KR102653366B1 - 대형 포토마스크 - Google Patents

대형 포토마스크 Download PDF

Info

Publication number
KR102653366B1
KR102653366B1 KR1020207029308A KR20207029308A KR102653366B1 KR 102653366 B1 KR102653366 B1 KR 102653366B1 KR 1020207029308 A KR1020207029308 A KR 1020207029308A KR 20207029308 A KR20207029308 A KR 20207029308A KR 102653366 B1 KR102653366 B1 KR 102653366B1
Authority
KR
South Korea
Prior art keywords
light
film
shielding
low
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020207029308A
Other languages
English (en)
Korean (ko)
Other versions
KR20200128141A (ko
Inventor
후유키 곤노
다츠야 미요시
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Priority to KR1020247010297A priority Critical patent/KR102944085B1/ko
Publication of KR20200128141A publication Critical patent/KR20200128141A/ko
Application granted granted Critical
Publication of KR102653366B1 publication Critical patent/KR102653366B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020207029308A 2018-03-15 2019-03-14 대형 포토마스크 Active KR102653366B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020247010297A KR102944085B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2018048085 2018-03-15
JPJP-P-2018-048085 2018-03-15
JP2018238508 2018-12-20
JPJP-P-2018-238508 2018-12-20
PCT/JP2019/010647 WO2019177116A1 (ja) 2018-03-15 2019-03-14 大型フォトマスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020247010297A Division KR102944085B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Publications (2)

Publication Number Publication Date
KR20200128141A KR20200128141A (ko) 2020-11-11
KR102653366B1 true KR102653366B1 (ko) 2024-04-02

Family

ID=67906680

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020207029308A Active KR102653366B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크
KR1020247010297A Active KR102944085B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020247010297A Active KR102944085B1 (ko) 2018-03-15 2019-03-14 대형 포토마스크

Country Status (5)

Country Link
JP (3) JP7420065B2 (https=)
KR (2) KR102653366B1 (https=)
CN (1) CN112119352B (https=)
TW (1) TWI711878B (https=)
WO (1) WO2019177116A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2025258A (en) * 2019-05-02 2020-11-05 Asml Netherlands Bv A patterning device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619661B1 (ko) 2000-12-26 2006-09-05 신에쓰 가가꾸 고교 가부시끼가이샤 포토마스크 블랭크 및 포토마스크
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
JP2015102664A (ja) * 2013-11-25 2015-06-04 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask
JPH11125896A (ja) * 1997-08-19 1999-05-11 Toppan Printing Co Ltd フォトマスクブランクス及びフォトマスク
ATE487255T1 (de) * 2001-05-31 2010-11-15 Nichia Corp Halbleiterlaserelement
JP4389440B2 (ja) * 2002-10-29 2009-12-24 凸版印刷株式会社 転写マスク及びその作製方法
WO2004070472A1 (ja) * 2003-02-03 2004-08-19 Hoya Corporation フォトマスクブランク及びフォトマスク、並びにフォトマスクを用いたパターン転写方法
JP2007156365A (ja) * 2005-12-09 2007-06-21 Canon Inc 反射防止膜、光学素子、光学系、露光装置及びデバイス製造方法
TW200745630A (en) * 2006-04-24 2007-12-16 Asahi Glass Co Ltd Blank, black matrix, and color filter
US8198118B2 (en) * 2006-10-31 2012-06-12 Taiwan Semiconductor Manufacturing Co. Method for forming a robust mask with reduced light scattering
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
WO2008139904A1 (ja) * 2007-04-27 2008-11-20 Hoya Corporation フォトマスクブランク及びフォトマスク
JP2009229868A (ja) * 2008-03-24 2009-10-08 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
KR20090110240A (ko) * 2008-04-16 2009-10-21 지오마텍 가부시키가이샤 포토마스크용 기판, 포토마스크 및 그의 제조방법
KR20110115058A (ko) * 2010-04-14 2011-10-20 주식회사 에스앤에스텍 포토마스크 블랭크, 포토마스크 및 패턴 형성 방법
CN110083008A (zh) * 2011-10-21 2019-08-02 大日本印刷株式会社 大型相移掩模及大型相移掩模的制造方法
KR101473163B1 (ko) * 2013-07-26 2014-12-16 주식회사 에스앤에스텍 플랫 패널 디스플레이용 블랭크 마스크 및 포토 마스크
JP6080915B2 (ja) * 2014-08-25 2017-02-15 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP6594742B2 (ja) * 2014-11-20 2019-10-23 Ｈｏｙａ株式会社 フォトマスクブランク及びそれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR101846065B1 (ko) * 2015-03-27 2018-04-05 호야 가부시키가이샤 포토마스크 블랭크 및 이것을 사용한 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
JP6301383B2 (ja) * 2015-03-27 2018-03-28 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR20160129789A (ko) * 2015-04-30 2016-11-09 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토마스크
JP6352224B2 (ja) * 2015-07-17 2018-07-04 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
CN107848946A (zh) * 2015-07-23 2018-03-27 三菱瓦斯化学株式会社 新型(甲基)丙烯酰基化合物及其制造方法
JP6451561B2 (ja) * 2015-09-03 2019-01-16 信越化学工業株式会社 フォトマスクブランク
JP7125835B2 (ja) * 2016-04-05 2022-08-25 旭化成株式会社 ペリクル
JP6891099B2 (ja) * 2017-01-16 2021-06-18 Hoya株式会社 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619661B1 (ko) 2000-12-26 2006-09-05 신에쓰 가가꾸 고교 가부시끼가이샤 포토마스크 블랭크 및 포토마스크
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
JP2015102664A (ja) * 2013-11-25 2015-06-04 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法

Also Published As

Publication number Publication date
JP2024001250A (ja) 2024-01-09
JP2025122138A (ja) 2025-08-20
TW201945832A (zh) 2019-12-01
WO2019177116A1 (ja) 2019-09-19
CN112119352B (zh) 2024-07-26
KR20200128141A (ko) 2020-11-11
JP7420065B2 (ja) 2024-01-23
KR102944085B1 (ko) 2026-03-27
CN112119352A (zh) 2020-12-22
JPWO2019177116A1 (ja) 2021-02-25
KR20240046289A (ko) 2024-04-08
TWI711878B (zh) 2020-12-01

Similar Documents

Publication Publication Date Title
TWI584058B (zh) 大型相位移遮罩及大型相位移遮罩之製造方法
KR102251087B1 (ko) 마스크 블랭크, 네거티브형 레지스트막 부착 마스크 블랭크, 위상 시프트 마스크, 및 그것을 사용하는 패턴 형성체의 제조 방법
KR101624436B1 (ko) 대형 위상 시프트 마스크 및 대형 위상 시프트 마스크의 제조 방법
JPH06175347A (ja) ホトマスクおよびそれを用いたパタン形成方法
KR20010098405A (ko) 전자장치의 제조방법, 패턴형성방법 및 이들을 이용한포토마스크
KR101846065B1 (ko) 포토마스크 블랭크 및 이것을 사용한 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
KR940007066B1 (ko) 반사형 포토마스크와 반사형 포토리소그래피 방법
CN108351603A (zh) 膜掩模、其制备方法和使用膜掩模的图案形成方法
KR101815368B1 (ko) 포토마스크, 포토마스크 세트, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
KR100706731B1 (ko) 위상 시프트 마스크
JP2025122138A (ja) 大型フォトマスク
KR20150144684A (ko) 근접 노광용 포토 마스크
KR101771341B1 (ko) 포토마스크의 제조 방법, 포토마스크, 및 표시 장치의 제조 방법
TWI569090B (zh) 相位移遮罩及使用該相位移遮罩之抗蝕劑圖案形成方法
CN101231460A (zh) 灰度光罩及其制造方法
KR20060117874A (ko) 포토마스크 및 영상 디바이스의 제조방법
CN116360202A (zh) 曝光成像结构、反射式光掩模版组及投影式光刻机
JP6722421B2 (ja) 位相シフトマスクおよびその製造方法
JP2012212124A (ja) フォトマスクの製造方法、パターン転写方法及び表示装置の製造方法
JP2014191323A (ja) プロキシミティ露光用フォトマスクおよびそれを用いるパターン露光方法
KR100810412B1 (ko) 레티클 및 그 제조 방법
KR20230046984A (ko) 포토마스크 및 이의 제조 방법
KR101673590B1 (ko) 하프톤 마스크의 리페어방법
JPH0651492A (ja) 位相シフトマスク及びその製造方法
KR20040059719A (ko) 블랭킷 포토 마스크의 접지구조

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20201013

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
AMND Amendment
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20201209

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20230111

Patent event code: PE09021S01D

AMND Amendment
E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20230711

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20230111

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

X091 Application refused [patent]
AMND Amendment
PX0901 Re-examination

Patent event code: PX09011S01I

Patent event date: 20230711

Comment text: Decision to Refuse Application

Patent event code: PX09012R01I

Patent event date: 20230612

Comment text: Amendment to Specification, etc.

Patent event code: PX09012R01I

Patent event date: 20201209

Comment text: Amendment to Specification, etc.

PX0701 Decision of registration after re-examination

Patent event date: 20231227

Comment text: Decision to Grant Registration

Patent event code: PX07013S01D

Patent event date: 20231207

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20230711

Comment text: Decision to Refuse Application

Patent event code: PX07011S01I

Patent event date: 20230612

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

Patent event date: 20201209

Comment text: Amendment to Specification, etc.

Patent event code: PX07012R01I

X701 Decision to grant (after re-examination)
GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20240327

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20240328

End annual number: 3

Start annual number: 1

PG1601 Publication of registration