KR102800583B1 - 노광 장치, 및 물품의 제조 방법 - Google Patents

노광 장치, 및 물품의 제조 방법 Download PDF

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Publication number
KR102800583B1
KR102800583B1 KR1020200181556A KR20200181556A KR102800583B1 KR 102800583 B1 KR102800583 B1 KR 102800583B1 KR 1020200181556 A KR1020200181556 A KR 1020200181556A KR 20200181556 A KR20200181556 A KR 20200181556A KR 102800583 B1 KR102800583 B1 KR 102800583B1
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South Korea
Prior art keywords
light
optical system
projection optical
exposure
receiving element
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Korean (ko)
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KR20210092130A (ko
Inventor
미츠루 이노우에
아츠시 이토
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020200181556A 2020-01-15 2020-12-23 노광 장치, 및 물품의 제조 방법 Active KR102800583B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020004671A JP7453790B2 (ja) 2020-01-15 2020-01-15 露光装置、および物品の製造方法
JPJP-P-2020-004671 2020-01-15

Publications (2)

Publication Number Publication Date
KR20210092130A KR20210092130A (ko) 2021-07-23
KR102800583B1 true KR102800583B1 (ko) 2025-04-28

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KR1020200181556A Active KR102800583B1 (ko) 2020-01-15 2020-12-23 노광 장치, 및 물품의 제조 방법

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Country Link
JP (1) JP7453790B2 (enExample)
KR (1) KR102800583B1 (enExample)
CN (1) CN113126448B (enExample)
TW (1) TWI836164B (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006179930A (ja) * 2004-12-23 2006-07-06 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2011510494A (ja) * 2008-01-16 2011-03-31 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定手段を有するマイクロリソグラフィのための投影露光装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3448614B2 (ja) * 1993-08-12 2003-09-22 株式会社ニコン 投影露光方法、走査型投影露光装置、及び素子製造方法
JP3459742B2 (ja) * 1996-01-17 2003-10-27 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JPH10289864A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置
AU6853598A (en) * 1997-04-18 1998-11-13 Nikon Corporation Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
JP3421922B2 (ja) * 2000-02-22 2003-06-30 富士写真光機株式会社 アライメント変動測定装置
JP2005294608A (ja) * 2004-04-01 2005-10-20 Nikon Corp 放電光源ユニット、照明光学装置、露光装置および露光方法
JP4844835B2 (ja) * 2004-09-14 2011-12-28 株式会社ニコン 補正方法及び露光装置
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
TW200745771A (en) * 2006-02-17 2007-12-16 Nikon Corp Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
US7999939B2 (en) * 2007-08-17 2011-08-16 Asml Holding N.V. Real time telecentricity measurement
US20100165309A1 (en) * 2008-07-10 2010-07-01 Nikon Corporation Deformation measuring apparatus, exposure apparatus, jig for the deformation measuring apparatus, position measuring method and device fabricating method
TW201227178A (en) * 2010-11-02 2012-07-01 Nikon Corp Liquid supply apparatus, liquid supply method, management apparatus, management method, exposure apparatus, exposure method, device fabricating system, device fabricating method, program and recording medium
JP2014135368A (ja) * 2013-01-09 2014-07-24 Canon Inc 露光装置、計測方法及びデバイスの製造方法
JP2017072678A (ja) * 2015-10-06 2017-04-13 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
JP2017172678A (ja) * 2016-03-23 2017-09-28 Ntn株式会社 極低温環境用転がり軸受

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006179930A (ja) * 2004-12-23 2006-07-06 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2011510494A (ja) * 2008-01-16 2011-03-31 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定手段を有するマイクロリソグラフィのための投影露光装置

Also Published As

Publication number Publication date
JP2021110905A (ja) 2021-08-02
TW202129431A (zh) 2021-08-01
KR20210092130A (ko) 2021-07-23
JP7453790B2 (ja) 2024-03-21
CN113126448B (zh) 2025-01-07
CN113126448A (zh) 2021-07-16
TWI836164B (zh) 2024-03-21

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