CN112119352B - 大型光掩模 - Google Patents

大型光掩模 Download PDF

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Publication number
CN112119352B
CN112119352B CN201980032507.6A CN201980032507A CN112119352B CN 112119352 B CN112119352 B CN 112119352B CN 201980032507 A CN201980032507 A CN 201980032507A CN 112119352 B CN112119352 B CN 112119352B
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China
Prior art keywords
light
film
pattern
low reflection
exposure
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CN201980032507.6A
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Chinese (zh)
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CN112119352A (zh
Inventor
今野冬木
三好建也
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Publication of CN112119352A publication Critical patent/CN112119352A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201980032507.6A 2018-03-15 2019-03-14 大型光掩模 Active CN112119352B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2018-048085 2018-03-15
JP2018048085 2018-03-15
JP2018238508 2018-12-20
JP2018-238508 2018-12-20
PCT/JP2019/010647 WO2019177116A1 (ja) 2018-03-15 2019-03-14 大型フォトマスク

Publications (2)

Publication Number Publication Date
CN112119352A CN112119352A (zh) 2020-12-22
CN112119352B true CN112119352B (zh) 2024-07-26

Family

ID=67906680

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980032507.6A Active CN112119352B (zh) 2018-03-15 2019-03-14 大型光掩模

Country Status (5)

Country Link
JP (3) JP7420065B2 (https=)
KR (2) KR102653366B1 (https=)
CN (1) CN112119352B (https=)
TW (1) TWI711878B (https=)
WO (1) WO2019177116A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2025258A (en) * 2019-05-02 2020-11-05 Asml Netherlands Bv A patterning device

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JP2009229868A (ja) * 2008-03-24 2009-10-08 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
KR20090110240A (ko) * 2008-04-16 2009-10-21 지오마텍 가부시키가이샤 포토마스크용 기판, 포토마스크 및 그의 제조방법
KR20110115058A (ko) * 2010-04-14 2011-10-20 주식회사 에스앤에스텍 포토마스크 블랭크, 포토마스크 및 패턴 형성 방법
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JP6594742B2 (ja) * 2014-11-20 2019-10-23 Ｈｏｙａ株式会社 フォトマスクブランク及びそれを用いたフォトマスクの製造方法、並びに表示装置の製造方法
KR101846065B1 (ko) * 2015-03-27 2018-04-05 호야 가부시키가이샤 포토마스크 블랭크 및 이것을 사용한 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
KR20160129789A (ko) * 2015-04-30 2016-11-09 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토마스크
JP6352224B2 (ja) * 2015-07-17 2018-07-04 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
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Patent Citations (1)

* Cited by examiner, † Cited by third party
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JP2016188997A (ja) * 2015-03-27 2016-11-04 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法

Also Published As

Publication number Publication date
JP2024001250A (ja) 2024-01-09
JP2025122138A (ja) 2025-08-20
TW201945832A (zh) 2019-12-01
WO2019177116A1 (ja) 2019-09-19
KR102653366B1 (ko) 2024-04-02
KR20200128141A (ko) 2020-11-11
JP7420065B2 (ja) 2024-01-23
KR102944085B1 (ko) 2026-03-27
CN112119352A (zh) 2020-12-22
JPWO2019177116A1 (ja) 2021-02-25
KR20240046289A (ko) 2024-04-08
TWI711878B (zh) 2020-12-01

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