KR102637165B1 - 유량 측정 장치 및 처리 장치 - Google Patents
유량 측정 장치 및 처리 장치 Download PDFInfo
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- KR102637165B1 KR102637165B1 KR1020160075721A KR20160075721A KR102637165B1 KR 102637165 B1 KR102637165 B1 KR 102637165B1 KR 1020160075721 A KR1020160075721 A KR 1020160075721A KR 20160075721 A KR20160075721 A KR 20160075721A KR 102637165 B1 KR102637165 B1 KR 102637165B1
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- 238000012545 processing Methods 0.000 title claims abstract description 140
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 70
- 238000005259 measurement Methods 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 30
- 230000008859 change Effects 0.000 claims abstract description 24
- 238000004364 calculation method Methods 0.000 claims abstract description 7
- 239000007789 gas Substances 0.000 claims description 137
- 239000007788 liquid Substances 0.000 claims description 93
- 238000010438 heat treatment Methods 0.000 claims description 81
- 230000007246 mechanism Effects 0.000 claims description 42
- 239000011248 coating agent Substances 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 36
- 239000000126 substance Substances 0.000 claims description 21
- 238000011282 treatment Methods 0.000 claims description 15
- 230000007423 decrease Effects 0.000 claims description 8
- 238000012790 confirmation Methods 0.000 claims description 7
- 238000001514 detection method Methods 0.000 claims description 6
- 230000005484 gravity Effects 0.000 claims description 6
- 230000001133 acceleration Effects 0.000 claims description 5
- 238000009529 body temperature measurement Methods 0.000 claims description 5
- 230000002123 temporal effect Effects 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000005856 abnormality Effects 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 10
- 235000012431 wafers Nutrition 0.000 description 69
- 238000012546 transfer Methods 0.000 description 27
- 238000007664 blowing Methods 0.000 description 12
- 239000003595 mist Substances 0.000 description 10
- 230000006870 function Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 8
- QDZOEBFLNHCSSF-PFFBOGFISA-N (2S)-2-[[(2R)-2-[[(2S)-1-[(2S)-6-amino-2-[[(2S)-1-[(2R)-2-amino-5-carbamimidamidopentanoyl]pyrrolidine-2-carbonyl]amino]hexanoyl]pyrrolidine-2-carbonyl]amino]-3-(1H-indol-3-yl)propanoyl]amino]-N-[(2R)-1-[[(2S)-1-[[(2R)-1-[[(2S)-1-[[(2S)-1-amino-4-methyl-1-oxopentan-2-yl]amino]-4-methyl-1-oxopentan-2-yl]amino]-3-(1H-indol-3-yl)-1-oxopropan-2-yl]amino]-1-oxo-3-phenylpropan-2-yl]amino]-3-(1H-indol-3-yl)-1-oxopropan-2-yl]pentanediamide Chemical compound C([C@@H](C(=O)N[C@H](CC=1C2=CC=CC=C2NC=1)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CC(C)C)C(N)=O)NC(=O)[C@@H](CC=1C2=CC=CC=C2NC=1)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@@H](CC=1C2=CC=CC=C2NC=1)NC(=O)[C@H]1N(CCC1)C(=O)[C@H](CCCCN)NC(=O)[C@H]1N(CCC1)C(=O)[C@H](N)CCCNC(N)=N)C1=CC=CC=C1 QDZOEBFLNHCSSF-PFFBOGFISA-N 0.000 description 7
- 102100024304 Protachykinin-1 Human genes 0.000 description 7
- 101800003906 Substance P Proteins 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 101150075071 TRS1 gene Proteins 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 238000000859 sublimation Methods 0.000 description 3
- 230000008022 sublimation Effects 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 238000012795 verification Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- CWWARWOPSKGELM-SARDKLJWSA-N methyl (2s)-2-[[(2s)-2-[[2-[[(2s)-2-[[(2s)-2-[[(2s)-5-amino-2-[[(2s)-5-amino-2-[[(2s)-1-[(2s)-6-amino-2-[[(2s)-1-[(2s)-2-amino-5-(diaminomethylideneamino)pentanoyl]pyrrolidine-2-carbonyl]amino]hexanoyl]pyrrolidine-2-carbonyl]amino]-5-oxopentanoyl]amino]-5 Chemical compound C([C@@H](C(=O)NCC(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCSC)C(=O)OC)NC(=O)[C@H](CC=1C=CC=CC=1)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@H]1N(CCC1)C(=O)[C@H](CCCCN)NC(=O)[C@H]1N(CCC1)C(=O)[C@@H](N)CCCN=C(N)N)C1=CC=CC=C1 CWWARWOPSKGELM-SARDKLJWSA-N 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F3/00—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow
- G01F3/02—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement
- G01F3/20—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows
- G01F3/22—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows for gases
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Measuring Volume Flow (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2015-123949 | 2015-06-19 | ||
JP2015123949A JP6369398B2 (ja) | 2015-06-19 | 2015-06-19 | 流量測定装置、及び処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160150047A KR20160150047A (ko) | 2016-12-28 |
KR102637165B1 true KR102637165B1 (ko) | 2024-02-16 |
Family
ID=57724740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160075721A KR102637165B1 (ko) | 2015-06-19 | 2016-06-17 | 유량 측정 장치 및 처리 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6369398B2 (zh) |
KR (1) | KR102637165B1 (zh) |
TW (1) | TWI647428B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019214827A1 (en) * | 2018-05-10 | 2019-11-14 | Kostov Mihail | Apparatus and method for estimating fluid parameters |
JP2020118476A (ja) * | 2019-01-21 | 2020-08-06 | Tdk株式会社 | 風速測定方法および風速計 |
CN110567537A (zh) * | 2019-09-10 | 2019-12-13 | 贵阳学院 | 一种重力杆式光纤流量传感器及其流量检测方法 |
CN110658355A (zh) * | 2019-11-01 | 2020-01-07 | 烟台龙源电力技术股份有限公司 | 一种管道气流流速测量装置 |
CN111604324A (zh) * | 2020-05-15 | 2020-09-01 | 北京北方华创微电子装备有限公司 | 晶片清洗机的控制方法及晶片清洗机 |
KR102246720B1 (ko) * | 2020-06-23 | 2021-04-30 | (주)발맥스기술 | 초음파 유량 측정 장치 |
TWI764654B (zh) * | 2021-03-30 | 2022-05-11 | 明泰科技股份有限公司 | 用以檢測出風路徑暢通或阻塞的風量檢測裝置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013057543A (ja) * | 2011-09-07 | 2013-03-28 | Denso Corp | 空気流量測定装置 |
JP2014048064A (ja) * | 2012-08-29 | 2014-03-17 | Andex Co Ltd | 風速計、及びこれを備えた塗装ブース |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56172723U (zh) * | 1980-05-23 | 1981-12-19 | ||
JPS5977024U (ja) * | 1982-11-15 | 1984-05-24 | 東京瓦斯株式会社 | ベ−ン式流量検出装置 |
US4599907A (en) * | 1985-04-19 | 1986-07-15 | Kraus Robert A | Mass-flow sensing transducer |
US5041009A (en) | 1987-08-31 | 1991-08-20 | Amp Incorporated | Daisy chain connector and method |
JPH02223822A (ja) * | 1989-02-23 | 1990-09-06 | Maezawa Ind Inc | 流速または流量の測定方法及び測定装置 |
JPH05280735A (ja) * | 1992-03-30 | 1993-10-26 | Ubukata Seisakusho:Kk | 風量計及びそれを用いた装置 |
US7024945B2 (en) * | 2002-02-22 | 2006-04-11 | Compumedics Limited | Flow sensing apparatus |
TWM321522U (en) * | 2007-04-19 | 2007-11-01 | Tong Dean Tech Co Ltd | Flow sensing device |
-
2015
- 2015-06-19 JP JP2015123949A patent/JP6369398B2/ja active Active
-
2016
- 2016-06-13 TW TW105118287A patent/TWI647428B/zh active
- 2016-06-17 KR KR1020160075721A patent/KR102637165B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013057543A (ja) * | 2011-09-07 | 2013-03-28 | Denso Corp | 空気流量測定装置 |
JP2014048064A (ja) * | 2012-08-29 | 2014-03-17 | Andex Co Ltd | 風速計、及びこれを備えた塗装ブース |
Also Published As
Publication number | Publication date |
---|---|
KR20160150047A (ko) | 2016-12-28 |
JP2017009380A (ja) | 2017-01-12 |
TW201704721A (zh) | 2017-02-01 |
JP6369398B2 (ja) | 2018-08-08 |
TWI647428B (zh) | 2019-01-11 |
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