造方法
WO2018088563A1 (ja) * 2016-11-14 2018-05-17 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

Also Published As

Publication number Publication date
CN114206793A (zh) 2022-03-18
TW202110760A (zh) 2021-03-16
WO2021019654A1 (ja) 2021-02-04
US20220144685A1 (en) 2022-05-12
CN114222722B (zh) 2024-02-23
TW202208295A (zh) 2022-03-01
CN119461833A (zh) 2025-02-18
KR20220043112A (ko) 2022-04-05
TW202302483A (zh) 2023-01-16
US20260116808A1 (en) 2026-04-30
US11021389B2 (en) 2021-06-01
KR20220043118A (ko) 2022-04-05
JP2021020840A (ja) 2021-02-18
CN114222722A (zh) 2022-03-22
JPWO2021019911A1 (https=) 2021-02-04
US20210032155A1 (en) 2021-02-04
JP2024160378A (ja) 2024-11-13
CN114206793B8 (zh) 2024-12-20
JP7544052B2 (ja) 2024-09-03
CN119461834A (zh) 2025-02-18
TWI738424B (zh) 2021-09-01
TWI746068B (zh) 2021-11-11
TWI811124B (zh) 2023-08-01
TWI782733B (zh) 2022-11-01
CN114206793B (zh) 2024-11-15
JP6715381B1 (ja) 2020-07-01
TW202112688A (zh) 2021-04-01
WO2021019911A1 (ja) 2021-02-04
US12534396B2 (en) 2026-01-27

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