KR102644010B1 - 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액 - Google Patents

표면개질된 중공실리카 및 표면개질된 중공실리카 분산액 Download PDF

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Publication number
KR102644010B1
KR102644010B1 KR1020210117800A KR20210117800A KR102644010B1 KR 102644010 B1 KR102644010 B1 KR 102644010B1 KR 1020210117800 A KR1020210117800 A KR 1020210117800A KR 20210117800 A KR20210117800 A KR 20210117800A KR 102644010 B1 KR102644010 B1 KR 102644010B1
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South Korea
Prior art keywords
hollow silica
modified hollow
silica dispersion
silane
ethyl
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KR1020210117800A
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English (en)
Korean (ko)
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KR20230034713A (ko
Inventor
이유진
하승훈
김수연
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주식회사 케이씨텍
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Priority to KR1020210117800A priority Critical patent/KR102644010B1/ko
Priority to JP2022020415A priority patent/JP7422796B2/ja
Priority to TW111114410A priority patent/TWI823345B/zh
Priority to CN202210393958.6A priority patent/CN115746616A/zh
Publication of KR20230034713A publication Critical patent/KR20230034713A/ko
Application granted granted Critical
Publication of KR102644010B1 publication Critical patent/KR102644010B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

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  • Silicon Compounds (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
KR1020210117800A 2021-09-03 2021-09-03 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액 KR102644010B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020210117800A KR102644010B1 (ko) 2021-09-03 2021-09-03 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액
JP2022020415A JP7422796B2 (ja) 2021-09-03 2022-02-14 表面改質された中空シリカ及び表面改質された中空シリカの分散液
TW111114410A TWI823345B (zh) 2021-09-03 2022-04-15 表面改質的中空二氧化矽及表面改質的中空二氧化矽分散液
CN202210393958.6A CN115746616A (zh) 2021-09-03 2022-04-15 表面改性的中空二氧化硅粒子及表面改性的中空二氧化硅分散液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020210117800A KR102644010B1 (ko) 2021-09-03 2021-09-03 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액

Publications (2)

Publication Number Publication Date
KR20230034713A KR20230034713A (ko) 2023-03-10
KR102644010B1 true KR102644010B1 (ko) 2024-03-07

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KR1020210117800A KR102644010B1 (ko) 2021-09-03 2021-09-03 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액

Country Status (4)

Country Link
JP (1) JP7422796B2 (zh)
KR (1) KR102644010B1 (zh)
CN (1) CN115746616A (zh)
TW (1) TWI823345B (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011173945A (ja) 2010-02-23 2011-09-08 Mitsubishi Rayon Co Ltd 被膜用シリカゾルの製造方法、被膜用組成物、被膜、被膜を表層に有する樹脂積層体、及びその製造方法

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JP5078620B2 (ja) * 2005-11-25 2012-11-21 日揮触媒化成株式会社 中空シリカ微粒子、それを含む透明被膜形成用組成物、および透明被膜付基材
JP5358080B2 (ja) * 2006-10-19 2013-12-04 富士フイルム株式会社 無機微粒子、組成物、硬化物、光学フィルム、偏光板、及び画像表示装置
JP5223411B2 (ja) * 2008-03-27 2013-06-26 Ｊｓｒ株式会社 シリカ系中空粒子の製造方法
JP5614968B2 (ja) * 2009-10-22 2014-10-29 株式会社Adeka 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法
JP5713668B2 (ja) * 2010-12-28 2015-05-07 日揮触媒化成株式会社 ハードコート層膜形成用塗料組成物
US9389339B2 (en) * 2011-04-22 2016-07-12 Fujifilm Corporation Method for producing antireflection film, antireflection film, and coating composition
KR101141955B1 (ko) * 2011-05-30 2012-05-04 백산철강(주) 저굴절 중공 복합체, 그 제조 방법 및 이를 포함하는 코팅액
WO2014057976A1 (ja) * 2012-10-10 2014-04-17 Dic株式会社 コア－シェル型シリカナノ粒子及びその製造方法、並びにこれを利用した中空シリカナノ粒子の製造方法及び該製法により得られる中空シリカナノ粒子
CN103803565B (zh) * 2014-02-11 2015-09-09 厦门大学 一种单分散性中空介孔二氧化硅纳米粒子的制备方法
WO2015138153A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing silica/polymer hybrid hollow nanospheres through interfacial polymerization in inverse miniemulsions
KR101790553B1 (ko) * 2014-05-30 2017-10-26 (주)석경에이티 중공실리카 입자의 제조방법, 중공실리카 입자 및 그를 포함하는 조성물 및 단열 시트
JP6904531B2 (ja) * 2016-11-14 2021-07-21 Ｅｎｅｏｓ株式会社 複合粒子、複合粒子の製造方法、金属ナノ粒子を内包する中空シリカ粒子の製造方法、触媒、及びアルケン類の製造方法
JP6895760B2 (ja) * 2017-02-03 2021-06-30 日揮触媒化成株式会社 シリカ系粒子分散液の製造方法、シリカ系粒子分散液、透明被膜形成用塗布液及び透明被膜付基材
CN107265465B (zh) * 2017-06-07 2019-04-16 山东交通学院 一种中空二氧化硅纳米球的制备方法及其产品
JP7071418B2 (ja) * 2019-02-15 2022-05-18 ローム アンド ハース エレクトロニック マテリアルズ エルエルシー 反射防止コーティング

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011173945A (ja) 2010-02-23 2011-09-08 Mitsubishi Rayon Co Ltd 被膜用シリカゾルの製造方法、被膜用組成物、被膜、被膜を表層に有する樹脂積層体、及びその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
담명녕, 나노실리카 중공 미세구조의 제조, 상명대학교 대학원 자연과학대학 공업화학과 석사학위 논문, 2008년

Also Published As

Publication number Publication date
CN115746616A (zh) 2023-03-07
JP2023037553A (ja) 2023-03-15
KR20230034713A (ko) 2023-03-10
JP7422796B2 (ja) 2024-01-26
TW202311161A (zh) 2023-03-16
TWI823345B (zh) 2023-11-21

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