JP7420065B2 - 大型フォトマスク - Google Patents

大型フォトマスク Download PDF

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Publication number
JP7420065B2
JP7420065B2 JP2020506656A JP2020506656A JP7420065B2 JP 7420065 B2 JP7420065 B2 JP 7420065B2 JP 2020506656 A JP2020506656 A JP 2020506656A JP 2020506656 A JP2020506656 A JP 2020506656A JP 7420065 B2 JP7420065 B2 JP 7420065B2
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Japan
Prior art keywords
light
film
shielding
low
pattern
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JP2020506656A
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Japanese (ja)
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JPWO2019177116A1 (ja
Inventor
冬木 今野
建也 三好
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Publication of JPWO2019177116A1 publication Critical patent/JPWO2019177116A1/ja
Priority to JP2023182390A priority Critical patent/JP2024001250A/ja
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Priority to JP2025087066A priority patent/JP2025122138A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020506656A 2018-03-15 2019-03-14 大型フォトマスク Active JP7420065B2 (ja)

Priority Applications (2)

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JP2023182390A JP2024001250A (ja) 2018-03-15 2023-10-24 大型フォトマスク
JP2025087066A JP2025122138A (ja) 2018-03-15 2025-05-26 大型フォトマスク

Applications Claiming Priority (5)

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JP2018048085 2018-03-15
JP2018048085 2018-03-15
JP2018238508 2018-12-20
JP2018238508 2018-12-20
PCT/JP2019/010647 WO2019177116A1 (ja) 2018-03-15 2019-03-14 大型フォトマスク

Related Child Applications (1)

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JP2023182390A Division JP2024001250A (ja) 2018-03-15 2023-10-24 大型フォトマスク

Publications (2)

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JPWO2019177116A1 JPWO2019177116A1 (ja) 2021-02-25
JP7420065B2 true JP7420065B2 (ja) 2024-01-23

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ID=67906680

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JP2020506656A Active JP7420065B2 (ja) 2018-03-15 2019-03-14 大型フォトマスク
JP2023182390A Pending JP2024001250A (ja) 2018-03-15 2023-10-24 大型フォトマスク
JP2025087066A Pending JP2025122138A (ja) 2018-03-15 2025-05-26 大型フォトマスク

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JP2023182390A Pending JP2024001250A (ja) 2018-03-15 2023-10-24 大型フォトマスク
JP2025087066A Pending JP2025122138A (ja) 2018-03-15 2025-05-26 大型フォトマスク

Country Status (5)

Country Link
JP (3) JP7420065B2 (https=)
KR (2) KR102653366B1 (https=)
CN (1) CN112119352B (https=)
TW (1) TWI711878B (https=)
WO (1) WO2019177116A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2025258A (en) * 2019-05-02 2020-11-05 Asml Netherlands Bv A patterning device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
KR101473163B1 (ko) 2013-07-26 2014-12-16 주식회사 에스앤에스텍 플랫 패널 디스플레이용 블랭크 마스크 및 포토 마스크
JP2016045490A (ja) 2014-08-25 2016-04-04 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP2016188997A (ja) 2015-03-27 2016-11-04 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
JP2017026701A (ja) 2015-07-17 2017-02-02 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
JP2018116263A (ja) 2017-01-16 2018-07-26 Hoya株式会社 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法

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US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask
JPH11125896A (ja) * 1997-08-19 1999-05-11 Toppan Printing Co Ltd フォトマスクブランクス及びフォトマスク
JP4088742B2 (ja) 2000-12-26 2008-05-21 信越化学工業株式会社 フォトマスクブランクス、フォトマスク及びフォトマスクブランクスの製造方法
ATE487255T1 (de) * 2001-05-31 2010-11-15 Nichia Corp Halbleiterlaserelement
JP4389440B2 (ja) * 2002-10-29 2009-12-24 凸版印刷株式会社 転写マスク及びその作製方法
WO2004070472A1 (ja) * 2003-02-03 2004-08-19 Hoya Corporation フォトマスクブランク及びフォトマスク、並びにフォトマスクを用いたパターン転写方法
JP2007156365A (ja) * 2005-12-09 2007-06-21 Canon Inc 反射防止膜、光学素子、光学系、露光装置及びデバイス製造方法
TW200745630A (en) * 2006-04-24 2007-12-16 Asahi Glass Co Ltd Blank, black matrix, and color filter
US8198118B2 (en) * 2006-10-31 2012-06-12 Taiwan Semiconductor Manufacturing Co. Method for forming a robust mask with reduced light scattering
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
WO2008139904A1 (ja) * 2007-04-27 2008-11-20 Hoya Corporation フォトマスクブランク及びフォトマスク
JP2009229868A (ja) * 2008-03-24 2009-10-08 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
KR20090110240A (ko) * 2008-04-16 2009-10-21 지오마텍 가부시키가이샤 포토마스크용 기판, 포토마스크 및 그의 제조방법
KR20110115058A (ko) * 2010-04-14 2011-10-20 주식회사 에스앤에스텍 포토마스크 블랭크, 포토마스크 및 패턴 형성 방법
CN110083008A (zh) * 2011-10-21 2019-08-02 大日本印刷株式会社 大型相移掩模及大型相移掩模的制造方法
JP6106579B2 (ja) * 2013-11-25 2017-04-05 Hoya株式会社 フォトマスクの製造方法、フォトマスク及びパターン転写方法
JP6594742B2 (ja) * 2014-11-20 2019-10-23 Ｈｏｙａ株式会社 フォトマスクブランク及びそれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR101846065B1 (ko) * 2015-03-27 2018-04-05 호야 가부시키가이샤 포토마스크 블랭크 및 이것을 사용한 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
KR20160129789A (ko) * 2015-04-30 2016-11-09 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토마스크
CN107848946A (zh) * 2015-07-23 2018-03-27 三菱瓦斯化学株式会社 新型(甲基)丙烯酰基化合物及其制造方法
JP6451561B2 (ja) * 2015-09-03 2019-01-16 信越化学工業株式会社 フォトマスクブランク
JP7125835B2 (ja) * 2016-04-05 2022-08-25 旭化成株式会社 ペリクル

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008090254A (ja) 2006-09-04 2008-04-17 Geomatec Co Ltd フォトマスク用基板及びフォトマスク並びにその製造方法
KR101473163B1 (ko) 2013-07-26 2014-12-16 주식회사 에스앤에스텍 플랫 패널 디스플레이용 블랭크 마스크 및 포토 마스크
JP2016045490A (ja) 2014-08-25 2016-04-04 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
JP2016188997A (ja) 2015-03-27 2016-11-04 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
JP2017026701A (ja) 2015-07-17 2017-02-02 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
JP2018116263A (ja) 2017-01-16 2018-07-26 Hoya株式会社 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法

Also Published As

Publication number Publication date
JP2024001250A (ja) 2024-01-09
JP2025122138A (ja) 2025-08-20
TW201945832A (zh) 2019-12-01
WO2019177116A1 (ja) 2019-09-19
CN112119352B (zh) 2024-07-26
KR102653366B1 (ko) 2024-04-02
KR20200128141A (ko) 2020-11-11
KR102944085B1 (ko) 2026-03-27
CN112119352A (zh) 2020-12-22
JPWO2019177116A1 (ja) 2021-02-25
KR20240046289A (ko) 2024-04-08
TWI711878B (zh) 2020-12-01

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