KR102635086B1 - Euv광용 감광성 조성물, 패턴 형성 방법, 전자 디바이스의 제조 방법 - Google Patents

Euv광용 감광성 조성물, 패턴 형성 방법, 전자 디바이스의 제조 방법 Download PDF

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KR102635086B1
KR102635086B1 KR1020217028449A KR20217028449A KR102635086B1 KR 102635086 B1 KR102635086 B1 KR 102635086B1 KR 1020217028449 A KR1020217028449 A KR 1020217028449A KR 20217028449 A KR20217028449 A KR 20217028449A KR 102635086 B1 KR102635086 B1 KR 102635086B1
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KR20210124392A (ko
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쿄헤이 사키타
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후지필름 가부시키가이샤
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/283—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate
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    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F220/585—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine and containing other heteroatoms, e.g. 2-acrylamido-2-methylpropane sulfonic acid [AMPS]
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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    • C08F212/22—Oxygen
    • C08F212/24—Phenols or alcohols

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Materials For Photolithography (AREA)
KR1020217028449A 2019-03-29 2020-03-09 Euv광용 감광성 조성물, 패턴 형성 방법, 전자 디바이스의 제조 방법 Active KR102635086B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2019067401 2019-03-29
JPJP-P-2019-067401 2019-03-29
JPJP-P-2020-030660 2020-02-26
JP2020030660 2020-02-26
PCT/JP2020/010050 WO2020203073A1 (ja) 2019-03-29 2020-03-09 Ｅｕｖ光用感光性組成物、パターン形成方法、電子デバイスの製造方法

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KR20210124392A KR20210124392A (ko) 2021-10-14
KR102635086B1 true KR102635086B1 (ko) 2024-02-08

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US (1) US20210405530A1 (https=)
EP (1) EP3950744B1 (https=)
JP (1) JPWO2020203073A1 (https=)
KR (1) KR102635086B1 (https=)
CN (1) CN113574079B (https=)
IL (1) IL285690A (https=)
TW (1) TWI824124B (https=)
WO (1) WO2020203073A1 (https=)

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WO2018193954A1 (ja) * 2017-04-21 2018-10-25 富士フイルム株式会社 Ｅｕｖ光用感光性組成物、パターン形成方法、電子デバイスの製造方法
WO2019045107A1 (ja) * 2017-09-04 2019-03-07 富士フイルム株式会社 反転パターン形成方法、電子デバイスの製造方法
WO2019058945A1 (ja) * 2017-09-20 2019-03-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び、電子デバイスの製造方法

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