JP7422796B2 - 表面改質された中空シリカ及び表面改質された中空シリカの分散液 - Google Patents

表面改質された中空シリカ及び表面改質された中空シリカの分散液 Download PDF

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JP7422796B2
JP7422796B2 JP2022020415A JP2022020415A JP7422796B2 JP 7422796 B2 JP7422796 B2 JP 7422796B2 JP 2022020415 A JP2022020415 A JP 2022020415A JP 2022020415 A JP2022020415 A JP 2022020415A JP 7422796 B2 JP7422796 B2 JP 7422796B2
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hollow silica
silane
dispersion
vinyl
ethyl
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JP2023037553A (ja
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ユ ジン イ
スン フン ハ
ス ヨン キム
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ケーシーテック カンパニー リミテッド
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  • Silicon Compounds (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Inorganic Chemistry (AREA)
JP2022020415A 2021-09-03 2022-02-14 表面改質された中空シリカ及び表面改質された中空シリカの分散液 Active JP7422796B2 (ja)

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KR10-2021-0117800 2021-09-03
KR1020210117800A KR102644010B1 (ko) 2021-09-03 2021-09-03 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액

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JP7422796B2 true JP7422796B2 (ja) 2024-01-26

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Citations (7)

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JP2008121011A (ja) 2006-10-19 2008-05-29 Fujifilm Corp 塗布組成物、硬化物、光学フィルム、反射防止フィルム、偏光板、及び画像表示装置
JP2009234854A (ja) 2008-03-27 2009-10-15 Jsr Corp シリカ系中空粒子の製造方法
KR101141955B1 (ko) 2011-05-30 2012-05-04 백산철강(주) 저굴절 중공 복합체, 그 제조 방법 및 이를 포함하는 코팅액
JP2012140520A (ja) 2010-12-28 2012-07-26 Jgc Catalysts & Chemicals Ltd 塗料組成物
JP2012234170A (ja) 2011-04-22 2012-11-29 Fujifilm Corp 反射防止フィルムの製造方法、反射防止フィルム、塗布組成物
JP2018080070A (ja) 2016-11-14 2018-05-24 Jxtgエネルギー株式会社 複合粒子、複合粒子の製造方法、金属ナノ粒子を内包する中空シリカ粒子の製造方法、触媒、及びアルケン類の製造方法
JP2018123043A (ja) 2017-02-03 2018-08-09 日揮触媒化成株式会社 シリカ系粒子分散液の製造方法、シリカ系粒子分散液、透明被膜形成用塗布液及び透明被膜付基材

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WO2007060884A1 (ja) * 2005-11-25 2007-05-31 Catalysts & Chemicals Industries Co., Ltd. 中空シリカ微粒子、それを含む透明被膜形成用組成物、および透明被膜付基材
JP5614968B2 (ja) * 2009-10-22 2014-10-29 株式会社Adeka 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法
JP5601496B2 (ja) * 2010-02-23 2014-10-08 三菱レイヨン株式会社 被膜用シリカゾルの製造方法、被膜用組成物、被膜、被膜を表層に有する樹脂積層体、及びその製造方法
US20150274538A1 (en) * 2012-10-10 2015-10-01 Dic Corporation Core-shell silica nanoparticles, method for manufacturing the same, method for manufacturing hollow silica nanoparticles therefrom, and hollow silica nanoparticles manufactured thereby
CN103803565B (zh) * 2014-02-11 2015-09-09 厦门大学 一种单分散性中空介孔二氧化硅纳米粒子的制备方法
WO2015138153A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Process for preparing silica/polymer hybrid hollow nanospheres through interfacial polymerization in inverse miniemulsions
KR101790553B1 (ko) * 2014-05-30 2017-10-26 (주)석경에이티 중공실리카 입자의 제조방법, 중공실리카 입자 및 그를 포함하는 조성물 및 단열 시트
CN107265465B (zh) * 2017-06-07 2019-04-16 山东交通学院 一种中空二氧化硅纳米球的制备方法及其产品
JP7071418B2 (ja) * 2019-02-15 2022-05-18 ローム アンド ハース エレクトロニック マテリアルズ エルエルシー 反射防止コーティング

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008121011A (ja) 2006-10-19 2008-05-29 Fujifilm Corp 塗布組成物、硬化物、光学フィルム、反射防止フィルム、偏光板、及び画像表示装置
JP2009234854A (ja) 2008-03-27 2009-10-15 Jsr Corp シリカ系中空粒子の製造方法
JP2012140520A (ja) 2010-12-28 2012-07-26 Jgc Catalysts & Chemicals Ltd 塗料組成物
JP2012234170A (ja) 2011-04-22 2012-11-29 Fujifilm Corp 反射防止フィルムの製造方法、反射防止フィルム、塗布組成物
KR101141955B1 (ko) 2011-05-30 2012-05-04 백산철강(주) 저굴절 중공 복합체, 그 제조 방법 및 이를 포함하는 코팅액
JP2018080070A (ja) 2016-11-14 2018-05-24 Jxtgエネルギー株式会社 複合粒子、複合粒子の製造方法、金属ナノ粒子を内包する中空シリカ粒子の製造方法、触媒、及びアルケン類の製造方法
JP2018123043A (ja) 2017-02-03 2018-08-09 日揮触媒化成株式会社 シリカ系粒子分散液の製造方法、シリカ系粒子分散液、透明被膜形成用塗布液及び透明被膜付基材

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KR20230034713A (ko) 2023-03-10
TWI823345B (zh) 2023-11-21
TW202311161A (zh) 2023-03-16
KR102644010B1 (ko) 2024-03-07
JP2023037553A (ja) 2023-03-15
CN115746616A (zh) 2023-03-07

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