TWI746068B - 支持玻璃基板 - Google Patents

支持玻璃基板 Download PDF

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Publication number
TWI746068B
TWI746068B TW109124434A TW109124434A TWI746068B TW I746068 B TWI746068 B TW I746068B TW 109124434 A TW109124434 A TW 109124434A TW 109124434 A TW109124434 A TW 109124434A TW I746068 B TWI746068 B TW I746068B
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TW
Taiwan
Prior art keywords
glass substrate
supporting glass
ratio
gpa
calculated
Prior art date
Application number
TW109124434A
Other languages
English (en)
Chinese (zh)
Other versions
TW202112688A (zh
Inventor
稲葉誠二
齋藤康成
玉井喜芳
小野和孝
小林悠波
長野幹雄
Original Assignee
日商Agc股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商Agc股份有限公司 filed Critical 日商Agc股份有限公司
Publication of TW202112688A publication Critical patent/TW202112688A/zh
Application granted granted Critical
Publication of TWI746068B publication Critical patent/TWI746068B/zh

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/068Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69Insulating materials thereof
    • H10W70/692Ceramics or glasses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Glass Compositions (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW109124434A 2019-07-29 2020-07-20 支持玻璃基板 TWI746068B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
WOPCT/JP2019/029695 2019-07-29
PCT/JP2019/029695 WO2021019654A1 (ja) 2019-07-29 2019-07-29 支持ガラス基板
JP2019206867A JP6715381B1 (ja) 2019-07-29 2019-11-15 支持ガラス基板
JP2019-206867 2019-11-15
WOPCT/JP2020/022363 2020-06-05
PCT/JP2020/022363 WO2021019911A1 (ja) 2019-07-29 2020-06-05 支持ガラス基板

Publications (2)

Publication Number Publication Date
TW202112688A TW202112688A (zh) 2021-04-01
TWI746068B true TWI746068B (zh) 2021-11-11

Family

ID=71131645

Family Applications (4)

Application Number Title Priority Date Filing Date
TW109124434A TWI746068B (zh) 2019-07-29 2020-07-20 支持玻璃基板
TW109124433A TWI738424B (zh) 2019-07-29 2020-07-20 支持玻璃基板
TW110136973A TWI782733B (zh) 2019-07-29 2020-07-20 支持玻璃基板
TW111137187A TWI811124B (zh) 2019-07-29 2020-07-20 支持玻璃基板

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW109124433A TWI738424B (zh) 2019-07-29 2020-07-20 支持玻璃基板
TW110136973A TWI782733B (zh) 2019-07-29 2020-07-20 支持玻璃基板
TW111137187A TWI811124B (zh) 2019-07-29 2020-07-20 支持玻璃基板

Country Status (6)

Country Link
US (3) US11021389B2 (https=)
JP (3) JP6715381B1 (https=)
KR (1) KR102809471B1 (https=)
CN (4) CN114222722B (https=)
TW (4) TWI746068B (https=)
WO (2) WO2021019654A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782733B (zh) * 2019-07-29 2022-11-01 日商Agc股份有限公司 支持玻璃基板

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7800444B2 (ja) * 2020-12-23 2026-01-16 Agc株式会社 ガラス基板及びガラス基板の製造方法
JP7719339B2 (ja) * 2021-04-06 2025-08-06 Agc株式会社 ガラス基板の製造方法及びガラス基板
CN115872617A (zh) * 2021-09-29 2023-03-31 成都光明光电股份有限公司 玻璃组合物
JP2023067765A (ja) * 2021-10-29 2023-05-16 Agc株式会社 ガラス及びガラスの製造方法
WO2024219377A1 (ja) * 2023-04-17 2024-10-24 Agc株式会社 ガラス
KR20250173495A (ko) 2023-04-17 2025-12-10 에이지씨 가부시키가이샤 유리
WO2024219379A1 (ja) 2023-04-17 2024-10-24 Agc株式会社 ガラス
WO2025079639A1 (ja) * 2023-10-13 2025-04-17 Agc株式会社 ガラス

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH1079122A (ja) * 1996-09-04 1998-03-24 Hoya Corp 情報記録媒体用基板に適した材料の選定方法、この方法を用いて選定した材料、この材料を用いた基板及び磁気ディスク
JP2012533776A (ja) * 2009-07-22 2012-12-27 セイジ・エレクトロクロミクス,インコーポレイテッド エレクトロクロミック装置
CN107848878A (zh) * 2015-07-24 2018-03-27 旭硝子株式会社 玻璃基板、层叠基板、层叠基板的制造方法、层叠体、捆包体以及玻璃基板的制造方法
TW201823174A (zh) * 2016-08-05 2018-07-01 旭硝子股份有限公司 無鹼玻璃基板、積層基板、及玻璃基板之製造方法
CN109923083A (zh) * 2016-11-14 2019-06-21 Hoya株式会社 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物

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JPS6140687U (ja) 1984-08-17 1986-03-14 リズム時計工業株式会社 電池寿命報知時計
DE3935471A1 (de) * 1989-10-25 1991-05-02 Hoechst Ag Keramische stoffzusammensetzung und ihre verwendung
JP2000063144A (ja) 1998-08-11 2000-02-29 Asahi Glass Co Ltd 情報記録媒体基板用ガラス
JP2001122637A (ja) * 1999-10-26 2001-05-08 Nippon Electric Glass Co Ltd ディスプレイ用ガラス基板
JP2002220256A (ja) * 2001-01-22 2002-08-09 Asahi Glass Co Ltd 無鉛ガラス、電子回路基板用組成物および電子回路基板
JP3995902B2 (ja) 2001-05-31 2007-10-24 Hoya株式会社 情報記録媒体用ガラス基板及びそれを用いた磁気情報記録媒体
JP5359271B2 (ja) * 2006-07-13 2013-12-04 旭硝子株式会社 無アルカリガラス基板及びその製造方法並びに液晶ディスプレイパネル
JP5831838B2 (ja) * 2011-03-08 2015-12-09 日本電気硝子株式会社 無アルカリガラス
KR101409707B1 (ko) * 2011-07-01 2014-06-19 아반스트레이트 가부시키가이샤 평판 디스플레이용 유리 기판 및 그의 제조 방법
CN110698057A (zh) * 2012-12-21 2020-01-17 康宁股份有限公司 具有改进的总节距稳定性的玻璃
KR102627987B1 (ko) * 2014-12-05 2024-01-22 쥴 랩스, 인크. 교정된 투여량 제어
JP6443668B2 (ja) 2014-12-17 2018-12-26 日本電気硝子株式会社 支持ガラス基板及びこれを用いた積層体
KR20170110619A (ko) * 2015-02-06 2017-10-11 아사히 가라스 가부시키가이샤 광 선택 투과형 유리 및 적층 기판
CN116199432A (zh) 2015-05-28 2023-06-02 Agc株式会社 玻璃基板及层叠基板
CN114920453A (zh) 2017-12-15 2022-08-19 成都光明光电股份有限公司 玻璃组合物
KR102809471B1 (ko) 2019-07-29 2025-05-19 에이지씨 가부시키가이샤 지지 유리 기판

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1079122A (ja) * 1996-09-04 1998-03-24 Hoya Corp 情報記録媒体用基板に適した材料の選定方法、この方法を用いて選定した材料、この材料を用いた基板及び磁気ディスク
JP2012533776A (ja) * 2009-07-22 2012-12-27 セイジ・エレクトロクロミクス,インコーポレイテッド エレクトロクロミック装置
CN107848878A (zh) * 2015-07-24 2018-03-27 旭硝子株式会社 玻璃基板、层叠基板、层叠基板的制造方法、层叠体、捆包体以及玻璃基板的制造方法
TW201823174A (zh) * 2016-08-05 2018-07-01 旭硝子股份有限公司 無鹼玻璃基板、積層基板、及玻璃基板之製造方法
CN109923083A (zh) * 2016-11-14 2019-06-21 Hoya株式会社 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782733B (zh) * 2019-07-29 2022-11-01 日商Agc股份有限公司 支持玻璃基板
US12534396B2 (en) 2019-07-29 2026-01-27 AGC Inc. Supporting glass substrate

Also Published As

Publication number Publication date
CN114206793A (zh) 2022-03-18
TW202110760A (zh) 2021-03-16
WO2021019654A1 (ja) 2021-02-04
US20220144685A1 (en) 2022-05-12
CN114222722B (zh) 2024-02-23
TW202208295A (zh) 2022-03-01
CN119461833A (zh) 2025-02-18
KR20220043112A (ko) 2022-04-05
TW202302483A (zh) 2023-01-16
US20260116808A1 (en) 2026-04-30
US11021389B2 (en) 2021-06-01
KR20220043118A (ko) 2022-04-05
JP2021020840A (ja) 2021-02-18
KR102809471B1 (ko) 2025-05-19
CN114222722A (zh) 2022-03-22
JPWO2021019911A1 (https=) 2021-02-04
US20210032155A1 (en) 2021-02-04
JP2024160378A (ja) 2024-11-13
CN114206793B8 (zh) 2024-12-20
JP7544052B2 (ja) 2024-09-03
CN119461834A (zh) 2025-02-18
TWI738424B (zh) 2021-09-01
TWI811124B (zh) 2023-08-01
TWI782733B (zh) 2022-11-01
CN114206793B (zh) 2024-11-15
JP6715381B1 (ja) 2020-07-01
TW202112688A (zh) 2021-04-01
WO2021019911A1 (ja) 2021-02-04
US12534396B2 (en) 2026-01-27

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